公开(公告)号：US07241991B1

公开(公告)日：2007-07-10

申请号：US11271122

申请日：2005-11-09

Applicant: Keith Standiford ,  Mark A. Neil

Inventor： Keith Standiford ,  Mark A. Neil

IPC: H01L21/00 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J2237/2814 ,  H01J2237/2817

Abstract: One embodiment relates to a method for metrology using an electron beam apparatus. At least one region of interest is selected in a field of view at a magnification level. Scanning parameters are determined to selectively scan over the at least one regions of interest under the magnification level of the field of view. The electron beam is selectively scanned over the at least one region of interest to capture image data from the at least one region of interest while maintaining the magnification level of the field of view. Other embodiments are also disclosed.

Abstract translation: 一个实施例涉及使用电子束装置的计量方法。 在放大级别的视场中选择至少一个感兴趣区域。 确定扫描参数以在视场的放大级别下选择性地扫描感兴趣的至少一个区域。 在所述至少一个感兴趣区域上选择性地扫描电子束以从所述至少一个感兴趣区域捕获图像数据，同时保持视场的放大水平。 还公开了其他实施例。

公开(公告)号：US07218768B2

公开(公告)日：2007-05-15

申请号：US10366862

申请日：2003-02-13

Applicant: David M. W. Evans ,  Bin-Ming Ben Tsai ,  Jason Z. Lin

Inventor： David M. W. Evans ,  Bin-Ming Ben Tsai ,  Jason Z. Lin

IPC: G06K9/00

CPC classification number: G06K9/00 ,  G03F7/7065 ,  G06K9/522 ,  G06K9/6202 ,  G06T7/0004 ,  G06T7/37 ,  G06T2207/20056 ,  G06T2207/30148

Abstract: The present invention is a hybrid technique for finding defects on digitized device images using a combination of spatial domain and frequency domain techniques. The two dimensional spectra of two images are found using Fourier like transforms. Any strong harmonics in the spectra are removed, using the same spectral filter on both spectra. The images are then aligned, transformed back to the spatial domain, and subtracted. The resulting spectrally-filtered difference image is thresholded and analyzed for defects. Use of the hybrid technique of the present invention to process digitized images results in the highest-performance and most flexible defect detection system. It is the best performer on both array and random devices, and it can cope with problems such as shading variations and the dark-bright problem that no other technique can address. The hybrid technique of the present invention also uses frequency domain techniques to align the images with fewer errors than spatial domain techniques of similar or lesser complexity. Further, the relative offsets of the pairs of images are determined by frequency domain techniques—and this method may be the most accurate and the least expensive.

Abstract translation: 本发明是使用空间域和频域技术的组合来发现数字化设备图像上的缺陷的混合技术。 使用傅立叶样变换发现两幅图像的二维光谱。 在两个光谱上使用相同的光谱滤波器去除光谱中的任何强谐波。 然后将图像对准，转换回空间域，并减去。 对所得到的光谱滤波差分图像进行阈值处理并分析缺陷。 使用本发明的混合技术来处理数字化图像导致最高性能和最灵活的缺陷检测系统。 它是阵列和随机设备上表现最好的，它可以应对诸如阴影变化和没有其他技术可以解决的暗亮问题的问题。 本发明的混合技术还使用频域技术将图像与具有相似或较小复杂度的空间域技术相比具有更少的错误。 此外，通过频域技术确定图像对的相对偏移，并且该方法可以是最准确且最便宜的。

公开(公告)号：US07209239B2

公开(公告)日：2007-04-24

申请号：US10678920

申请日：2003-10-02

Applicant: Shiow-Hwei Hwang ,  Tao-Yi Fu

Inventor： Shiow-Hwei Hwang ,  Tao-Yi Fu

IPC: G01B11/02

CPC classification number: G01B11/303 ,  G01N21/9501

Abstract: A system and method for coherent optical inspection are described. In one embodiment, an illuminating beam illuminates a sample, such as a semiconductor wafer, to generate a reflected beam. A reference beam then interferes with the reflected beam to generate an interference pattern at a detector, which records the interference pattern. The interference pattern may then be compared with a comparison image to determine differences between the interference pattern and the comparison image. According to another aspect, the phase difference between the reference beam and the reflected beam may be adjusted to enhance signal contrast. Another embodiment provides for using differential interference techniques to suppress a regular pattern in the sample.

Abstract translation: 描述了用于相干光学检查的系统和方法。 在一个实施例中，照明光束照射诸如半导体晶片的样本以产生反射光束。 参考光束然后干扰反射光束，以在记录干涉图案的检测器处产生干涉图案。 然后可以将干涉图案与比较图像进行比较，以确定干涉图案和比较图像之间的差异。 根据另一方面，可以调整参考光束和反射光束之间的相位差以增强信号对比度。 另一实施例提供使用差分干涉技术来抑制样本中的规则图案。

公开(公告)号：US20070081154A1

公开(公告)日：2007-04-12

申请号：US11314779

申请日：2005-12-20

Applicant: Evan Mapoles ,  Grace Chen ,  Christopher Bevis ,  David Shortt

Inventor： Evan Mapoles ,  Grace Chen ,  Christopher Bevis ,  David Shortt

IPC: G01N21/88

CPC classification number: G01N21/95607 ,  G01N21/47 ,  G01N21/95623 ,  G01N2021/8822

Abstract: A dark field surface inspection tool and system are disclosed herein. The tool includes an illumination source capable of scanning a light beam onto an inspection surface. Light scattered by each inspection point is captured as image data by a photo detector array arranged at a fourier plane. The images captured are adaptively filtered to remove a portion of the bright pixels from the images to generate filtered images. The filtered images are then analyzed to detect defects in the inspection surface. Methods of the invention include using die-to-die comparison to identify bright portions of scattering patterns and generate unique image filters associated with those patterns. The associated images are then filtered to generate filtered images which are then used to detect defects. Also, data models of light scattering behavior can be used to generate filters.

Abstract translation: 本文公开了一种暗场表面检查工具和系统。 该工具包括能够将光束扫描到检查表面上的照明源。 由每个检查点散射的光通过布置在傅立叶平面上的光检测器阵列捕获为图像数据。 捕获的图像被自适应地滤波以从图像中去除一部分亮像素以产生滤波图像。 然后分析滤波图像以检测检查表面中的缺陷。 本发明的方法包括使用管芯到管芯的比较来识别散射图案的亮部分并且生成与这些图案相关联的独特的图像滤波器。 然后将相关联的图像过滤以产生滤波图像，然后将其用于检测缺陷。 此外，可以使用光散射行为的数据模型来生成滤波器。

公开(公告)号：US07199874B2

公开(公告)日：2007-04-03

申请号：US11297028

申请日：2005-12-07

Applicant: Christopher F. Bevis ,  Paul J. Sullivan ,  David W. Shortt ,  George J. Kren

Inventor： Christopher F. Bevis ,  Paul J. Sullivan ,  David W. Shortt ,  George J. Kren

IPC: G01N21/88

CPC classification number: G01N21/4738 ,  G01N21/8806 ,  G01N2021/8822

Abstract: An inspection tool embodiment includes an illumination source for directing a light beam onto a workpiece to generate scattered light that includes the ordinary scattering pattern of the workpiece as well as light scattered from defects of the workpiece. The embodiment includes a programmable light selection array that receives light scattered from the workpiece and selectively directs the light scattered from defects onto a photosensor which detects the defect signal. Processing circuitry receives the defect signal and conducts surface analysis of the workpiece that can include the characterizing of defects of the workpiece. The programmable light selection arrays can include, but are not limited to, reflector arrays and filter arrays. The invention also includes associated surface inspection methods.

Abstract translation: 检查工具实施例包括用于将光束引导到工件上以产生散射光的照明源，其包括工件的普通散射图案以及从工件的缺陷散射的光。 该实施例包括可编程光选择阵列，其接收从工件散射的光并选择性地将从缺陷散射的光引导到检测缺陷信号的光电传感器上。 处理电路接收缺陷信号并进行可能包括工件缺陷表征的工件的表面分析。 可编程光选择阵列可以包括但不限于反射器阵列和滤波器阵列。 本发明还包括相关的表面检查方法。

公开(公告)号：US07196801B1

公开(公告)日：2007-03-27

申请号：US10771020

申请日：2004-02-03

Applicant: Gary R. Janik ,  Liang-Guo Wang ,  Christopher M. Pohlhammer

Inventor： Gary R. Janik ,  Liang-Guo Wang ,  Christopher M. Pohlhammer

IPC: G01B11/30

CPC classification number: G01B11/306

Abstract: A method for measuring a characteristic of a substrate, including directing an incident beam at an inspection grid of points on the substrate, receiving the reflected beam with a position sensitive detector, measuring the displacement of the reflected beam from its expected location, compiling a database of the displacement measurements, examining the database for effects of a pattern induced anomaly in the displacement measurements, producing an adjusted database, and deriving the characteristic of the substrate from the adjusted database. Thus, pattern induced errors from the displacement measurements are corrected. In this manner, problems with interpreting the reflection angles of a beam in substrate stress analysis equipment are overcome where distortions in the reflection angles are caused by deposition patterns on the substrates.

Abstract translation: 一种用于测量衬底的特性的方法，包括将入射光束定向在衬底上的点的检查栅格处，用位置敏感检测器接收反射光束，测量反射光束从其预期位置的位移，编译数据库 的位移测量，检查数据库中位移测量中模式引起的异常的影响，产生调整后的数据库，以及从调整后的数据库导出底物的特征。 因此，校正来自位移测量的图案诱导误差。 以这种方式，克服了在基板应力分析设备中解释光束的反射角度的问题，其中反射角的失真是由基板上的沉积图案引起的。

公开(公告)号：US07190453B1

公开(公告)日：2007-03-13

申请号：US10945167

申请日：2004-09-20

Applicant: Paul Aoyagi ,  Philip D. Flanner, III ,  Leonid Poslavsky

Inventor： Paul Aoyagi ,  Philip D. Flanner, III ,  Leonid Poslavsky

IPC: G01J4/00 ,  G01B11/28

CPC classification number: G01N21/211 ,  G01B11/0641

Abstract: A method of determining the actual properties of a film stack. An incident beam of light is directed towards the film stack, such that the incident beam of light is reflected from the film stack as a reflected beam of light. The actual properties of the reflected beam of light are measured, and properties of the film stack are estimated. A mathematical model of the film stack is solved with the estimated properties of the film stack to yield theoretical properties of the reflected beam of light. The theoretical properties of the reflected beam of light are compared to the actual properties of the reflected beam of light to yield a cost function. The estimated properties of the film stack are iteratively adjusted and the mathematical model is iteratively solved until the cost function is within a desired tolerance. The estimated properties of the film stack are reported as the actual properties of the film stack. A method based on analytical derivatives, and not numerically computed derivatives, of solutions to Maxwell's equations that are at least partially expressible as complex exponential matrices is used to iteratively adjust the estimated properties of the film stack.

Abstract translation: 确定薄膜叠层的实际特性的方法。 入射光束被引向胶片堆叠，使得入射光束作为反射光束从胶片堆叠反射。 测量反射光束的实际性质，并估计膜堆的性质。 利用膜堆的估计性质来解决膜堆的数学模型，以产生反射光束的理论性质。 将反射光束的理论性质与反射光束的实际特性进行比较，以产生成本函数。 迭代地调整膜堆的估计性质，并且迭代地求解数学模型，直到成本函数在期望的公差内。 膜叠层的估计性质被报告为薄膜叠层的实际特性。 使用基于分析导数而不是数值计算的导数，将至少部分地表示为复指数矩阵的麦克斯韦方程的解的方法迭代地调整膜堆的估计性质。

公开(公告)号：US07184138B1

公开(公告)日：2007-02-27

申请号：US10798024

申请日：2004-03-11

Applicant: Bo Li

Inventor： Bo Li

IPC: G01N21/00 ,  G01B11/30

CPC classification number: G01N21/9501 ,  G01N21/8806

Abstract: Spatial filtering is disclosed that improves the signal to noise ration of a sample inspection system of the type having a detector and collection optics that receive radiation scattered from a point on a sample surface and direct the scattered radiation toward the detector. The spatial filtering may screen the detector from substantially all of the forward-scattered radiation from back-scattered radiation that is scattered in a at an elevation angle less than about 45° with respect to a normal to the surface. Forward scattered noise is screened from the detector while backscattered signal reaches the detector. Programmable spatial filters may be used to selectively block scattered noise due to surface roughness while transmitting scattered signal due to surface defects.

Abstract translation: 公开了空间滤波，其改进了具有检测器和收集光学器件的样品检测系统的信噪比，其接收从样品表面上的点散射的辐射并将散射的辐射引导到检测器。 空间滤波可以从相对于表面的法线以小于约45°的仰角散射的来自反散射辐射的基本上所有的前向散射辐射来屏蔽检测器。 从反射散射信号到达检测器时，从检测器屏蔽正向散射噪声。 可编程空间滤波器可用于选择性地阻止由于表面粗糙度而引起的散射噪声，同时由于表面缺陷而传播散射信号。

公开(公告)号：US07171038B2

公开(公告)日：2007-01-30

申请号：US10017860

申请日：2001-12-14

Applicant: David Adler ,  Kirk Bertsche ,  Mark McCord ,  Stuart Friedman

Inventor： David Adler ,  Kirk Bertsche ,  Mark McCord ,  Stuart Friedman

IPC: G06K9/00

CPC classification number: G01N23/203 ,  G01N21/956 ,  G01N21/95607 ,  G01N23/20 ,  G01N23/2251 ,  G01N23/2252 ,  G01N2223/304 ,  G01N2223/611 ,  G01N2223/646 ,  G03F1/84 ,  G03F1/86 ,  G03F7/70616 ,  G03F7/7065 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2817

Abstract: A method and apparatus for inspection and review of defects is disclosed wherein data gathering is improved. In one embodiment, multiple or segmented detectors are used in a particle beam system.

Abstract translation: 公开了一种用于检查和检查缺陷的方法和装置，其中提高了数据收集。 在一个实施例中，在粒子束系统中使用多个或分段检测器。

公开(公告)号：US07167185B1

公开(公告)日：2007-01-23

申请号：US10396228

申请日：2003-03-24

Applicant: Lih-Huah Yiin ,  Yen-Wen Lu ,  George Q. Chen

Inventor： Lih-Huah Yiin ,  Yen-Wen Lu ,  George Q. Chen

IPC: G09G5/02

CPC classification number: G03F1/84 ,  G06T7/0004 ,  G06T2207/30148

Abstract: Faster and more accurate techniques for displaying images are described. The techniques can be applied in various applications that include semiconductor fabrication processes. The invention uses preprocessed images to generate a user-selected image in order to increase the speed of image processing. The invention displays the pixels forming an image using grayscale shading in order to improve the accuracy of displaying the patterns used in photolithography processes. The techniques of the present invention can be used to display images that represent lithography patterns stored within memory devices or to display images captured by inspection or metrology devices.

Abstract translation: 描述更快更准确的显示图像的技术。 这些技术可以应用于包括半导体制造工艺的各种应用中。 本发明使用预处理图像来生成用户选择的图像，以便提高图像处理的速度。 本发明使用灰度阴影显示形成图像的像素，以便提高显示在光刻工艺中使用的图案的精度。 本发明的技术可以用于显示表示存储在存储器件内的光刻图案的图像，或者显示由检查或计量装置捕获的图像。