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公开(公告)号：US11047901B2
公开(公告)日：2021-06-29
申请号：US16437675
申请日：2019-06-11
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Mee-Hyun Lim , Sung-Yeol Kim , Seong-Keun Cho , Won-Don Joo , Jae-Hong Kim , Taek-Jin Kim , Kyung-Min Lee , Sang-Min Lee
IPC: G01R31/26 , G01N21/21 , G01R1/07 , G01R31/308
Abstract: In a method of testing an interconnection substrate, a blocking condition of a reference light reflected from a probe having an intrinsic optical characteristic may be set. An electric field emitted from a test interconnection substrate having a plurality of circuits may change the intrinsic optical characteristics of the probe into test optical characteristics. Light may be irradiated to the probe having the test optical characteristics. The reference light reflected from the probe having the test optical characteristic may be blocked in accordance with the blocking condition. The remaining reflected light that may be due to an abnormal circuit may be detected.
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2.发明授权公开(公告)号：US10910202B2
公开(公告)日：2021-02-02
申请号：US16366225
申请日：2019-03-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Hun-Yong Park , Sang-Woo Bae , Seul-Gi Lee , Won-Don Joo
Abstract: A plasma monitoring system includes a plasma chamber performing plasma processes, first and second plasma sensing devices, and a controller. The first and second plasma sensing devices are respectively in a first horizontal direction and a second horizontal direction perpendicular to each other from a center point of a monitoring plasma plane in the plasma chamber. The first and second plasma sensing device generate first and second detection signals with respect to the monitoring plasma plane based on a first incident beam radiated from the monitoring plasma plane in the first horizontal direction and a second incident beam radiated from the monitoring plasma plane in the second horizontal direction. The controller detects two-dimensional plasma distribution information with respect to the monitoring plasma plane by performing a convolution operation based on the first and second detection signals, and controls the plasma processes based on the two-dimensional plasma distribution information.
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3.发明授权Light source device and semiconductor manufacturing apparatus including the same 有权光源装置及包括该光源装置的半导体制造装置公开(公告)号：US09425036B2
公开(公告)日：2016-08-23
申请号：US14151166
申请日：2014-01-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Wook-Rae Kim , Hashimoto Kohei , Won-Don Joo , Kwang-Soo Kim , Byeong-Hwan Jeon , Sue-Jin Cho
IPC: H01J61/02
CPC classification number: H01J61/025 , G03F7/70016 , G03F7/70175 , H01J61/545 , H01J61/86 , H01J65/042
Abstract: Provided are a light source device and a semiconductor manufacturing apparatus including the same. The light source device includes a light-emitting lamp. The light source device includes a laser generator configured to generate and direct a laser beam to the light-emitting lamp. The light source device includes a recycling optical element configured to redirect the laser beam to the light-emitting lamp. The recycling optical element includes a first recycling optical modulator configured to change the phase of the laser beam.
Abstract translation: 提供一种光源装置和包括该光源装置的半导体制造装置。 光源装置包括发光灯。 光源装置包括：激光发生器，被配置为产生并将激光束定向到发光灯。 光源装置包括被配置为将激光束重定向到发光灯的再循环光学元件。 回收光学元件包括被配置为改变激光束的相位的第一再循环光学调制器。
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公开(公告)号：US10816480B2
公开(公告)日：2020-10-27
申请号：US16364251
申请日：2019-03-26
Applicant: Samsung Electronics Co., Ltd.
Inventor： Eun-Hee Jeang , Aleksandr Shorokhov , Anton Medvedev , Maksim Riabko , Sang-Woo Bae , Akinori Okubo , Sang-Min Lee , Seong-Keun Cho , Won-Don Joo
Abstract: In a method of detecting a defect on a substrate, an incident beam may be radiated to a surface of the substrate to generate reflected light beams. A second harmonic generation (SHG) beam among the reflected light beams may be detected. The SHG beam may be generated by a defect on the substrate. A nano size defect may be detected by examining the SHG beam.
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5.发明申请公开(公告)号：US20200096778A1
公开(公告)日：2020-03-26
申请号：US16376790
申请日：2019-04-05
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Ji-Young Chu , Min-Hwan Seo , Jung-Chul Lee , Won-Don Joo
Abstract: An optical rearrangement device includes an optical block having a substantially hexahedral shape. The optical block includes a front face, a top face, a first side face, a bottom face, a second side face, and a back face. The top face is parallel with the bottom face. The optical block is arranged such that when an input beam is incident through the front face at a right angle thereto, the input beam is totally reflected at each of the top face, the bottom face, the first side face, and the second side face and an output beam is output through the front face or the back face at a right angle thereto.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20190146347A1
公开(公告)日：2019-05-16
申请号：US16109054
申请日：2018-08-22
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sang-Min Lee , Sang-Hyun Park , Won-Don Joo
IPC: G03F7/20 , H01L21/027
Abstract: A maskless exposure method includes spatially modulating a light output from a light source into a pattern beam having a mask pattern, condensing the modulated pattern beam into a first group of spot beams having a first focal position on a Z-axis substantially perpendicular to an exposure surface of an object layer, and into a second group of spot beams having a second focal position different from the first focal position, and scanning the object layer with the first and second groups of spot beams. The object layer has a first height and a second height different from the first height.
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公开(公告)号：US09255694B2
公开(公告)日：2016-02-09
申请号：US13762782
申请日：2013-02-08
Applicant: Samsung Electronics Co., Ltd.
Inventor： Won-Don Joo , Woo-Seok Ko , Yu-Sin Yang , Sue-Jin Cho , Sang Don Jang , Byeong Hwan Jeon
CPC classification number: F21V13/04 , G01N21/8806 , G01N21/9501 , G03B2215/0582 , G03B2215/0592
Abstract: An illumination optic system includes a convex mirror to reflect light from a light source to towards a lens. The light source is at a first focus position and the lens is at a second focus position of the mirror. The system also includes a reflector to reflect light not incident on the lens toward the convex mirror. The reflector has a light guide hole to guide light to the incidence surface of the lens.
Abstract translation: 照明光学系统包括用于将来自光源的光反射到透镜的凸面镜。 光源处于第一焦点位置，并且透镜处于反射镜的第二焦点位置。 该系统还包括反射器，以将未入射到透镜的光朝向凸面镜反射。 反射器具有导光孔以将光引导到透镜的入射表面。
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公开(公告)号：US08841824B2
公开(公告)日：2014-09-23
申请号：US13667203
申请日：2012-11-02
Applicant: Samsung Electronics Co., Ltd.
Inventor： Woo-Seok Ko , Yu-Sin Yang , Sue-Jin Cho , Won-Don Joo , Min-Kook Kim , Sang-Kil Lee , Byeong-Hwan Jeon
CPC classification number: H01J65/04
Abstract: A broadband light illuminator of an optical inspector for optically detecting defects of an inspection object may include an electrode-less chamber including a plasma area from which broadband light is generated; a first energy provider, exterior to the chamber, configured to provide first energy for ionizing high pressure gases to form ionized gases in the chamber; a second energy provider, exterior to the chamber, configured to provide second energy for transforming the ionized gases into a plasma state to form the plasma area at a central portion of the chamber; an elliptical reflector having a first focus at which the chamber is positioned and a second focus such that the broadband light is reflected from the elliptical reflector toward the second focus; and a lens unit focusing the reflected broadband light onto the inspection object to form an inspection light for detecting the defects of the inspection object.
Abstract translation: 用于光学检测检查对象的缺陷的光学检查器的宽带照明器可以包括：无电极室，包括产生宽带光的等离子体区域; 第一能量提供者，在室外，被配置为提供第一能量，用于离子化高压气体以在室中形成离子化气体; 第二能量供应器，室外，被配置为提供第二能量，用于将电离气体转换成等离子体状态，以在室的中心部分形成等离子体区域; 具有第一焦点的椭圆形反射器，室被定位，第二焦点使得宽带光从椭圆形反射器反射到第二焦点; 以及透镜单元，将反射的宽带光聚焦到检查对象上，以形成用于检测检查对象的缺陷的检查光。
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9.发明授权公开(公告)号：US10670968B2
公开(公告)日：2020-06-02
申请号：US16109054
申请日：2018-08-22
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Sang-Min Lee , Sang-Hyun Park , Won-Don Joo
IPC: G03F7/20 , H01L21/027
Abstract: A maskless exposure method includes spatially modulating a light output from a light source into a pattern beam having a mask pattern, condensing the modulated pattern beam into a first group of spot beams having a first focal position on a Z-axis substantially perpendicular to an exposure surface of an object layer, and into a second group of spot beams having a second focal position different from the first focal position, and scanning the object layer with the first and second groups of spot beams. The object layer has a first height and a second height different from the first height.
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公开(公告)号：US09839110B2
公开(公告)日：2017-12-05
申请号：US15222571
申请日：2016-07-28
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Wook-Rae Kim , Won-Don Joo , Byeong-Hwan Jeon , Sung-Hwi Cho , Young-Kyu Park , Jung-Chul Lee , Jin-Woo Ahn
CPC classification number: H05H1/46 , H01J61/025 , H01J61/30 , H01J61/54 , H01J65/04 , H05G2/00 , H05H1/24 , H05H2240/00
Abstract: A plasma light source apparatus includes a first laser generator configured to generate a first laser. A second laser generator is configured to generate a second laser. A chamber is configured to accommodate and seal a medium material for plasma ignition and to allow plasma to be ignited by the first laser and to be maintained by the second laser. An inner surface of the chamber includes two curved mirrors that face each other.
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