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公开(公告)号:US11081565B2
公开(公告)日:2021-08-03
申请号:US16530757
申请日:2019-08-02
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , George E. Pax , Yogesh Sharma , Gregory A. King , Thomas H. Kinsley , Randon K. Richards
IPC: H05K1/18 , H01L23/14 , H01L29/66 , H01L23/495 , H05K1/11
Abstract: Systems, apparatuses, and methods relating to memory devices and packaging are described. A device, such as a dual inline memory module (DIMM) or other electronic device package, may include a substrate with a layer of graphene configured to conduct thermal energy (e.g., heat) away from components mounted or affixed to the substrate. In some examples, a DIMM includes an uppermost or top layer of graphene that is exposed to the air and configured to allow connection of memory devices (e.g., DRAMs) to be soldered to the conducting pads of the substrate. The graphene may be in contact with parts of the memory device other than the electrical connections with the conducting pads and may thus be configured as a heat sink for the device. Other thin, conductive layers of may be used in addition to or as an alternative to graphene. Graphene may be complementary to other heat sink mechanisms.
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公开(公告)号:US20210118852A1
公开(公告)日:2021-04-22
申请号:US16939756
申请日:2020-07-27
Applicant: Micron Technology, Inc.
Inventor: Owen R. Fay , Randon K. Richards , Aparna U. Limaye , Dong Soon Lim , Chan H. Yoo , Bret K. Street , Eiichi Nakano , Shijian Luo
IPC: H01L25/065 , H01L25/18 , H01L23/00 , H01L23/552 , H01L23/66 , H01L21/78 , H01L21/66 , H01L25/00 , H01Q1/48 , H01Q1/22
Abstract: Disclosed is a microelectronic device assembly comprising a substrate having conductors exposed on a surface thereof. Two or more microelectronic devices are stacked on the substrate, each microelectronic device comprising an active surface having bond pads operably coupled to conductive traces extending over a dielectric material to via locations beyond at least one side of the stack, and vias extending through the dielectric materials at the via locations and comprising conductive material in contact with at least some of the conductive traces of each of the two or more electronic devices and extending to exposed conductors of the substrate. Methods of fabrication and related electronic systems are also disclosed.
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公开(公告)号:US20210074623A1
公开(公告)日:2021-03-11
申请号:US16952703
申请日:2020-11-19
Applicant: Micron Technology, Inc.
Inventor: Hyunsuk Chun , Chan H. Yoo , Tracy N. Tennant
IPC: H01L23/498 , H01L21/48 , H01L23/31 , H01L23/00
Abstract: Embodiments of a redistribution layer structure comprise a low-k dielectric material and incorporating a reinforcement structure proximate and inward of a peripheral edge thereof, the reinforcement structure comprising conductive material electrically isolated from conductive paths through the RDL structure. Semiconductor packages including an embodiment of the RDL structure and methods of fabricating such RDL structures are also disclosed.
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104.
公开(公告)号:US20210005526A1
公开(公告)日:2021-01-07
申请号:US16503363
申请日:2019-07-03
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , Owen R. Fay
IPC: H01L23/36 , H05K7/20 , H01L23/42 , H01L23/498 , H01L25/10 , H01L25/00 , H01L25/065 , H01L23/00
Abstract: Semiconductor assemblies including thermal management configurations for reducing heat transfer between vertically stacked devices and associated systems and methods are disclosed herein. In some embodiments, the semiconductor assemblies comprise at least one memory device mounted over a logic device with a thermally conductive layer, a thermal-insulator interposer, or a combination thereof disposed between the memory device and the logic device. The thermally conductive layer includes a structure configured to transfer the thermal energy across a horizontal plane. The thermal-insulator interposer includes a structure configured to reduce heat transfer between the logic device and the memory device.
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105.
公开(公告)号:US20200066625A1
公开(公告)日:2020-02-27
申请号:US16106791
申请日:2018-08-21
Applicant: Micron Technology, Inc.
Inventor: Hyunsuk Chun , Chan H. Yoo , Tracy N. Tennant
IPC: H01L23/498 , H01L23/00 , H01L23/31 , H01L21/48
Abstract: Embodiments of a redistribution layer structure comprise a low-k dielectric material and incorporating a reinforcement structure proximate and inward of a peripheral edge thereof, the reinforcement structure comprising conductive material electrically isolated from conductive paths through the RDL structure. Semiconductor packages including an embodiment of the RDL structure and methods of fabricating such RDL structures are also disclosed.
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106.
公开(公告)号:US20190214331A1
公开(公告)日:2019-07-11
申请号:US16351816
申请日:2019-03-13
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , Eiichi Nakano
IPC: H01L23/498 , H01L23/00 , H01L21/56 , H01L23/538 , H01L41/047 , H01R12/77
Abstract: A semiconductor device assembly that includes a flexible member having a first portion connected to a substrate and a connector attached to a second portion of the flexible member. The connector is electrically connected to the substrate via a conducting layer within the flexible member. The substrate may be a semiconductor device, such as a chip. The connector may be configured to connect the semiconductor device to another semiconductor device assembly or a system board, such as a printed circuit board. A material may encapsulate at least a portion of the substrate of the semiconductor assembly. The semiconductor device assembly may be formed by selectively connecting the flexible member to a first substrate. A second substrate and connector may then be connected to the flexible member. A release layer may be used to release the assembly of the second substrate, flexible member, and connector from the first substrate.
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公开(公告)号:US10304805B2
公开(公告)日:2019-05-28
申请号:US15686024
申请日:2017-08-24
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , Mark E. Tuttle
IPC: H01L25/065 , H01L25/00
Abstract: Semiconductor devices including a dual-sided redistribution structure and having low-warpage across all temperatures and associated systems and methods are disclosed herein. In one embodiment, a semiconductor device includes a first semiconductor die electrically coupled to a first side of a redistribution structure and a second semiconductor die electrically coupled to a second side of the redistribution structure opposite the first side. The semiconductor device also includes a first molded material on the first side, a second molded material on the second side, and conductive columns electrically coupled to the first side and extending through the first molded material. The first and second molded materials can have the same volume and/or coefficients of thermal expansion to inhibit warpage of the semiconductor device.
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公开(公告)号:US20190115270A1
公开(公告)日:2019-04-18
申请号:US15787321
申请日:2017-10-18
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , Mark E. Tuttle
IPC: H01L23/18 , H01L23/373 , H01L23/31 , H01L21/66
CPC classification number: H01L23/18 , H01L22/12 , H01L22/20 , H01L23/16 , H01L23/3128 , H01L23/3135 , H01L23/373 , H01L23/562
Abstract: A semiconductor device assembly including a substrate, a semiconductor device, a stiffener member, and mold compound. The stiffener member is tuned, or configured, to reduce and/or control the shape of warpage of the semiconductor device assembly at an elevated temperature. The stiffener member may be placed on the substrate, on the semiconductor device, and/or on the mold compound. A plurality of stiffener members may be used. The stiffener members may be positioned in a predetermined pattern on a component of the semiconductor device assembly. A stiffener member may be used so that the warpage of a first semiconductor device substantially corresponds to the warpage of a second semiconductor device at an elevated temperature. The stiffener member may be tuned by providing the member with a desired coefficient of thermal expansion (CTE). The desired CTE may be based on the individual CTEs of the components of a semiconductor device assembly.
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公开(公告)号:US20190035755A1
公开(公告)日:2019-01-31
申请号:US15660442
申请日:2017-07-26
Applicant: Micron Technology, Inc.
Inventor: Ashok Pachamuthu , Chan H. Yoo , Szu-Ying Ho , John F. Kaeding
IPC: H01L23/00 , H01L21/768 , H01L25/00 , H01L21/56 , H01L21/683 , H01L25/065 , H01L23/31
Abstract: Methods of making semiconductor device modules may involve forming holes in a sacrificial material and placing an electrically conductive material in the holes. The sacrificial material may be removed to expose posts of the electrically conductive material. A stack of semiconductor dice may be placed between at least two of the posts after removing the sacrificial material, one of the semiconductor dice of the stack including an active surface facing in a direction opposite a direction in which another active surface of another of the semiconductor dice of the stack. The posts and the stack of semiconductor dice may be at least laterally encapsulated in an encapsulant. Bond pads of the one of the semiconductor dice may be electrically connected to corresponding posts after at least laterally encapsulating the posts and the stack of semiconductor dice.
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公开(公告)号:US10103038B1
公开(公告)日:2018-10-16
申请号:US15685921
申请日:2017-08-24
Applicant: Micron Technology, Inc.
Inventor: Chan H. Yoo , John F. Kaeding , Ashok Pachamuthu , Mark E. Tuttle
Abstract: Semiconductor devices having a semiconductor die electrically coupled to a redistribution structure and a molded material over the redistribution structure are disclosed herein, along with associated systems and methods. In one embodiment, a semiconductor device includes a semiconductor die attached to a first side of a substrate-free redistribution structure, and a plurality of conductive columns extending through a molded material disposed on the first side of the redistribution structure. The semiconductor device can also include a second redistribution structure on the molded material and electrically coupled to the conductive columns. A semiconductor device can be manufactured using a single carrier and requiring processing on only a single side of the semiconductor device.
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