公开(公告)号：US10859921B2

公开(公告)日：2020-12-08

申请号：US14738543

申请日：2015-06-12

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jun-Ho Sim ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Hyun-Seok Kim

IPC: G03F7/20 ,  G03F9/00 ,  H01L23/544

Abstract: A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.

公开(公告)号：US09921488B2

公开(公告)日：2018-03-20

申请号：US14612648

申请日：2015-02-03

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jun-Ho Sim ,  Jung-In Park ,  Ki-Beom Lee ,  Hi-Kuk Lee ,  Hyun-Seok Kim ,  Kab-Jong Seo ,  Sang-Hyun Yun ,  Sang-Hyun Lee ,  Jung-Chul Heo ,  Jong-Joo Kim ,  Chang-Hoon Kim

IPC: G03F7/20 ,  G02B26/08

CPC classification number: G03F7/70641 ,  G02B26/0833 ,  G03F7/2053 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70391

Abstract: A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.

公开(公告)号：US20160054660A1

公开(公告)日：2016-02-25

申请号：US14664770

申请日：2015-03-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sang-Hyun Lee ,  Hyun-Seok Kim ,  Jung-Chul Heo ,  Hi-Kuk Lee ,  Sang-Hyun Yun ,  Ki-Beom Lee ,  Chang-Hoon Kim ,  Jung-In Park ,  Kab-Jong Seo ,  Jun-Ho Sim ,  Jae-Hyuk Chang

IPC: G03F7/20 ,  H01L27/12 ,  H01L29/786

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  H01L27/124 ,  H01L27/1285 ,  H01L29/41733 ,  H01L29/78696

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.

Abstract translation: 无掩模曝光装置包括具有数字微镜装置的曝光头，数字微镜装置被配置为通过反射来自曝光源的源光束将曝光光束扫描到衬底; 以及系统控制部，被配置为通过利用图形数据系统文件来控制数字微镜装置。 图形数据系统文件在平面图中包括源电极，漏电极和源极和漏电极之间的沟道部分的数据。 通道部分包括沿垂直于曝光头的扫描方向的方向延伸的第一部分。 通道部分的第一部分的宽度被定义为曝光光束的脉冲事件产生的倍数。

公开(公告)号：US09746780B2

公开(公告)日：2017-08-29

申请号：US14745366

申请日：2015-06-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun-Seok Kim ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Jung-Chul Heo ,  Kab-Jong Seo ,  Ki-Beom Lee ,  Jun-Ho Sim

IPC: G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70358 ,  G03F7/70508

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

公开(公告)号：US09690204B2

公开(公告)日：2017-06-27

申请号：US14664770

申请日：2015-03-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sang-Hyun Lee ,  Hyun-Seok Kim ,  Jung-Chul Heo ,  Hi-Kuk Lee ,  Sang-Hyun Yun ,  Ki-Beom Lee ,  Chang-Hoon Kim ,  Jung-In Park ,  Kab-Jong Seo ,  Jun-Ho Sim ,  Jae-Hyuk Chang

IPC: G03B27/44 ,  G03B27/68 ,  G03F7/20 ,  H01L29/786 ,  H01L27/12 ,  H01L29/417

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  H01L27/124 ,  H01L27/1285 ,  H01L29/41733 ,  H01L29/78696

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.

公开(公告)号：US09436098B2

公开(公告)日：2016-09-06

申请号：US14635339

申请日：2015-03-02

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jung-Chul Heo ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Sang-Hyun Yun ,  Ki-Beom Lee ,  Hyun-Seok Kim ,  Kab-Jong Seo ,  Jun-Ho Sim ,  Byoung-Min Yun ,  Sang-Don Jang ,  Jae-Young Jang ,  Chang-Hoon Kim

IPC: G03F7/20 ,  H01L29/786 ,  H01L27/12

CPC classification number: G03F7/70508 ,  G03F7/2022 ,  G03F7/2051 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70391 ,  H01L27/1222 ,  H01L27/124 ,  H01L27/1259 ,  H01L29/78669 ,  H01L29/78693 ,  H01L29/78696

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.

Abstract translation: 无掩模曝光装置包括具有数字微镜装置的曝光头。 数字微镜装置被配置为将从曝光源施加的源光束传输到衬底。 系统控制部分被配置为通过使用图形数据系统文件来控制数字微镜装置。 图形数据系统文件包括用于形成源电极，漏电极和设置在源电极和漏电极之间的沟道部分的数据。 图形系统文件包括用于形成相对于曝光头的扫描方向沿对角线方向延伸的通道部分的数据。

公开(公告)号：US20160116847A1

公开(公告)日：2016-04-28

申请号：US14745366

申请日：2015-06-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hyun-Seok Kim ,  Sang-Hyun Yun ,  Hi-Kuk Lee ,  Jae-Hyuk Chang ,  Sang-Hyun Lee ,  Jung-In Park ,  Jung-Chul Heo ,  Kab-Jong Seo ,  Ki-Beom Lee ,  Jun-Ho Sim

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70358 ,  G03F7/70508

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.

Abstract translation: 无掩模曝光装置包括具有数字微镜装置和曝光源的曝光头，数字微镜装置被配置为将从曝光源输出的源光束反射到基板，以及系统控制器，被配置为控制数字 微镜设备通过使用图形数据系统文件。 图形数据系统文件包括关于要在基板上形成的图案的数据。 在与曝光头的扫描方向平行的方向上延伸的图案包括具有大于目标宽度的第一宽度的第一图案部分和与第一图案部分交替设置的第二图案部分，并且具有第二宽度， 小于目标宽度。