摘要:
A crystalline semiconductor film in which the locations and sizes of crystal grains have been controlled, is prepared, and a TFT capable of high speed operation is realized by employing the crystalline semiconductor film as the channel forming region of the TFT. An organic resin film (2 in FIG. 1) having a predetermined shape is provided on a substrate (1), whereupon an inorganic insulating film (3) and an amorphous semiconductor film are formed. Subsequently, the amorphous semiconductor film is crystallized by laser annealing. The material and thickness of the organic resin film (2) in the predetermined shape or those of the inorganic insulating film (3) are properly regulated, whereby the cooling rate of the semiconductor film is lowered to form a first region (4a) in which crystal grain diameters are large.
摘要:
Oscillation in which unwanted vibration (B mode) is surely suppressed while stable oscillation by principal vibration (C mode) is obtained is obtained. In a Colpitts oscillator including a piezoelectric vibrator, a transistor, and a first and second divided capacitive components, by inserting a feedback circuit formed by connecting a third capacitive component and a first inductor in series between a connection midpoint between the first capacitive component and the second capacitive component and an emitter of the transistor, inserting a second inductor in parallel with the second capacitive component, and setting the parallel resonance frequency of the second capacitive component and the second inductor in the vicinity of the oscillation frequency of the oscillator, the frequency band in which the negative resistance of the circuit side seen from the piezoelectric vibrator appears is set to a narrow band containing only a desired frequency to suppress unwanted vibration of the oscillator.
摘要:
A laser annealing method for obtaining a crystalline semiconductor film having a large grain size is provided. Laser light is irradiated to the top surface and the bottom surface of an amorphous semiconductor film when crystallizing the amorphous semiconductor film by laser light irradiation. Furthermore, a relationship of 0
摘要:
A piezooscillator having a piezoelectric resonator, composed of: a case surrounding a space where the piezoelectric resonator is provided and including a substrate and a cover; a buffer material supporting the piezoelectric resonator and suppressing a shock conveyed from the case to the piezoelectric resonator; and a wiring member electrically connecting the piezoelectric resonator and the substrate and having flexibility, or composed of: a case surrounding a space where the piezoelectric resonator is provided and including a first substrate and a cover; a second substrate mounting the piezoelectric resonator thereon; a buffer material supporting the second substrate and suppressing a shock conveyed from the case to the piezoelectric resonator; and a wiring member electrically connecting the first and second substrates and having flexibility, in which, when the case suffers the shock from outside, the buffer material absorbs the shock to prevent the shock conveyance to the piezoelectric resonator and frequency variation arising in the piezooscillator, realizing shock-resistance improvement, is provided.
摘要:
Island-like semiconductor films and markers are formed prior to laser irradiation. Markers are used as positional references so as not to perform laser irradiation all over the semiconductor within a substrate surface, but to perform a minimum crystallization on at least indispensable portion. Since the time required for laser crystallization can be reduced, it is possible to increase the substrate processing speed. By applying the above-described constitution to a conventional SLS method, a means for solving such problem in the conventional SLS method that the substrate processing efficiency is insufficient, is provided.
摘要:
The lip-type seal of the present invention is a lip-type seal with which the outer periphery of a rotational shaft (S) supported by a predetermined housing (H) is sealed. The lip-type seal is made up of a first annular reinforcing member (11) and a first sealing member (12). The first reinforcing member (11) includes a wall surface part (11a) defining a hole through which the rotational shaft (S) is passed and a cylindrical part (11b) bent from the outer edge of the wall surface part (11a). The first sealing member (12) includes an annular base (12a) that is joined to the housing (H), a first lip part (12b) that extends almost conically from the base (12a) inwardly in the radial direction and that comes into contact with the rotational shaft (S), and an annular concave part (12c) formed in the base (12a) so as to detachably fit the cylindrical part (11b). Accordingly, a desired sealing capability can be secured, and the components can be easily assembled, disassembled, and recycled.
摘要:
A laser beam irradiation method that achieves uniform crystallization, even if a film thickness of an a-Si film or the like fluctuates, is provided. The present invention provides a laser beam irradiation method in which a non-single crystal semiconductor film is formed on a substrate having an insulating surface and a laser beam having a wavelength longer than 350 nm is irradiated to the non-single crystal semiconductor film, thus crystallizing the non-single crystal silicon film. The non-single crystal semiconductor film has a film thickness distribution within the surface of the substrate, and a differential coefficient of a laser beam absorptivity with respect to the film thickness of the non-single crystal semiconductor film is positive.
摘要:
An object is to enhance the orientation ratio of a crystalline semiconductor film obtained by crystallizing an amorphous semiconductor film while using as a substrate a less-heat-resistive material such as glass thereby providing a semiconductor device using a crystalline semiconductor film with high quality equivalent to a single crystal. A first crystalline semiconductor film and a second crystalline semiconductor film are formed overlying a substrate, which integrally structure a crystalline semiconductor layer. The first and second crystalline semiconductor films are polycrystalline bodies aggregated with a plurality of crystal grains. However, the crystal grains are aligned toward a (101)-plane orientation at a ratio of 30 percent or greater, preferably 80 percent or greater. Also, relying on a plane orientation of the crystal grains in the first crystalline semiconductor film, the second crystalline semiconductor film has a plane orientation also aligned in the same direction with a probability of 60 percent or higher.
摘要:
A semiconductor device comprises a first insulating film provided over a substrate and heat-treated, a second insulating film provided over the first insulating film, and a semiconductor film provided over the second insulating film, the second insulating film and the semiconductor film being formed successively without exposing them to the atmosphere.
摘要:
The present invention provides a semiconductor device in which a bottom-gate TFT or an inverted stagger TFT arranged in each circuit is suitably constructed in conformity with the functionality of the respective circuits, thereby attaining an improvement in the operating efficiency and reliability of the semiconductor device. In the structure, LDD regions in a pixel TFT are arranged so as not to overlap with a channel protection insulating film and to overlap with a gate electrode by at least a portion thereof. LDD regions in an N-channel TFT of a drive circuit is arranged so as not to overlap with a channel protection insulating film and to overlap with a gate electrode by at least a portion thereof. LDD regions in a P-channel TFT of the drive circuit is arranged so as to overlap with a channel protection insulating film and to overlap with the gate electrode.