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41 条记录 (耗时 0.068 秒)

    Method and apparatus for pattern matching
    1.
    发明授权
    Method and apparatus for pattern matching 失效
    模式匹配的方法和装置

    公开(公告)号：US5373567A

    公开(公告)日：1994-12-13

    申请号：US2036

    申请日：1993-01-08

    申请人： Kozo Takahashi ,  Toshiaki Kitamura ,  Muneki Hamashima

    发明人： Kozo Takahashi ,  Toshiaki Kitamura ,  Muneki Hamashima

    IPC分类号： G06T3/40 ,  G06K9/68 ,  G06T7/00 ,  G06T7/60 ,  G06K9/36

    CPC分类号： G06K9/685

    摘要： In the pattern matching method, when a reference pattern is extracted from the reference picture, check search is carried out repeatedly a plural number of times while conducting picture compressions on the reference picture with the compression start position being changed to obtain correlation values between the reference picture and the reference pattern. Based on the correlation values obtained by the check search, the number of times of search to be done actually and the picture compression ratio for the actual search are determined.

    摘要翻译： 在图案匹配方法中，当从参考图像提取参考图案时，在对压缩开始位置进行改变的基准图像上进行图像压缩的同时多次进行检查检索，以获得参考图像之间的相关值 图片和参考图案。 基于通过检查搜索获得的相关值，确定实际搜索的次数和实际搜索的图像压缩比。

    Scanning device and scanning method
    5.
    发明授权
    Scanning device and scanning method 有权
    扫描装置和扫描方法

    公开(公告)号：US06670602B1

    公开(公告)日：2003-12-30

    申请号：US09324896

    申请日：1999-06-03

    申请人： Yoshiaki Kohama ,  Akihiro Goto ,  Muneki Hamashima ,  Yukiharu Okubo

    发明人： Yoshiaki Kohama ,  Akihiro Goto ,  Muneki Hamashima ,  Yukiharu Okubo

    IPC分类号： H01J314

    CPC分类号： H01J37/28 ,  H01J2237/2817

    摘要： New and improved scanning device and corresponding method that include and involve a movable stage on which a specimen is positioned, irradiation means which irradiates an electron beam onto an irradiation region of the specimen, secondary beam detection means used in generating a picture of the irradiation region by detecting a secondary beam which consists of at least one of secondary electrons or reflected electrons from the irradiation region of the electron beam, an imaging electron optical system which causes imaging of the secondary beam on a detection surface of the secondary beam detection means, and which is arranged between the specimen and the secondary beam detection means. The secondary beam detection means is equipped with a fluorescent unit which is arranged on the detection surface, and which converts the secondary beam into light, and one-dimensional line sensors which have a structure arrayed in two dimensions forming electric charge by photoelectric conversion, an array imaging element which continuously adds up the electric charge of the accumulated image in a predetermined line of the line sensors, and the electric charge of the line of the image which moves accompanying the movement of the stage, and a two-dimensional imaging element which emits electric charge by means of photoelectric conversion. The scanning device and corresponding method further include and involve changeover means for selectively irradiating the light converted by means of the fluorescent unit to an imaging element which is either one of the array imaging elements and the two-dimensional imaging element.

    摘要翻译： 新的改进的扫描装置及其相应的方法，其包括并涉及其上放置试样的可移动台，将电子束照射到试样的照射区域上的照射装置，用于产生照射区域的图像的二次束检测装置 通过检测由来自电子束的照射区域的二次电子或反射电子中的至少一种构成的次级光束，使次光束在二次光束检测装置的检测表面上成像的成像电子光学系统，以及 其布置在样本和次级束检​​测装置之间。 二次光束检测装置配备有布置在检测表面上并将次光束转换为光的荧光单元和具有通过光电转换形成电荷的二维排列的结构的一维线传感器， 阵列成像元件，其连续地将累积图像的电荷累积在行传感器的预定线中，以及伴随舞台移动移动的图像线的电荷，以及二维成像元件 通过光电转换发射电荷。 扫描装置和相应的方法还包括并包括切换装置，用于选择性地将通过荧光单元转换的光照射到作为阵列成像元件和二维成像元件之一的成像元件。

    Method of electric discharge machining a cathode for an electron gun
    7.
    发明授权
    Method of electric discharge machining a cathode for an electron gun 有权
    放电加工电子枪阴极的方法

    公开(公告)号：US07598471B2

    公开(公告)日：2009-10-06

    申请号：US11714885

    申请日：2007-03-07

    申请人： Muneki Hamashima ,  Takao Kato ,  Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake

    发明人： Muneki Hamashima ,  Takao Kato ,  Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake

    IPC分类号： B23H9/00 ,  B23H1/04

    CPC分类号： F01N3/2828 ,  F01N2260/18 ,  F01N2330/06 ,  H01J37/06 ,  H01J37/28

    摘要： A method of machining a cathode used in an electron gun. The method includes steps of placing an object to be machined, which is a material of the cathode, and a machining electrode in an electrically insulating oil; applying a discharge current to the machining electrode; and machining the object to be machined to have a shape corresponding to the shape of the machining electrode by means of electric discharge machining of the machining electrode. The machining electrode includes a disk, recesses formed on a front surface of the disk, a protrusion provided on a back surface of the disk, and a hole for mounting a lead wire for applying discharge current to the machining electrode. Bumps corresponding to the shape of the recesses of the machining electrode are formed on the object to be machined by means of the electric discharge machining.

    摘要翻译： 一种加工电子枪阴极的方法。 该方法包括以下步骤：将作为阴极材料的待加工对象和电绝缘油中的加工电极放置; 向加工电极施加放电电流; 并且通过加工电极的放电加工将被加工物加工成具有与加工电极的形状对应的形状。 加工电极包括盘，形成在盘的前表面上的凹部，设置在盘的后表面上的突起，以及用于安装用于向加工电极施加放电电流的引线的孔。 通过放电加工在被加工物体上形成与加工电极的凹部的形状相对应的凸起。

    Object observation apparatus and object observation
    10.
    再颁专利
    Object observation apparatus and object observation 有权

    公开(公告)号：USRE40221E1

    公开(公告)日：2008-04-08

    申请号：US10986576

    申请日：2004-11-12

    申请人： Muneki Hamashima ,  Yoichi Watanabe ,  Yoshiaki Kohama

    发明人： Muneki Hamashima ,  Yoichi Watanabe ,  Yoshiaki Kohama

    IPC分类号： H01J37/28

    CPC分类号： H01J37/265 ,  G01N23/225 ,  H01J37/244 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/2446 ,  H01J2237/2817

    摘要： This invention relates to an object observation apparatus and observation method. The object observation apparatus is characterized by including a drivable stage on which a sample is placed, an irradiation optical system which is arranged to face the sample on the stage, and emits an electron beam as a secondary beam, an electron detection device which is arranged to face the sample, causes to project, as a primary beam, at least one of a secondary electron, reflected electron, and back-scattering electron generated by the sample upon irradiation of the electron beam, and generates image information of the sample, a stage driving device which is adjacent to the stage to drive the stage, and a deflector arranged between the sample and the electron detection device to deflect the secondary beam, the electron detection device having a converter arranged on a detection surface to convert the secondary beam into light, an array image sensing unit which is adjacent to the converter, has pixels of a plurality of lines each including a plurality of pixels on the detection surface, sequentially transfers charges of pixels of each line generated upon reception of light of an optical image obtained via the converter to corresponding pixels of an adjacent line at a predetermined timing, adds, every transfer, charges generated upon reception of light after the transfer at the pixels which received the charges, and sequentially outputs charges added up to a line corresponding to an end, and a control unit connected to the array image sensing unit to output a transfer signal for sequentially transferring charges of pixels of each line to an adjacent line, and the control unit having a stage scanning mode in which the array image sensing unit is controlled in accordance with a variation in projection position of the secondary beam projected on the electron detection device that is generated by movement of the stage device, and a deflector operation mode in which the array image sensing unit is controlled in accordance with a variation in projection position of the secondary beam projected on the detection device by the deflector.