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公开(公告)号：US11753347B2
公开(公告)日：2023-09-12
申请号：US17069025
申请日：2020-10-13
申请人： CORNING INCORPORATED
CPC分类号： C04B41/0063 , B28B3/006 , C03B23/0355 , C03B23/0357 , C04B38/0074 , B23B31/307 , B25B11/005 , B28B11/005 , C04B2235/5436
摘要： A method for finishing a glass or ceramic article includes applying a force to the glass or ceramic article. The force is applied to the glass or ceramic article at least when the glass or ceramic article is at a temperature that is greater than or equal to a creep temperature of the glass or ceramic article. Holding the force to the glass or ceramic article as the glass or ceramic article is cooled to a temperature that is less than the creep temperature of the glass or ceramic article.
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公开(公告)号：US20180065187A1
公开(公告)日：2018-03-08
申请号：US15679725
申请日：2017-08-17
申请人： DISCO CORPORATION
发明人： Setsuo Yamamoto
IPC分类号： B23B31/30 , H01L21/683 , H01L21/68
CPC分类号： B23B31/307 , B23B2226/18 , H01L21/682 , H01L21/6836 , H01L21/6838 , H01L21/68785
摘要： A chuck table for holding a plate-shaped workpiece under suction includes a suction plate made of porous ceramics and having a plurality of open pores, and a frame covering a side surface and a reverse side, except an attractive suction surface, of the suction plate and having a plurality of suction grooves defined in an upper surface thereof and a fluid communication passage defined therein that holds the suction grooves in fluid communication with a suction source, the frame supporting the suction plate thereon. The suction plate has a porosity in the range from 60% to 70% by volume, and the open pores have diameters in the range from 10 μm to 25 μm.
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公开(公告)号：US09615902B2
公开(公告)日：2017-04-11
申请号：US13988749
申请日：2011-11-18
申请人： Florent Miguel , Gilles Arnaud
发明人： Florent Miguel , Gilles Arnaud
CPC分类号： A61C13/0022 , A61C5/77 , A61C13/0006 , A61C13/12 , B23B31/307 , Y10T29/49567
摘要： The present disclosure relates to a method and device for producing a dental component. The method includes: a) providing a piece of material attached to or held by a first holder; b) shaping the piece of material to form the dental component and at least one support pin maintaining the dental component attached to the first holder or the initial piece of material; c) engaging a second holder to the dental component while the dental component still is attached to the first holder or the initial piece of material via the at least one support pin; and d) removing the at least one support pin from the dental component while the dental component is engaged by the second holder.
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公开(公告)号：US09314853B2
公开(公告)日：2016-04-19
申请号：US14333170
申请日：2014-07-16
申请人： DISCO CORPORATION
发明人： Nobuhiko Wakita
CPC分类号： B23B31/307 , B24B27/06 , B24B45/00 , B27B5/30 , B27B5/32 , B28D5/02 , B28D5/022 , B28D7/04 , Y10T83/647
摘要： A cutting unit includes a spindle, a spindle housing, a support flange on the front of the spindle, a cutting blade detachably supported to the support flange, and a fixing flange for fixing the cutting blade to the support flange. The support flange includes a boss portion adapted to be inserted through a central opening of the cutting blade, a flange portion for supporting one side surface of the cutting blade, and a cylindrical portion for engaging the front of the spindle. The flange portion has a suction hole opening toward the fixing flange, and the cylindrical portion has a communication hole communicating with the suction hole. The communication hole is connected to a vacuum source through a rotary joint fixed to the spindle housing so that communication between the communication hole and the vacuum source is selectively made by an on-off valve.
摘要翻译： 切割单元包括主轴，主轴壳体，主轴前部的支撑凸缘，可拆卸地支撑在支撑凸缘上的切割刀片以及用于将切割刀片固定到支撑凸缘的固定凸缘。 支撑凸缘包括适于插入穿过切割刀片的中心开口的凸台部分，用于支撑切割刀片的一个侧面的凸缘部分和用于接合主轴前部的圆柱形部分。 凸缘部具有朝向固定凸缘开口的吸入孔，圆筒部具有与吸入孔连通的连通孔。 连通孔通过固定到主轴壳体的旋转接头连接到真空源，使得连通孔和真空源之间的连通通过开关阀选择性地进行。
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公开(公告)号：US20150325466A1
公开(公告)日：2015-11-12
申请号：US14647729
申请日：2012-11-27
发明人： Hui Wang , Fuping Chen , Huaidong Zhang , Wenjun Wang
IPC分类号： H01L21/687 , H01L21/683 , H01L21/67
CPC分类号： H01L21/6838 , B23B31/307 , H01L21/67259 , H01L21/68728 , H01L21/6875 , Y10T279/11
摘要： A substrate supporting apparatus includes a rotatable chuck, a first mass flow controller, a second mass flow controller, a plurality of locating pins and guiding pillars, and a motor in which the rotatable chuck defines a plurality of first injecting ports and second injecting ports, the first injecting ports are connected with a first gas passage for supplying gas to the substrate and sucking the substrate by Bernoulli effect, the second injecting ports are connected with a second gas passage for supplying gas to the substrate and lifting the substrate, the first and the second mass flow controllers are respectively installed on the first and the second gas passages, the plurality of locating pins and guiding pillars are disposed at the top surface of the rotatable chuck and every guiding pillar protrudes to form a holding portion, and the motor is used for rotating the rotatable chuck.
摘要翻译： 基板支撑装置包括可旋转卡盘，第一质量流量控制器，第二质量流量控制器，多个定位销和引导柱，以及电动机，其中可旋转卡盘限定多个第一注入口和第二注入口， 第一注入口与第一气体通道连接，用于向衬底供应气体并通过伯努利效应吸附衬底，第二注入口与用于向衬底供应气体并提升衬底的第二气体通道连接，第一和第 第二质量流量控制器分别安装在第一和第二气体通道上，多个定位销和引导柱设置在可旋转卡盘的顶表面处，并且每个引导柱突出以形成保持部分，并且电动机 用于旋转可旋转卡盘。
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6.发明申请公开(公告)号：US20030141673A1
公开(公告)日：2003-07-31
申请号：US10057114
申请日：2002-01-25
IPC分类号： B25B011/00 , B23Q003/00
CPC分类号： H01L21/6838 , B23B31/307 , B25B11/005 , Y10T279/11
摘要： In a first aspect, a rotary vacuum-chuck is provided that may hold a substrate such as a silicon wafer for rotation. The vacuum-chuck includes a hollow rotary shaft and a chuck mounted on the hollow rotary shaft and having a surface adapted to support a substrate. The chuck has one or more openings in fluid communication with the hollow rotary shaft. A venturi is formed near an end of the hollow rotary shaft to apply vacuum to the hollow rotary shaft and the openings in the chuck surface. No seal is required between the end of the hollow rotary shaft and a surrounding stationary block.
摘要翻译： 在第一方面中，提供一种旋转式真空吸盘，其可以保持诸如硅晶片的基板旋转。 真空吸盘包括中空旋转轴和安装在中空旋转轴上并具有适于支撑基底的表面的卡盘。 卡盘具有与中空旋转轴流体连通的一个或多个开口。 在中空旋转轴的端部附近形成文丘里管，以向空心旋转轴和卡盘表面中的开口施加真空。 在空心旋转轴的端部和周围的固定块之间不需要密封。
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公开(公告)号：US06502808B1
公开(公告)日：2003-01-07
申请号：US09669322
申请日：2000-09-25
申请人： Paul R. Stone , David E. Strand , Paul E. Nelson
发明人： Paul R. Stone , David E. Strand , Paul E. Nelson
IPC分类号： B23B3130
CPC分类号： B25B11/005 , B23B31/307 , Y10T29/49998
摘要： A method and apparatus for holding a part on a fixture in a precisely known predetermined position includes pressing a surface of the part against a vacuum head and sealing an annular elastomeric sealing ring against the part surface. A valve button of a valve is engaged by the part surface to open the valve and establish communication between a vacuum source. The part is pulled by the vacuum against a hard stop in the vacuum head having a fixed precisely known relationship to said vacuum head reference surface. The hard-stop can be mounted in the base of the vacuum head for pivoting about at least one axis to self-align the hard-stop face with the part face.
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公开(公告)号：US5427363A
公开(公告)日：1995-06-27
申请号：US77552
申请日：1993-06-14
IPC分类号： B23B31/30
CPC分类号： B23Q1/035 , B23B31/307 , Y10T279/11
摘要： An apparatus for holding a workpiece to a known position without regard to the angularity of the surface of the workpiece at the point of contact with the apparatus includes a disk shaped, substantially flat contact pad for engaging the workpiece. The surface of the contact pad opposite the workpiece is substantially spherical and fits in a conical seat so that the center point of the upper surface of the contact pad is always at an known position when the contact pad is seated, without regard to the angularity of the contact pad. A proximity detector determines when the contact pad is seated providing an indication to an operator that the workpiece is properly engaged by the apparatus. The contact pad is contained within the interior of a suction cup that engages the workpiece whereupon externally supplied vacuum pulls the suction cup and the workpiece together. A second embodiment employs the contact pad with an aperture therethrough so as to provide fluid communication to an air supply passing through the contact seat. The air supply provides an air bearing to enable a workpiece to be slid on a cushion of air.
摘要翻译： 用于将工件保持在已知位置而不考虑工件在与设备的接触点处的表面的角度的装置包括用于接合工件的盘形的基本平坦的接触垫。 接触垫的与工件相对的表面基本上是球形的，并且配合在锥形座中，使得接触垫的上表面的中心点总是处于已知位置，而不考虑接触垫的角度 接触垫。 接近检测器确定接触垫何时就位，向操作者提供工件被该装置正确接合的指示。 接触垫被包含在与工件接合的吸盘的内部，从而外部提供的真空将吸盘和工件拉在一起。 第二个实施例采用接触垫，其中穿过孔，以便提供流经通过接触座的空气供应的流体连通。 空气供应提供空气轴承以使工件能够在空气垫上滑动。
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公开(公告)号：US4603867A
公开(公告)日：1986-08-05
申请号：US596207
申请日：1984-04-02
IPC分类号： B23B31/30
CPC分类号： B23B31/307 , Y10S264/78 , Y10T279/11
摘要： A vacuum spinner chuck having improved holding power for thin wafers is obtained by providing a retention means for moveably holding an O-ring on the peripheral edge of the chuck. There is a first part-circular portion adjacent the upper surface of the chuck, arranged so that in the absence of vacuum the O-ring protrudes above the chuck surface and contacts the wafer. Below this first part-circular portion is a second sloped portion which tilts away from the surface of the spinner chuck by an angle preferably in the range 30-60 degrees. There is a smooth transition between these two portions. When vacuum is applied to the space between the wafer and the chuck, the wafer presses on the O-ring causing it to stretch and move down from the part-circular portion onto the sloped portion until the wafer rests on the surface of the chuck. The stretch creates an opposing force which holds the O-ring in contact with the wafer and the spinner chuck to prevent loss of vacuum. The stretch automatically returns the O-ring to its initial position when the vacuum is removed. The holding power of the chuck is doubled.
摘要翻译： 通过设置用于在卡盘的周缘上可移动地保持O形环的保持装置，获得具有改善的用于薄晶片的保持力的真空旋转卡盘。 存在与卡盘的上表面相邻的第一部分圆形部分，其布置成使得在没有真空的情况下，O形环突出在卡盘表面上方并接触晶片。 在该第一部分圆形部分之下是第二倾斜部分，其倾斜远离旋转卡盘的表面优选地在30-60度的范围内。 这两个部分之间有一个平滑的过渡。 当将真空施加到晶片和卡盘之间的空间时，晶片压在O形环上，使得其从部分圆形部分向下拉伸并向下移动到倾斜部分上，直到晶片搁置在卡盘的表面上。 拉伸产生相反的力，其将O形环保持与晶片和旋转卡盘接触以防止真空损失。 当真空被去除时，拉伸自动将O形圈返回到其初始位置。 卡盘的保持力倍增。
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公开(公告)号：US3838865A
公开(公告)日：1974-10-01
申请号：US39137873
申请日：1973-08-24
CPC分类号： B23B31/307 , B23B31/10 , Y10T279/11
摘要： This invention is directed to a fixture for supporting a thinwalled workpiece defined by a surface of revolution in a ''''free'''' state during a machining operation. The fixture utilizes a plurality of circumferentially spaced-apart vacuum heads for supporting the workpiece with each head being pivotally mounted and selectively radially adjustable for contacting the surface of the workpiece.
摘要翻译： 本发明涉及一种用于在加工操作期间以“自由”状态的旋转表面支撑的薄壁工件的固定装置。 夹具利用多个周向间隔开的真空头，用于支撑工件，每个头部枢转地安装并且选择性地可径向调节以接触工件的表面。
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