Automatic follow-up projecting system
    91.
    发明授权
    Automatic follow-up projecting system 失效
    自动后续投影系统

    公开(公告)号:US5114224A

    公开(公告)日:1992-05-19

    申请号:US556978

    申请日:1990-07-24

    CPC分类号: G09F19/18

    摘要: A light for an infrared ray) emitting member or a reflective (or an infrared ray reflective) medium is mounted at a predetermined position on an object upon which an image is projected. The light emitting member or the reflective medium is acquired in the coaxial direction of an image projecting unit by an (infrared ray) image pick-up means and video signals obtained by the (infrared ray) image pick-up means are digitized in an image processing unit, such that a highly luminous point of the light emitting or reflected portion occurs in a binary image. A central value of a primary moment on the binary image including the high luminous point, is calculated in real time, and the calculated data is fed back to an electrically-driven driving portion of the image projecting unit, so that the image may be continually projected at the predetermined position. The electrically-drive turntable automatically controls the image projecting direction including the direction of light. The image projecting apparatus projects the image by automatically tracking the position of the moving light emitting member or the reflective medium. Consequently, the image can be continually projected at the predetermined position, automatically tracking the moving object such as an airship or a balloon, so that it can be available as an effective advertizing medium or news.

    Alignment system for exposure apparatus
    92.
    发明授权
    Alignment system for exposure apparatus 失效
    曝光装置对准系统

    公开(公告)号:US4962318A

    公开(公告)日:1990-10-09

    申请号:US395078

    申请日:1989-08-17

    申请人: Kenji Nishi

    发明人: Kenji Nishi

    CPC分类号: G03F9/7088 G03F9/7049

    摘要: An exposure apparatus for transferring a mask pattern to a wafer having a surface photoresist layer. The apparatus is comprised of first and second detectors and a determination unit. The first detector includes a light-emitting system for generating first light to illuminate first marks on the substrate and provides first position data. The second mark position detector includes a light-emitting system for generating second light having a wider wavelength distribution than that of the first light to illuminate second marks on the substrate and provides second position data. Determination unit (EGA operational unit 502 or the like) is provided for determining the position of the substrate as a whole by using both of the first and second position data.

    摘要翻译: 一种用于将掩模图案转印到具有表面光致抗蚀剂层的晶片的曝光装置。 该装置由第一和第二检测器和确定单元组成。 第一检测器包括用于产生第一光以照亮基板上的第一标记并提供第一位置数据的发光系统。 第二标记位置检测器包括用于产生具有比第一光的波长分布更宽的第二光的发光系统,以照亮基板上的第二标记并提供第二位置数据。 提供确定单元(EGA操作单元502等)以通过使用第一和第二位置数据来确定整个基板的位置。

    Image display device and image display system
    93.
    发明授权
    Image display device and image display system 失效
    图像显示装置和图像显示系统

    公开(公告)号:US08289230B2

    公开(公告)日:2012-10-16

    申请号:US12542944

    申请日:2009-08-18

    申请人: Kenji Nishi

    发明人: Kenji Nishi

    IPC分类号: G09G5/00

    摘要: An image display device comprising a display portion that projects, via eyepiece optical systems which respectively correspond to each of the both eyes of a user, a light emitted from a two-dimensionally light emitting type photoelectric device which is perpendicular to the light beam emitting direction onto the eyeballs of said user, a supporting portion that supports the display portion at its portion that is not in contact with the user, and a face contact portion that is supported by the display portion and is capable of changing the distance between the eyepiece optical systems and the eyes of the user, whereby images with high image quality and high field angle are, in a space-saving manner, safely provided to the user, and, at the time, with the personal image display devices' disadvantages being saved, even multiple persons can enjoy the images.

    摘要翻译: 一种图像显示装置,包括:显示部,其通过目视光学系统分别对应于用户的两只眼睛中的每一个,从与发光方向垂直的二维发光型光电装置发射的光 在所述用户的眼球上,支撑部分,其在与用户不接触的部分处支撑显示部分,以及由接触部分支撑的面接触部分,并且能够改变目镜光学部件 系统和使用者的眼睛,从而以节省空间的方式将具有高图像质量和高视野角的图像安全地提供给用户,并且在此时,个人图像显示装置的缺点得到节省, 甚至多人可以享受图像。

    LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM
    94.
    发明申请
    LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM 有权
    液体加工设备,液体加工方法和储存介质

    公开(公告)号:US20120234356A1

    公开(公告)日:2012-09-20

    申请号:US13417388

    申请日:2012-03-12

    IPC分类号: B08B3/10 B08B3/02

    摘要: There is provided a liquid processing apparatus including a rotation unit configured to hold the target substrate and rotate the target substrate around a vertical axis; a processing solution supply nozzle configured to supply the processing solution to the surface of the target substrate being rotated; a first gas supply unit configured to form a downward flow of a first gas that flows over the entire surface of the target substrate and is introduced into a cup in order to form a processing atmosphere suitable for a liquid process to be performed; and a second gas supply unit configured to form a downward flow of a second gas different from the first gas in a region outside the downward flow of the first gas. The first gas supply unit and the second gas supply unit are provided at a ceiling portion of the housing serving as the processing space.

    摘要翻译: 提供了一种液体处理装置,包括:旋转单元,被配置为保持目标基板并使目标基板绕垂直轴旋转; 处理溶液供给喷嘴,被配置为将所述处理溶液供给到正在旋转的所述目标基板的表面; 第一气体供给单元,被配置为形成在目标基板的整个表面上流动的第一气体的向下流动并被引入杯中以形成适合于要进行的液体处理的处理气氛; 以及第二气体供给单元,被配置为在所述第一气体的向下流动的外部区域中形成与所述第一气体不同的第二气体的向下流动。 第一气体供给单元和第二气体供给单元设置在用作处理空间的壳体的顶部。

    Image display device using P-polarized light and S-polarized light
    95.
    发明授权
    Image display device using P-polarized light and S-polarized light 失效
    使用P偏振光和S偏振光的图像显示装置

    公开(公告)号:US07738179B2

    公开(公告)日:2010-06-15

    申请号:US10575186

    申请日:2004-10-07

    申请人: Kenji Nishi

    发明人: Kenji Nishi

    CPC分类号: G02B27/0025

    摘要: An image display device projects lights emitted from each of two two-dimensionally light emitting type photoelectric devices onto first and second light diffusing bodies, and projects and images transmitted images of the light diffusing bodies onto the retina in the respective eyeballs of the user. The display device includes one light source, a first polarization beam splitter dividing light emitted from the light source into P-polarized light and S-polarized light, and an optical system which leads each of the P-polarized light and S-polarized lights respectively to the two photoelectric devices thereby illuminating the two photoelectric devices. The optical system leads polarized light to each of the two photoelectric devices via a second polarization beam splitter and a λ/4 plate, and leads reflected lights to the relay optical system via the λ/4 plate and the second polarization beam splitter.

    摘要翻译: 图像显示装置将从两个二维发光型光电装置中的每一个发射的光投射到第一和第二光漫射体上,并将光漫射体的图像发送到用户的各个眼球中的视网膜上。 显示装置包括一个光源,将从光源发射的光分为P偏振光和S偏振光的第一偏振分束器和分别引导每个P偏振光和S偏振光的光学系统 到两个光电器件,从而照亮两个光电器件。 光学系统经由第二偏振分束器和λ/ 4板将偏振光引导到两个光电装置中的每一个,并且经由λ/ 4板和第二偏振分束器将反射光引导到中继光学系统。

    Image display unit
    96.
    发明申请
    Image display unit 失效
    图像显示单元

    公开(公告)号:US20070018124A1

    公开(公告)日:2007-01-25

    申请号:US10575186

    申请日:2004-10-07

    申请人: Kenji Nishi

    发明人: Kenji Nishi

    IPC分类号: G01N21/86

    CPC分类号: G02B27/0025

    摘要: It is configured such that one lens surface of the convex lenses (L21, L22) which are located near to pupil H of the eyeball and with respect to which the deflection angles of the light beams are larger is made a conic surface having a conic constant K

    摘要翻译: 其构造为使得位于眼球的瞳孔H附近并且相对于光束的偏转角较大的凸透镜(L 21,L 22)的一个透镜表面被制成具有 锥形常数K <0,并且同时,为了校正色像差,提供通过组合彼此不同的玻璃材料制成的胶合透镜(L 23,L 24)。 胶合透镜由至少两个透镜构成; 胶合透镜的胶合部分在瞳孔侧形成凹面; 胶合透镜的瞳孔侧透镜的色散小于另一透镜的颜色分散; 并且胶合透镜具有凸凹凸形状,该形状具有高色差校正效果。 由此,能够实现即使相对于眼球移动时发生的目镜中心的晶状体的移动,甚至在相关联的色像差的情况下也能够提供足够好的图像的图像显示装置。

    Exposure method, exposure apparatus, and method for producing device
    97.
    发明授权
    Exposure method, exposure apparatus, and method for producing device 失效
    曝光方法,曝光装置及其制造方法

    公开(公告)号:US07126689B2

    公开(公告)日:2006-10-24

    申请号:US09782062

    申请日:2001-02-14

    申请人: Kenji Nishi

    发明人: Kenji Nishi

    摘要: An exposure apparatus for exposing a substrate with an exposure light beam passing through a mask comprises a movable stage for moving the substrate, a stage chamber for accommodating the movable stage, a transport system for transporting the substrate into the stage chamber, and a first alignment system for performing positional adjustment for the substrate with respect to the movable stage in the stage chamber. The position of an exposure objective delivered from the transport system into the stage chamber can be subjected to positional adjustment by using the first alignment system. The stage chamber and the movable stage can be assembled to a frame of the exposure apparatus in accordance with the module system. The exposure apparatus includes a second alignment system for performing positional adjustment for the substrate installed on the movable stage at an exposure position.

    摘要翻译: 用于通过掩模曝光的曝光光束曝光衬底的曝光装置包括用于移动衬底的可移动台,用于容纳可移动台的台室,用于将衬底输送到舞台室中的传送系统和第一对准 用于相对于舞台室中的可移动台进行基板的位置调整的系统。 可以通过使用第一对准系统对从传送系统传送到舞台室中的曝光物镜的位置进行位置调整。 根据模块系统,舞台室和可移动台可组装到曝光设备的框架上。 曝光装置包括用于在曝光位置对安装在可移动台上的基板进行位置调整的第二对准系统。

    Image display unit and projection optical system

    公开(公告)号:US07068444B2

    公开(公告)日:2006-06-27

    申请号:US10528849

    申请日:2003-09-18

    申请人: Kenji Nishi

    发明人: Kenji Nishi

    IPC分类号: G02B27/14

    摘要: An intermediate image of an image from the LCD module 142 is deflected by reflection mirrors M1 and M2 via zoom automatic focus control system (g) and then is formed on diffusion glass 131 via relay lens (b) and reflection mirrors M3 and M4. The LCD image is projected on the retina of eyeballs via eyepiece lens 132 by the light flux diffused at an order of ±20 degrees by diffusion glass 131. One side of the eyepiece lens 132 close to the crystal balls 2 has an aspherical shape of a Conic surface and a Conic coefficient of the Conic surface is −1 and less. Thereby the optical system that has a viewing angle of 60 degrees and over and has a small aberration can be obtained.

    Projection exposure apparatus
    99.
    再颁专利

    公开(公告)号:USRE39083E1

    公开(公告)日:2006-05-02

    申请号:US08994758

    申请日:1997-12-19

    申请人: Kenji Nishi

    发明人: Kenji Nishi

    CPC分类号: G03F7/70358 G03F7/70725

    摘要: Constant speed drive of a reticle and a wafer in a relative scanning direction and positioning of the reticle and the wafer are simultaneously performed with high precision by a slit scanning exposure scheme. A reticle side scanning stage for scanning a reticle relative to a slit-like illumination area in the relative scanning direction is placed on a reticle side base. A reticle side fine adjustment stage for moving and rotating the reticle within a two-dimensional plane is placed on the reticle side scanning stage. The reticle is placed on the reticle side fine adjustment stage. Constant speed drive and positioning of the reticle and a wafer are performed by independently controlling the reticle side scanning stage and the reticle side fine adjustment stage.