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    Antireflective coating composition and process thereof
    11.
    发明授权
    Antireflective coating composition and process thereof 有权
    防反射涂料组合物及其工艺

    公开(公告)号：US09152051B2

    公开(公告)日：2015-10-06

    申请号：US13917022

    申请日：2013-06-13

    Applicant: M. Dalil Rahman ,  Clement Anyadiegwu ,  Douglas McKenzie ,  Takanori Kudo ,  Elizabeth Wolfer ,  Salem K. Mullen

    Inventor： M. Dalil Rahman ,  Clement Anyadiegwu ,  Douglas McKenzie ,  Takanori Kudo ,  Elizabeth Wolfer ,  Salem K. Mullen

    IPC: G03F7/09 ,  G03F7/30 ,  G03F7/075 ,  C09D165/00 ,  C09D5/00

    CPC classification number: G03F7/091 ,  C08G2261/314 ,  C08G2261/3424 ,  C09D5/006 ,  C09D165/00 ,  G03F7/0752 ,  G03F7/0757 ,  G03F7/30

    Abstract: The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar′ and Ar″ are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —(CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.

    Abstract translation: 本发明涉及一种包含新型聚合物的吸收性硬掩模抗反射涂料组合物，其中新型聚合物在聚合物的主链中包含四个重复单元-A-， - B - ， - C-和-D-，其中A为 重复单元在其骨架中包含稠合芳环，B具有结构（1），C是结构（2）的羟基联苯，D是结构式（3）的衍生化芴，其中R 1是C 1 -C 4烷基，R 2是 C 1 -C 4烷基，R 3和R 4独立地是氢或C 1 -C 4烷基，Ar'和Ar“独立地是苯基或萘衍生部分，R 5和R 6独立地是-OH或 - （CH 2）n OH，其中n = 2-4 ，R 7和R 8独立地为氢或C 1 -C 4烷基。 本发明还涉及使用新型抗反射涂料组合物形成图像的方法。

    Composition for Coating over a Photoresist Pattern Comprising a Lactam
    16.
    发明申请
    Composition for Coating over a Photoresist Pattern Comprising a Lactam 审中-公开
    用于在包含内酰胺的光致抗蚀剂图案上涂覆的组合物

    公开(公告)号：US20120219919A1

    公开(公告)日：2012-08-30

    申请号：US13033912

    申请日：2011-02-24

    Applicant: Muthiah Thiyagarajan ,  Ralph R. Dammel ,  Yi Cao ,  SungEun Hong ,  WenBing Kang ,  Clement Anyadiegwu

    Inventor： Muthiah Thiyagarajan ,  Ralph R. Dammel ,  Yi Cao ,  SungEun Hong ,  WenBing Kang ,  Clement Anyadiegwu

    IPC: G03F7/26

    CPC classification number: G03F7/405

    Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), represents the attachment to the polymer, m=1-6, and n=1-4.The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.

    Abstract translation: 本发明涉及一种用于涂覆光致抗蚀剂图案的水性涂料组合物，其包含含有结构（1）的内酰胺基团的聚合物，其中R 1独立地选自氢，C 1 -C 4烷基，C 1 -C 6烷基醇，羟基（OH） （NH 2），羧酸和酰胺（CONH 2）表示与聚合物的连接，m = 1-6，n = 1-4。 本发明还涉及一种用于制造微电子器件的方法，包括提供具有光致抗蚀剂图案的基底，用新颖的涂层材料涂覆光致抗蚀剂图案，使一部分涂料与光致抗蚀剂图案接触，并且将一部分 不与去除溶液反应的涂料。

    Composition for coating over a photoresist pattern comprising a lactam
    17.
    发明授权
    Composition for coating over a photoresist pattern comprising a lactam 有权
    用于在包含内酰胺的光致抗蚀剂图案上涂覆的组合物

    公开(公告)号：US07923200B2

    公开(公告)日：2011-04-12

    申请号：US11697804

    申请日：2007-04-09

    Applicant: Muthiah Thiyagarajan ,  Ralph R. Dammel ,  Yi Cao ,  SungEun Hong ,  WenBing Kang ,  Clement Anyadiegwu

    Inventor： Muthiah Thiyagarajan ,  Ralph R. Dammel ,  Yi Cao ,  SungEun Hong ,  WenBing Kang ,  Clement Anyadiegwu

    IPC: G03F7/40

    CPC classification number: G03F7/40 ,  C09D139/00

    Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2),  represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.

    Abstract translation: 本发明涉及一种用于涂覆光致抗蚀剂图案的水性涂料组合物，其包含含有结构（1）的内酰胺基团的聚合物，其中R 1独立地选自氢，C 1 -C 4烷基，C 1 -C 6烷基醇，羟基（OH） （NH 2），羧酸和酰胺（CONH 2）表示与聚合物的连接，m = 1-6，n = 1-4。 本发明还涉及一种用于制造微电子器件的方法，包括提供具有光致抗蚀剂图案的基底，用新颖的涂层材料涂覆光致抗蚀剂图案，使一部分涂料与光致抗蚀剂图案接触，并且将一部分 不与去除溶液反应的涂料。

    Antireflective Coating Composition Comprising Fused Aromatic Rings
    18.
    发明申请
    Antireflective Coating Composition Comprising Fused Aromatic Rings 审中-公开
    包含熔融芳环的防反射涂料组合物

    公开(公告)号：US20100119979A1

    公开(公告)日：2010-05-13

    申请号：US12270189

    申请日：2008-11-13

    Applicant: M. Dalil Rahman ,  Douglas McKenzie ,  Clement Anyadiegwu

    Inventor： M. Dalil Rahman ,  Douglas McKenzie ,  Clement Anyadiegwu

    IPC: C08G65/40 ,  C08L71/10 ,  G03F7/20

    CPC classification number: G03F7/091 ,  C08G61/02 ,  C08G2261/342 ,  H01L21/0276 ,  H01L21/3081

    Abstract: The present invention relates to an organic spin coatable antireflective coating composition comprising with (i) at least one unit with fused aromatic rings in the backbone of the polymer of structure (1), (ii) at least one aromatic unit ring in the backbone of the polymer of structure (2) where the aromatic ring has a pendant alkylene(fusedaromatic) group and a pendant hydroxy group, and, (iii) at least one unit with an aliphatic moiety in the backbone of the polymer of structure (3). where, Fr1 is a substituted or unsubstituted fused aromatic ring moiety with 3 or more fused aromatic rings, Fr2 is a fused aromatic ring moiety with 2 or more fused aromatic rings, Ar is a substituted or unsubstituted aromatic ring moiety, R′ and R″ are independently selected from hydrogen and C1-C4 alkyl, y=1-4, and B is a substituted or unsubstituted aliphatic moiety, and R1 is selected from hydrogen or aromatic moiety. The invention further relates to a process for imaging the present composition.

    Abstract translation: 本发明涉及有机可旋涂抗反射涂料组合物，其包含（i）至少一个在结构（1）的聚合物的主链中具有稠合芳环的单元，（ii）至少一个芳族单元环，其主链为 结构（2）的聚合物，其中芳环具有侧链亚烷基（稠合芳基）基团和侧羟基，和（iii）至少一个在结构（3）的聚合物主链中具有脂族部分的单元。 其中，Fr1是具有3个以上稠合芳环的取代或未取代的稠合芳香环部分，Fr2是具有2个以上稠合芳香环的稠合芳环部分，Ar是取代或未取代的芳环部分，R'和R“ 独立地选自氢和C 1 -C 4烷基，y = 1-4，B是取代或未取代的脂族部分，R 1选自氢或芳族部分。 本发明还涉及用于对本发明组合物进行成像的方法。

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