摘要:
A device for detecting the displacement of an object is provided with a semiconductor laser having an active layer for emitting laser beams in two directions, mirrors for directing the laser beams toward a diffraction grating provided on the object, and a detector for receiving the interfering lights diffracted by the diffraction grating. The active layer of the semiconductor laser is arranged substantially parallel to the diffraction grating, to save space, also to enable light deflection such that the spreading direction of the light beams from the semiconductor laser coincides with the direction of pitch of the diffraction grating. The diffraction grating is irradiated with an improved efficiency, giving diffracted lights with higher intensity to the detector and improving the S/N ratio of detection. The space between the semiconductor laser and the object is reduced, thus reducing the entire volume of system.
摘要:
A measuring arrangement includes forming first and second pairs of light beams each having a low frequency light beam and a high frequency light beam. Both pairs of light beams generate beat signals of the same frequency. The low frequency light beam of either pair and the high frequency of the other pair pass through a predetermined optical path to cause phase changes in the same direction. Beat signals are generated by superposing the first and second beam pair to provide measurement information on the phase changes.
摘要:
In measuring apparatus for detecting relative displacement of a diffraction grating, a light beam is separated in an optical unit such as polarizing beam splitter into a reflected light beam and a transmitted light beam which beams are projected onto the diffraction grating. The diffracted light of the reflected and transmitted light beams are deflected by a deflection unit to be projected again onto the diffraction grating for rediffraction. The rediffracted light of the reflected and transmitted light beams are combined in the polarizing beam splitter and a detector detects the interference state of the combined rediffracted light. The deflection unit deflects the diffracted light beams of the reflected light and transmitted light so that they reenter the diffraction grating after traveling along the same optical path in the directions opposite to each other. The apparatus provides a simple configuration that prevents reduction of light intensity and provides the same optical path for both reference and displacement measuring light beams so that errors caused by fluctuation in air and heterogeneity in optical components are cancelled.
摘要:
A method and an apparatus for measuring a very small displacement of an object. The first and second beat signals are produced by light beams of different frequencies diffracted by a diffraction grating. The phase difference between the first and second beat signals is detected, thereby measuring the relative displacement of the diffraction grating.
摘要:
Disclosed is a method of determining a best focus position or best exposure amount of a projection lens in an arrangement wherein a reticle is placed on a plane perpendicular to an optical axis of the projection lens, wherein a pattern having periodicity in a predetermined direction is provided on a surface of the reticle, wherein the pattern is transferred to a photosensitive substrate by the projection lens to form a printed pattern thereon. The method includes providing the pattern by using a plurality of zigzag openings of a constant line width, extending in a direction perpendicular to the predetermined direction and being arrayed with a constant periodicity along that direction, transferring the pattern to the photosensitive substrate sequentially with different focus positions to form plural printed patterns thereon, imaging the printed patterns upon an image pickup surface of photoelectrically converting means; calculating, from an imagewise signal produced by the photoelectrically converting means, information related to one frequency component of zigzag lines, constituting an outline of an image of the zigzag opening, and determining the best focus position on the basis of the information.
摘要:
A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.
摘要:
A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.
摘要:
A displacement detecting system includes a scale provided on a surface of a movable object and having a diffraction grating formed along a predetermined direction, a head unit disposed above the surface of the movable object and having a plurality of detection heads, for detecting displacement of the scale in the predetermined direction, the detection heads being disposed along a direction different from the predetermined direction, and a selecting device for selecting at least one detection head out of the detection heads, for detection of a displacement of the scale in the predetermined direction.
摘要:
Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelength are produced; at least the first light is projected to a position of inspection; and heterodyne interference light produced on the basis of the second light and light scattered at the inspection position and having its state of polarization changed, by the scattering, from the first state of polarization, is detected.
摘要:
An exposure apparatus includes an illumination optical system configured to illuminate a reticle, a projection optical system configured to project a pattern of the reticle onto a substrate, a polarization adjuster configured to independently adjust each polarization state of plural areas in an effective light source distribution used to illuminate the reticle, a polarization measurement unit configured to measure a polarization state of light that has passed the polarization adjuster, and a controller configured to independently control each polarization state of the plural areas via the polarization adjuster based on a measurement result of the polarization measurement unit.