RESISTIVE CROSS-POINT ARCHITECTURE FOR ROBUST DATA REPRESENTATION WITH ARBITRARY PRECISION
    111.
    发明申请
    RESISTIVE CROSS-POINT ARCHITECTURE FOR ROBUST DATA REPRESENTATION WITH ARBITRARY PRECISION 有权
    用于精确数据表达的电阻式交叉点架构

    公开(公告)号:US20160049195A1

    公开(公告)日:2016-02-18

    申请号:US14824782

    申请日:2015-08-12

    IPC分类号: G11C13/00

    摘要: This disclosure relates generally to resistive memory systems. The resistive memory systems may be utilized to implement neuro-inspired learning algorithms with full parallelism. In one embodiment, a resistive memory system includes a cross point resistive network and switchable paths. The cross point resistive network includes variable resistive elements and conductive lines. The conductive lines are coupled to the variable resistive elements such that the conductive lines and the variable resistive elements form the cross point resistive network. The switchable paths are connected to the conductive lines so that the switchable paths are operable to selectively interconnect groups of the conductive lines such that subsets of the variable resistive elements each provide a combined variable conductance. With multiple resistive elements in the subsets, process variations in the conductances of the resistive elements average out. As such, learning algorithms may be implemented with greater precision using the cross point resistive network.

    摘要翻译: 本公开一般涉及电阻式存储器系统。 电阻式存储器系统可用于实现具有完全并行性的神经启发式学习算法。 在一个实施例中,电阻式存储器系统包括交叉点电阻网络和可切换路径。 交叉点电阻网络包括可变电阻元件和导线。 导线耦合到可变电阻元件,使得导线和可变电阻元件形成交叉电阻网络。 可切换路径连接到导线,使得可切换路径可操作以选择性地互连导电线组,使得可变电阻元件的子集各自提供组合的可变电导。 在子集中具有多个电阻元件,电阻元件的电导的工艺变化平均。 因此,可以使用交叉点电阻网络以更高的精度来实现学习算法。

    Fast parallel test of SRAM arrays
    112.
    发明授权
    Fast parallel test of SRAM arrays 有权
    SRAM阵列的快速并行测试

    公开(公告)号:US08966329B2

    公开(公告)日:2015-02-24

    申请号:US13808438

    申请日:2011-07-19

    摘要: In general, each parallel test operation on Static Random Access Memory (SRAM) cells is a test operation performed on a block of the SRAM cells in parallel, or simultaneously. In one embodiment, the SRAM cells are arranged into multiple rows and multiple columns where the columns are further arranged into one or more column groups. The block of the SRAM cells for each parallel test operation includes SRAM cells in two or more of the rows, SRAM cells in two or more columns in the same column group, or both SRAM cells in two or more rows and SRAM cells in two or more columns in the same column group.

    摘要翻译: 通常,静态随​​机存取存储器(SRAM)单元上的每个并行测试操作是对SRAM单元的块并行或同时执行的测试操作。 在一个实施例中,SRAM单元被布置成多行和多列,其中列进一步布置成一个或多个列组。 用于每个并行测试操作的SRAM单元的块包括两行或多行中的SRAM单元,同一列组中的两列或更多列中的SRAM单元,或两行或多行中的两个SRAM单元或两个或更多行中的SRAM单元 更多列在同一列组中。

    Optimization of source, mask and projection optics
    113.
    发明授权
    Optimization of source, mask and projection optics 有权
    源,掩模和投影光学优化

    公开(公告)号:US08893060B2

    公开(公告)日:2014-11-18

    申请号:US13293114

    申请日:2011-11-09

    IPC分类号: G06F17/50 G03F1/70 G03F7/20

    摘要: Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein, and preferably including optimizing a source, a mask, and the projection optics. The projection optics is sometimes broadly referred to as “lens”, and therefore the joint optimization process may be termed source mask lens optimization (SMLO). SMLO is desirable over existing source mask optimization process (SMO), partially because including the projection optics in the optimization can lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics. The projection optics can be used to shape wavefront in the lithographic projection apparatus, enabling aberration control of the overall imaging process. According to the embodiments herein, the optimization can be accelerated by iteratively using linear fitting algorithm or using Taylor series expansion using partial derivatives of transmission cross coefficients (TCCs).

    摘要翻译: 本发明的实施例提供了优化包括优化其中的投影光学元件的光刻投影设备的方法,并且优选地包括优化源,掩模和投影光学器件。 投影光学器件有时被广泛地称为“透镜”,因此联合优化过程可以被称为源掩模透镜优化(SMLO)。 SMLO对于现有的源掩码优化处理(SMO)是期望的,部分原因在于,通过引入投影光学器件的多个可调特性,优化中的投影光学器件可以导致更大的处理窗口。 投影光学元件可用于在光刻投影设备中形成波前,从而实现整个成像过程的像差控制。 根据本文的实施例,可以通过迭代地使用线性拟合算法或者使用使用传输交叉系数(TCC)的偏导数的泰勒级数扩展来加速优化。

    Methods and apparatus for searching with awareness of geography and languages
    114.
    发明授权
    Methods and apparatus for searching with awareness of geography and languages 有权
    用地理和语言意识进行搜索的方法和设备

    公开(公告)号:US08838632B2

    公开(公告)日:2014-09-16

    申请号:US13176241

    申请日:2011-07-05

    申请人: Yu Cao

    发明人: Yu Cao

    IPC分类号: G06F7/00 G06F17/30

    摘要: A system that automatically discerning the best combinations of a user query's geographical origin and language, retrieving and displaying search results accordingly. A record on the system are associated with a geographic location and a language. A record could be composed of two or more records, each of which associates with a location and a language. A record could be in rich media format.

    摘要翻译: 自动识别用户查询的地理来源和语言的最佳组合的系统,相应地检索和显示搜索结果。 系统上的记录与地理位置和语言相关联。 记录可以由两个或多个记录组成,每个记录与位置和语言相关联。 记录可以是富媒体格式。

    Three-dimensional mask model for photolithography simulation

    公开(公告)号:US08589829B2

    公开(公告)日:2013-11-19

    申请号:US13736929

    申请日:2013-01-08

    IPC分类号: G06F17/50

    摘要: A three-dimensional mask model of the invention provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.

    PHARMACEUTICAL COMPOSITIONS
    117.
    发明申请
    PHARMACEUTICAL COMPOSITIONS 审中-公开
    药物组合物

    公开(公告)号:US20130245061A1

    公开(公告)日:2013-09-19

    申请号:US13989250

    申请日:2011-12-01

    IPC分类号: C07D471/04

    摘要: A pharmaceutical composition for the oral administration of a therapeutic compound of formula (I), comprising granules that comprise at least therapeutic compound of formula (I) or a tautomer thereof, or a pharmaceutically acceptable salt, or a hydrate or solvate thereof; at least one non-ionic surfactant that is Vitamin E-TPGS in an amount ranging from about 15 to about 80% by weight of the composition; and at least one a dissolution enhancing agent selected from polyethylene glycol, polyethylene oxide, and any combination of the foregoing; processes for making such pharmaceutical compositions; a kit comprising such pharmaceutical composition and the instructions for administration thereof; and related uses and methods of treatment.

    摘要翻译: 口服给药式(I)治疗性化合物的药物组合物,其包含至少包含治疗性式(I)化合物或其互变异构体或其药学上可接受的盐或其水合物或溶剂合物的颗粒剂; 至少一种非离子表面活性剂,其量为所述组合物的约15至约80重量%的量的维生素E-TPGS; 和至少一种选自聚乙二醇,聚环氧乙烷和前述的任何组合的溶解增强剂; 制备这种药物组合物的方法; 包含该药物组合物的试剂盒及其施用说明书; 及相关用途及治疗方法。

    Methods and system for model-based generic matching and tuning
    118.
    发明授权
    Methods and system for model-based generic matching and tuning 有权
    基于模型的通用匹配和调优的方法和系统

    公开(公告)号:US08443307B2

    公开(公告)日:2013-05-14

    申请号:US12613285

    申请日:2009-11-05

    摘要: The present invention relates to a method for tuning lithography systems so as to allow different lithography systems to image different patterns utilizing a known process that does not require a trial and error process to be performed to optimize the process and lithography system settings for each individual lithography system. According to some aspects, the present invention relates to a method for a generic model-based matching and tuning which works for any pattern. Thus it eliminates the requirements for CD measurements or gauge selection. According to further aspects, the invention is also versatile in that it can be combined with certain conventional techniques to deliver excellent performance for certain important patterns while achieving universal pattern coverage at the same time.

    摘要翻译: 本发明涉及一种用于调整光刻系统的方法,以便允许不同的光刻系统利用不需要进行试验和误差处理的已知工艺对不同的图案进行成像,以优化每个单独光刻的工艺和光刻系统设置 系统。 根据一些方面,本发明涉及一种用于任何模式的基于模型的通用匹配和调整的方法。 因此,它消除了对CD测量或量规选择的要求。 根据其它方面,本发明也是通用的,因为它可以与某些常规技术相结合,以在同时实现通用图案覆盖的同时为某些重要图案提供优异的性能。

    Methods and system for lithography process window simulation
    120.
    发明授权
    Methods and system for lithography process window simulation 有权
    光刻工艺窗口模拟方法与系统

    公开(公告)号:US08200468B2

    公开(公告)日:2012-06-12

    申请号:US12315849

    申请日:2008-12-05

    IPC分类号: G06F17/50

    摘要: A method of efficient simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process. In one given embodiment, the function for simulating the aerial images with focus and dose (exposure) variation is defined as: I(x,f,1+ε)=I0(x)+└ε·I0(x)+(1+ε)·a(x)·(f−f0)+(1+ε)·b(x)·(f−f0)2┘ where IO represents image intensity at nominal focus and exposure, fO represents nominal focus, f and ε represent an actual focus-exposure level at which the simulated image is calculated, and parameters “a” and “b” represent first order and second order derivative images with respect to focus change.

    摘要翻译: 一种有效地模拟用于对具有多个特征进行成像的目标设计的光刻工艺的成像性能的方法。 该方法包括以下步骤:确定用于产生模拟图像的功能,其中该功能考虑到与光刻工艺相关联的工艺变化; 并利用该功能产生模拟图像,其中模拟图像表示用于光刻工艺的目标设计的成像结果。 在一个给定的实施例中,用于模拟具有焦点和剂量(曝光)变化的空中图像的功能被定义为:I(x,f,1 +&egr;)= I0(x)+└&egr;·I0(x)+ (1 +&egr))a(x)·(f-f0)+(1 +&egr))b(x)·(f-f0)2其中IO表示标称焦点和曝光时的图像强度,fO表示 名义焦点,f和&egr 表示计算模拟图像的实际焦点曝光水平,并且参数“a”和“b”表示关于焦点变化的一阶和二阶导数图像。