Deposition Of N-Metal Films Comprising Aluminum Alloys
    11.
    发明申请
    Deposition Of N-Metal Films Comprising Aluminum Alloys 有权
    包含铝合金的N-金属膜的沉积

    公开(公告)号:US20140017408A1

    公开(公告)日:2014-01-16

    申请号:US13930194

    申请日:2013-06-28

    Abstract: Provided are methods of depositing films comprising alloys of aluminum, which may be suitable as N-metal films. Certain methods comprise exposing a substrate surface to a metal halide precursor comprising a metal halide selected from TiCl4, TaCl5 and HfCl4 to provide a metal halide at the substrate surface; purging metal halide; exposing the substrate surface to an alkyl aluminum precursor comprising one or more of dimethyaluminum hydride, diethylhydridoaluminum, methyldihydroaluminum, and an alkyl aluminum hydrides of the formula [(CxHy)3-aAlHa]n, wherein x has a value of 1 to 3, y has a value of 2x+2, a has a value of 1 to 2, and n has a value of 1 to 4; and exposing the substrate surface to an alane-containing precursor comprising one or more of dimethylethylamine alane, methylpyrrolidinealane, di(methylpyrolidine)alane, and trimethyl amine alane borane. Other methods comprise exposing a substrate surface to a metal precursor and trimethyl amine alane borane.

    Abstract translation: 提供了沉积包括铝合金的膜的方法,其可以适合作为N-金属膜。 某些方法包括将衬底表面暴露于包含选自TiCl 4,TaCl 5和HfCl 4的金属卤化物的金属卤化物前体,以在衬底表面提供金属卤化物; 清洗金属卤化物; 将基材表面暴露于包含一种或多种二氢化铝氢化物,二乙基氢化铝,甲基二氢铝和式[(C x H y)3-a AlHa] n的烷基铝氢化物的烷基铝前体,其中x具有1至3的值,y 具有2x + 2的值,a具有1至2的值,并且n具有1至4的值; 并将基材表面暴露于含有二甲基乙基胺丙烷,甲基吡咯烷烃,二(甲基吡咯烷)甲烷和三甲基胺丙烷硼烷中的一种或多种的含Alane的前体。 其他方法包括将基底表面暴露于金属前体和三甲基胺丙烷硼烷。

    Deposition Of Films Containing Alkaline Earth Metals
    12.
    发明申请
    Deposition Of Films Containing Alkaline Earth Metals 审中-公开
    沉积含碱性地球金属的薄膜

    公开(公告)号:US20140004274A1

    公开(公告)日:2014-01-02

    申请号:US13923599

    申请日:2013-06-21

    Applicant: David Thompson

    Inventor: David Thompson

    CPC classification number: C23C16/404

    Abstract: Described are methods of depositing a metal film by chemical reaction on a substrate. The method comprises: exposing the substrate to flows of a first reactant gas comprising a group 2 metal and a second reactant gas comprising a halide to form a first layer containing a metal halide on the substrate; exposing the substrate to a third reactant gas comprising an oxidant to form a second layer containing a metal peroxide or metal hydroxide on the substrate during; exposing the substrate to heat or a plasma to convert the metal peroxide or metal hydroxide to metal oxide. The method may be repeated to form the metal oxide film absent any metal carbonate impurity.

    Abstract translation: 描述了通过化学反应将金属膜沉积在基底上的方法。 该方法包括:将衬底暴露于包含第2族金属的第一反应气体和包含卤化物的第二反应气体的流动,以在衬底上形成含有金属卤化物的第一层; 将衬底暴露于包含氧化剂的第三反应气体,以在衬底期间在衬底上形成含有金属过氧化物或金属氢氧化物的第二层; 将基底暴露于加热或等离子体以将金属过氧化物或金属氢氧化物转化为金属氧化物。 可以重复该方法以形成没有金属碳酸盐杂质的金属氧化物膜。

    APPARATUS AND METHOD TO SECURE ACQUISITION AND CONTENTION BURST ACTIVITY IN A COMMUNICATION NETWORK
    13.
    发明申请
    APPARATUS AND METHOD TO SECURE ACQUISITION AND CONTENTION BURST ACTIVITY IN A COMMUNICATION NETWORK 有权
    在通信网络中安全采集和保持BURST活动的装置和方法

    公开(公告)号:US20130170505A1

    公开(公告)日:2013-07-04

    申请号:US13806937

    申请日:2010-06-25

    Abstract: An apparatus and method of communication in a network includes a hub having a burst time plan generating section to generate a burst time plan including time slot allocation information that allocates transmission time slots in a subsequent frame to remote terminals. The allocation information identifies at least one time slot in the subsequent frame as a dummy time slot assigned to at least one remote terminal already acquired in the network. The hub also includes a transmitter to transmit the burst time plan including the allocation information. A corresponding remote terminal and computer readable media are also discussed.

    Abstract translation: 网络中的通信装置和方法包括:具有突发时间计划生成部分的集线器,用于生成包括在后续帧中向远程终端分配传输时隙的时隙分配信息的突发时间计划。 分配信息将后续帧中的至少一个时隙标识为分配给已经在网络中获取的至少一个远程终端的虚拟时隙。 集线器还包括用于发送包括分配信息的突发时间计划的发射机。 还讨论了相应的远程终端和计算机可读介质。

    Apparatus And Process For Atomic Layer Deposition
    17.
    发明申请
    Apparatus And Process For Atomic Layer Deposition 审中-公开
    用于原子层沉积的装置和工艺

    公开(公告)号:US20120225192A1

    公开(公告)日:2012-09-06

    申请号:US13189692

    申请日:2011-07-25

    CPC classification number: C23C16/45551 C23C16/45527

    Abstract: Provided are atomic layer deposition apparatus and methods including a gas distribution plate comprising at least one gas injector unit. Each gas injector unit comprises a plurality of elongate gas injectors including at least two first reactive gas injectors and at least one second reactive gas injector, the at least two first reactive gas injectors surrounding the at least one second reactive gas injector. Also provided are atomic layer deposition apparatuses and methods including a gas distribution plate with a plurality of gas injector units.

    Abstract translation: 提供的原子层沉积装置和方法包括包括至少一个气体注入单元的气体分配板。 每个气体喷射器单元包括多个细长的气体喷射器,其包括至少两个第一反应气体喷射器和至少一个第二反应气体喷射器,所述至少两个第一反应气体喷射器围绕至少一个第二反应气体喷射器。 还提供了包括具有多个气体喷射器单元的气体分配板的原子层沉积设备和方法。

    Apparatus and Process for Atomic Layer Deposition
    18.
    发明申请
    Apparatus and Process for Atomic Layer Deposition 审中-公开
    原子层沉积的装置和工艺

    公开(公告)号:US20120225191A1

    公开(公告)日:2012-09-06

    申请号:US13037992

    申请日:2011-03-01

    CPC classification number: C23C16/45551 C23C16/45527

    Abstract: Provided are atomic layer deposition apparatus and methods including a gas distribution plate comprising at least one gas injector unit. Each gas injector unit comprises a plurality of elongate gas injectors including at least two first reactive gas injectors and at least one second reactive gas injector, the at least two first reactive gas injectors surrounding the at least one second reactive gas injector. Also provided are atomic layer deposition apparatuses and methods including a gas distribution plate with a plurality of gas injector units.

    Abstract translation: 提供的原子层沉积装置和方法包括包括至少一个气体注入单元的气体分配板。 每个气体喷射器单元包括多个细长的气体喷射器,其包括至少两个第一反应气体喷射器和至少一个第二反应气体喷射器,所述至少两个第一反应气体喷射器围绕至少一个第二反应气体喷射器。 还提供了包括具有多个气体喷射器单元的气体分配板的原子层沉积设备和方法。

    Special purpose small arms ammunition
    20.
    发明授权
    Special purpose small arms ammunition 有权
    专用小武器弹药

    公开(公告)号:US08176850B2

    公开(公告)日:2012-05-15

    申请号:US12837704

    申请日:2010-07-16

    CPC classification number: F42B12/74 F42B12/78

    Abstract: A multi-piece projectile for a small arms cartridge includes a metal cup that has a bore, a plastic sheath having a through hole and a high-density core. The cup is a cylindrical metal structure having a bore. The sheath is a cylindrical end and a conical end and a through hole. The core is a cylindrical structure having conical end and a blunt end. The projectile is assembled by placing the core in the through hole of the sheath and then pressing the sheath into the bore of the cup. The assembled projectile is attached to the cartridge by crimping the cup to the orifice in the end of the cartridge casing after it is filled with the propellant. When the projectile is fired all of the components remain coupled together but break apart upon impact with a target. Because the core has a higher mass than the other components the components separate very easily, the majority of the kinetic energy remains in the core. Once separated from the other components, the core is able to penetrate through various protective materials.

    Abstract translation: 用于小武器盒的多件式抛射物包括具有孔的金属杯,具有通孔的塑料护套和高密度芯。 杯是具有孔的圆柱形金属结构。 护套是圆柱形端部,锥形端部和通孔。 芯是具有圆锥形端和平端的圆柱形结构。 通过将芯放置在护套的通孔中,然后将护套压入杯的孔中来组装抛射体。 组装好的抛射体在填充推进剂之后,通过将杯子压紧到盒壳体的端部的孔口而连接到盒体上。 当射弹被射击时,所有的部件保持耦合在一起,但与目标撞击时会分离。 由于核心质量高于其他部件,组件分离非常容易,大部分动能仍然保留在核心中。 一旦与其他部件分离,该芯能够穿透各种保护材料。

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