公开(公告)号：US07684462B2

公开(公告)日：2010-03-23

申请号：US11102611

申请日：2005-04-07

申请人： Jun Ye ,  Zhen Zhu ,  Shifeng Zhao ,  Lieyi Fang ,  Zhiliang Chen

发明人： Jun Ye ,  Zhen Zhu ,  Shifeng Zhao ,  Lieyi Fang ,  Zhiliang Chen

IPC分类号： H04B1/00

CPC分类号： H03K7/08 ,  H02M1/44 ,  H02M3/156

摘要： System and method for providing frequency control to a power converter. The system includes a pseudorandom signal generator configured to generate a digital signal. The digital signal is associated with at least an N-bit datum, and N is a positive integer. Additionally, the system includes a digital-to-analog converter configured to receive the digital signal and generate a first control signal, an output signal generator configured to receive the first control signal and generate at least a first output signal associated with a frequency, and a pulse-width-modulation generator configured to receive at least the first output signal. The N-bit datum represents a pseudorandom number.

摘要翻译： 向功率转换器提供频率控制的系统和方法。 该系统包括被配置为产生数字信号的伪随机信号发生器。 数字信号与至少一个N位数据相关联，N是正整数。 另外，该系统包括被配置为接收数字信号并产生第一控制信号的数模转换器，被配置为接收第一控制信号并产生与频率相关联的至少第一输出信号的输出信号发生器，以及 脉冲宽度调制发生器，被配置为至少接收第一输出信号。 N位数据表示伪随机数。

公开(公告)号：US07558419B1

公开(公告)日：2009-07-07

申请号：US10917060

申请日：2004-08-12

申请人： Jun Ye ,  Yu Cao ,  R. Fabian Pease

发明人： Jun Ye ,  Yu Cao ,  R. Fabian Pease

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G03F1/84 ,  G06T2207/30148

摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for inspecting integrated circuits, including, for example, patterns projected, provided or formed on a wafer using photomasks, or patterns on the photomask itself. The inspection system and technique of this aspect includes first identifying, determining and/or detecting areas and/or patterns that are potentially defective by removing, filtering and/or eliminating from a set of potential defects any and/or all typical, regular or normal patterns. The identification, determination and/or detection of potential defects may be performed relatively quickly by a rapidly executing algorithm. In this way, a first or “coarse” analysis is performed rapidly and some, many, all or substantially all of the regular, normal or typical patterns are eliminated from further analysis. Thereafter, a second more detailed analysis is performed. This second analysis focuses on the set of potential defects that were identified, determined and/or detected during the first analysis of the photomask or wafer (i.e., the “coarse” analysis). The second analysis may be considerably a more detailed or a “fine” analysis relative to the first or “coarse” analysis. Indeed, in one embodiment, the second analysis may implement a more computational intensive process, without sacrificing throughput, since only a small portion of the photomask or wafer is inspected in the second analysis. In this way, the detailed analysis of the defect candidates may identify (i) all or substantially all of the actual defects and/or (ii) only the actual defects from the potential defects identified during the first analysis.

摘要翻译： 这里描述和说明了许多发明。 在一个方面，本发明涉及用于检查集成电路的技术和系统，包括例如使用光掩模投影，提供或形成在晶片上的图案或光掩模本身上的图案。 该方面的检查系统和技术包括首先识别，确定和/或检测潜在缺陷的区域和/或图案，该区域和/或图案通过去除，过滤和/或从一组潜在的缺陷中消除任何和/或所有典型的，规则的或正常的 模式。 可能通过快速执行的算法相对较快地执行潜在缺陷的识别，确定和/或检测。 以这种方式，快速执行第一个或“粗略”分析，并从进一步的分析中消除一些，许多，全部或基本上所有常规，正常或典型的模式。 此后，进行第二更详细的分析。 该第二分析集中在在光掩模或晶片的第一次分析期间（即，“粗略”分析））中识别，确定和/或检测到的潜在缺陷集合。 第二次分析可能相对于第一次或“粗略”分析可能是更详细或“精细”的分析。 实际上，在一个实施例中，第二分析可以实现更加计算密集的过程，而不会牺牲吞吐量，因为在第二次分析中只检查了一小部分光掩模或晶片。 以这种方式，缺陷候选人的详细分析可以识别（i）所有或基本上所有的实际缺陷和/或（ii）仅在第一次分析期间识别的潜在缺陷的实际缺陷。

公开(公告)号：US07538881B2

公开(公告)日：2009-05-26

申请号：US11707550

申请日：2007-02-16

申请人： Jun Ye ,  Michael J. Thorpe ,  Kevin Moll ,  R. Jason Jones

发明人： Jun Ye ,  Michael J. Thorpe ,  Kevin Moll ,  R. Jason Jones

IPC分类号： G01B9/02 ,  G01J3/45

CPC分类号： G01J3/26 ,  G01N21/3504 ,  G01N21/359 ,  G01N21/39

摘要： Cavity enhanced spectroscopy efficiently couples a broadband optical frequency comb to a high finesse optical cavity inside which a sample test gas is placed. The output of the optical cavity is a multiplicity of channels of data resulting from the differential absorption of light at various of the comb frequencies. The device can operate in a ringdown mode or a non-ringdown enhanced absorption spectroscopy mode. Careful measurement and control of cavity dispersion and comb spacing are part of the coupling process. Several dispersive detection methods adapted to detecting the multiplicity of channels are provided.

摘要翻译： 腔增强光谱法将宽带光频梳有效地耦合到其中放置样品测试气体的高精细光学腔。 光腔的输出是由各种梳状频率下的光的差分吸收而产生的多个数据通道。 该装置可以在振铃模式或非减振增强吸收光谱模式下工作。 仔细测量和控制腔体分散和梳齿间距是耦合过程的一部分。 提供了适用于检测多个通道的几种色散检测方法。

公开(公告)号：US20090053628A1

公开(公告)日：2009-02-26

申请号：US11892407

申请日：2007-08-22

申请人： Jun Ye ,  Yu Cao

发明人： Jun Ye ,  Yu Cao

IPC分类号： G03F7/20

CPC分类号： G03F7/705 ,  G03F7/70125 ,  G03F7/70458 ,  G03F7/70516 ,  G03F7/70525

摘要： A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values.

摘要翻译： 一种基于模型的调谐方法，用于利用参考光刻系统调整第一光刻系统，每个参考光刻系统具有用于控制成像性能的可调参数。 该方法包括定义测试图案和成像模型的步骤; 使用参考光刻系统成像测试图案并测量成像结果; 使用第一光刻系统成像测试图案并测量成像结果; 使用对应于参考光刻系统的成像结果校准成像模型，其中校准的成像模型具有第一组参数值; 使用对应于第一光刻系统的成像结果来调整校准的成像模型，其中调谐的校准模型具有第二组参数值; 以及基于第一组参数值和第二组参数值之间的差异来调整第一光刻系统的参数。

公开(公告)号：US20080074660A1

公开(公告)日：2008-03-27

申请号：US11707550

申请日：2007-02-16

申请人： Jun Ye ,  Michael Thorpe ,  Kevin Moll ,  R. Jones

发明人： Jun Ye ,  Michael Thorpe ,  Kevin Moll ,  R. Jones

IPC分类号： G01J3/00 ,  G01J3/45

CPC分类号： G01J3/26 ,  G01N21/3504 ,  G01N21/359 ,  G01N21/39

摘要： Cavity enhanced spectroscopy efficiently couples a broadband optical frequency comb to a high finesse optical cavity inside which a sample test gas is placed. The output of the optical cavity is a multiplicity of channels of data resulting from the differential absorption of light at various of the comb frequencies. The device can operate in a ringdown mode or a non-ringdown enhanced absorption spectroscopy mode. Careful measurement and control of cavity dispersion and comb spacing are part of the coupling process. Several dispersive detection methods adapted to detecting the multiplicity of channels are provided.

摘要翻译： 腔增强光谱法将宽带光频梳有效地耦合到其中放置样品测试气体的高精细光学腔。 光腔的输出是由各种梳状频率下的光的差分吸收而产生的多个数据通道。 该装置可以在振铃模式或非减振增强吸收光谱模式下工作。 仔细测量和控制腔体分散和梳齿间距是耦合过程的一部分。 提供了适用于检测多个通道的几种色散检测方法。

公开(公告)号：US07345895B2

公开(公告)日：2008-03-18

申请号：US11449142

申请日：2006-06-07

申请人： Zhen Zhu ,  Jun Ye ,  Shifeng Zhao ,  Lieyi Fang ,  Zhiliang Chen

发明人： Zhen Zhu ,  Jun Ye ,  Shifeng Zhao ,  Lieyi Fang ,  Zhiliang Chen

IPC分类号： H02M3/335

CPC分类号： H02M1/32 ,  H02M3/33507

摘要： System and method for protecting a power converter. The system includes a compensation system configured to receive an input signal and generate a control signal, a cycle threshold generator configured to receive the control signal and generate a cycle threshold, and a comparator configured to receive the cycle threshold and a feedback signal and generate a comparison signal. Additionally, the system includes a pulse-width-modulation generator configured to receive the comparison signal and generate a modulation signal in response to the comparison signal, and a switch configured to receive the modulation signal and control an input current for a power converter. The input current is associated with an output power for the power converter. The cycle threshold corresponds to a threshold power level for the output power. The threshold power level is constant, decreases, or increases with respect to the input signal.

公开(公告)号：US20070210840A1

公开(公告)日：2007-09-13

申请号：US11407682

申请日：2006-04-19

申请人： Zhen Zhu ,  Jun Ye ,  Zhiliang Chen ,  Lieyi Fang

发明人： Zhen Zhu ,  Jun Ye ,  Zhiliang Chen ,  Lieyi Fang

IPC分类号： H03L7/00

CPC分类号： H03K17/223 ,  H03K2217/0036

摘要： A system and method for power-on reset and under-voltage lockout schemes. The system includes a first transistor, which includes a first gate, a first terminal, and a second terminal, the second terminal being biased to a predetermined voltage. The system includes a second transistor, which include a second gate, a third terminal, and a fourth terminal, the third terminal being configured to receive an input voltage. The system includes a first resistor that is associated with a first resistance. The first resistor includes a fifth terminal and a sixth terminal, the fifth terminal being configured to receive the input voltage. The system includes a second resistor that is associated with a second resistance. The second resistor includes a seventh terminal and an eighth terminal, the seventh terminal being coupled to the sixth terminal. The system includes a first Zener diode that is associated with a first Zener voltage.

摘要翻译： 一种上电复位和欠压锁定方案的系统和方法。 该系统包括第一晶体管，其包括第一栅极，第一端子和第二端子，第二端子被偏置到预定电压。 该系统包括第二晶体管，其包括第二栅极，第三端子和第四端子，第三端子被配置为接收输入电压。 该系统包括与第一电阻相关联的第一电阻器。 第一电阻器包括第五端子和第六端子，第五端子被配置为接收输入电压。 该系统包括与第二电阻相关联的第二电阻器。 第二电阻器包括第七端子和第八端子，第七端子耦合到第六端子。 该系统包括与第一齐纳电压相关联的第一齐纳二极管。

公开(公告)号：US20070061772A1

公开(公告)日：2007-03-15

申请号：US11530402

申请日：2006-09-08

申请人： Jun Ye ,  Stefan Hunsche

发明人： Jun Ye ,  Stefan Hunsche

IPC分类号： G06F17/50 ,  G03F1/00 ,  G21K5/00

CPC分类号： G06F17/5081 ,  G03F1/36 ,  G03F1/84 ,  G03F7/70441 ,  G03F7/705

摘要： Methods and systems are disclosed to inspect a manufactured lithographic mask, to extract physical mask data from mask inspection data, to determine systematic mask error data based on differences between the physical mask data and mask layout data, to generate systematic mask error parameters based on the systematic mask error data, to create an individual mask error model with systematic mask error parameters, to predict patterning performance of the lithographic process using a particular mask and/or a particular projection system, and to predict process corrections that optimize patterning performance and thus the final device yield.

摘要翻译： 公开了用于检查制造的光刻掩模的方法和系统，以从掩模检查数据提取物理掩模数据，以基于物理掩模数据和掩模布局数据之间的差异来确定系统掩模误差数据，以基于 系统掩模误差数据，以产生具有系统掩模误差参数的单独掩模误差模型，以预测使用特定掩模和/或特定投影系统的光刻工艺的图案化性能，以及预测优化图案化性能的工艺校正， 最终装置产量。

公开(公告)号：US20070022402A1

公开(公告)日：2007-01-25

申请号：US11527010

申请日：2006-09-26

申请人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

发明人： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

IPC分类号： G06F17/50 ,  G03F1/00 ,  G21K5/00

CPC分类号： G06F17/5009 ,  G03F1/00 ,  G03F7/004 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G06T7/0004 ,  G06T2207/30148 ,  G21K5/00

摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.

摘要翻译： 这里描述和说明了许多发明。 在一个方面，本发明涉及用于模拟，验证，检查，表征，确定和/或评估光刻设计，技术和/或系统的技术和系统，和/或由其执行的各个功能或使用的组件 其中。 在一个实施例中，本发明是加速光刻特性和/或性质的光刻模拟，检查，表征和/或评估以及光刻系统和处理技术的效果和/或相互作用的系统和方法。 在这方面，在一个实施例中，本发明采用光刻仿真系统架构，包括特定于应用的硬件加速器，以及用于加速和促进掩模设计的验证，表征和/或检验的处理技术，例如RET设计 ，包括对整个光刻工艺进行详细的仿真和表征，以验证设计在最终的晶片图案上实现和/或提供期望的结果。 该系统包括：（1）通用目的型计算设备，用于执行在数据处理中具有分支和相互依赖性的基于案例的逻辑，以及（2）加速器子系统执行大部分计算密集型任务。

公开(公告)号：US20060291258A1

公开(公告)日：2006-12-28

申请号：US11449142

申请日：2006-06-07

申请人： Zhen Zhu ,  Jun Ye ,  Shifeng Zhao ,  Lieyi Fang ,  Zhiliang Chen

发明人： Zhen Zhu ,  Jun Ye ,  Shifeng Zhao ,  Lieyi Fang ,  Zhiliang Chen

IPC分类号： H02M3/335

CPC分类号： H02M1/32 ,  H02M3/33507

摘要： System and method for protecting a power converter. The system includes a compensation system configured to receive an input signal and generate a control signal, a cycle threshold generator configured to receive the control signal and generate a cycle threshold, and a comparator configured to receive the cycle threshold and a feedback signal and generate a comparison signal. Additionally, the system includes a pulse-width-modulation generator configured to receive the comparison signal and generate a modulation signal in response to the comparison signal, and a switch configured to receive the modulation signal and control an input current for a power converter. The input current is associated with an output power for the power converter. The cycle threshold corresponds to a threshold power level for the output power. The threshold power level is constant, decreases, or increases with respect to the input signal.