摘要:
A memory card with electrostatic discharge (ESD) protection and a manufacturing method thereof are provided. The memory card includes a circuit board, a set of contacts, at least one chip and an ESD protection path. The signal paths of the board is not exposed at the edge of the circuit board. The ESD protection path for transmitting ESD current is disposed on the circuit board. Furthermore, a part of the ESD protection path extends to the edge of the circuit board.
摘要:
A high-speed video signal processing system, which includes a reception end for receiving analog signals; a plurality of analog to digital converters coupled to the reception end for converting analog signals received from the reception end to digital signals according to control signals; and an interleaving controller coupled to the plurality of analog to digital converters for generating the control signals to selectively enable the plurality of analog to digital converters according to a predetermined sequence.
摘要:
A film includes a removable base material, a resin layer and a plurality of arc elastomers. The resin layer is a partially-cured resin which is in a half-melting state with viscosity at a temperature higher than a first temperature and in a solid state without viscosity at a temperature lower than a second temperature, and the resin layer in a solid state is adhered on the base material. The arc elastomers are disposed inside the resin layer. The present invention further provides a chip packaging process using the film.
摘要:
A memory card with electrostatic discharge (ESD) protection is provided. The memory card includes a board, a set of contacts, at least one chip and an ESD protection path. The board having a signal path not electrically connected to the edge of the board. The ESD protection path for transmitting ESD current is disposed on the board. Furthermore, a part of the ESD protection path extends to the edge of the board.
摘要:
A semiconductor package structure is disclosed. The structure includes a lead frame, a semiconductor chip, a plurality of metallic conducting wires, an encapsulation, a barrier layer and a pure tin layer, herein the lead frame has at least one die pad, a plurality of inner leads and outer leads. The semiconductor chip is disposed on the die pad. The metallic conducting wires electrically connect the semiconductor chip and the inner leads. The encapsulation packages of the semiconductor chip, the die pad, the metallic conducting wires and the inner leads. The barrier layer covers each of the outer leads to prevent an inter-metallic compound produced by the outer leads and pure tin. The pure tin layer covers the barrier layer to increase the solder wettability for the outer leads. Besides, a method for manufacturing the semiconductor package structure is disclosed.
摘要:
A package structure includes a lead frame having a plurality of leads, each of which includes a first recession, at least a first device, and a plurality of solder joints respectively positioned in the first recessions for connecting the first device to the lead frame.
摘要:
A manufacturing method of STI in DRAM includes the following steps. Step 1 is providing a substrate and step 2 is forming at least one trench in the substrate. Step 3 is doping at least one of side portions and bottom portions of the trench with a dopant. Step 4 is forming an oxidation inside the trench and step 5 is providing a planarization step to remove the oxidation. The stress of the corners of STI is reduced so as to modify the defect of the substrate and improve the DRAM variability in retention time.
摘要:
A DRAM with dopant stop layer includes a substrate, a trench-type transistor and a capacitor electrically connected to the trench-type transistor. The trench-type transistor includes a gate structure embedded in the substrate. A source doping region and a drain doping region are disposed in the substrate at two sides of the gate structure. A boron doping region is disposed under the source doping region. A dopant stop layer is disposed within the boron doping region or below the boron doping region. The dopant stop layer includes a dopant selected from the group consisting of C, Si, Ge, Sn, Cl, F and Br.
摘要:
A dispenser for a chemical-mechanical polishing (CMP) apparatus, includes a delivery arm disposed over a polishing pad of a CMP apparatus, at least a slurry delivery groove formed in the delivery arm and extending along a length of the delivery arm, and a plurality of first openings connected to the slurry delivery groove.
摘要:
A DRAM with dopant stop layer includes a substrate, a trench-type transistor and a capacitor electrically connected to the trench-type transistor. The trench-type transistor includes a gate structure embedded in the substrate. A source doping region and a drain doping region are disposed in the substrate at two sides of the gate structure. A boron doping region is disposed under the source doping region. A dopant stop layer is disposed within the boron doping region or below the boron doping region. The dopant stop layer includes a dopant selected from the group consisting of C, Si, Ge, Sn, Cl, F and Br.