Expert knowledge methods and systems for data analysis

    公开(公告)号:US20070124118A1

    公开(公告)日:2007-05-31

    申请号:US11698400

    申请日:2007-01-25

    IPC分类号: G06F15/00

    摘要: A method for adjusting a data set defining a set of process runs, each process run having a set of data corresponding to a set of variables for a wafer processing operation is provided. A model derived from a data set is received. A new data set corresponding to one process run is received. The new data set is projected to the model. An outlier data point produced as a result of the projecting is identified. A variable corresponding to the one outlier data point is identified, the identified variable exhibiting a high contribution. A value for the variable from the new data set is identified. Whether the value for the variable is unimportant is determined. A normalized matrix of data is created, using random data and the variable that was determined to be unimportant from each of the new data set and the data set. The data set is updated with the normalized matrix of data.

    Materials and gas chemistries for processing systems
    16.
    发明申请
    Materials and gas chemistries for processing systems 审中-公开
    材料和气体化学处理系统

    公开(公告)号:US20060011583A1

    公开(公告)日:2006-01-19

    申请号:US11230689

    申请日:2005-09-19

    摘要: A plasma processing system for processing a substrate, is disclosed. The plasma processing system includes a single chamber, substantially azimuthally symmetric plasma processing chamber within which a plasma is both ignited and sustained for the processing. The plasma processing chamber has no separate plasma generation chamber. The plasma processing chamber has an upper end and a lower end. The plasma processing chamber includes a material that does not substantially react with the reactive gas chemistries that are delivered into the plasma processing chamber. In addition, the reactant gases that are flown into the plasma processing chamber are disclosed.

    摘要翻译: 公开了一种用于处理衬底的等离子体处理系统。 等离子体处理系统包括单室,基本方位对称的等离子体处理室,其中等离子体都被点燃并持续进行处理。 等离子体处理室没有单独的等离子体产生室。 等离子体处理室具有上端和下端。 等离子体处理室包括与输送到等离子体处理室中的反应性气体化学物质基本上不反应的材料。 此外,公开了流入等离子体处理室的反应气体。

    Method for adjusting voltage on a powered faraday shield
    18.
    发明申请
    Method for adjusting voltage on a powered faraday shield 有权
    用于调节动力法拉第盾屏蔽电压的方法

    公开(公告)号:US20050194355A1

    公开(公告)日:2005-09-08

    申请号:US11109921

    申请日:2005-04-19

    摘要: An apparatus and method for adjusting the voltage applied to a Faraday shield of an inductively coupled plasma etching apparatus is provided. An appropriate voltage is easily and variably applied to a Faraday shield such that sputtering of a plasma can be controlled to prevent and mitigate deposition of non-volatile reaction products that adversely affect an etching process. The appropriate voltage for a particular etching process or step is applied to the Faraday shield by simply adjusting a tuning capacitor. It is not necessary to mechanically reconfigure the etching apparatus to adjust the Faraday shield voltage.

    摘要翻译: 提供了一种用于调整施加到电感耦合等离子体蚀刻装置的法拉第屏蔽的电压的装置和方法。 适当的电压容易且可变地施加到法拉第屏蔽,使得可以控制等离子体的溅射以防止和减轻不利地影响蚀刻工艺的非挥发性反应产物的沉积。 通过简单地调整调谐电容器,将特定蚀刻工艺或步骤的适当电压施加到法拉第屏蔽。 不需要机械地重新配置蚀刻装置来调节法拉第屏蔽电压。

    CONTRAST SYSTEM AND METHODS FOR REFLECTIVE MARKERS

    公开(公告)号:US20190064290A1

    公开(公告)日:2019-02-28

    申请号:US15688134

    申请日:2017-08-28

    摘要: A contrast system and methods for improving optical detection during a medical procedure, the system involving: at least one tracking marker, each at least one tracking marker comprising a tracking marker coupling feature; and at least one contrast element, each at least one contrast element comprising a contrast element coupling feature and an optically non-reflective feature, the contrast element coupling feature configured to complement the tracking marker coupling feature, each at least one contrast element configured to respectively accommodate, by backing, each at least one tracking marker, and each at least one contrast element configured to respectively facilitate coupling each at least one tracking marker with at least one trackable object through at least one background object via at least one of a contrast element fastening feature and a trackable object fastening feature, whereby at least one of optical contrast and imaging in relation to the at least one tracking marker and the at least one background object is enhanceable, false detection of the at least one tracking marker is minimizable, and optical detection of the at least one tracking marker is improvable.