利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

30 条记录 (耗时 0.024 秒)

    Antireflective coating composition and process thereof
    3.
    发明授权
    Antireflective coating composition and process thereof 有权
    防反射涂料组合物及其工艺

    公开(公告)号：US09152051B2

    公开(公告)日：2015-10-06

    申请号：US13917022

    申请日：2013-06-13

    申请人： M. Dalil Rahman ,  Clement Anyadiegwu ,  Douglas McKenzie ,  Takanori Kudo ,  Elizabeth Wolfer ,  Salem K. Mullen

    发明人： M. Dalil Rahman ,  Clement Anyadiegwu ,  Douglas McKenzie ,  Takanori Kudo ,  Elizabeth Wolfer ,  Salem K. Mullen

    IPC分类号： G03F7/09 ,  G03F7/30 ,  G03F7/075 ,  C09D165/00 ,  C09D5/00

    CPC分类号： G03F7/091 ,  C08G2261/314 ,  C08G2261/3424 ,  C09D5/006 ,  C09D165/00 ,  G03F7/0752 ,  G03F7/0757 ,  G03F7/30

    摘要： The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar′ and Ar″ are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —(CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.

    摘要翻译： 本发明涉及一种包含新型聚合物的吸收性硬掩模抗反射涂料组合物，其中新型聚合物在聚合物的主链中包含四个重复单元-A-， - B - ， - C-和-D-，其中A为 重复单元在其骨架中包含稠合芳环，B具有结构（1），C是结构（2）的羟基联苯，D是结构式（3）的衍生化芴，其中R 1是C 1 -C 4烷基，R 2是 C 1 -C 4烷基，R 3和R 4独立地是氢或C 1 -C 4烷基，Ar'和Ar“独立地是苯基或萘衍生部分，R 5和R 6独立地是-OH或 - （CH 2）n OH，其中n = 2-4 ，R 7和R 8独立地为氢或C 1 -C 4烷基。 本发明还涉及使用新型抗反射涂料组合物形成图像的方法。

    Antireflective Coating Composition Comprising Fused Aromatic Rings
    5.
    发明申请
    Antireflective Coating Composition Comprising Fused Aromatic Rings 审中-公开
    包含熔融芳环的防反射涂料组合物

    公开(公告)号：US20100119979A1

    公开(公告)日：2010-05-13

    申请号：US12270189

    申请日：2008-11-13

    申请人： M. Dalil Rahman ,  Douglas McKenzie ,  Clement Anyadiegwu

    发明人： M. Dalil Rahman ,  Douglas McKenzie ,  Clement Anyadiegwu

    IPC分类号： C08G65/40 ,  C08L71/10 ,  G03F7/20

    CPC分类号： G03F7/091 ,  C08G61/02 ,  C08G2261/342 ,  H01L21/0276 ,  H01L21/3081

    摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising with (i) at least one unit with fused aromatic rings in the backbone of the polymer of structure (1), (ii) at least one aromatic unit ring in the backbone of the polymer of structure (2) where the aromatic ring has a pendant alkylene(fusedaromatic) group and a pendant hydroxy group, and, (iii) at least one unit with an aliphatic moiety in the backbone of the polymer of structure (3). where, Fr1 is a substituted or unsubstituted fused aromatic ring moiety with 3 or more fused aromatic rings, Fr2 is a fused aromatic ring moiety with 2 or more fused aromatic rings, Ar is a substituted or unsubstituted aromatic ring moiety, R′ and R″ are independently selected from hydrogen and C1-C4 alkyl, y=1-4, and B is a substituted or unsubstituted aliphatic moiety, and R1 is selected from hydrogen or aromatic moiety. The invention further relates to a process for imaging the present composition.

    摘要翻译： 本发明涉及有机可旋涂抗反射涂料组合物，其包含（i）至少一个在结构（1）的聚合物的主链中具有稠合芳环的单元，（ii）至少一个芳族单元环，其主链为 结构（2）的聚合物，其中芳环具有侧链亚烷基（稠合芳基）基团和侧羟基，和（iii）至少一个在结构（3）的聚合物主链中具有脂族部分的单元。 其中，Fr1是具有3个以上稠合芳环的取代或未取代的稠合芳香环部分，Fr2是具有2个以上稠合芳香环的稠合芳环部分，Ar是取代或未取代的芳环部分，R'和R“ 独立地选自氢和C 1 -C 4烷基，y = 1-4，B是取代或未取代的脂族部分，R 1选自氢或芳族部分。 本发明还涉及用于对本发明组合物进行成像的方法。

    Antireflective coating composition
    7.
    发明申请
    Antireflective coating composition 有权
    防反射涂料组合物

    公开(公告)号：US20090280435A1

    公开(公告)日：2009-11-12

    申请号：US12115776

    申请日：2008-05-06

    申请人： Douglas McKenzie ,  David Abdallah ,  Allen G. Timko ,  M. Dalil Rahman

    发明人： Douglas McKenzie ,  David Abdallah ,  Allen G. Timko ,  M. Dalil Rahman

    IPC分类号： G03F7/20 ,  G03F7/039

    CPC分类号： G03F7/091

    摘要： The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), where R1 to R9 is independently selected from H and C1-C6 alkyl, R′ and R″ is independently selected from H and C1-C6 alkyl, X is C1-C6 alkylene, Y is C1-C6 alkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.

    摘要翻译： 本发明涉及包含聚合物，交联剂和热酸发生剂的抗反射涂料组合物，其中聚合物包含至少一个结构单元（1），至少一个结构单元（2）和至少一个结构结构 （3），其中R 1至R 9独立地选自H和C 1 -C 6烷基，R'和R“独立地选自H和C 1 -C 6烷基，X是C 1 -C 6亚烷基，Y是C 1 -C 6亚烷基。 本发明还涉及一种用于对涂覆在抗反射涂层组合物上的光致抗蚀剂进行成像的方法。

    Antireflective Coating Composition
    8.
    发明申请
    Antireflective Coating Composition 有权
    防反射涂料组合物

    公开(公告)号：US20090246691A1

    公开(公告)日：2009-10-01

    申请号：US12060307

    申请日：2008-04-01

    申请人： M. Dalil Rahman ,  David Abdallah ,  Rhuzi Zhang ,  Douglas McKenzie

    发明人： M. Dalil Rahman ,  David Abdallah ,  Rhuzi Zhang ,  Douglas McKenzie

    IPC分类号： G03F7/004 ,  G03F7/00

    CPC分类号： G03F7/091

    摘要： The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2. where, R1 to R12 are independently selected from hydrogen and C1-C4 alkyl, structure. 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.

    摘要翻译： 本发明涉及一种抗反射组合物，其包含热酸产生剂和环氧聚合物，其包含至少一个结构单元1，至少一个结构单元，其中R1至R12独立地选自氢和C1-C4烷基， 结构体。 1具有选自顺式，反式或其混合物的构型，x和y是聚合物中单体单元的摩尔％。 本发明还涉及一种用于制造微电子器件的方法。

    Process for producing film forming resins for photoresist compositions
    9.
    发明授权
    Process for producing film forming resins for photoresist compositions 失效
    用于制造光致抗蚀剂组合物的成膜树脂的方法

    公开(公告)号：US06610465B2

    公开(公告)日：2003-08-26

    申请号：US09833226

    申请日：2001-04-11

    申请人： M. Dalil Rahman ,  Douglas McKenzie ,  Takanori Kudo ,  Munirathna Padmanaban

    发明人： M. Dalil Rahman ,  Douglas McKenzie ,  Takanori Kudo ,  Munirathna Padmanaban

    IPC分类号： G03F732

    CPC分类号： B01J20/28033 ,  B01J20/28004 ,  B01J20/28028 ,  B01J20/2803 ,  B01J20/28085 ,  B01J47/018 ,  B01J47/133 ,  C08F6/02 ,  C08F6/16 ,  G03F7/0395

    摘要： The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent; (b) providing the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and particulate ion exchange resin particles, where the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and (ii) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin; (c) rinsing the filter sheets of step (b) with the solvent of step (a); and (d) passing the solution of the film forming resin through the rinsed filter sheets of step (c).

    摘要翻译： 本发明提供一种适用于光致抗蚀剂组合物的成膜树脂的制造方法，包括以下步骤：（a）在成膜剂中提供成膜树脂的溶液; （b）提供以下两个过滤片：（i）含有固定有微粒过滤助剂和粒状离子交换树脂颗粒的自支撑纤维基质的过滤片，其中颗粒助滤剂和离子交换树脂颗粒基本上分布 均匀地遍布所述基质的横截面; 和（ii）含有固定有颗粒助滤剂和粘合剂树脂的纤维自支撑基质的过滤片; （c）用步骤（a）的溶剂冲洗步骤（b）的过滤片; 和（d）使成膜树脂的溶液通过步骤（c）的冲洗过的滤纸。

    Antireflective coating composition
    10.
    发明授权
    Antireflective coating composition 有权
    防反射涂料组合物

    公开(公告)号：US07989144B2

    公开(公告)日：2011-08-02

    申请号：US12060307

    申请日：2008-04-01

    申请人： M. Dalil Rahman ,  David Abdallah ,  Rhuzi Zhang ,  Douglas McKenzie

    发明人： M. Dalil Rahman ,  David Abdallah ,  Rhuzi Zhang ,  Douglas McKenzie

    IPC分类号： G03F7/11 ,  G03F7/30 ,  B29C59/16 ,  C08F291/02

    CPC分类号： G03F7/091

    摘要： The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2, where, R1 to R12 are independently selected from hydrogen and C1-C4 alkyl, structure 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.

    摘要翻译： 本发明涉及包含热酸产生剂和环氧聚合物的抗反射组合物，其包含至少一个结构单元1，至少一个结构单元2，其中R 1至R 12独立地选自氢和C 1 -C 4烷基， 结构1具有选自顺式，反式或其混合物的构型，x和y是聚合物中单体单元的摩尔％。 本发明还涉及一种用于制造微电子器件的方法。