公开(公告)号：US20230175034A1

公开(公告)日：2023-06-08

申请号：US17995371

申请日：2021-04-01

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

发明人： Pierre MARCOUX ,  Victor BIARDEAU ,  Mathieu DUPOY ,  Frederic-Xavier GAILLARD ,  Joel LE GALUDEC

IPC分类号： C12Q1/04 ,  G01N21/3563 ,  G01N21/03

CPC分类号： C12Q1/04 ,  G01N21/3563 ,  G01N21/03 ,  G01N2021/0385

摘要： Methods for characterizing micro-organisms may include (a) depositing micro-organisms on a porous medium with a first and a second surface and pores extending from the first surface to the second surface; (b) arranging the porous medium on the surface of a nutrient medium contained in a chamber, the second surface being arranged in contact with the nutrient medium; (c) moving the porous medium in relation to the chamber; (d) positioning the porous medium between an infrared light source and an image sensor, the light source being configured to emit an incident light wave in an emission wavelength; (e) illuminating micro-organisms retained on the porous medium, using the light source and acquiring an image using the image sensor, the image allowing an observation of at least one colony of micro-organisms; and (f) characterizing the colony of microorganisms from the image acquired in the illuminating (e).

公开(公告)号：US11665143B2

公开(公告)日：2023-05-30

申请号：US16650348

申请日：2018-09-11

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

发明人： Frédéric Laurent ,  Alexis Olivereau

IPC分类号： H04L9/12 ,  H04L9/18 ,  H04L9/40 ,  H04L12/46 ,  H04L45/24 ,  H04L9/34

CPC分类号： H04L63/0421 ,  H04L12/4633 ,  H04L45/24 ,  H04L63/0428 ,  H04L63/0876

摘要： An enhanced device and method for anonymization also offering improved security properties of data exchanged bidirectionally between a client and a server in a communication network. A protocol in respect of data exchange between client and server which relies on a two-level third-party servers architecture as well as on a system for bidirectional communication between the client and the server through these two levels of third-party servers.

公开(公告)号：US11655283B2

公开(公告)日：2023-05-23

申请号：US16625254

申请日：2018-07-24

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES ,  ASSISTANCE PUBLIQUE—HOPITAUX DE PARIS

发明人： Edgardo D. Carosella ,  Diana Tronik-Le Roux ,  Jean-Philippe Deslys ,  Jérôme Verine ,  François Desgrandchamps ,  Nathalie Rouas-Freiss ,  Joël Le Maoult

IPC分类号： A61K38/17 ,  C07K14/47 ,  C07K14/74 ,  C07K16/28 ,  C12N15/79

CPC分类号： C07K14/70539 ,  A61K38/1709 ,  A61K38/1774 ,  C07K14/47 ,  C07K16/2833 ,  C12N15/79 ,  C07K2317/33

摘要： Embodiments of the disclosure pertain to the field of HLA-G molecules and their therapeutic use. The disclosure pertains to new HLA-G isoforms, that is to say new RNA transcripts and proteins deriving from the HLA-G gene, pharmaceutical composition comprising thereof, as well as primers specific of these transcripts and antibodies specific of these proteins. The disclosure further pertains to the diagnostic or therapeutic use of these molecules.

公开(公告)号：US11648625B2

公开(公告)日：2023-05-16

申请号：US16183070

申请日：2018-11-07

申请人： Commissariat a l'Energie Atomique et aux Energies Alternatives

发明人： Ludovic Rouillon

IPC分类号： B23K26/211 ,  H01M8/0232 ,  H01M8/0245 ,  B23K26/12 ,  B23K26/34 ,  H01M8/0256 ,  B23K26/00 ,  B23K26/21 ,  H01M8/10 ,  B23K101/34 ,  B23K101/18 ,  H01M8/1018

CPC分类号： B23K26/211 ,  B23K26/009 ,  B23K26/123 ,  B23K26/21 ,  B23K26/34 ,  H01M8/0232 ,  H01M8/0245 ,  H01M8/0256 ,  B23K2101/18 ,  B23K2101/35 ,  H01M8/1018 ,  H01M2008/1095

摘要： A method for welding between two metallic plates, including:



(a) fitting a solid plate without openings, configured to be transparent at at least one emission wavelength of a laser beam (F) emitted by a laser (L), between the laser (L) and at least one contact zone between the metallic plates to be welded;
(a1) inerting of the contact zone via a netural gas, where the neutral gas circulates in channels delimited by the contact zone between the metallic plates and by the solid plate;
(a2) exerting pressure on the two metallic plates to apply them against one another in the contact zone to be welded, where the application pressure is exerted by the solid plate directly in contact with one of the two metallic plates to be welded; and
(b) emission of a laser beam, through the solid plate, to perform welding of the metallic plates in the contact zone.

公开(公告)号：US11648416B2

公开(公告)日：2023-05-16

申请号：US17117318

申请日：2020-12-10

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

发明人： Claude Chabrol

IPC分类号： A61N5/06

CPC分类号： A61N5/0622 ,  A61N2005/0632 ,  A61N2005/0651 ,  A61N2005/0664

摘要： An optically stimulating module to be integrated into a probe is implantable into a living being with a view to locally illuminating a region of said living being. The module includes a casing, and a hermetic electronic unit housed in the casing. The hermetic electronic unit includes two luminous diodes connected back-to-back, and at least two electrical contacts for connecting the module to an electrical power source.

公开(公告)号：US20230142800A1

公开(公告)日：2023-05-11

申请号：US17786206

申请日：2020-12-17

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

发明人： Hervé Nozach ,  Coline Sivelle ,  Raphaël Sierocki ,  Bernard Maillere

IPC分类号： C07K16/24 ,  A61P37/02

CPC分类号： C07K16/241 ,  A61P37/02 ,  C07K2317/565

摘要： The invention relates to adalimumab variants with reduced immunogenic potential and retained or increased affinity and therapeutic applications thereof.

公开(公告)号：US11646196B2

公开(公告)日：2023-05-09

申请号：US17445747

申请日：2021-08-24

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

发明人： Heimanu Niebojewski ,  Christophe Plantier ,  Shay Reboh

IPC分类号： H01L21/02 ,  H01L29/165 ,  H01L29/66

CPC分类号： H01L21/02236 ,  H01L21/02532 ,  H01L29/165 ,  H01L29/66553

摘要： Making of a transistor structure comprising in this order:



forming semiconductor blocks made of SixGe1-x over the surface semiconductor layer and on either side of insulating spacers, the semiconductor blocks having lateral facets,
growth of a silicon-based layer over the semiconductor blocks, so as to fill cavities located between said facets and said insulating spacers,
thermal oxidation to perform a germanium enrichment of semiconductor portions of the surface semiconductor layer disposed on either side of the spacers.

公开(公告)号：US11642724B2

公开(公告)日：2023-05-09

申请号：US15772219

申请日：2016-11-03

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE

发明人： Alexandre Allemand ,  Alain Largeteau ,  Seu U-Chan Chung ,  Yann Le Petitcorps ,  Jérôme Roger

IPC分类号： B22F3/105 ,  C04B35/111 ,  C23C16/32 ,  C04B35/01 ,  C04B35/46 ,  C04B35/468 ,  B28B3/02 ,  B22F3/11 ,  C04B35/115 ,  C04B35/457 ,  C04B35/486 ,  C04B35/645 ,  H05B3/60

CPC分类号： B22F3/105 ,  B22F3/11 ,  B28B3/025 ,  C04B35/016 ,  C04B35/111 ,  C04B35/115 ,  C04B35/457 ,  C04B35/46 ,  C04B35/4682 ,  C04B35/486 ,  C04B35/645 ,  C23C16/32 ,  C23C16/325 ,  H05B3/60 ,  B22F2003/1051 ,  B22F2999/00 ,  C04B2235/3208 ,  C04B2235/3224 ,  C04B2235/6583 ,  C04B2235/6585 ,  C04B2235/666 ,  B22F2999/00 ,  B22F3/105 ,  B22F3/003

摘要： A die or piston of a spark plasma sintering apparatus, wherein the die or piston is made from graphite and the outer surfaces of the die or piston are coated with a silicon carbide layer with a thickness of 1 to 10 micrometres, the silicon carbide layer being further optionally coated with one or more other layer(s) made from a carbide other than silicon carbide chosen from hafnium carbide, tantalum carbide and titanium carbide, the other layer(s) each having a thickness of 1 to 10 micrometres. A spark plasma sintering (SPS) apparatus comprising the die and two of the pistons, defining a sintering, densification or assembly chamber capable of receiving a powder to be sintered, a part to be densified, or parts to be assembled. A method of sintering a powder, densifying a part, or assembling two parts by means of a method of spark plasma sintering (SPS) in an oxidising atmosphere, using the spark plasma sintering (SPS) apparatus.

公开(公告)号：US11639893B2

公开(公告)日：2023-05-02

申请号：US17678714

申请日：2022-02-23

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

发明人： Jean-Guillaume Coutard ,  Cedric Allier ,  Sebastien Becker ,  Mathieu Dupoy

IPC分类号： G01N21/35 ,  G01N21/3563 ,  G01N21/39 ,  G01N33/483

摘要： A device for observing a biological sample is provided, including: a light source to emit a light beam at a wavelength between 1 μm and 20 μm; an image sensor including pixels defining a detection plane; a holder to hold the sample between the source and the sensor at a distance from the plane smaller than 1 mm, such that the source is configured to illuminate an area of the sample larger than 1 mm2, no image-forming optics are placed between the sample and the sensor, and the sensor is configured to acquire an image corresponding to an area of the sample larger than 1 mm2 and representative of an absorption of the beam by the sample at the wavelength; and a processor to determine a map of an amount of analyte in the sample, based on the image acquired by the sensor, the analyte absorbing light at the wavelength.

公开(公告)号：US11634810B2

公开(公告)日：2023-04-25

申请号：US16337623

申请日：2017-09-28

申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

发明人： Frédéric Schuster ,  Fernando Lomello ,  Francis Maury ,  Alexandre Michau ,  Raphaël Boichot ,  Michel Pons

IPC分类号： C23C16/18 ,  C23C16/02 ,  C23C16/10 ,  C23C16/32 ,  C23C16/34 ,  C23C16/36 ,  C23C16/448 ,  C23C16/56 ,  G21C3/07 ,  G21C3/20

摘要： Process for manufacturing a nuclear component comprising i) a support containing a substrate based on a metal (1), the substrate (1) being coated or not coated with an interposed layer (3) positioned between the substrate (1) and at least one protective layer (2) and ii) the protective layer (2) composed of a protective material comprising chromium; the process comprising a step a) of vaporizing a mother solution followed by a step b) of depositing the protective layer (2) onto the support via a process of chemical vapor deposition of an organometallic compound by direct liquid injection (DLI-MOCVD).