公开(公告)号：US11703464B2

公开(公告)日：2023-07-18

申请号：US17505696

申请日：2021-10-20

Applicant: Bruker Technologies Ltd.

Inventor： Alex Dikopoltsev ,  Matthew Wormington ,  Yuri Vinshtein ,  Alexander Krokhmal

IPC: G01N23/201 ,  G01N23/207 ,  G01T1/166 ,  G01N23/223

CPC classification number: G01N23/201 ,  G01N23/207 ,  G01N23/223 ,  G01T1/166 ,  G01N2223/6116

Abstract: A method for evaluating an array of high aspect ratio (HAR) structures on a sample includes illuminating the sample with an x-ray beam along a first axis parallel to within two degrees to the HAR structures in the array and sensing a first pattern of small angle x-ray scattering (SAXS) scattered from the sample while illuminating the sample along the first axis. The sample is illuminated with the x-ray beam along a second axis that is oblique to the HAR structures in the array, and a second pattern of the SAXS scattered from the sample is sensed while illuminating the sample along the second axis. Information is extracted with respect to the HAR structures based on the first and second patterns.

公开(公告)号：US11692953B2

公开(公告)日：2023-07-04

申请号：US17445721

申请日：2021-08-23

Applicant: NOVA LTD.

Inventor： Gilad Barak

IPC: G01N23/2055 ,  H01L21/66 ,  G06T7/00 ,  G06T5/00 ,  G01N23/201 ,  G01N23/20 ,  G01N23/207

CPC classification number: G01N23/2055 ,  G01N23/20 ,  G01N23/201 ,  G06T5/002 ,  G06T7/0004 ,  H01L22/12 ,  G01N23/207 ,  G01N2223/401 ,  G01N2223/6116 ,  G06T2207/10116 ,  G06T2207/20224 ,  G06T2207/30148

Abstract: A method and system are presented for use in X-ray based measurements on patterned structures. The method comprises: processing data indicative of measured signals corresponding to detected radiation response of a patterned structure to incident X-ray radiation, and subtracting from said data an effective measured signals substantially free of background noise, said effective measured signals being formed of radiation components of reflected diffraction orders such that model based interpretation of the effective measured signals enables determination of one or more parameters of the patterned structure, wherein said processing comprises: analyzing the measured signals and extracting therefrom a background signal corresponding to the background noise; and applying a filtering procedure to the measured signals to subtract therefrom signal corresponding to the background signal, resulting in the effective measured signal.

公开(公告)号：US11667838B2

公开(公告)日：2023-06-06

申请号：US16097136

申请日：2017-04-26

Applicant: SHOEI CHEMICAL INC.

Inventor： Takafumi Moriyama ,  Aya Midorikawa

IPC: C09K11/72 ,  C09K11/88 ,  C09K11/02 ,  B82Y30/00 ,  B82Y20/00 ,  B82Y40/00 ,  G01N23/201

CPC classification number: C09K11/883 ,  C09K11/025 ,  B82Y20/00 ,  B82Y30/00 ,  B82Y40/00 ,  G01N23/201

Abstract: An object of the present invention is to provide a core/shell type quantum dot material capable of increasing the photoluminescence quantum yield and a method of manufacturing the same. The quantum dot material according to one embodiment of the present invention is a quantum dot material comprising a plurality of nanoscopic core-shell structures, each nanoscopic core-shell structure including a nanocrystalline core including phosphorus and indium, a shell disposed on the nanocrystalline core, and a modifier comprising at least one of chlorine and bromine, wherein the content of chlorine and/or bromine is within a range of 2 to 15 mass % of the quantum dot material.

公开(公告)号：US11652007B2

公开(公告)日：2023-05-16

申请号：US16666196

申请日：2019-10-28

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Su-Horng Lin ,  Chi-Ming Yang

IPC: G01N23/00 ,  H01L21/66 ,  G01N23/02 ,  G01N23/083 ,  G01N23/201

CPC classification number: H01L22/12 ,  G01N23/02 ,  G01N23/083 ,  G01N23/201

Abstract: A method includes illuminating a wafer by an X-ray, detecting a spatial domain pattern produced when illuminating the wafer by the X-ray, identifying at least one peak from the detected spatial domain pattern, and analyzing the at least one peak to obtain a morphology of a transistor structure of the wafer.

公开(公告)号：US20180131044A1

公开(公告)日：2018-05-10

申请号：US15803458

申请日：2017-11-03

Applicant: Brown University

Inventor： Christoph Rose-Petruck ,  Brian Sheldon ,  Alexandra Stephan ,  Ravi Kumar ,  Francicso Schunk

IPC: H01M10/42 ,  G01N23/201 ,  G01N23/20025

CPC classification number: H01M10/4285 ,  G01N23/20025 ,  G01N23/201 ,  G01N23/2076

Abstract: A method and apparatus for in-situ x-ray scatter imaging of battery electrodes. An apparatus includes an X-ray source, a grid, the grid comprising stainless steel wires with uniform spacing, and a cell, the X-ray source directing a beam of energy through the metal grid and components of the cell, the cell blurring a previously sharp projection of grid wires on an image detector. A method includes providing a Spatial Frequency Heterodyne Imaging system, providing a grid, providing a cell, generating X-rays from the Spatial Frequency Heterodyne Imaging system that pass through components of the cell and the grid, and

公开(公告)号：US20180024081A1

公开(公告)日：2018-01-25

申请号：US15214575

申请日：2016-07-20

Applicant: PANalytical B.V.

Inventor： Vladimir Kogan ,  Detlef Beckers

IPC: G01N23/20 ,  G01N23/201

CPC classification number: G01N23/20033 ,  G01N23/20 ,  G01N23/20008 ,  G01N23/20025 ,  G01N23/20066 ,  G01N23/201 ,  G01N23/22 ,  G01N23/223 ,  G01N2223/054

Abstract: A sample holder 2 for holding a capillary 40 for X-ray analysis has a first thermal transport member 36 on the base portion 14 on one side of a longitudinal slit 12 and a second thermal transport member 38 on the base portion 16 on the other side. The thermal transport members 36, 38 are compressed between a frame 30 and the base portion 14, 16 in the transverse direction to urge the edges of the first and second thermal transport members together, to hold a capillary 40 longitudinally aligned with the longitudinal slit 12.

公开(公告)号：US20170307548A1

公开(公告)日：2017-10-26

申请号：US15495634

申请日：2017-04-24

Applicant: KLA-Tencor Corporation

Inventor： Alexander Bykanov ,  Nikolay Artemiev ,  Joseph A. Di Regolo ,  John Wade Viatella

IPC: G01N23/201 ,  G01N23/20 ,  G21K1/02

CPC classification number: G01N23/201 ,  G01N2223/054 ,  G01N2223/309 ,  G01N2223/316 ,  G21K1/04 ,  G21K7/00

Abstract: Methods and systems for reducing the effect of finite source size on illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements are described herein. A beam shaping slit having a slender profile is located in close proximity to the specimen under measurement and does not interfere with wafer stage components over the full range of angles of beam incidence. In one embodiment, four independently actuated beam shaping slits are employed to effectively block a portion of an incoming x-ray beam and generate an output beam having a box shaped illumination cross-section. In one aspect, each of the beam shaping slits is located at a different distance from the specimen in a direction aligned with the beam axis. In another aspect, the beam shaping slits are configured to rotate about the beam axis in coordination with the orientation of the specimen.

公开(公告)号：US09672949B2

公开(公告)日：2017-06-06

申请号：US14596615

申请日：2015-01-14

Applicant: Konica Minolta, Inc.

Inventor： Chiho Makifuchi

IPC: A61B6/04 ,  G21K1/06 ,  G06T5/00 ,  A61B6/00 ,  G01N23/201 ,  G01N23/04

CPC classification number: G21K1/067 ,  A61B6/4233 ,  A61B6/4291 ,  A61B6/484 ,  A61B6/5205 ,  A61B6/5258 ,  A61B6/586 ,  G01N23/04 ,  G01N23/201 ,  G01N2223/045 ,  G06T5/002 ,  G06T2207/10116 ,  G06T2207/30008

Abstract: The X-ray imaging system of this invention includes: a detecting member which detects a salt and pepper noise region in the reconstructed image based on at least one characteristic value of the moire stripe image not including the object and/or the moire stripe image including the object; a masked-image generating member which generates a masked image for identifying the detected salt and pepper noise region; and an image processing member which masks or trims at least one of the reconstructed image and the moire stripe images with the generated masked image.

公开(公告)号：US20170153189A1

公开(公告)日：2017-06-01

申请号：US15322611

申请日：2015-06-25

Applicant: Commissariat A L ' Energie Atomique et Aux Energies Alternatives

Inventor： Caroline PAULUS ,  Joachim TABARY

IPC: G01N23/20 ,  G01N23/201 ,  G01N23/087 ,  G01N23/207

CPC classification number: G01N23/20083 ,  G01N23/087 ,  G01N23/201 ,  G01N23/2076 ,  G01N2223/04 ,  G01N2223/045 ,  G01N2223/3037 ,  G01N2223/304 ,  G01N2223/316 ,  G01N2223/50

Abstract: A method for analyzing an object includes irradiating the object with incident photon radiation and acquiring an energy spectrum scattered by the material using a spectrometric detector in scatter mode. An energy spectrum transmitted by the material is acquired using a spectrometric detector in transmission mode. A signature (f) is reconstructed representing the object, both from the scatter spectrum measured and from the transmission spectrum measured, and the reconstructed signature thereof is compared with signatures of standard materials.

公开(公告)号：US09606073B2

公开(公告)日：2017-03-28

申请号：US14735162

申请日：2015-06-10

Applicant: JORDAN VALLEY SEMICONDUCTORS LTD.

Inventor： Isaac Mazor ,  Alex Krokhmal ,  Alex Dikopoltsev ,  Matthew Wormington

IPC: G01N23/201

CPC classification number: G01N23/201 ,  G01N2223/6116

Abstract: Apparatus, including a sample-support that retains a sample in a plane having an axis, the plane defining first and second regions separated by the plane. A source-mount in the first region rotates about the axis, and an X-ray source on the source-mount directs first and second incident beams of X-rays to impinge on the sample at first and second angles along beam axes that are orthogonal to the axis. A detector-mount in the second region moves in a plane orthogonal to the axis and an X-ray detector on the detector-mount receives first and second diffracted beams of X-rays transmitted through the sample in response to the first and second incident beams, and outputs first and second signals, respectively, in response to the received first and second diffracted beams. A processor analyzes the first and the second signals so as to determine a profile of a surface of the sample.