公开(公告)号：US20190131158A1

公开(公告)日：2019-05-02

申请号：US16094920

申请日：2017-04-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazuya MATSUMOTO ,  Yuki HOSAKA ,  Mitsunori OHATA ,  Takashi YAMAMOTO

IPC: H01L21/683 ,  H01J37/32 ,  C23C16/44

Abstract: A plasma processing apparatus includes a chamber body that provides a chamber, a support structure which supports a workpiece inside the chamber body, and a first drive device which rotates the support structure inside the chamber body about a first axis that extends in a direction orthogonal to the vertical direction. The support structure includes a holding unit including an electrostatic chuck which holds the workpiece and which is rotatable around a second axis orthogonal to the first axis, a container provided below the holding unit, and a second drive device which rotates the holding unit around the second axis. The container has a cylindrical container body and a bottom cover configured to close a bottom side opening in the container body. The bottom cover is detachable from the container body.

公开(公告)号：US20130306593A1

公开(公告)日：2013-11-21

申请号：US13948921

申请日：2013-07-23

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tsuyoshi HIDA ,  Takashi YAMAMOTO

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  H01L21/67115 ,  H01L21/6831 ,  Y10T29/49986 ,  Y10T279/23

Abstract: An electrostatic chuck of a stack structure includes a metal layer interposed between insulating layers and a groove formed at a peripheral portion of the electrostatic chuck to have a thickness gradually increasing toward an outside, the groove being covered with a thermally sprayed insulating film. The thermally sprayed film covers at least a portion of the metal layer exposed at an inside of the groove such that the thermally sprayed film does not protrude from the groove.

Abstract translation: 堆叠结构的静电卡盘包括插入在绝缘层之间的金属层和形成在静电卡盘的周边部分处的具有朝向外部逐渐增加的厚度的槽，该槽被热喷涂的绝缘膜覆盖。 喷镀膜覆盖暴露在槽内部的金属层的至少一部分，使得喷镀膜不从槽突出。

公开(公告)号：US20190131137A1

公开(公告)日：2019-05-02

申请号：US16094986

申请日：2017-04-10

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazuya MATSUMOTO ,  Yuki HOSAKA ,  Mitsunori OHATA ,  Takashi YAMAMOTO

IPC: H01L21/3065 ,  H01L21/683 ,  H05H1/46 ,  H01J37/32

Abstract: A plasma processing apparatus includes a support structure configured to support a workpiece and a first drive device configured to rotate the support structure about a first axis extending in a direction orthogonal to a vertical direction. The support structure includes a holding unit including an electrostatic chuck and a container provided under the holding unit. The container includes a tubular container body, and a bottom cover configured to close a bottom side opening of the container body and to be detachable from the container body. A maintenance method includes: rotating a support structure about a first axis such that the bottom cover is positioned above an electrostatic chuck, removing the bottom cover from the container body, and maintaining a component provided in the container body.

公开(公告)号：US20180047547A1

公开(公告)日：2018-02-15

申请号：US15558126

申请日：2016-04-07

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazuya MATSUMOTO ,  Takashi YAMAMOTO

IPC: H01J37/32 ,  H01R39/38 ,  H01R39/28 ,  H01L21/67 ,  H01L21/683

CPC classification number: H01J37/32715 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/3244 ,  H01J37/32724 ,  H01J37/32733 ,  H01J37/32816 ,  H01J37/32834 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/683 ,  H01L21/6833 ,  H01L43/12 ,  H01R39/28 ,  H01R39/381

Abstract: Disclosed is a slip ring including: a conductive rotor that is rotatable around a rotation axis; a conductive stator provided coaxially with the rotor; a conductive sphere disposed between the rotor and the stator to form an electric path between the rotor and the stator; and a conductive coil spring provided between the sphere and one of the rotor and the stator and extending in a circumferential direction with respect to the rotation axis to be in contact with the sphere and one of the rotor and the stator.

公开(公告)号：US20150200124A1

公开(公告)日：2015-07-16

申请号：US14663713

申请日：2015-03-20

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takashi YAMAMOTO

IPC: H01L21/687 ,  H01L21/683

CPC classification number: H01J37/32642 ,  H01J37/32568 ,  H01J37/32577 ,  H01J37/32715 ,  H01L21/6833 ,  H01L21/68742

Abstract: A method of manufacturing a semiconductor device is provided by performing plasma processing on a substrate to be processed by using a plasma processing apparatus including a processing chamber, a lower electrode, an upper electrode, a plurality of lifter pins, a focus ring, a lifter pin for focus ring and an electrical connection mechanism.

Abstract translation: 通过使用包括处理室，下电极，上电极，多个升降销，聚焦环，升降器的等离子体处理装置，对待处理的基板进行等离子体处理来提供制造半导体装置的方法 聚焦环针和电气连接机构。

公开(公告)号：US20150129112A1

公开(公告)日：2015-05-14

申请号：US14528001

申请日：2014-10-30

Applicant: Tokyo Electron Limited

Inventor： Michishige SAITO ,  Koichi MURAKAMI ,  Takashi YAMAMOTO

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32522 ,  H01J37/32532 ,  H01J37/32541 ,  H01J37/3255

Abstract: A shower head assembly includes an electrode plate, and a laminate base that is constituted of ceramic sheets and provided to hold the electrode plate. The laminate base includes no bonding surface between the ceramic sheets. The laminate base includes a first gas diffusion space formed in its central area and a second gas diffusion space formed in its peripheral area. A first heater electrode layer is provided above the first gas diffusion space, and a second heater electrode layer is provided above the second gas diffusion space. A first coolant passage is formed above the first gas diffusion space, and a second coolant passage is formed above the second gas diffusion space. A first gas supply passage is connected to the first gas diffusion space, and a second gas supply passage is connected to the second gas diffusion space.

Abstract translation: 淋浴头组件包括电极板和由陶瓷片构成并设置成夹持电极板的层叠基座。 层压基底不包括陶瓷片之间的粘合表面。 层叠基部包括在其中心区域形成的第一气体扩散空间和形成在其周边区域中的第二气体扩散空间。 第一加热电极层设置在第一气体扩散空间的上方，第二加热电极层设置在第二气体扩散空间的上方。 第一冷却剂通道形成在第一气体扩散空间上方，第二冷却剂通道形成在第二气体扩散空间的上方。 第一气体供给通路与第一气体扩散空间连接，第二气体供给路与第二气体扩散空间连接。

公开(公告)号：US20140203821A1

公开(公告)日：2014-07-24

申请号：US14161538

申请日：2014-01-22

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takashi YAMAMOTO ,  Junichi SHIMADA

IPC: G01R27/26

CPC classification number: H01J37/32917 ,  H01J37/32082 ,  H01J37/32174 ,  H01L22/14 ,  H01L22/26

Abstract: Disclosed is a test apparatus for efficiently and accurately testing a high frequency voltage dependency of an impedance of a test object without damaging the test object. The test apparatus includes a high frequency power source unit, a reference waveform generator, a matching device, an oscilloscope, a control panel, and a main control unit. The test apparatus may boost a high frequency pulse output at a relatively low power from the high frequency power source unit to a voltage required for a high frequency withstand voltage test to be applied to a test object in a state where impedance matching is performed between the high frequency power source unit and the test by the matching device, that is, under a tuned state. Whether the waveform of the voltage applied to the test object is a defined waveform may be concisely monitored and observed by the oscilloscope.

Abstract translation: 公开了一种用于有效且准确地测试测试对象的阻抗的高频电压依赖性而不损坏测试对象的测试装置。 测试装置包括高频电源单元，参考波形发生器，匹配装置，示波器，控制面板和主控制单元。 测试装置可以将来自高频电源单元的较低功率的高频脉冲输出升压到在被测对象施加的阻抗匹配的状态下进行的高频耐受电压测试所需的电压 高频电源单元和匹配装置的测试，即处于调谐状态。 施加到测试对象的电压的波形是否是定义的波形，可以由示波器进行简明的监视和观察。