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115 条记录 (耗时 0.05 秒)

    Method and its apparatus for inspecting defects
    92.
    发明授权
    Method and its apparatus for inspecting defects 有权
    检查缺陷的方法及其装置

    公开(公告)号：US07599545B2

    公开(公告)日：2009-10-06

    申请号：US10893988

    申请日：2004-07-20

    申请人： Yukihiro Shibata ,  Shunji Maeda ,  Hitoshi Kubota

    发明人： Yukihiro Shibata ,  Shunji Maeda ,  Hitoshi Kubota

    IPC分类号： G06K9/00 ,  H04N7/18

    CPC分类号： G01N21/9501 ,  G01N21/13 ,  G01N21/8806 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/154 ,  G01N2021/8825 ,  G01N2021/9513

    摘要： The present invention relates to a high-sensitivity inspection method and apparatus adapted for the fine-structuring of patterns, wherein defect inspection sensitivity is improved using the following technologies: detection optical system is improved in resolution by filling the clearance between an objective lens 30 and a sample 1, with a liquid, and increasing effective NA (Numerical Aperture); and when a transparent interlayer-insulating film is formed on the surface of the sample, amplitude splitting at the interface between the liquid and the insulating film is suppressed for reduction in the unevenness of optical images in brightness due to interference of thin-film, by immersing the clearance between the objective lens and the sample, with a liquid of a refractive index close to that of the transparent film.

    摘要翻译： 本发明涉及一种适用于图案精细化的高灵敏度检测方法和装置，其中使用以下技术提高了缺陷检查灵敏度：通过填充物镜30与物镜30之间的间隙来提高检测光学系统的分辨率。 样品1，具有液体，并且增加有效NA（数值孔径）; 并且当在样品的表面上形成透明的层间绝缘膜时，抑制液体与绝缘膜之间的界面处的振幅分裂，以减少由于薄膜的干扰引起的光学图像在亮度上的不均匀性，由 将物镜与样品之间的间隙浸入折射率接近于透明膜的液体。

    Automated guided vehicle, operation control system and method for the same, and automotive vehicle
    96.
    发明授权
    Automated guided vehicle, operation control system and method for the same, and automotive vehicle 失效
    自动导向车，操作控制系统及方法与汽车

    公开(公告)号：US06941200B2

    公开(公告)日：2005-09-06

    申请号：US10398547

    申请日：2001-10-15

    申请人： Osamu Sonoyama ,  Takahiro Yokomae ,  Yoichi Sugitomo ,  Masahide Yoshihara ,  Osamu Matsushima ,  Toyotoshi Tsujikawa ,  Takeshi Asano ,  Hitoshi Kubota

    发明人： Osamu Sonoyama ,  Takahiro Yokomae ,  Yoichi Sugitomo ,  Masahide Yoshihara ,  Osamu Matsushima ,  Toyotoshi Tsujikawa ,  Takeshi Asano ,  Hitoshi Kubota

    IPC分类号： B61B13/00 ,  G05D1/02 ,  G01C22/00

    CPC分类号： G05D1/0297 ,  G05D1/0272 ,  G05D1/0274 ,  G05D1/0282 ,  G05D2201/0216

    摘要： A waiting time of an automated guided vehicle is substantially eliminated by significantly shortening the communication time of various information, and the transport efficiency of an automated guided vehicle as well as the operating rate of work stations and production lines as a whole are improved, and in addition, the flexibility of an operation control system for the automated guided vehicle is improved. An automated guided vehicle (1) includes a wireless local area network adapter (11) for passing information by radio with an operation control unit connected to the local area network or with another automated guided vehicle, a memory part (12) for storing at least information from the operation control unit or from another automated guided vehicle and information related to the automated guided vehicle itself, and a control part (14) for controlling the wireless local area network adapter and the memory part.

    摘要翻译： 通过显着缩短各种信息的通信时间，自动化引导车的等待时间得到了实质性的消除，自动化引导车辆的运输效率以及整个工作站和生产线的运行率得到了改善，并且在 此外，提高了自动导引车辆的操作控制系统的灵活性。 一种自动导引车辆（1）包括无线局域网适配器（11），用于通过无线电与通过连接到局域网或与其他自动导引车辆的操作控制单元传递信息，存储部分（12）至少存储 来自操作控制单元或来自另一自动引导车辆的信息以及与自动引导车辆本身相关的信息，以及用于控制无线局域网适配器和存储器部分的控制部分（14）。

    Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns on an object to be inspected
    98.
    发明授权
    Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns on an object to be inspected 失效
    半导体基板的制造方法以及检查被检体的图案的缺陷的方法和装置

    公开(公告)号：US06404498B1

    公开(公告)日：2002-06-11

    申请号：US09588201

    申请日：2000-06-06

    申请人： Shunji Maeda ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Hitoshi Kubota ,  Kenji Oka

    发明人： Shunji Maeda ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Hitoshi Kubota ,  Kenji Oka

    IPC分类号： G01B1100

    CPC分类号： G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95615 ,  G01N2201/0618 ,  G01N2201/0634

    摘要： A pattern detection method and apparatus for inspecting, with high resolution, a micro fine defect of a pattern on an inspected object, and a semiconductor substrate manufacturing method and system with a high yield. A micro fine pattern on the inspected object is inspected by annular-looped illumination through an objective lens onto a wafer, the wafer having micro fine patterns thereon. The illumination may be polarized and controlled according to an image detected on the pupil of the objective lens, and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect. Simultaneously, micro fine defects on the micro-fine pattern are detected with high resolution. Further, process conditions of a manufacturing line are controlled by analyzing a cause of defect and a factor of defect.

    摘要翻译： 用于以高分辨率检查被检查物体上的图案的微细缺陷的图案检测方法和装置，以及高产率的半导体基板制造方法和系统。 被检查物体上的微细图案通过物镜通过环形照明被检查到晶片上，晶片上具有微细精细图案。 照明可以根据在物镜的光瞳上检测到的图像进行偏振和控制，并且通过检测来自晶片的反射光来获得图像信号。 将图像信号与参考图像信号进行比较，并且检测出显示不一致的图案的一部分作为缺陷。 同时，以高分辨率检测微细图案上的微细缺陷。 此外，通过分析缺陷的原因和缺陷因素来控制生产线的工艺条件。

    Pattern checking method and checking apparatus
    100.
    发明授权
    Pattern checking method and checking apparatus 失效
    模式检查方法和检查装置

    公开(公告)号：US06317512B1

    公开(公告)日：2001-11-13

    申请号：US08753011

    申请日：1996-11-19

    申请人： Shunji Maeda ,  Hitoshi Kubota ,  Hiroshi Makihira ,  Takashi Hiroi

    发明人： Shunji Maeda ,  Hitoshi Kubota ,  Hiroshi Makihira ,  Takashi Hiroi

    IPC分类号： G06K900

    CPC分类号： G06T7/001 ,  G06T7/74 ,  G06T2207/30148

    摘要： A pattern checking method wherein an image of a certain position of one pattern is detected; the detected image is positioned with respect to an image of a position corresponding to the certain position, in a reference pattern image; and the positioned images are compared with each other, whereby a discrepant place among these positioned images is judged as a defect the positioning operations of the images of the detected patterns are controlled based upon either pattern information such as density of the images of the detected patterns, or information obtained from the positioning operations for images of other positions in the patterns. An image sensor unit for detecting images of patterns is constructed which has such a structure that a plurality of one-dimensional image sensors functioning as a pattern detector are arranged in a two-dimensional form, and an output of a certain one-dimensional image sensor for imaging a certain position of one pattern is delayed for a predetermined time period, and also both of an output of an one-dimensional image sensor adjoining the first-mentioned one-dimensional image sensor, which images the same position of the same pattern, and the delayed output of the certain one-dimensional image sensor are sequentially added to derive a summation output. The image sensor unit is inclined at a predetermined angle with respect to a plane perpendicular to the reflection light from the patterns, and the reflection light from the patterns is focused via a confocal focusing optical system onto this image sensor unit.

    摘要翻译： 一种图案检查方法，其中检测到一个图案的某个位置的图像; 检测图像相对于与特定位置对应的位置的图像在参考图案图像中定位; 并且定位的图像彼此进行比较，由此将这些定位的图像中的不一致的位置判断为检测图案的图像的定位操作的缺陷，基于诸如检测图案的图像的密度的图案信息 或者从图案中的其他位置的图像的定位操作获得的信息。 用于检测图案的图像的图像传感器单元被构造成具有以二维形式配置作为图案检测器的多个一维图像传感器的结构，以及某一个一维图像传感器的输出 对于一个图案的某个位置的成像被延迟预定的时间段，并且与相同图案的相同位置成像的第一个提到的一维图像传感器邻接的一维图像传感器的输出， 并且依次添加特定一维图像传感器的延迟输出以导出求和输出。 图像传感器单元相对于与图案的反射光垂直的平面以预定角度倾斜，并且来自图案的反射光经由共聚焦聚焦光学系统聚焦到该图像传感器单元上​​。