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公开(公告)号:US10461213B2
公开(公告)日:2019-10-29
申请号:US15924976
申请日:2018-03-19
Applicant: LG ELECTRONICS INC.
Inventor: Kyoungsoo Lee , Sangwook Park
IPC: H01L31/20 , H01L31/0376 , H01L31/18 , H01L31/0224 , H01L31/0747
Abstract: A method of manufacturing a solar cell includes forming a photoelectric converter including an amorphous semiconductor layer, forming an electrode connected to the photoelectric converter, and performing a post-treatment by providing light to the photoelectric converter and the electrode, wherein, in the performing of the post-treatment, a plasma lighting system (PLS) is used as a light source, and a processing temperature is within a range from about 100° C. to about 300° C.
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公开(公告)号:US09601644B2
公开(公告)日:2017-03-21
申请号:US14700451
申请日:2015-04-30
Applicant: LG ELECTRONICS INC.
Inventor: Kyoungsoo Lee , Seongeun Lee
IPC: H01L31/068 , H01L27/142 , H01L31/0376 , H01L31/18
CPC classification number: H01L31/0376 , H01L25/042 , H01L27/142 , H01L31/022425 , H01L31/04 , H01L31/06 , H01L31/068 , H01L31/0682 , H01L31/18 , H01L31/1804 , H01L31/1876 , H01L2924/0002 , Y02E10/547 , Y02P70/521 , H01L2924/00
Abstract: A method for manufacturing a solar cell according to an embodiment of the present invention includes preparing a semiconductor substrate having a first conductivity type dopant; ion-implanting a pre-amorphization elements into a front surface of the semiconductor substrate to form an amorphous layer; and forming an emitter layer by ion-implanting second conductivity type dopant into the front surface of the semiconductor substrate. The method then further includes heat-treating the layers to activate the second conductivity type dopant. The method further includes forming a back surface field layer at a back surface of the semiconductor substrate by ion-implanting a first conductivity type dopant.
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公开(公告)号:US09698300B2
公开(公告)日:2017-07-04
申请号:US14733620
申请日:2015-06-08
Applicant: LG ELECTRONICS INC.
Inventor: Kyoungsoo Lee , Minho Choi , Jinhyung Lee , Gyeayoung Kwag , Sangwook Park
CPC classification number: H01L31/1864 , H01L21/3003 , H01L31/1868 , Y02E10/50 , Y02P70/521
Abstract: A method of manufacturing a solar cell is discussed. The method of manufacturing the solar cell includes: forming a conductive region on a semiconductor substrate; forming an electrode connected to the conductive region; and post-processing the semiconductor substrate to passivate the semiconductor substrate. The post-processing of the semiconductor substrate comprises a main processing process for heat-treating the semiconductor substrate while providing light to the semiconductor substrate. A temperature of the main processing process is about 100° C. to about 800° C., and the temperature and light intensity of the main processing process satisfy Equation of 1750−31.8·T+(0.16)·T2≦I. Here, T is the temperate (° C.) of the main processing process, and I is the light intensity (mW/cm2) of the main processing process.
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公开(公告)号:US09269839B2
公开(公告)日:2016-02-23
申请号:US14038159
申请日:2013-09-26
Applicant: LG ELECTRONICS INC.
Inventor: Hyunho Lee , Kyoungsoo Lee , Changseo Park
IPC: H01L31/044 , H01L31/0216 , H01L31/0224 , H01L31/0368 , H01L31/068
CPC classification number: H01L31/02167 , H01L31/022441 , H01L31/03682 , H01L31/068 , Y02E10/546 , Y02E10/547
Abstract: A solar cell is discussed. The solar cell includes a semiconductor substrate, a p-type conductive region formed at the semiconductor substrate and including a p-type impurity, and a passivation film formed on the p-type conductive region and including aluminum oxide. The passivation film has a thickness of 7 to 17 Å.
Abstract translation: 讨论太阳能电池。 太阳能电池包括半导体衬底,形成在半导体衬底处并包含p型杂质的p型导电区域,以及形成在p型导电区域上并包括氧化铝的钝化膜。 钝化膜的厚度为7至17埃。
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公开(公告)号:US10453983B2
公开(公告)日:2019-10-22
申请号:US15381529
申请日:2016-12-16
Applicant: LG ELECTRONICS INC.
Inventor: Kyoungsoo Lee , Sangwook Park , Jinhyung Lee
IPC: H01L31/068 , H01L31/0224 , H01L31/0236 , H01L31/0216 , H01L31/072 , H01L31/18 , H01L31/074 , H01L31/0747
Abstract: Disclosed herein are a solar cell and a method of manufacturing the same. The solar cell module includes a semiconductor substrate, a first passivation film located on a front surface of the semiconductor substrate, a second passivation film located on a rear surface of the semiconductor substrate, a front electric field region located on the first passivation film on the front surface of the semiconductor substrate and being of a same conductivity-type as that of the semiconductor substrate, an emitter region located on the second passivation film on the rear surface of the semiconductor substrate and being of a conductivity-type opposite that of the semiconductor substrate, first electrodes conductively connected to the front electric field region, and second electrode conductively connected to the emitter region.
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公开(公告)号:US09947825B2
公开(公告)日:2018-04-17
申请号:US15381751
申请日:2016-12-16
Applicant: LG ELECTRONICS INC.
Inventor: Kyoungsoo Lee , Sangwook Park
IPC: H01L31/20 , H01L31/18 , H01L31/0224 , H01L31/0376 , H01L31/0747
CPC classification number: H01L31/208 , H01L31/022425 , H01L31/0376 , H01L31/03767 , H01L31/0747 , H01L31/1884 , H01L31/202 , H01L31/204 , Y02E10/50
Abstract: Disclosed is a manufacturing method of a solar cell, including forming a photoelectric converter including an amorphous semiconductor layer, forming an electrode connected to the photoelectric converter, and performing a post-treatment by providing light to the photoelectric converter and the electrode.
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公开(公告)号:US20150162467A1
公开(公告)日:2015-06-11
申请号:US14605394
申请日:2015-01-26
Applicant: LG Electronics Inc.
Inventor: Kyoungsoo Lee , Seongeun Lee
IPC: H01L31/0376 , H01L31/0224
CPC classification number: H01L31/0376 , H01L25/042 , H01L27/142 , H01L31/022425 , H01L31/04 , H01L31/06 , H01L31/068 , H01L31/0682 , H01L31/18 , H01L31/1804 , H01L31/1876 , H01L2924/0002 , Y02E10/547 , Y02P70/521 , H01L2924/00
Abstract: A method for manufacturing a solar cell includes preparing a semiconductor substrate having a first conductivity type dopant; ion-implanting a pre-amorphization elements into a front surface of the semiconductor substrate to form an amorphous layer; and forming an emitter layer by ion-implanting second conductivity type dopant into the front surface of the semiconductor substrate. The method then further includes heat-treating the layers to activate the second conductivity type dopant. The method further includes forming a back surface field layer at a back surface of the semiconductor substrate by ion-implanting a first conductivity type dopant.
Abstract translation: 一种制造太阳能电池的方法包括:制备具有第一导电型掺杂剂的半导体衬底; 将前非晶化元件离子注入半导体衬底的前表面以形成非晶层; 以及通过将第二导电型掺杂剂离子注入到所述半导体衬底的前表面中形成发射极层。 然后该方法还包括热处理层以激活第二导电型掺杂剂。 该方法还包括通过离子注入第一导电型掺杂剂在半导体衬底的背面形成背表面场层。
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公开(公告)号:US10593558B2
公开(公告)日:2020-03-17
申请号:US15866052
申请日:2018-01-09
Applicant: LG ELECTRONICS INC.
Inventor: Kyoungsoo Lee , Sunghyun Hwang , Sangwook Park
IPC: H01L21/00 , H01L21/3205 , H01L21/28 , H01L21/02 , H01L31/072 , H01L31/0747 , H01L31/18 , H01L31/20
Abstract: A method of manufacturing a solar cell is disclosed. The method of manufacturing the solar cell includes depositing an intrinsic amorphous silicon layer on a surface of a semiconductor substrate, depositing an amorphous silicon layer containing impurities on the intrinsic amorphous silicon layer to form a conductive region, and forming an electrode electrically connected to the conductive region. The depositing of the intrinsic amorphous silicon layer includes depositing the intrinsic amorphous silicon on the surface of the semiconductor substrate at a deposition rate of 0.5 nm/sec to 2.0 nm/sec.
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公开(公告)号:US09768342B2
公开(公告)日:2017-09-19
申请号:US14831615
申请日:2015-08-20
Applicant: LG ELECTRONICS INC.
Inventor: Kyoungsoo Lee , Manhyo Ha
IPC: H01L31/044 , H01L31/18 , H01L31/0236 , H01L31/0216 , H01L31/068
CPC classification number: H01L31/186 , H01L31/02167 , H01L31/02168 , H01L31/02363 , H01L31/02366 , H01L31/068 , Y02E10/547
Abstract: A method for manufacturing a solar cell includes forming a first dielectric layer on a second surface opposite a first surface of a substrate; forming second dielectric layers respectively on an emitter region and the first dielectric layer; forming a third dielectric layer on the second dielectric layer that is positioned on the emitter region; forming a hydrogenated silicon oxide layer on the third dielectric layer; forming a first electrode on the emitter region and connected to the emitter region; and forming a second electrode on the second surface of the substrate and connected to the substrate, wherein the first surface of the substrate has first and second textured surfaces, and wherein the first textured surface includes a plurality of first protrusions and a plurality of first depressions and the second textured surface includes a plurality of second protrusions and a plurality of second depressions.
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公开(公告)号:US09634160B2
公开(公告)日:2017-04-25
申请号:US14605462
申请日:2015-01-26
Applicant: LG ELECTRONICS INC.
Inventor: Kyoungsoo Lee , Myungjun Shin , Jiweon Jeong
IPC: H01L31/0216 , H01L31/0224 , H01L31/0236 , H01L31/068
CPC classification number: H01L31/02366 , H01L31/02167 , H01L31/022425 , H01L31/02363 , H01L31/068 , Y02E10/547
Abstract: A method for manufacturing asolar cell includes texturing a front surface of a semiconductor substrate having a first conductive type dopant by using a dry etching method, forming an emitter layer by ion-implanting a second conductive type dopant into the front surface of the semiconductor substrate, forming a back passivation film on a back surface of the semiconductor substrate; and forming a first electrode electrically connected to the emitter layer and a second electrode being in partial contact with the back surface of the semiconductor substrate.
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