Abstract:
The present invention relates to a semiconductor device that has a semiconductor-on-insulator (SeOI) structure, which includes a substrate, an insulating layer such as an oxide layer on the substrate and a semiconductor layer on the insulating layer with a field-effect-transistor (FET) formed in the SeOI structure from the substrate and deposited layers, wherein the FET has a channel region in the substrate, a gate dielectric layer that is made from at least a part of the oxide layer of the SeOI structure; and a gate electrode that is formed at least partially from a part of the semiconductor layer of the SeOI structure. The invention further relates to a method of forming one or more field-effect-transistors or metal-oxide-semiconductor transistors from a semiconductor-on-insulator structure that involves patterning and etching the SeOI structure, forming shallow trench isolations, depositing insulating, metal or semiconductor layers, and removing mask and/or pattern layers.
Abstract:
An SRAM-type memory cell that includes a semiconductor on insulator substrate having a thin film of semiconductor material separated from a base substrate by an insulating layer; and six transistors such as two access transistors, two conduction transistors and two charge transistors arranged so as to form with the conduction transistors two back-coupled inverters. Each of the transistors has a back control gate formed in the base substrate below the channel and able to be biased in order to modulate the threshold voltage of the transistor, with a first back gate line connecting the back control gates of the access transistors to a first potential and a second back gate line connecting the back control gates of the conduction transistors and charge transistors to a second potential. The first and second potentials can be modulated according to the type of cell control operation.
Abstract:
The invention relates to a flash memory cell having a FET transistor with a floating gate on a semiconductor-on-insulator (SOI) substrate composed of a thin film of semiconductor material separated from a base substrate by an insulating buried oxide (BOX) layer, The transistor has in the thin film, a channel, with two control gates, a front control gate located above the floating gate and separated from it by an inter-gate dielectric, and a back control gate located within the base substrate directly under the insulating (BOX) layer and separated from the channel by only the insulating (BOX) layer. The two control gates are designed to be used in combination to perform a cell programming operation. The invention also relates to a memory array made up of a plurality of memory cells according to the first aspect of the invention, which can be in an array of rows and columns, and a method of fabricating such memory cells and memory arrays.
Abstract:
The invention relates to a method of controlling a DRAM memory cell of an FET transistor on a semiconductor-on-insulator substrate that includes a thin film of semiconductor material separated from a base substrate by an insulating layer or BOX layer, the transistor having a channel and two control gates, a front control gate being arranged on top of the channel and separated from the latter by a gate dielectric and a back control gate being arranged in the base substrate and separated from the channel by the insulating layer (BOX). In a cell programming operation, the front control gate and the back control gate are operated jointly by applying a first voltage to the front control gate and a second voltage to the back control gate, with the first voltage being lower in amplitude than the voltage needed to program the cell when no voltage is applied to the back control gate.
Abstract:
There are many inventions described and illustrated herein. In a first aspect, the present invention is directed to a memory device and technique of reading data from and writing data into memory cells of the memory device. In this regard, in one embodiment of this aspect of the invention, the memory device and technique for operating that device that minimizes, reduces and/or eliminates the debilitating affects of the charge pumping phenomenon. This embodiment of the present invention employs control signals that minimize, reduce and/or eliminate transitions of the amplitudes and/or polarities. In another embodiment, the present invention is a semiconductor memory device including a memory array comprising a plurality of semiconductor dynamic random access memory cells arranged in a matrix of rows and columns. Each semiconductor dynamic random access memory cell includes a transistor having a source region, a drain region, a electrically floating body region disposed between and adjacent to the source region and the drain region, and a gate spaced apart from, and capacitively coupled to, the body region. Each transistor includes a first state representative of a first charge in the body region, and a second data state representative of a second charge in the body region. Further, each row of semiconductor dynamic random access memory cells includes an associated source line which is connected to only the semiconductor dynamic random access memory cells of the associated row.
Abstract:
A cell design and methods for reducing the cell size of cells in high-current devices, such as MRAM, by increasing the effective width of a transistor in the cell to be greater than the actual width of the active area of the cell are described. This permits the cell size to be decreased without decreasing the current that is driven by the transistor. According to the invention, this is achieved by increasing the length of gate portions of one or more transistors within the active area of a cell to increase the effective transistor width. In one embodiment, two transistors, electrically connected in parallel, are used per cell. The two transistors double the effective transistor width within the cell relative to a single transistor design. Such cell designs can be used with a variety of devices, including various types of MRAM and PCRAM.
Abstract:
A MRAM storage device comprises a substrate, on/above of which a plurality of word lines, a plurality of bit lines, a plurality of memory cells, and a plurality of isolation diodes are provided. Each memory cell forms a resistive cross point of one word line and one bit line, respectively. Each memory cell is connected to one isolation diode such that a unidirectional conductive path is formed from a word line to a bit line via the corresponding memory cell, respectively. The substrate, at least a part of the word lines or at least a part of the bit lines, and the isolation diodes are realized as one common monocrystal semiconductor block.
Abstract:
There are many inventions described and illustrated herein. In a first aspect, the present invention is directed to a memory device and technique of reading data from and writing data into memory cells of the memory device. In this regard, in one embodiment of this aspect of the invention, the memory device and technique for operating that device that minimizes, reduces and/or eliminates the debilitating affects of the charge pumping phenomenon. This embodiment of the present invention employs control signals that minimize, reduce and/or eliminate transitions of the amplitudes and/or polarities. In another embodiment, the present invention is a semiconductor memory device including a memory array comprising a plurality of semiconductor dynamic random access memory cells arranged in a matrix of rows and columns. Each semiconductor dynamic random access memory cell includes a transistor having a source region, a drain region, a electrically floating body region disposed between and adjacent to the source region and the drain region, and a gate spaced apart from, and capacitively coupled to, the body region. Each transistor includes a first state representative of a first charge in the body region, and a second data state representative of a second charge in the body region. Further, each row of semiconductor dynamic random access memory cells includes an associated source line which is connected to only the semiconductor dynamic random access memory cells of the associated row.
Abstract:
A resistive memory cell random access memory device and method for fabrication. In one embodiment, the invention relates to a resistive memory cell random access memory device comprising a plurality of first current lines; a plurality of second current lines; a plurality of third current lines being formed as split current lines; and an array of resistive memory cells arranged in columns defined by said first current lines and rows defined by said third current lines, each resistive memory cell including a resistive memory element and an access transistor connected in series, each memory cell being connected between one of said first current lines and a reference potential, wherein said access transistors being FinFET-type field effect transistors, each one having two independent gates and a common floating body, and wherein each third current line being connected to one of said two independent gates of each one of the access transistors of a row of said array and being connected to one of said two independent gates of each one of the access transistors of an adjacent row of said array. It also relates to a method for its fabrication.
Abstract:
A configuration of resistive memory cells is disclosed. In one embodiment, the configuration of resistive memory cells comprises a plurality of first current lines; a plurality of second current lines; and a plurality of third current lines. A plurality of resistive memory cells being disposed in a memory matrix form between said first and second current lines, said first current lines defining the columns of said memory matrix form, while said second current lines defining the rows of it, wherein each one of the resistive memory cells being connected to one of said first current lines; a plurality of selection transistors having gates and drain-source paths, each drain-source path of said selection transistors being connected to a multiplicity of the resistive memory cells of a row of said memory matrix, said drain-source paths of different selection transistors being connected to a fourth current line (SL), the gates of said selection transistors of a row of said memory matrix form being connected to one of said third current lines. It further relates to a method for sensing the resistance values of a selected resistive memory cell.