公开(公告)号：US20180136330A1

公开(公告)日：2018-05-17

申请号：US15808968

申请日：2017-11-10

申请人： Yasuhiro Nihei ,  Toshishige Fujii ,  Takeshi Ogawa ,  Hiroaki Tanaka ,  Shu Takahashi ,  Yoichi Ichikawa ,  Masahiro Itoh

发明人： Yasuhiro Nihei ,  Toshishige Fujii ,  Takeshi Ogawa ,  Hiroaki Tanaka ,  Shu Takahashi ,  Yoichi Ichikawa ,  Masahiro Itoh

IPC分类号： G01S17/10 ,  G01S7/48 ,  G01S7/486

摘要： An distance measurement apparatus includes a light source to emit irradiation light, circuitry to output, to the light source, a first current that changes in accordance of light-emission timing information defining at least turn-on timing of the light source, and a second current that does not change in accordance of the light-emission timing information, a sensor to detect reflection light reflected from an object irradiated with the irradiation light emitted from the light source. The circuitry calculates a distance to the object based on a detection amount of the reflection light detected by the sensor.

公开(公告)号：US20180128919A1

公开(公告)日：2018-05-10

申请号：US15808674

申请日：2017-11-09

申请人： Yoichi Ichikawa ,  Hiroaki Tanaka ,  Shu Takahashi ,  Masahiro Itoh ,  Yasuhiro Nihei ,  Takeshi Ogawa ,  Toshishige Fujii

发明人： Yoichi Ichikawa ,  Hiroaki Tanaka ,  Shu Takahashi ,  Masahiro Itoh ,  Yasuhiro Nihei ,  Takeshi Ogawa ,  Toshishige Fujii

IPC分类号： G01S17/10

CPC分类号： G01S17/10 ,  G01S7/4914 ,  G01S17/32 ,  G01S17/89

摘要： A distance-measuring apparatus, a mobile object, a robot, a three-dimensional measuring device, a surveillance camera, and a distance-measuring method. The distance-measuring apparatus, a mobile object includes a light source to emit light, an imaging element to receive and photoelectrically convert the light into a plurality of electrical signals, and to obtain the electrical signals upon being sorted into a plurality of phase signals, and a computing unit to calculate distance to the object based on the phase signals. In the distance-measuring apparatus, a period of time during which the imaging element obtains the phase signals is different from a light emitting period of the light source in length. The distance-measuring method includes determining whether or not aliasing is present based on a light emitting period of the light source, a period of time during which the plurality of phase signals are obtained, and a result of the calculating.

公开(公告)号：US10048808B2

公开(公告)日：2018-08-14

申请号：US14940484

申请日：2015-11-13

申请人： Koji Masuda ,  Yasuhiro Nihei ,  Takeshi Ueda ,  Masahiro Itoh ,  Shu Takahashi ,  Takeshi Ogawa ,  Hiroaki Tanaka ,  Shiori Ohta

发明人： Koji Masuda ,  Yasuhiro Nihei ,  Takeshi Ueda ,  Masahiro Itoh ,  Shu Takahashi ,  Takeshi Ogawa ,  Hiroaki Tanaka ,  Shiori Ohta

IPC分类号： G06F3/042 ,  G06F3/00 ,  G06F3/03 ,  H04N9/31 ,  H04N13/02 ,  H04N13/00

摘要： An input operation detection device to detect input operation input to an image includes a first and second imaging parts and a processor to detect input operation based on data acquired by the first and second imaging parts. The image is divided into first and second images. The optical axes of imaging optical systems of the first and second imaging parts intersect with the image at points on the same side as installation position sides of the corresponding imaging parts with respect to the center of the corresponding images.

公开(公告)号：US20150301690A1

公开(公告)日：2015-10-22

申请号：US14677070

申请日：2015-04-02

申请人： Koji MASUDA ,  Yasuhiro Nihei ,  Shu Takahashi ,  Takeshi Ueda ,  Hiroaki Tanaka ,  Shiori Ohta ,  Masahiro Itoh ,  Toshiaki Tokita ,  Takeshi Ogawa

发明人： Koji MASUDA ,  Yasuhiro Nihei ,  Shu Takahashi ,  Takeshi Ueda ,  Hiroaki Tanaka ,  Shiori Ohta ,  Masahiro Itoh ,  Toshiaki Tokita ,  Takeshi Ogawa

IPC分类号： G06F3/042

CPC分类号： G06F3/0425 ,  G03B21/10 ,  G06F3/0488 ,  G06F2203/04101 ,  G06T7/254 ,  G06T7/521 ,  G06T7/593 ,  G06T2207/10021 ,  H04N13/239 ,  H04N13/254

摘要： According to an aspect of the present invention, an input-operation detection device for detecting a user input operation performed on at least a portion of a displayed image includes; a light emitter that emits detection light, an imaging unit including an imaging optical system and an image sensor and configured to capture an image of at least one of the displayed image and the input operation, and a processing unit that detects position, at which the input operation is performed, or motion, by which the input operation is provided, based on a result of image capture output from the imaging unit. The position where optical axis of the imaging optical system intersects a display surface of the displayed image and center of the displayed image are on the same side relative to a position where the imaging unit is mounted.

摘要翻译： 根据本发明的一个方面，一种用于检测在显示图像的至少一部分上执行的用户输入操作的输入操作检测装置包括： 发射检测光的光发射器，包括成像光学系统和图像传感器并且被配置为捕获所显示的图像和输入操作中的至少一个的图像的成像单元，以及检测位置的处理单元， 基于从成像单元输出的图像捕获的结果，执行输入操作或通过其提供输入操作的运动。 成像光学系统的光轴与所显示图像的显示面和显示图像的中心相交的位置相对于安装成像单元的位置位于同一侧。

公开(公告)号：US10962776B2

公开(公告)日：2021-03-30

申请号：US16779843

申请日：2020-02-03

申请人： Hiroaki Tanaka ,  Toshihiro Yamashiro

发明人： Hiroaki Tanaka ,  Toshihiro Yamashiro

IPC分类号： G02B27/01

摘要： A display device includes a light source; a light deflector configured to deflect light emitted from the light source to scan as scanning light in a main scanning direction and a sub-scanning direction; a screen having a scanning area to be two-dimensionally scanned with the scanning light at a predetermined cycle, the scanning area having a first area and a second area that differ in position in the sub-scanning direction; a light receiver disposed on the screen, configured to detect the light scanning in each of the first area and the second area of the screen; and a control unit configured to adjust a position of the scanning light in the scanning area according to the number of scanning lines in each of the first area and the second area.

公开(公告)号：US09372433B2

公开(公告)日：2016-06-21

申请号：US14830352

申请日：2015-08-19

申请人： Hiroyuki Suhara ,  Hiroaki Tanaka

发明人： Hiroyuki Suhara ,  Hiroaki Tanaka

IPC分类号： G03G15/043 ,  B41J2/385 ,  B41J2/435

CPC分类号： G03G15/043 ,  B41J2/385 ,  B41J2/435

摘要： An electrostatic latent image forming method for forming, on an image carrier, an electrostatic latent image that has a pattern where there are an irradiated area and a not-irradiated area in a mixed manner, the electrostatic latent image forming method comprises; adjusting an exposure condition of an irradiated area that is included in the irradiated area and is adjacent to the not-irradiated area so that an electric field intensity of an electrostatic latent image that corresponds to the not-irradiated area is increased so as to prevent adhesion of a developer, and irradiating the image carrier with light under the adjusted exposure condition.

公开(公告)号：US20150054075A1

公开(公告)日：2015-02-26

申请号：US14501244

申请日：2014-09-30

申请人： Tadahiro Ohmi ,  Hiroaki Tanaka

发明人： Tadahiro Ohmi ,  Hiroaki Tanaka

IPC分类号： H01L29/10 ,  H01L29/417 ,  H01L29/45 ,  H01L29/78

CPC分类号： H01L29/1087 ,  H01L27/1203 ,  H01L29/41733 ,  H01L29/458 ,  H01L29/7816

摘要： There is provided a semiconductor device. An n-type transistor is formed on a (551) surface of a silicon substrate. A silicide layer region in contact with a diffusion region (heavily doped region) of the n-type transistor has a thickness not more than 5 nm. A metal layer region in contact with the silicide layer has a thickness of 25 nm (inclusive) to 400 nm (inclusive). A barrier height between the silicide layer region and the diffusion region has a minimum value in this thickness relationship.

摘要翻译： 提供了一种半导体器件。 n型晶体管形成在硅衬底的（551）表面上。 与n型晶体管的扩散区域（重掺杂区域）接触的硅化物层区域的厚度不大于5nm。 与硅化物层接触的金属层区域的厚度为25nm（含）〜400nm（含）。 硅化物层区域和扩散区域之间的势垒高度在该厚度关系中具有最小值。

公开(公告)号：US08836150B2

公开(公告)日：2014-09-16

申请号：US13989962

申请日：2010-11-29

申请人： Hiroaki Tanaka

发明人： Hiroaki Tanaka

IPC分类号： H01L23/498 ,  H01L23/00 ,  H01L29/739 ,  H01L29/417

CPC分类号： H01L23/498 ,  H01L24/05 ,  H01L24/48 ,  H01L24/49 ,  H01L24/85 ,  H01L29/417 ,  H01L29/41741 ,  H01L29/7397 ,  H01L2224/04042 ,  H01L2224/05553 ,  H01L2224/05557 ,  H01L2224/05624 ,  H01L2224/451 ,  H01L2224/48091 ,  H01L2224/48132 ,  H01L2224/4847 ,  H01L2224/48491 ,  H01L2224/49175 ,  H01L2224/85205 ,  H01L2924/00014 ,  H01L2924/1305 ,  H01L2924/13055 ,  H01L2924/3511 ,  H01L2224/45099 ,  H01L2924/00

摘要： A semiconductor device disclosed in this description has a semiconductor substrate including an element region in which a semiconductor element is formed, and an upper surface electrode formed on an upper surface of the element region of the semiconductor substrate. The upper surface electrode has a first thickness region and a second thickness region which is thicker than the first thickness region, and a bonding wire is bonded on the second thickness region.

摘要翻译： 在本说明书中公开的半导体器件具有包括其中形成半导体元件的元件区域和形成在半导体衬底的元件区域的上表面上的上表面电极的半导体衬底。 上表面电极具有比第一厚度区域厚的第一厚度区域和第二厚度区域，并且接合线接合在第二厚度区域上。

公开(公告)号：US08704937B2

公开(公告)日：2014-04-22

申请号：US13837623

申请日：2013-03-15

申请人： Keiji Matsusaka ,  Hiroaki Tanaka

发明人： Keiji Matsusaka ,  Hiroaki Tanaka

IPC分类号： H04N5/225 ,  G02B9/34

CPC分类号： G02B3/00 ,  G02B3/04 ,  G02B13/004 ,  G02B13/18 ,  H04N5/23245

摘要： An imaging optical system, an imaging device, and a digital apparatus have a four lens construction with positive, negative, positive, and negative refractive powers. A surface position at the maximum effective diameter of the second lens element is located on the object side than a surface vertex thereof. The fourth lens element has an inflection point at a position other than the intersection of the optical axis and the fourth lens element. The optical system satisfies the following conditions. 0.7 72 ν4>50, and 0.55

摘要翻译： 成像光学系统，成像装置和数字装置具有正，负，正和负折射力的四透镜结构。 第二透镜元件的最大有效直径处的表面位置位于物体侧，而不是其表面​​顶点。 第四透镜元件在光轴和第四透镜元件的交点以外的位置具有拐点。 光学系统满足以下条件。 0.7 72＆ ; 4> 50和0.55

公开(公告)号：US20130241084A1

公开(公告)日：2013-09-19

申请号：US13989962

申请日：2010-11-29

申请人： Hiroaki Tanaka

发明人： Hiroaki Tanaka

IPC分类号： H01L23/498

CPC分类号： H01L23/498 ,  H01L24/05 ,  H01L24/48 ,  H01L24/49 ,  H01L24/85 ,  H01L29/417 ,  H01L29/41741 ,  H01L29/7397 ,  H01L2224/04042 ,  H01L2224/05553 ,  H01L2224/05557 ,  H01L2224/05624 ,  H01L2224/451 ,  H01L2224/48091 ,  H01L2224/48132 ,  H01L2224/4847 ,  H01L2224/48491 ,  H01L2224/49175 ,  H01L2224/85205 ,  H01L2924/00014 ,  H01L2924/1305 ,  H01L2924/13055 ,  H01L2924/3511 ,  H01L2224/45099 ,  H01L2924/00

摘要： A semiconductor device disclosed in this description has a semiconductor substrate including an element region in which a semiconductor element is formed, and an upper surface electrode formed on an upper surface of the element region of the semiconductor substrate. The upper surface electrode has a first thickness region and a second thickness region which is thicker than the first thickness region, and a bonding wire is bonded on the second thickness region.

摘要翻译： 在本说明书中公开的半导体器件具有包括其中形成半导体元件的元件区域和形成在半导体衬底的元件区域的上表面上的上表面电极的半导体衬底。 上表面电极具有比第一厚度区域厚的第一厚度区域和第二厚度区域，并且接合线接合在第二厚度区域上。