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18 条记录 (耗时 0.037 秒)

    Apparatus comprising a rotating contaminant trap
    3.
    发明授权
    Apparatus comprising a rotating contaminant trap 失效
    包括旋转污染物捕集器的装置

    公开(公告)号：US07889312B2

    公开(公告)日：2011-02-15

    申请号：US11525225

    申请日：2006-09-22

    申请人： Johannes Christiaan Leonardus Franken ,  Vadim Yevgenyevich Banine ,  Arnoud Cornelis Wassink

    发明人： Johannes Christiaan Leonardus Franken ,  Vadim Yevgenyevich Banine ,  Arnoud Cornelis Wassink

    IPC分类号： G03B27/52 ,  G03B27/54 ,  G03B27/72

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  F16C32/0603 ,  F16C32/0685 ,  F16C33/02 ,  F16C33/72 ,  F16C2300/62 ,  G03F7/70033 ,  G03F7/70941

    摘要： A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).

    摘要翻译： 公开了一种布置在辐射束的路径中的污染物捕集装置，用于捕获从被配置成产生辐射束的辐射源发出的污染物。 污染物捕集装置包括具有多个通道形成元件的转子，该多个通道形成元件限定了基本上平行于辐射束的传播方向布置的通道，该转子包括可充电的材料并且被布置为由于操作而导致带电 辐射源; 以及构造成相对于转子承载结构可旋转地保持转子的轴承，其中所述装置被配置为（i）控制或重定向转子的放电，或（ii）抑制转子的放电或（ iii）（i）和（ii）。

    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    4.
    发明授权
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US07098994B2

    公开(公告)日：2006-08-29

    申请号：US10758270

    申请日：2004-01-16

    申请人： Johannes Hubertus Josephina Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Christiaan Leonardus Franken

    发明人： Johannes Hubertus Josephina Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Christiaan Leonardus Franken

    IPC分类号： G03B27/72 ,  G03B27/52 ,  G03B27/54

    CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

    摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a collector which is arranged for transmitting radiation, received from a first radiation source, to the illumination system. The apparatus includes at least a heater for heating the collector when the collector receives substantially no radiation from the first radiation source. Further aspects of the invention relate to a device manufacturing method as well as a device manufactured thereby.

    摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及被布置成用于将从第一辐射源接收的辐射传送到照明系统的收集器。 当收集器基本上不接收来自第一辐射源的辐射时，该装置至少包括用于加热集电器的加热器。 本发明的其它方面涉及一种装置制造方法以及由此制造的装置。