中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

9 records (took 0.012 seconds)

    Lateral shift measurement using an optical technique
    1.
    发明授权
    Lateral shift measurement using an optical technique 有权
    使用光学技术的侧向位移测量

    公开(公告)号：US08941832B2

    公开(公告)日：2015-01-27

    申请号：US13747937

    申请日：2013-01-23

    Applicant: Nova Measuring Instruments Ltd.

    Inventor： Boaz Brill ,  Moshe Finarov ,  David Schiener

    IPC: G01B11/00 ,  H01L23/544 ,  H01L21/76 ,  G01B11/27 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20 ,  H01L21/66

    CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

    Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

    Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造期间层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。

    Process control using non-zero order diffraction
    2.
    发明授权
    Process control using non-zero order diffraction 有权

    公开(公告)号：US10048595B2

    公开(公告)日：2018-08-14

    申请号：US15430568

    申请日：2017-02-13

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Boaz Brill

    IPC: G01B11/04 ,  G03B27/32 ,  G03B27/74 ,  G03F7/20 ,  G01N21/47

    Abstract: A method of controlling a manufacturing process, the method including the steps of a) providing a testing area with a periodic structure, where the periodic structure includes a series of sets of patterned features, b) illuminating the periodic structure with a light, thereby producing a non-zero order diffraction signal, c) collecting the diffraction signal to produce a test signature, d) matching the test signature with a reference signature, where the reference signature was previously produced by performing steps a), b), and c) with respect to a reference structure that is at least similar to the periodic structure, and e) controlling a manufacturing process using a control setting set associated with the matching reference signature.

    Method and system for use in monitoring properties of patterned structures
    5.
    发明授权
    Method and system for use in monitoring properties of patterned structures 有权
    用于监测图案结构特性的方法和系统

    公开(公告)号：US08643842B2

    公开(公告)日：2014-02-04

    申请号：US13652513

    申请日：2012-10-16

    Applicant: Nova Measuring Instruments Ltd.

    Inventor： Yoel Cohen ,  Boaz Brill

    IPC: G01B11/06 ,  G01J4/00 ,  G01N21/84

    CPC classification number: G01N21/9501 ,  G01B11/0625 ,  G01B11/24 ,  G06F15/00

    Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.

    Abstract translation: 提供了一种用于表征具有包括多个不同周期图案的位置的结构的物品的性质的方法和系统，其中方法包括提供指示由几何和材料参数限定的不同叠层的光学性质的预测的理论模型 所述位置在几何参数和材料参数中的至少一个中是常见的; 对物品的至少两个不同堆叠执行光学测量，并产生指示每个所测量的叠层的几何参数和材料组成参数的光学测量数据; 处理所述光学测量数据，所述处理包括同时将所述多个测量堆叠的所述光学测量数据与所述理论模型拟合并提取所述至少一个公共参数，从而能够表征单个物品内的多层结构的属性。

    Method and system for measuring patterned structures
    7.
    发明授权
    Method and system for measuring patterned structures 有权

    公开(公告)号：US09184102B2

    公开(公告)日：2015-11-10

    申请号：US14494981

    申请日：2014-09-24

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Moshe Finarov ,  Boaz Brill

    IPC: G01B11/14 ,  H01L21/66 ,  G01B11/24 ,  G01N21/21 ,  G01B9/02 ,  G01J3/45

    CPC classification number: G01B11/24 ,  G01B9/02087 ,  G01J3/45 ,  G01N21/21 ,  H01L22/12 ,  H01L22/20

    Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

    METHOD AND SYSTEM FOR USE IN OPTICAL MEASUREMENTS IN DEEP THREE-DIMENSIONAL STRUCTURES
    8.
    发明申请
    METHOD AND SYSTEM FOR USE IN OPTICAL MEASUREMENTS IN DEEP THREE-DIMENSIONAL STRUCTURES 审中-公开
    用于深层三维结构光学测量的方法和系统

    公开(公告)号：US20150168132A1

    公开(公告)日：2015-06-18

    申请号：US14378486

    申请日：2013-02-12

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Boaz Brill

    IPC: G01B11/22 ,  G01N21/95 ,  G01N21/21 ,  G01B11/30

    CPC classification number: G01B11/22 ,  G01B11/02 ,  G01B11/24 ,  G01B11/30 ,  G01B2210/56 ,  G01N21/21 ,  G01N21/9501 ,  G01N21/95692 ,  G01N2021/8848 ,  G01N2201/061 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: A measurement system and method are presented for use in measuring in patterned structures having annularly-shaped vias. The system comprises illumination and detection channels, a polarization orientation system, a navigation system, and a control unit. The polarization orientation system provides at least one of a first polarization orientation condition corresponding to a first measurement mode enabling determination a depth of the via, and a second polarization orientation condition corresponding to a second measurement mode enabling determination of one or more parameters of a profile of the via, the first and second polarization orientation conditions defining first and second predetermined orientations respectively for polarization of the incident light relative a sidewall of the via.

    Abstract translation: 提出了一种用于在具有环形通孔的图案化结构中测量的测量系统和方法。 该系统包括照明和检测通道，偏振定向系统，导航系统和控制单元。 偏振取向系统提供与能够确定通孔的深度的第一测量模式相对应的第一偏振取向条件和对应于第二测量模式的第二极化取向条件中的至少一个，使得能够确定轮廓的一个或多个参数 所述第一和第二偏振取向条件分别限定入射光相对于所述通孔的侧壁的偏振的第一和第二预定取向。

    Method and system for use in monitoring properties of patterned structures
    9.
    发明授权
    Method and system for use in monitoring properties of patterned structures 有权
    用于监测图案结构特性的方法和系统

    公开(公告)号：US08964178B2

    公开(公告)日：2015-02-24

    申请号：US14139913

    申请日：2013-12-24

    Applicant: Nova Measuring Instruments Ltd.

    Inventor： Yoel Cohen ,  Boaz Brill

    IPC: G01N21/95 ,  G01B11/06 ,  G01B11/24 ,  G06F15/00

    CPC classification number: G01N21/9501 ,  G01B11/0625 ,  G01B11/24 ,  G06F15/00

    Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.

    Abstract translation: 提供了一种用于表征具有包括多个不同周期图案的位置的结构的物品的性质的方法和系统，其中方法包括提供指示由几何和材料参数限定的不同叠层的光学性质的预测的理论模型 所述位置在几何参数和材料参数中的至少一个中是常见的; 对物品的至少两个不同堆叠执行光学测量，并产生指示每个所测量的叠层的几何参数和材料组成参数的光学测量数据; 处理所述光学测量数据，所述处理包括同时将所述多个测量堆叠的所述光学测量数据与所述理论模型拟合并提取所述至少一个公共参数，从而能够表征单个物品内的多层结构的属性。

Patent Agency Ranking