Substrate processing apparatus
    92.
    发明申请
    Substrate processing apparatus 审中-公开
    基板加工装置

    公开(公告)号:US20080166886A1

    公开(公告)日:2008-07-10

    申请号:US11902035

    申请日:2007-09-18

    IPC分类号: H01L21/31 C23C16/00

    摘要: There is provided a substrate processing apparatus, comprising: a processing chamber that houses a plurality of substrates in a state of being stacked; a heating member that heats the substrate and an atmosphere in the processing chamber; a first gas supply member that supplies a source gas that thermally-decomposes; a second gas supply member that supplies oxidative gas; an exhaust member that exhausts the atmosphere in the processing chamber; and a controller that controls at least the first gas supply member, the second gas supply member, and the exhaust member. The first gas supply member further includes at least one inlet opening that introduces the source gas into the processing chamber; the first inlet opening opens so as to avoid the side of the substrate; the second gas supply member further includes at least one second inlet opening that introduces the oxidative gas into the processing chamber; the second inlet opening opens to the side of the substrate; and the controller controls the first and second gas supply members and the exhaust member, so that the source gas and the oxidative gas are alternately supplied and exhausted to the processing chamber, to form a desired film on the substrate.

    摘要翻译: 提供了一种基板处理装置,包括:处理室,其以堆叠的状态容纳多个基板; 加热构件,其加热所述基板和所述处理室中的气氛; 提供热分解的源气体的第一气体供给构件; 供给氧化气体的第二气体供给部件; 排气构件,其排出处理室中的气氛; 以及至少控制第一气体供给构件,第二气体供给构件和排气构件的控制器。 第一供气构件还包括将源气体引入处理室的至少一个入口; 第一入口开口打开以避免衬底的侧面; 第二气体供给构件还包括将氧化气体引入处理室的至少一个第二入口; 第二入口开口通向基板的侧面; 并且控制器控制第一和第二气体供给构件和排气构件,使得源气体和氧化气体被交替地供给并排出到处理室,以在基板上形成期望的膜。

    Method for manufacturing semiconductor device background
    93.
    发明申请
    Method for manufacturing semiconductor device background 有权
    制造半导体器件背景的方法

    公开(公告)号:US20080132084A1

    公开(公告)日:2008-06-05

    申请号:US11979707

    申请日:2007-11-07

    IPC分类号: H01L21/316 B05C11/00

    摘要: To improve a step coverage and a loading effect, without inviting a deterioration of throughput and an increase of cost, in a method for forming a thin film by alternately flowing a raw material and alcohol to a processing chamber. The method includes: loading a silicon wafer having a surface terminated by H into a processing chamber; supplying alcohol to supply the alcohol into the processing chamber as a first gas; first purging to discharge the first gas from an inside of the processing chamber; supplying a raw material to supply a source gas into the processing chamber as a second gas; second purging to discharge the second gas from the inside of the processing chamber; generating a desired thin film on the silicon wafer by setting as one cycle at least the aforementioned supplying alcohol, first purging, supplying the raw material, and second purging, and by repeating this cycle a prescribed number of times; and unloading the silicon wafer, with said desired thin film generated thereon, from the inside of the processing chamber.

    摘要翻译: 在通过将原料和醇交替地流动到处理室来形成薄膜的方法中,为了提高台阶覆盖率和装载效果,不会引起生产量的恶化和成本的增加。 该方法包括:将具有由H端接的表面的硅晶片加载到处理室中; 供应酒精以将酒精作为第一气体供应到处理室中; 首先从处理室的内部排出第一气体; 提供原料以将源气体作为第二气体供应到处理室中; 第二次吹扫以从处理室的内部排出第二气体; 通过将至少上述供应醇设置为一个循环,首先清洗,供给原料和第二次清洗,并通过重复该循环规定次数,在硅晶片上产生所需的薄膜; 并且从处理室的内部卸载其上产生有所需要的薄膜的硅晶片。

    Method of catalytic decomposition of water
    94.
    发明授权
    Method of catalytic decomposition of water 失效
    水的催化分解方法

    公开(公告)号:US07357912B2

    公开(公告)日:2008-04-15

    申请号:US11206967

    申请日:2005-08-19

    IPC分类号: C01B3/04 B01J21/06

    摘要: A method of catalytically decomposing water, which comprises contacting water with a composite catalyst comprising a solid acid catalyst and a solid base catalyst at an elevated temperature, wherein the composite catalyst contains the solid acid catalyst in an amount of 36 to 65% by weight and the balance being the solid base catalyst, and wherein the temperature is higher than a temperature at which pH values of the (H2O/O2 redox) potential and (H2O/H2 redox) potential are equal to each other, the redox potentials being given by a water potential—pH value diagram.

    摘要翻译: 一种催化分解水的方法,其包括使水与包含固体酸催化剂和固体碱催化剂的复合催化剂在升高的温度下接触,其中复合催化剂含有36-65重量%的固体酸催化剂,和 余量为固体碱催化剂,其中温度高于(H 2 O 2 O / O 2 O 2氧化还原)电位的pH值和(H 氧化还原电位彼此相等,氧化还原电位由水电位 - pH值图表给出。

    Lead acid battery
    95.
    发明申请
    Lead acid battery 审中-公开
    铅酸蓄电池

    公开(公告)号:US20070141465A1

    公开(公告)日:2007-06-21

    申请号:US11641766

    申请日:2006-12-20

    IPC分类号: H01M4/38

    摘要: It is an object of the present invention to provide a lead acid battery which generates a higher power than the conventional lead acid battery does. To this end, the lead acid battery of the present invention is characterized in that electrodes are formed, each of the electrodes having a structure in which a metallic powder is disorderly distributed, the metallic powder being composed of a metallic lead powder or a lead alloy powder containing lead as a main element of composition. In the lead acid battery, a charge collection network of a metallic powder containing lead is formed. As a result, the lead acid battery generates a higher power than the conventional lead acid battery does.

    摘要翻译: 本发明的目的是提供一种比常规铅酸电池产生更高功率的铅酸电池。 为此,本发明的铅酸电池的特征在于,形成电极,每个电极具有金属粉末无序分布的结构,金属粉末由金属铅粉末或铅合金构成 含铅的粉末作为组成的主要元素。 在铅酸电池中,形成含有铅的金属粉末的电荷收集网。 结果,铅酸电池产生比常规铅酸电池更高的功率。

    Power steering device
    96.
    发明申请
    Power steering device 审中-公开
    动力转向装置

    公开(公告)号:US20070074926A1

    公开(公告)日:2007-04-05

    申请号:US11487356

    申请日:2006-07-17

    IPC分类号: B62D5/06

    摘要: A power assist mechanism is provided that assists operation of a steering mechanism when receiving a pressurized hydraulic fluid. A hydraulic pump feeds the power assist mechanism with the pressurized hydraulic fluid when driven. An electric motor drives the hydraulic pump. A battery unit is provided for energizing the electric motor. A control unit is provided for controlling the electric power from the battery unit to the electric motor. The battery unit comprises a plurality of lead-acid batteries that are connected in series. Each lead-acid battery comprises a spirally wound positive plate, a spirally wound negative plate, a spirally wound insulating plate that is spirally wound and sandwiched between the positive and negative plates, a battery case that puts therein the spirally wound positive, negative and insulating plates and an electrolyte that is provided in the battery case.

    摘要翻译: 提供动力辅助机构,其在接收加压液压流体时辅助转向机构的操作。 驱动时,液压泵将动力辅助机构与加压液压流体一起供给。 电动机驱动液压泵。 提供电池单元以对电动机通电。 提供控制单元,用于控制从电池单元到电动机的电力。 电池单元包括串联连接的多个铅酸电池。 每个铅酸电池包括螺旋缠绕的正极板,螺旋卷绕的负极板,螺旋卷绕并夹在正极板和负极板之间的螺旋卷绕的绝缘板,放置螺旋卷绕的正极,负极和绝缘的电池壳体 板和设置在电池壳体中的电解质。

    Novel abutted exchange bias design for sensor stabilization

    公开(公告)号:US20060198059A1

    公开(公告)日:2006-09-07

    申请号:US11074270

    申请日:2005-03-04

    IPC分类号: G11B5/127 G11B5/33

    CPC分类号: G11B5/3932

    摘要: A hard bias (HB) structure for biasing a free layer in a MR sensor within a magnetic read head is comprised of a main biasing layer with a large negative magnetostriction (λS) value. Compressive stress in the device after lapping induces a strong in-plane anisotropy that effectively provides a longitudinal bias to stabilize the sensor. The main biasing layer is formed between two FM layers, and at least one AFM layer is disposed above the upper FM layer or below the lower FM layer. Additionally, there may be a Ta/Ni or Ta/NiFe seed layer as the bottom layer in the HB structure. Compared with a conventional abutted junction exchange bias design, the HB structure described herein results in higher output amplitude under similar asymmetry sigma and significantly decreases sidelobe occurrence. Furthermore, smaller MRWu with a similar track width is achieved since the main biasing layer acts as a side shield.

    Substrate processing device
    99.
    发明申请
    Substrate processing device 审中-公开
    基板加工装置

    公开(公告)号:US20060124058A1

    公开(公告)日:2006-06-15

    申请号:US10529896

    申请日:2003-11-06

    IPC分类号: C23C16/00

    CPC分类号: C23C16/4405 C23C16/45536

    摘要: A substrate processing device comprises a reaction vessel 11 forming a space receiving a substrate 1 and adapted to have a plurality of reaction gases supplied thereto to perform desired processing of the substrate, an exhaust port 16 formed in the reaction vessel 11 for exhausting the reaction vessel 11, and a gas supply system 70A, 70B for supplying at least a plurality of reaction gases into the reaction vessel 11, the gas supply system 70A, 70B including a cleaning gas supply unit for supplying a cleaning gas to perform desired processing of the substrate 1 to thereby remove adherents in the reaction vessel 11, and a post-processing gas supply unit for supplying a post-processing gas capable of removing the elements contained in the cleaning gas remaining in the reaction vessel 11 after the adherents have been removed by supplying the cleaning gas, the post-processing gas containing all of the reaction gases used in performing desired processing of the substrate.

    摘要翻译: 基板处理装置包括反应容器11,形成容纳基板1的空间,并且适于提供多个反应气体以进行基板的所需处理;形成在反应容器11中用于排出反应容器的排气口 11,以及用于将至少多个反应气体供应到反应容器11中的气体供应系统70A,70B,气体供应系统70A,70B,其包括用于供应清洁气体以执行期望的清洁气体供应单元 处理基板1,从而除去反应容器11中的附着物;以及后处理气体供给单元,用于提供在附着物具有的残留在反应容器11中的清洁气体中包含的元素的后处理气体 通过提供清洁气体,后处理气体含有在进行基材的所需加工中使用的所有反应气体而被除去。