公开(公告)号：US06223447B1

公开(公告)日：2001-05-01

申请号：US09504288

申请日：2000-02-15

申请人： Joseph Yudovsky ,  Salvador Umotoy ,  Lawrence C. Lei ,  Ronald Rose

发明人： Joseph Yudovsky ,  Salvador Umotoy ,  Lawrence C. Lei ,  Ronald Rose

IPC分类号： F26B1724

CPC分类号： H01L21/68721 ,  H01L21/68735

摘要： A fastening device which prevents rotational and vertical displacement of a purge ring caused by purge gas exiting the purge ring or caused by other processing conditions. The fastening device comprises a clamp which releasably holds the purge ring together with the wafer support. A pin is inserted into a bore through the purge ring, wafer support and the clamp to releasably secure the clamp in place. Slots may be formed in the purge ring to guide placement of the clamp.

摘要翻译： 一种紧固装置，其防止由吹扫气体离开吹扫环或由其它加工条件引起的清洗环的旋转和垂直位移。 紧固装置包括可拆卸地将清洗环与晶片支撑件一起保持的夹具。 销通过清洗环，晶片支架和夹具插入孔中，以将夹具可释放地固定到位。 槽可以形成在清洗环中以引导夹具的放置。

公开(公告)号：US08342119B2

公开(公告)日：2013-01-01

申请号：US11870285

申请日：2007-10-10

申请人： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

发明人： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

IPC分类号： C23C16/458

CPC分类号： C23C16/4585 ,  C30B25/12 ,  C30B31/14

摘要： The invention provides a removable first edge ring configured for pin and recess/slot coupling with a second edge ring disposed on the substrate support. In one embodiment, a first edge ring includes a plurality of pins, and a second edge ring includes one or more alignment recesses and one or more alignment slots for mating engagement with the pins. Each of the alignment recesses and alignment slots are at least as wide as the corresponding pins, and each of the alignment slots extends in the radial direction a length that is sufficient to compensate for the difference in thermal expansion between the first edge ring and the second edge ring.

公开(公告)号：US06589352B1

公开(公告)日：2003-07-08

申请号：US09459313

申请日：1999-12-10

申请人： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

发明人： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

IPC分类号： C23C1600

CPC分类号： C23C16/4585 ,  C30B25/12 ,  C30B31/14

摘要： The invention provides a removable first edge ring configured for pin and recess/slot coupling with a second edge ring disposed on the substrate support. In one embodiment, a first edge ring includes a plurality of pins, and a second edge ring includes one or more alignment recesses and one or more alignment slots for mating engagement with the pins. Each of the alignment recesses and alignment slots are at least as wide as the corresponding pins, and each of the alignment slots extends in the radial direction a length that is sufficient to compensate for the difference in thermal expansion between the first edge ring and the second edge ring.

摘要翻译： 本发明提供了可拆卸的第一边缘环，其被配置用于与设置在基板支撑件上的第二边缘环的销和凹槽/狭槽联接。 在一个实施例中，第一边缘环包括多个销，并且第二边缘环包括一个或多个对准凹槽和用于与销配合接合的一个或多个对准槽。 每个对准凹槽和对准槽至少与相应的销一样宽，并且每个对准槽在径向方向上延伸的长度足以补偿第一边缘环和第二边缘之间的热膨胀差 边缘环。

公开(公告)号：US06503331B1

公开(公告)日：2003-01-07

申请号：US09660006

申请日：2000-09-12

申请人： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy

发明人： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy

IPC分类号： C23C1600

CPC分类号： H01J37/3244 ,  H01J2237/022

摘要： Provided herewith is a chamber for depositing a film on a substrate comprising a process compartment; a purge compartment, a purge ring located on the chamber body to separate the two compartments, a heater, and a shadow ring covering the periphery of the substrate. Alternatively, the chamber may further comprise a shield interconnected with the shadow ring. Still provided is a method for depositing a film of uniformity on a substrate in such a chamber. The method comprises the steps of positioning the substrate in a process compartment; flowing a process gas into the process compartment; flowing a purge gas in a purge compartment; and exhausting the process and purge gas from the chamber, thereby depositing a film of uniformity on the substrate.

摘要翻译： 提供了一种用于在包括处理隔室的基板上沉积膜的室; 净化室，位于室主体上以分离两个隔室的清洗环，加热器和覆盖基板周边的阴影环。 或者，腔室可以进一步包括与阴影环互连的护罩。 仍然提供了一种在这种室中的基板上沉积均匀膜的方法。 该方法包括以下步骤：将基板定位在处理室中; 将工艺气体流入加工室; 将吹扫气体流入净化室; 并排出该过程并从室中吹扫气体，从而在衬底上沉积均匀的膜。

公开(公告)号：US06375748B1

公开(公告)日：2002-04-23

申请号：US09387928

申请日：1999-09-01

申请人： Joseph Yudovsky ,  Tom Madar ,  Salvador Umotoy ,  Son Ngoc Trinh ,  Lawrence C. Lei ,  Anzhong (Andrew) Chang ,  Xiaoxiong (John) Yuan

发明人： Joseph Yudovsky ,  Tom Madar ,  Salvador Umotoy ,  Son Ngoc Trinh ,  Lawrence C. Lei ,  Anzhong (Andrew) Chang ,  Xiaoxiong (John) Yuan

IPC分类号： C23C1600

CPC分类号： H01L21/68735 ,  H01L21/68785

摘要： A substrate support having a removable edge ring, which is made of a material having a lower coefficient of thermal expansion (CTE), than that of the substrate support is provided. The edge ring and the substrate support are configured for pin and slot coupling. Specifically, either the edge ring, or the substrate support comprises a plurality of pins, and the other of the edge ring or the substrate support comprises a plurality of hollow regions or slots in which the pins may be inserted. The slots are at least as wide as a corresponding one of the plurality of pins and extend in the direction in which the substrate support expands and contracts during thermal cycling. Each of the slots extends a length which is sufficient to compensate for the difference between the CTE of the substrate support and the CTE of the edge ring, over the range of process temperatures to which the apparatus is exposed. Preferably the susceptor is made of aluminum, and the edge ring is made of ceramic. A restrictor gap may be defined between a surface of the substrate support and a surface of the purge ring so as to restrict a volume of purge gas flowing to an edge of a substrate positioned on the substrate support. The purge gas delivery channel may have an exposed outlet and may be upwardly angled to facilitate cleaning.

摘要翻译： 提供了一种具有可移除的边缘环的衬底支撑件，其由具有比衬底支撑件的热膨胀系数（CTE）低的材料制成。 边缘环和基板支撑件配置为销和槽联接。 具体来说，边缘环或衬底支撑件包括多个销，并且边缘环或衬底支撑件中的另一个包括可以插入销的多个中空区域或狭槽。 所述槽至少与所述多个销中相应的销一样宽，并且在所述基板支撑件在热循环期间膨胀和收缩的方向上延伸。 每个狭槽的长度足以补偿基板支撑件的CTE与边缘环的CTE之间的差异，在该设备暴露于该处理温度的范围内。 优选地，基座由铝制成，并且边缘环由陶瓷制成。 限定器间隙可以限定在衬底支撑件的表面和净化环的表面之间，以便限制流过位于衬底支撑件上的衬底的边缘的吹扫气体的体积。 净化气体输送通道可以具有暴露的出口并且可以向上成角度以便于清洁。

公开(公告)号：US20080072823A1

公开(公告)日：2008-03-27

申请号：US11870285

申请日：2007-10-10

申请人： Joseph Yudovsky ,  Lawrence Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

发明人： Joseph Yudovsky ,  Lawrence Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

IPC分类号： C23C16/458

CPC分类号： C23C16/4585 ,  C30B25/12 ,  C30B31/14

摘要： The invention provides a removable first edge ring configured for pin and recess/slot coupling with a second edge ring disposed on the substrate support. In one embodiment, a first edge ring includes a plurality of pins, and a second edge ring includes one or more alignment recesses and one or more alignment slots for mating engagement with the pins. Each of the alignment recesses and alignment slots are at least as wide as the corresponding pins, and each of the alignment slots extends in the radial direction a length that is sufficient to compensate for the difference in thermal expansion between the first edge ring and the second edge ring.

摘要翻译： 本发明提供了可拆卸的第一边缘环，其被配置用于与设置在基板支撑件上的第二边缘环的销和凹槽/狭槽联接。 在一个实施例中，第一边缘环包括多个销，并且第二边缘环包括一个或多个对准凹槽和用于与销配合接合的一个或多个对准槽。 每个对准凹槽和对准槽至少与相应的销一样宽，并且每个对准槽在径向方向上延伸的长度足以补偿第一边缘环和第二边缘之间的热膨胀差 边缘环。

公开(公告)号：US06521292B1

公开(公告)日：2003-02-18

申请号：US09632645

申请日：2000-08-04

申请人： Joseph Yudovsky ,  Salvador Umotoy ,  Thomas Madar

发明人： Joseph Yudovsky ,  Salvador Umotoy ,  Thomas Madar

IPC分类号： C23C1652

CPC分类号： C23C16/45521 ,  C23C16/455 ,  C23C16/4585 ,  H01L21/68721 ,  H01L21/68735

摘要： The present invention provides exemplary apparatus and methods for processing substrates and for ensuring purge gases reach the substrate edge, including edges of JMF type wafers, to help prevent unwanted deposition thereon. One embodiment provides an apparatus for processing substrates which includes a chamber and a substrate support (13) disposed in the chamber. An edge ring (15) is disposed on the substrate support. The edge ring has a lip portion (30) which at least partially overhangs an upper surface (36) of the substrate support to define a gap (29) between the lip portion and the upper surface. In this manner, the edge ring is designed to form a gap which properly directs purge gases to edges of the substrate, including JMF type substrates.

摘要翻译： 本发明提供了用于处理基板并用于确保吹扫气体到达基板边缘（包括JMF型晶片的边缘）的示例性装置和方法，以帮助防止其上不希望的沉积。 一个实施例提供了一种用于处理衬底的设备，其包括设置在腔室中的室和衬底支撑件（13）。 边缘环（15）设置在基板支撑件上。 边缘环具有唇部（30），其至少部分地悬垂在基底支撑件的上表面（36）上，以在唇部和上表面之间限定间隙（29）。 以这种方式，边缘环被设计成形成适当地将吹扫气体引导到衬底边缘的间隙，包括JMF型衬底。

公开(公告)号：US06436192B1

公开(公告)日：2002-08-20

申请号：US09481055

申请日：2000-01-11

申请人： Ling Chen ,  Joseph Yudovsky ,  Ying Yu ,  Lawrence C. Lei

发明人： Ling Chen ,  Joseph Yudovsky ,  Ying Yu ,  Lawrence C. Lei

IPC分类号： C23C1600

摘要： A method for aligning a wafer on a support member within a vacuum chamber includes increasing the pressure within the vacuum chamber to at least about 1 Torr before aligning the wafer. The wafer is introduced into the vacuum chamber on the support member, the pressure is increased to at least about one Torr, and the support member is lifted into a shadow ring that has a frustoconical inner cavity constructed to funnel the wafer to a centered, aligned position.

公开(公告)号：US6063440A

公开(公告)日：2000-05-16

申请号：US893461

申请日：1997-07-11

申请人： Ling Chen ,  Joseph Yudovsky ,  Ying Yu ,  Lawrence C. Lei

发明人： Ling Chen ,  Joseph Yudovsky ,  Ying Yu ,  Lawrence C. Lei

IPC分类号： C23C14/50 ,  C23C16/44 ,  C23C16/458 ,  H01L21/02 ,  H01L21/205 ,  H01L21/68 ,  C23C16/00

CPC分类号： C23C16/4585 ,  C23C16/44 ,  H01L21/68

摘要： A method for aligning a wafer on a support member within a vacuum chamber includes increasing the pressure within the vacuum chamber to at least about 1 Torr before aligning the wafer. The wafer is introduced into the vacuum chamber on the support member, the pressure is increased to at least about one Torr, and the support member is lifted into a shadow ring that has a frustoconical inner cavity constructed to funnel the wafer to a centered, aligned position.

摘要翻译： 在真空室内的支撑构件上对准晶片的方法包括在对准晶片之前将真空室内的压力增加至至少约1Torr。 将晶片引入到支撑构件上的真空室中，将压力增加至至少约1乇，并将支撑构件提升到阴影环中，阴影环具有构造成将晶圆漏斗到中心对准的截头圆锥形内腔 位置。

公开(公告)号：US20160027675A1

公开(公告)日：2016-01-28

申请号：US14774377

申请日：2014-03-14

申请人： Abraham RAVID ,  Kevin GRIFFIN ,  Joseph YUDOVSKY ,  Kaushal GANGAKHEDKAR ,  Dmitry A. DZILNO ,  Alex MINKOVICH

发明人： Abraham Ravid ,  Kevin Griffin ,  Joseph Yudovsky ,  Kaushal Gangakhedkar ,  Dmitry A. Dzilno ,  Alex Minkovich

IPC分类号： H01L21/67 ,  C23C16/458 ,  C23C16/52 ,  H01L21/687 ,  C23C16/455

CPC分类号： H01L21/67259 ,  C23C16/45544 ,  C23C16/4584 ,  C23C16/52 ,  H01L21/67248 ,  H01L21/68764 ,  H01L21/68771

摘要： Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.

摘要翻译： 描述了测量和控制基座组件和气体分配组件之间的间隙的装置和方法。 还描述了用于晶片转印目的的位置控制和温度控制的装置和方法。