摘要:
One or more embodiments include programming, in parallel, a first cell to one of a first number of states and a second cell to one of a second number of states. Such embodiments include programming, separately, the first cell to one of a third number of states based, at least in part, on the one of the first number of states and the second cell to one of a fourth number of states based, at least in part, on the one of the second number of states.
摘要:
There is provided a memory array and methods for manufacturing the same. In one embodiment, there is provided a string comprising a plurality of transistors. Each of the plurality of transistors includes: a charge storage node, a control gate, and at least one resistive element coupled to the string. The control gate of at least one of the plurality of transistors can be selectively coupled to a reference potential via a corresponding one of the at least one resistive element.
摘要:
Embodiments of the present disclosure provide methods, devices, modules, and systems for programming an array of non-volatile multilevel memory cells to a number of threshold voltage ranges. One method includes programming a lower page of a first wordline cell to increase a threshold voltage (Vt) of the first wordline cell to a first Vt within a lowermost Vt range. The method includes programming a lower page of a second wordline cell prior to programming an upper page of the first wordline cell. The method includes programming the upper page of the first wordline cell such that the first Vt is increased to a second Vt, wherein the second Vt is within a Vt range which is then a lowermost Vt range and is positive.
摘要:
Non-volatile memory devices utilizing a NAND architecture are adapted to perform read operations where a first potential is supplied to source lines associated with a selected block of an array of memory cells and a second, different, potential is supplied to other source lines not associated with that block. By supplying a different potential to source lines of unselected blocks, current leakage can be mitigated.
摘要:
Various embodiments include erasing at least one memory cell of a string of memory cells of a memory device while a control gate of at least one of a first memory cell and a second memory cell of the string of memory cells has a first voltage and while a control gate of each memory cell of a plurality of intermediate memory cells between the first memory cell and the second memory cell has a second voltage. Some embodiments include erase verifying only the first memory cell and second memory cell in a first erase verify operation, and erase verifying the plurality of intermediate memory cells in a second erase verify operation. Other embodiments including additional apparatus, systems, and methods are disclosed.
摘要:
Embodiments of the present disclosure provide methods, devices, modules, and systems for programming an array of non-volatile multilevel memory cells to a number of threshold voltage ranges. One method includes programming a lower page of a first wordline cell to increase a threshold voltage (Vt) of the first wordline cell to a first Vt within a lowermost Vt range. The method includes programming a lower page of a second wordline cell prior to programming an upper page of the first wordline cell. The method includes programming the upper page of the first wordline cell such that the first Vt is increased to a second Vt, wherein the second Vt is within a Vt range which is then a lowermost Vt range and is positive.
摘要:
Embodiments of the present disclosure provide methods, devices, and systems for performing a programming operation on an array of non-volatile memory cells. One method includes programming a number of cells to a number of final data states. The method includes performing, prior to completion of, e.g., finishing, the programming operation, an erase state check on a subset of the number of cells, which were to be programmed to an erased state.
摘要:
Memory arrays, and modules, devices and systems that utilize such memory arrays, are described as having a single level non-volatile memory cell interposed between and coupled to a select gate and a multiple level non-volatile memory cell. Various embodiments include structure, process, and operation and their applicability for memory devices and systems. In some embodiments, a memory array is described as including a number of select gates coupled in series to a number of single level non-volatile memory cells and a number of multiple level non-volatile memory cells, where a first select gate is coupled to a first single level non-volatile memory cell interposed between and coupled to the first select gate and a first multiple level non-volatile memory cell.
摘要:
Disclosed is a method of forming memory devices employing halogen ion implantation and diffusion processes. In one illustrative embodiment, the method includes forming a plurality of word line structures above a semiconducting substrate, each of the word line structures comprising a gate insulation layer, performing an LDD ion implantation process to form LDD doped regions in the substrate between the word line structures, performing a halogen ion implantation process to implant atoms of halogen into the semiconducting substrate between the word line structures, and performing at least one anneal process to cause at least some of the atoms of halogen to diffuse into the gate insulation layers on adjacent word line structures.
摘要:
A portion of a memory array has a string of two or more non-volatile memory cells, a first select gate coupled in series with one non-volatile memory cell of the string of two or more non-volatile memory cells, and a second select gate coupled in series with the first select gate. A length of the second select gate is greater than a length of the first select gate.