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公开(公告)号:US20250107154A1
公开(公告)日:2025-03-27
申请号:US18973522
申请日:2024-12-09
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Jun KOYAMA , Masashi TSUBUKU , Kosei NODA
IPC: H01L29/786 , H01L21/66 , H01L27/02 , H01L27/12
Abstract: A logic circuit includes a thin film transistor having a channel formation region formed using an oxide semiconductor, and a capacitor having terminals one of which is brought into a floating state by turning off the thin film transistor. The oxide semiconductor has a hydrogen concentration of 5×1019 (atoms/cm3) or less and thus substantially serves as an insulator in a state where an electric field is not generated. Therefore, off-state current of a thin film transistor can be reduced, leading to suppressing the leakage of electric charge stored in a capacitor, through the thin film transistor. Accordingly, a malfunction of the logic circuit can be prevented. Further, the excessive amount of current which flows in the logic circuit can be reduced through the reduction of off-state current of the thin film transistor, resulting in low power consumption of the logic circuit.
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公开(公告)号:US20240321897A1
公开(公告)日:2024-09-26
申请号:US18616481
申请日:2024-03-26
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Masahiro TAKAHASHI , Takuya HIROHASHI , Masashi TSUBUKU , Noritaka ISHIHARA , Masashi OOTA
IPC: H01L27/12 , C23C14/08 , G01N23/207 , G02F1/1368 , H01L21/02 , H01L21/66 , H01L29/04 , H01L29/24 , H01L29/66 , H01L29/786
CPC classification number: H01L27/1225 , C23C14/086 , G01N23/207 , G02F1/1368 , H01L22/12 , H01L29/04 , H01L29/24 , H01L29/66969 , H01L29/7869 , H01L29/78693 , H01L21/0237 , H01L21/02422 , H01L21/02554 , H01L21/02565 , H01L21/02631 , H01L2924/0002
Abstract: A metal oxide film including a crystal part and having highly stable physical properties is provided. The size of the crystal part is less than or equal to 10 nm, which allows the observation of circumferentially arranged spots in a nanobeam electron diffraction pattern of the cross section of the metal oxide film when the measurement area is greater than or equal to 5 nmφ and less than or equal to 10 nmφ.
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公开(公告)号:US20230395726A1
公开(公告)日:2023-12-07
申请号:US18237431
申请日:2023-08-24
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Jun KOYAMA , Masashi TSUBUKU , Kosei NODA
IPC: H01L29/786 , H01L27/12 , H01L27/02
CPC classification number: H01L29/7869 , H01L27/1225 , H01L29/78696 , H01L27/0207 , H01L22/34
Abstract: A logic circuit includes a thin film transistor having a channel formation region formed using an oxide semiconductor, and a capacitor having terminals one of which is brought into a floating state by turning off the thin film transistor. The oxide semiconductor has a hydrogen concentration of 5×1019 (atoms/cm3) or less and thus substantially serves as an insulator in a state where an electric field is not generated. Therefore, off-state current of a thin film transistor can be reduced, leading to suppressing the leakage of electric charge stored in a capacitor, through the thin film transistor. Accordingly, a malfunction of the logic circuit can be prevented. Further, the excessive amount of current which flows in the logic circuit can be reduced through the reduction of off-state current of the thin film transistor, resulting in low power consumption of the logic circuit.
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公开(公告)号:US20210343877A1
公开(公告)日:2021-11-04
申请号:US17373879
申请日:2021-07-13
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Hajime KIMURA , Kengo AKIMOTO , Masashi TSUBUKU , Toshinari SASAKI
IPC: H01L29/786 , G09G3/36 , H01L27/12
Abstract: A display device including a pixel having a memory. The pixel includes at least a display element, a capacitor, an inverter, and a switch. The switch is controlled with a signal held in the capacitor and a signal output from the inverter so that voltage is supplied to the display element. The inverter and the switch can be constituted by transistors with the same polarity. A semiconductor layer included in the pixel may be formed using a light-transmitting material. Moreover, a gate electrode, a drain electrode, and a capacitor electrode may be formed using a light-transmitting conductive layer. The pixel is formed using a light-transmitting material in such a manner, whereby the display device can be a transmissive display device while including a pixel having a memory.
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公开(公告)号:US20210210519A1
公开(公告)日:2021-07-08
申请号:US17206906
申请日:2021-03-19
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Jun KOYAMA , Atsushi HIROSE , Masashi TSUBUKU , Kosei NODA
IPC: H01L27/12 , H01L29/786 , H01L33/02 , H04R1/02 , H01L29/36 , H01L27/15 , H01L27/32 , H01L29/24 , H04M1/02
Abstract: An object is to obtain a semiconductor device having a high sensitivity in detecting signals and a wide dynamic range, using a thin film transistor in which an oxide semiconductor layer is used. An analog circuit is formed with the use of a thin film transistor including an oxide semiconductor which has a function as a channel formation layer, has a hydrogen concentration of 5×1019 atoms/cm3 or lower, and substantially functions as an insulator in the state where no electric field is generated. Thus, a semiconductor device having a high sensitivity in detecting signals and a wide dynamic range can be obtained.
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公开(公告)号:US20210175256A1
公开(公告)日:2021-06-10
申请号:US17105801
申请日:2020-11-27
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Masayuki SAKAKURA , Yoshiaki OIKAWA , Shunpei YAMAZAKI , Junichiro SAKATA , Masashi TSUBUKU , Kengo AKIMOTO , Miyuki HOSOBA
IPC: H01L27/12 , G02F1/1343 , G02F1/1345 , G02F1/1368
Abstract: The semiconductor device includes a driver circuit portion including a driver circuit and a pixel portion including a pixel. The pixel includes a gate electrode layer having a light-transmitting property, a gate insulating layer, a source electrode layer and a drain electrode layer each having a light-transmitting property provided over the gate insulating layer, an oxide semiconductor layer covering top surfaces and side surfaces of the source electrode layer and the drain electrode layer and provided over the gate electrode layer with the gate insulating layer therebetween, a conductive layer provided over part of the oxide semiconductor layer and having a lower resistance than the source electrode layer and the drain electrode layer, and an oxide insulating layer in contact with part of the oxide semiconductor layer.
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公开(公告)号:US20200335628A1
公开(公告)日:2020-10-22
申请号:US16919441
申请日:2020-07-02
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Jun KOYAMA , Masashi TSUBUKU , Kosei NODA
IPC: H01L29/786 , H01L27/12 , H01L27/02
Abstract: A logic circuit includes a thin film transistor having a channel formation region formed using an oxide semiconductor, and a capacitor having terminals one of which is brought into a floating state by turning off the thin film transistor. The oxide semiconductor has a hydrogen concentration of 5×1019 (atoms/cm3) or less and thus substantially serves as an insulator in a state where an electric field is not generated. Therefore, off-state current of a thin film transistor can be reduced, leading to suppressing the leakage of electric charge stored in a capacitor, through the thin film transistor. Accordingly, a malfunction of the logic circuit can be prevented. Further, the excessive amount of current which flows in the logic circuit can be reduced through the reduction of off-state current of the thin film transistor, resulting in low power consumption of the logic circuit.
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公开(公告)号:US20200286928A1
公开(公告)日:2020-09-10
申请号:US16879853
申请日:2020-05-21
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Shunpei YAMAZAKI , Toshinari SASAKI , Junichiro SAKATA , Masashi TSUBUKU
IPC: H01L27/12 , H01L29/45 , H01L29/786 , H01L29/24 , H01L29/423
Abstract: It is an object to manufacture a highly reliable display device using a thin film transistor having favorable electric characteristics and high reliability as a switching element. In a bottom gate thin film transistor including an amorphous oxide semiconductor, an oxide conductive layer having a crystal region is formed between an oxide semiconductor layer which has been dehydrated or dehydrogenated by heat treatment and each of a source electrode layer and a drain electrode layer which are formed using a metal material. Accordingly, contact resistance between the oxide semiconductor layer and each of the source electrode layer and the drain electrode layer can be reduced; thus, a thin film transistor having favorable electric characteristics and a highly reliable display device using the thin film transistor can be provided.
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公开(公告)号:US20200168710A1
公开(公告)日:2020-05-28
申请号:US16775394
申请日:2020-01-29
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Masashi TSUBUKU , Shunpei YAMAZAKI , Hidetomo KOBAYASHI , Kazuaki OHSHIMA , Masashi FUJITA , Toshihiko TAKEUCHI
IPC: H01L29/24 , H01L27/12 , H01L29/786 , G01R19/00 , H01L21/66
Abstract: A semiconductor device in which a transistor has the characteristic of low off-state current is provided. The transistor comprises an oxide semiconductor layer having a channel region whose channel width is smaller than 70 nm. A temporal change in off-state current of the transistor over time can be represented by Formula (a2). In Formula (a2), IOFF represents the off-state current, t represents time during which the transistor is off, α and τ are constants, β is a constant that satisfies 0
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公开(公告)号:US20200066761A1
公开(公告)日:2020-02-27
申请号:US16672988
申请日:2019-11-04
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Masayuki SAKAKURA , Yoshiaki OIKAWA , Shunpei YAMAZAKI , Junichiro SAKATA , Masashi TSUBUKU , Kengo AKIMOTO , Miyuki HOSOBA
IPC: H01L27/12 , G02F1/1345 , G02F1/1368 , G02F1/1343
Abstract: The semiconductor device includes a driver circuit portion including a driver circuit and a pixel portion including a pixel. The pixel includes a gate electrode layer having a light-transmitting property, a gate insulating layer, a source electrode layer and a drain electrode layer each having a light-transmitting property provided over the gate insulating layer, an oxide semiconductor layer covering top surfaces and side surfaces of the source electrode layer and the drain electrode layer and provided over the gate electrode layer with the gate insulating layer therebetween, a conductive layer provided over part of the oxide semiconductor layer and having a lower resistance than the source electrode layer and the drain electrode layer, and an oxide insulating layer in contact with part of the oxide semiconductor layer.
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