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    Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
    11.
    发明申请
    Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 失效
    投影物镜包括多个镜子，前视镜M3

    公开(公告)号：US20050036213A1

    公开(公告)日：2005-02-17

    申请号：US10639780

    申请日：2003-08-12

    申请人： Hans-Jurgen Mann ,  Russell Hudyma ,  Alexander Epple

    发明人： Hans-Jurgen Mann ,  Russell Hudyma ,  Alexander Epple

    IPC分类号： G02B17/08 ,  G03F7/20 ,  G02B17/00

    CPC分类号： G02B17/0892 ,  G02B17/0844 ,  G02B17/0856 ,  G03F7/70225

    摘要： According to one exemplary embodiment, a projection objective is provided and includes at least two non-planar (curved) mirrors, wherein an axial distance between a next to last non-planar mirror and a last non-planar mirror, as defined along a light path, is greater than an axial distance between the last non-planar mirror and a first refracting surface of lenses following in the light path. In one exemplary embodiment, the first refracting surface is associated with a single pass type lens. The present objectives form images with numerical apertures of at least about 0.80 or higher, e.g., 0.95. Preferably, the objective does not include folding mirrors and there is no intermediate image between the two mirrors, as well as the pupil of the objective being free of obscuration.

    摘要翻译： 根据一个示例性实施例，提供了一种投影物镜，并且包括至少两个非平面（弯曲）反射镜，其中在沿着光线定义的下一个至最后的非平面镜与最后的非平面镜之间的轴向距离 路径大于最后的非平面镜与在光路中跟随的透镜的第一折射表面之间的轴向距离。 在一个示例性实施例中，第一折射表面与单遍型透镜相关联。 当前目标形成具有至少约0.80或更高（例如0.95）的数值孔径的图像。 优选地，该目的不包括折叠反射镜，并且在两个反射镜之间不存在中间图像，以及物镜的瞳孔没有遮蔽。

    Catoptric Objectives And Systems Using Catoptric Objectives
    12.
    发明申请
    Catoptric Objectives And Systems Using Catoptric Objectives 有权
    使用图解目标的图解目标和系统

    公开(公告)号：US20100134908A1

    公开(公告)日：2010-06-03

    申请号：US12700169

    申请日：2010-02-04

    申请人： Hans-Jurgen Mann ,  David Shafer ,  Wilhelm Ulrich

    发明人： Hans-Jurgen Mann ,  David Shafer ,  Wilhelm Ulrich

    IPC分类号： G02B5/10

    CPC分类号： G03F7/70233 ,  G02B13/143 ,  G02B17/061 ,  G02B17/0652 ,  G02B17/0657

    摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

    摘要翻译： 通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像 侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

    Catoptric objectives and systems using catoptric objectives
    13.
    发明授权
    Catoptric objectives and systems using catoptric objectives 失效
    使用反射目标的目标和系统

    公开(公告)号：US07682031B2

    公开(公告)日：2010-03-23

    申请号：US11317851

    申请日：2005-12-22

    申请人： Hans-Jurgen Mann ,  David Shafer ,  Wilhelm Ulrich

    发明人： Hans-Jurgen Mann ,  David Shafer ,  Wilhelm Ulrich

    IPC分类号： G02B5/10

    CPC分类号： G03F7/70233 ,  G02B13/143 ,  G02B17/061 ,  G02B17/0652 ,  G02B17/0657

    摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

    摘要翻译： 通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像 侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

    Groupwise corrected objective
    14.
    发明授权
    Groupwise corrected objective 有权
    分组校正目标

    公开(公告)号：US07576934B2

    公开(公告)日：2009-08-18

    申请号：US11656878

    申请日：2007-01-23

    申请人： Michael Schottner ,  Hans-Jurgen Mann ,  Martin Lowisch

    发明人： Michael Schottner ,  Hans-Jurgen Mann ,  Martin Lowisch

    IPC分类号： G02B27/00

    CPC分类号： G02B27/0043 ,  G02B17/0647 ,  G03F7/70233 ,  G03F7/70258 ,  Y10S359/90

    摘要： An objective and method of fabricating an objective, particularly a projection objective for microlithography, comprising a plurality of optical elements. In one example, the method comprises acts of determining groups of optically similar optical elements or surfaces having at least two members, determining wave front deformations by the optical elements or surfaces, determining the necessary corrections for the optical elements or surfaces of a group, and performing the corrections for a group at a group member.

    摘要翻译： 一种制造物镜的目的和方法，特别是用于微光刻的投影物镜，其包括多个光学元件。 在一个示例中，该方法包括确定具有至少两个构件的光学相似的光学元件或表面的组的动作，确定光学元件或表面的波前变形，确定组的光学元件或表面的必要校正，以及执行 一个团体成员的一个组的更正。

    8-Mirror microlithography projection objective
    17.
    发明申请
    8-Mirror microlithography projection objective 失效
    8镜微光投影物镜

    公开(公告)号：US20080137183A1

    公开(公告)日：2008-06-12

    申请号：US12012825

    申请日：2008-02-06

    申请人： Hans-Jurgen Mann ,  Wilhelm Ulrich ,  Gunther Seitz

    发明人： Hans-Jurgen Mann ,  Wilhelm Ulrich ,  Gunther Seitz

    IPC分类号： G02B27/18 ,  G02B17/06

    CPC分类号： G03F7/70233 ,  G02B17/0657 ,  G03F7/70275

    摘要： A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light path is provided via the eight mirrors, and in the light path exactly one intermediate image of the object field is provided.

    摘要翻译： 投影物镜提供从物体平面中的物场到像平面中的图像场的光束的光路。 投影物镜包括第一镜（S 1），第二镜（S 2），第三镜（S 3），第四镜（S 4），第五镜（S 5），第六镜 ），第七反射镜（S7）和第八反射镜（S8）。 通过八个反射镜提供光路，并且在光路中提供了物场的一个中间图像。

    Reflective optical element and EUV lithography appliance
    18.
    发明申请
    Reflective optical element and EUV lithography appliance 审中-公开
    反光光学元件和EUV光刻设备

    公开(公告)号：US20060066940A1

    公开(公告)日：2006-03-30

    申请号：US11216560

    申请日：2005-08-31

    申请人： Johann Trenkler ,  Hans-Jurgen Mann ,  Udo Nothelfer

    发明人： Johann Trenkler ,  Hans-Jurgen Mann ,  Udo Nothelfer

    IPC分类号： F21V9/04 ,  G02B1/10

    CPC分类号： G02B5/0891 ,  B82Y10/00 ,  G02B5/0816 ,  G02B5/085 ,  G03F7/7015 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/062

    摘要： The invention relates to a reflective optical element and an EUV lithography appliance containing one such element, said appliance displaying a low propensity to contamination. According to the invention, the reflective optical element has a protective layer system consisting of at least one layer. The optical characteristics of the protective layer system are between those of a spacer and an absorber or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.

    摘要翻译： 本发明涉及一种包含一种这样的元件的反射光学元件和EUV光刻器具，所述器具显示出低的污染倾向。 根据本发明，反射型光学元件具有由至少一层构成的保护层系统。 保护层系统的光学特性在间隔物和吸收体的光学特性之间，或对应于间隔物的光学特性。 在折射率方面选择具有尽可能小的虚部和实部尽可能接近1的材料导致根据保护层系统的厚度在两个厚度d之间的平台型反射率过程 1和d 2。 选择保护层系统的厚度使其小于d 2。

    Projection system for EUV lithography
    19.
    发明申请
    Projection system for EUV lithography 有权

    公开(公告)号：US20060050258A1

    公开(公告)日：2006-03-09

    申请号：US11243407

    申请日：2005-10-04

    申请人： Russell Hudyma ,  Hans-Jurgen Mann ,  Udo Dinger

    发明人： Russell Hudyma ,  Hans-Jurgen Mann ,  Udo Dinger

    IPC分类号： G03B27/54

    CPC分类号： G02B17/0657 ,  G02B17/0652 ,  G03B27/54 ,  G03F7/70233 ,  G03F7/70275

    摘要： An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°. The system preferably has a numerical aperture greater than 0.18 at the image (IM). The system is preferably configured such that a chief ray (CR) converges toward the optical axis (OA) while propagating between the secondary mirror (M2) and the tertiary mirror (M3).

    Projection lens for a microlithographic projection exposure apparatus
    20.
    发明申请
    Projection lens for a microlithographic projection exposure apparatus 失效
    用于微光刻投影曝光装置的投影透镜

    公开(公告)号：US20050018312A1

    公开(公告)日：2005-01-27

    申请号：US10878611

    申请日：2004-06-29

    申请人： Toralf Gruner ,  Hans-Jurgen Mann

    发明人： Toralf Gruner ,  Hans-Jurgen Mann

    IPC分类号： G02B13/14 ,  G02B17/08 ,  G02B27/28 ,  G03F7/20 ,  G03B21/14

    CPC分类号： G02B27/286 ,  G02B13/14 ,  G02B17/08 ,  G02B17/0892 ,  G03F7/70191 ,  G03F7/70225 ,  G03F7/70566

    摘要： A projection lens (10) for a microlithographic projection exposure apparatus has a first optical element, for example a birefringent lens (L2), that has polarization dependent properties causing intensity fluctuations in an image plane of the projection lens. These fluctuation may be produced by a second optical element (24), for example a polarization selective beam splitting layer (28), that is arranged downstream of the first optical element. A gray filter (32; 132; 232) disposed in the beam path reduces the intensity fluctuations.

    摘要翻译： 用于微光刻投影曝光装置的投影透镜（10）具有第一光学元件（例如双折射透镜（L2）），其具有导致投影透镜的图像平面中的强度波动的偏振相关特性。 这些波动可以由布置在第一光学元件下游的第二光学元件（24）产生，例如偏振选择分束层（28）。 设置在光束路径中的灰色滤光器（32; 132; 232）减小了强度波动。