Method and apparatus for measuring displacement of a sample to be inspected using an interference light
    121.
    发明授权
    Method and apparatus for measuring displacement of a sample to be inspected using an interference light 有权
    使用干涉光测量被检样品的位移的方法和装置

    公开(公告)号:US08064066B2

    公开(公告)日:2011-11-22

    申请号:US12605089

    申请日:2009-10-23

    IPC分类号: G01B9/02

    摘要: In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

    摘要翻译: 在使用光干涉的位移测量装置中,探针光路在空间上与参考光路分离。 因此,当通过空气等的波动或机械振动产生温度或折射率分布时,光路差在两个光路之间波动,并且产生测量误差。 在该解决方案中,将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离,用探测光照射样品,用参考光照射参考表面,反射光 允许光束彼此干涉,并且从所得到的干涉光中获得样品的位移,从而防止由于光程差的波动而产生测量误差。

    Scanning probe microscope
    122.
    发明授权
    Scanning probe microscope 有权
    扫描探针显微镜

    公开(公告)号:US08011230B2

    公开(公告)日:2011-09-06

    申请号:US12023158

    申请日:2008-01-31

    IPC分类号: G01B5/28

    CPC分类号: G01Q70/04 G01Q10/06

    摘要: A scanning probe microscope, capable of performing shape measurement not affected by electrostatic charge distribution of a sample, which: monitors an electrostatic charge state by detecting a change in a flexure or vibrating state of a cantilever due to electrostatic charges in synchronization with scanning during measurement with relative scanning between the probe and the sample, and makes potential adjustment so as to cancel an influence of electrostatic charge distribution, thus preventing damage of the probe or the sample due to discharge and achieving reduction in measurement errors due to electrostatic charge distribution.

    摘要翻译: 扫描探针显微镜,其能够执行不受样品静电荷分布影响的形状测量,其通过检测与测量同步的静电荷引起的静电荷的悬臂的挠曲或振动状态的变化来监测静电荷状态 通过探针和样品之间的相对扫描,进行电位调整,以消除静电电荷分布的影响,从而防止由于放电而引起的探针或样品的损伤,并实现由静电电荷分布引起的测量误差的降低。

    Scanning probe microscope and sample observation method using the same
    124.
    发明授权
    Scanning probe microscope and sample observation method using the same 有权
    扫描探针显微镜和样品观察方法使用

    公开(公告)号:US07716970B2

    公开(公告)日:2010-05-18

    申请号:US11411022

    申请日:2006-04-26

    IPC分类号: G01B5/28

    CPC分类号: G01Q60/34

    摘要: The present invention provides a method of using an accurate three-dimensional shape without damaging a sample by making a probe contact the sample only at a measuring point, lifting and retracting the probe when moving to the next measuring point and making the probe approach the sample after moving to the next measuring point, wherein high frequency/minute amplitude cantilever excitation and vibration detection are performed and further horizontal direction excitation or vertical/horizontal double direction excitation are performed to improve the sensitivity of contacting force detection on a slope of steep inclination. The method uses unit for inclining the probe in accordance with the inclination of a measurement target and a structure capable of absorbing or adjusting the orientation of the light detecting the condition of contact between the probe and sample after reflection on the cantilever, which varies a great deal depending on the inclination of the probe.

    摘要翻译: 本发明提供了一种使用准确的三维形状而不损害样品的方法,该方法是使探针仅在测量点接触样品,当移动到下一个测量点时提升和缩回探针并使探针接近样品 在移动到下一个测量点之后,执行高频/分钟幅度的悬臂激励和振动检测,并且执行进一步的水平方向激励或垂直/水平双向激励,以提高在陡倾斜度上的接触力检测的灵敏度。 该方法使用用于根据测量对象的倾斜度和能够吸收或调节探测器和样品之间的接触条件的光的方向来倾斜测量头的单元,其反射在悬臂上,其变化很大 取决于探头的倾斜度。

    Scanning probe microscope and sample observing method using this and semiconductor device production method
    125.
    发明授权
    Scanning probe microscope and sample observing method using this and semiconductor device production method 有权
    扫描探针显微镜及采用此方法的样品观察方法及半导体器件的制作方法

    公开(公告)号:US07562564B2

    公开(公告)日:2009-07-21

    申请号:US10542624

    申请日:2004-01-29

    IPC分类号: G01N13/16 G12B21/20 G01N13/10

    摘要: A scanning probe microscope capable of measuring accurate 3-D shape information of a sample with high through-put without damaging a sample. In a method for acquiring an accurate 3-D shape of a sample without imparting damage to the sample by bringing a probe into contact at only a measurement point, once pulling up and retracting the probe when it moves towards a next measurement point, moving the probe towards the next measurement point and allowing it to approach, a deflection signal of the probe and its twist signal area analyzed so that measurement can be made at a minimum necessary retraction distance. Control for minimizing residual oscillation at the time of transverse movement is made so that a measurement frequency can be raised and high speed measurement can be accomplished.

    摘要翻译: 一种扫描探针显微镜,能够测量具有高通量的样品的精确3-D形状信息而不损害样品。 在通过仅在测量点使探针接触而获取样品的3-D形状的准确性的方法中,一旦在探头向下一个测量点移动时向上和向后缩回,则移动 探测下一个测量点并使其接近,分析探头的偏转信号及其扭转信号区域,以便能够以最小必要的回缩距离进行测量。 进行用于使横向运动时的残余振荡最小化的控制,使得可以提高测量频率并且可以实现高速度测量。

    Method of detecting particles and a processing apparatus using the same
    129.
    发明申请
    Method of detecting particles and a processing apparatus using the same 审中-公开
    检测粒子的方法及使用其的处理装置

    公开(公告)号:US20050016953A1

    公开(公告)日:2005-01-27

    申请号:US10790180

    申请日:2004-03-02

    CPC分类号: G01N15/0205

    摘要: A sample is processed while suppressing film deposition generated during plasma processing and fogging on a measurement window caused by etching to stably detect floating contaminants in a processing chamber with an improved contaminant capture rate. A particle detector is provided in the processing chamber, except for a space defined between electrodes of the plasma generator or a portion above the platform in which the plasma is generated. Laser light for scanning is emitted from the measurement window to the processing chamber, so that the particle detector detects scattered light from contaminants present in the processing chamber. The particle detector detects contaminants based on the detected scattered light during operation of the processing apparatus.

    摘要翻译: 处理样品,同时抑制等离子体处理期间产生的膜沉积和由蚀刻引起的测量窗上的雾化,以稳定地检测具有改进的污染物捕获率的处理室中的漂浮污染物。 除了等离子体发生器的电极之间的空间或其上产生等离子体的平台之上的部分之外,在处理室中设置有粒子检测器。 用于扫描的激光从测量窗口发射到处理室,使得颗粒检测器检测来自处理室中存在的污染物的散射光。 颗粒检测器在处理装置的操作期间基于检测到的散射光检测污染物。

    Method of processing a semiconductor device
    130.
    发明授权
    Method of processing a semiconductor device 失效
    半导体器件的处理方法

    公开(公告)号:US06778272B2

    公开(公告)日:2004-08-17

    申请号:US09760704

    申请日:2001-01-17

    IPC分类号: H01L2100

    摘要: A method of processing a semiconductor device is provided with several steps, including the step of generating plasma in a processing chamber to form or process a thin firm on a semiconductor device. The step of scanning, through a window, intensity modulated laser beam, which is modulated at a desired frequency inside the processing chamber where the semiconductor device is being processed. The step of receiving by a sensor through the window a back scattered light being scattered from fine particles suspended in the processing chamber by the scanning laser and detecting the desired frequency component from a signal outputted from the sensor. From the detected frequency component information relating to quantity, size, and distribution of the fine particles illuminated by the laser beam inside the processing chamber is obtained. This information is then outputted.

    摘要翻译: 提供半导体器件的处理方法有几个步骤,包括在处理室中产生等离子体以在半导体器件上形成或处理薄的固体的步骤。 通过窗口扫描在被处理半导体器件的处理室内的所需频率下调制的强度调制激光束的步骤。 由传感器通过窗口接收由扫描激光从悬浮在处理室中的细颗粒散射的背散射光并从传感器输出的信号中检测所需频率分量的步骤。 从与处理室内的激光束照射的微粒子的数量,大小,分布有关的检测频率成分信息得到。 然后输出该信息。