公开(公告)号：US07305015B2

公开(公告)日：2007-12-04

申请号：US10888980

申请日：2004-07-13

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

IPC分类号： H01S3/10

CPC分类号： G01N21/956 ,  G01N21/33 ,  G02F2001/3505 ,  G02F2001/3542 ,  H01S3/0092

摘要： An ultraviolet laser-generating device, for use in a defect inspection apparatus and a method thereof, etc., comprising: a laser ray source for irradiating and emitting a basic wave of laser ray therefrom; a wavelength converter device for receiving the basic wave of laser ray emitted from the laser ray source and for converting it into an ultraviolet laser ray composed of a multiplied high harmonic light of the basic wave of laser ray; and a container having an inlet window, upon which the basic wave of laser ray emitted from the laser ray source is incident upon, and an outlet window for emitting the ultraviolet laser ray composed of the multiplied high harmonic light of the basic wave of laser ray, and installing the wavelength converter device therein, wherein the container is hermetically sealed and is filled up with an inert gas, such as nitrogen or argon gas, therein.

摘要翻译： 一种用于缺陷检查装置及其方法的紫外线激光发生装置，包括：用于从其照射和发射激光光线的基本波的激光束源; 波长转换器装置，用于接收从激光射线源发射的激光的基波，并将其转换为由激光的基波的相乘的高次谐波构成的紫外激光; 以及具有入射窗的容器，从激光射线源发射的激光的基波入射到该入口窗口，以及用于发射由激光的基波的倍增的高次谐波构成的紫外线激光的出射窗 并且在其中安装波长转换器装置，其中容器被气​​密密封，并在其中填充有惰性气体，例如氮气或氩气。

公开(公告)号：US06943086B2

公开(公告)日：2005-09-13

申请号：US10267680

申请日：2002-10-10

申请人： Mikio Hongo ,  Sachio Uto ,  Mineo Nomoto ,  Toshihiko Nakata ,  Mutsuko Hatano ,  Shinya Yamaguchi ,  Makoto Ohkura

发明人： Mikio Hongo ,  Sachio Uto ,  Mineo Nomoto ,  Toshihiko Nakata ,  Mutsuko Hatano ,  Shinya Yamaguchi ,  Makoto Ohkura

IPC分类号： G02F1/1368 ,  B23K26/06 ,  B23K26/073 ,  G09F9/30 ,  H01L21/20 ,  H01L21/26 ,  H01L21/268 ,  H01L21/324 ,  H01L21/336 ,  H01L21/77 ,  H01L21/84 ,  H01L27/12 ,  H01L29/04 ,  H01L29/786 ,  H01S3/00 ,  B66C21/00

CPC分类号： H01L29/04 ,  B23K26/0622 ,  B23K26/064 ,  B23K26/0648 ,  B23K26/066 ,  B23K26/0665 ,  B23K26/0732 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02683 ,  H01L21/268 ,  H01L27/1285 ,  H01L27/1296 ,  H01L29/66757 ,  H01L29/78675

摘要： A laser beam is concentrated using an objective lens and radiated on a amorphous silicon film or polycrystalline silicon film having a grain size of one micron or less, the laser beam being processed from a continuous wave laser beam (1) to be pulsed using an EO modulator and to have arbitrary temporal energy change while pulsing ; (2) to have an arbitrary spatial energy distribution using a beam-homogenizer, filter having an arbitrary transmittance distribution, and rectangular slit; and (3) to eliminate coherency thereof using a high-speed rotating diffuser. In this manner, it is possible to realize a liquid crystal display device in which a driving circuit comprising a polycrystalline silicon film having substantially the same properties as a single crystal is incorporated in a TFT panel device.

摘要翻译： 使用物镜将激光束集中并照射在具有1微米或更小的晶粒尺寸的非晶硅膜或多晶硅膜上，激光束从连续波激光束（1）处理以使用EO脉冲 并且在脉冲时具有任意的时间能量变化; （2）使用束均化器，具有任意透射率分布的滤光器和矩形狭缝具有任意的空间能量分布; 和（3）消除使用高速旋转扩散器的相干性。 以这种方式，可以实现一种液晶显示装置，其中包括具有与单晶基本上相同性质的多晶硅膜的驱动电路并入TFT面板装置中。

公开(公告)号：US20050062961A1

公开(公告)日：2005-03-24

申请号：US10979169

申请日：2004-11-03

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

IPC分类号： G01N21/33 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66 ,  G01N21/88

CPC分类号： G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/151 ,  G01N2021/95615 ,  G01N2201/06113 ,  G01N2201/1035

摘要： An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.

摘要翻译： 一种用于检查缺陷的装置，包括安装待检查样本并且可在平面中移动的台面，用于发射紫外线的紫外光源的照明单元，用于对从紫外线发射的光照射安装在桌子上的样本的照明单元 源，用于形成由所述照明单元照射的所述样本的图像并且用图像传感器检测图像的检测单元，以及图像处理单元，用于处理由所述图像传感器检测到的图像，并且用于输出关于在所述图像传感器上检测到的缺陷的信息; 标本。 照明单元和检测单元设置在清洁的环境中，其中提供有清洁的气体并且由壁与外部分离。

公开(公告)号：US06831737B2

公开(公告)日：2004-12-14

申请号：US10050778

申请日：2002-01-18

申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunzi Maeda ,  Atsushi Shimoda

IPC分类号： G01N2100

CPC分类号： G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/151 ,  G01N2021/95615 ,  G01N2201/06113 ,  G01N2201/1035

摘要： The present invention provides a pattern defect inspecting apparatus wherein an amount-of-light monitor unit detects a variation in the amount of ultraviolet laser light during inspection to thereby determine the presence or absence of an influence thereof exerted on the inspection and detects the prediction of the life of a light source and a malfunction thereof, and the interior of an optical system is cleaned up to thereby ensure the prolongation of the life of each optical part and long-term reliability thereof, and a method thereof.

摘要翻译： 本发明提供了一种图案缺陷检查装置，其中光量监视器单元检测检查期间紫外激光量的变化，从而确定其对检查的影响的有无，并检测预测 光源的寿命和故障以及光学系统的内部被清理，从而确保每个光学部件的寿命延长及其长期可靠性及其方法。

公开(公告)号：US06831277B1

公开(公告)日：2004-12-14

申请号：US09437265

申请日：1999-11-10

申请人： Toshihiko Nakata ,  Hideaki Sasazawa ,  Kenji Furusawa ,  Minako Morisato ,  Hideo Yamakura ,  Toshio Tamura

发明人： Toshihiko Nakata ,  Hideaki Sasazawa ,  Kenji Furusawa ,  Minako Morisato ,  Hideo Yamakura ,  Toshio Tamura

IPC分类号： G01B1100

CPC分类号： G11B5/3173 ,  G11B5/3103 ,  G11B5/3166 ,  G11B5/3169 ,  G11B5/3189 ,  G11B5/3903 ,  G11B5/3967 ,  Y10T29/49036

摘要： A method of measuring variation in dimensions and alignment error of thin film magnetic heads formed on a raw bar cut-off from a substrate is provided. Such method comprises illuminating a MR element and a resistance detector element which is formed for monitoring a lapping process, both of which are formed on the raw bar, with illuminating light whose wavelength is 300 nm or less; forming an image by imaging light reflected from the elements; and converting the image to an image signal through photoelectric conversion so as to detect variation in dimensions of the MR element and the resistance detector element formed on the raw bar, and alignment error between the MR element and the resistance detector element with a high degree of accuracy.

摘要翻译： 提供了一种测量从基板上切割的生条上形成的薄膜磁头的尺寸变化和对准误差的方法。 这种方法包括：照射MR元件和电阻检测器元件，该元件形成用于监测两者都是在原料条上形成的研磨过程，其中波长为300nm或更小的照明光; 通过对从元件反射的光进行成像来形成图像; 并且通过光电转换将图像转换成图像信号，以便检测形成在原始条上的MR元件和电阻检测器元件的尺寸变化，以及MR元件和电阻检测器元件之间的对准误差 准确性。

公开(公告)号：US06721047B2

公开(公告)日：2004-04-13

申请号：US09944858

申请日：2001-08-31

申请人： Atsushi Shimoda ,  Sachio Uto ,  Minoru Yoshida ,  Shunji Maeda ,  Toshihiko Nakata

发明人： Atsushi Shimoda ,  Sachio Uto ,  Minoru Yoshida ,  Shunji Maeda ,  Toshihiko Nakata

IPC分类号： G01N2100

CPC分类号： G01N21/95684

摘要： The object of the invention is to provide high-sensitivity detection of fine patterns on a transparent inter-layer insulative film and defects on the same layer. Detection is performed with lower-layer patterns and defects on the same layer defocused, thus allowing detection of just the defects from the process that is intended for inspection. An inspection apparatus for a specimen on which a plurality of patterns intended to have identical shapes are arranged in a uniform manner includes: an imaging optical system with a relationship between illumination wavelength and objective lens numerical aperture that provides a resolution of no more than 0.18 microns, or preferably no more than 0.13 microns; an opto-electric converter disposed at an imaging position of the imaging optical system; an auto-focus optical system formed with an optical path disposed separate from the imaging optical system, with illumination applied at an incident angle of at least 85 degrees, preferably at least 88 degrees; means for adjusting a focal position of the imaging optical system based on a detection signal from the auto-focus optical system; and means for processing electronic signals from the opto-electrical converter.

摘要翻译： 本发明的目的是提供在透明层间绝缘膜上的精细图案的高灵敏度检测和同一层上的缺陷。 以相同层上的较低层图案和缺陷进行检测，散焦，从而允许仅检测来自用于检查的过程的缺陷。 用于其上具有相同形状的多个图案的样本的检查装置以均匀的方式布置包括：具有提供不超过0.18微米的分辨率的照明波长和物镜数值孔径之间的关系的成像光学系统 ，或优选不超过0.13微米; 设置在成像光学系统的成像位置处的光电转换器; 形成有与成像光学系统分开设置的光路的自动聚焦光学系统，其入射角至少为85度，优选为至少88度; 用于基于来自所述自动聚焦光学系统的检测信号调整所述成像光学系统的焦点位置的装置; 以及用于处理来自光电转换器的电子信号的装置。

公开(公告)号：US06712928B2

公开(公告)日：2004-03-30

申请号：US09791677

申请日：2001-02-26

申请人： Hiroyuki Nakano ,  Toshihiko Nakata

发明人： Hiroyuki Nakano ,  Toshihiko Nakata

IPC分类号： H05H100

CPC分类号： H01J37/3299 ,  C23C14/564 ,  C23C16/4401 ,  H01J2237/0225

摘要： The following operations are performed in order to allow particles suspended in a processing chamber to be detected using a single observation window and an optical system formed as a single unit and in order to provide precise detection of very weak particle-scattered light: when a desired film-forming/processing operation is being performed on a body being processed in a processing chamber, a beam that is P-polarized and that is intensity amplified at a frequency different from an excitation source frequency and integer multiples thereof is passed through an observation window sloped to form a Brewster angle relative to the P-polarized entry beam; back-scattered light scattered by particles in the processing chamber passes through the same observation window and received and imaged by a detection optical system; the frequency component described above and the intensity-modulated beam wavelength component are detected from the received light signal; and these detected components and the image information imaged as described above is used to determine the quantity, sizes, and distribution of the particles.

摘要翻译： 执行以下操作以便使用单个观察窗和形成为单个单元的光学系统来检测悬浮在处理室中的颗粒，并且为了提供非常弱的粒子散射光的精确检测：当期望的 正在对处理室中正在处理的物体进行成膜/处理操作，通过观察窗口将P偏振光束以不同于激发源频率和整数倍的频率进行强度放大的光束进行成膜/ 倾斜以相对于P偏振入射梁形成布鲁斯特角; 处理室中的颗粒散射的背散射光通过相同的观察窗，并由检测光学系统接收和成像; 从接收到的光信号中检测上述频率分量和强度调制波长分量; 并且将这些检测到的成分和如上所述成像的图像信息用于确定颗粒的数量，尺寸和分布。

公开(公告)号：US06613588B2

公开(公告)日：2003-09-02

申请号：US09933185

申请日：2001-08-21

申请人： Hiroyuki Nakano ,  Toshihiko Nakata

发明人： Hiroyuki Nakano ,  Toshihiko Nakata

IPC分类号： H01L2100

CPC分类号： G01N21/9501 ,  G01N21/94 ,  H01J2237/0225

摘要： The present invention is to detect particles suspended in a processing chamber using a single observation window and an optical system formed as a single unit and to provide precise detection of very weak particle-scattered light. When a thin film is being formed on an object to be processed in a processing chamber or if such a thin film is being processed, an optical guide module guides a laser beam from a laser light source separated from a laser illumination/scattered light detection optical system. The laser beam is guided to the laser illumination/scattered light detection optical system. The processing chamber is illuminated by the laser illumination/scattered light detection optical system via an observation window. The illumination light is scattered by particles in the processing chamber. Back-scattered light passing through the observation window is detected by the laser illumination/scattered light detection optical system.

公开(公告)号：US5645351A

公开(公告)日：1997-07-08

申请号：US364777

申请日：1994-12-27

申请人： Toshihiko Nakata ,  Shigeki Hirasawa ,  Yoko Saito ,  Takanori Ninomiya ,  Mineo Nomoto

发明人： Toshihiko Nakata ,  Shigeki Hirasawa ,  Yoko Saito ,  Takanori Ninomiya ,  Mineo Nomoto

IPC分类号： G01K5/52 ,  G01N21/17 ,  G01N29/24 ,  G01N29/34 ,  G01J5/38

CPC分类号： G01N29/346 ,  G01K5/52 ,  G01N21/171 ,  G01N29/2418 ,  G01N2291/012

摘要： A temperature measuring method and apparatus for measuring temperature of at least one measuring point of a sample. At least one measuring point on a surface of a sample at least with a first light. A displacement of the at least one measuring point on the surface of the sample occurs from thermal expansion of the sample in response to the first light impinging thereon and a signal indicative of the displacement is produced. The temperature of the at least one measuring point of the sample is determined from the signal.

摘要翻译： 一种用于测量样品的至少一个测量点的温度的温度测量方法和装置。 至少一个样品表面上至少有一个测量点至少有一个第一个光。 样品表面上的至少一个测量点的位移是由于样品响应于其上的第一个光的热膨胀而发生的，并且产生了表示位移的信号。 根据信号确定样品的至少一个测量点的温度。

公开(公告)号：US09267898B2

公开(公告)日：2016-02-23

申请号：US13983077

申请日：2011-12-20

申请人： Kenji Nakahira ,  Toshifumi Honda ,  Toshihiko Nakata

发明人： Kenji Nakahira ,  Toshifumi Honda ,  Toshihiko Nakata

IPC分类号： G01N21/88 ,  G01N21/956 ,  G01N21/95

CPC分类号： G01N21/88 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8835

摘要： An optical inspection apparatus is provided which suppresses the influence of quantum noise including: light irradiator which irradiates a sample with light; reference light emitter which emits reference light; light interference unit which generates interfering light through interference between transmitted light, scattered light, or reflected light from the sample irradiated with light by the light irradiator, and the reference light emitted by the reference light emitter; light detector which detects the interfering light generated by the light interference unit; defect identifier which identifies the presence or absence of a defect based on a detection signal obtained by the light detector detecting the interfering light; and light convertor which converts at least the state of the transmitted, scattered, or reflected light from the sample, the state of the reference light emitted by the reference light emitter, or the state of the interfering light generated by the light interference unit.

摘要翻译： 提供抑制量子噪声影响的光学检查装置，包括：用光照射样品的光照射器; 发射参考光的参考光发射器; 光干涉单元，其通过光照射器照射的样品的透射光，散射光或反射光之间的干涉产生干涉光，以及由参考光发射器发射的参考光; 光检测器，其检测由光干涉单元产生的干涉光; 缺陷识别器，其基于由所述光检测器检测到所述干扰光获得的检测信号来识别缺陷的存在或不存在; 以及光转换器，其至少转换来自样品的透射，散射或反射光的状态，由参考光发射器发射的参考光的状态或由光干涉单元产生的干涉光的状态。