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11.发明申请Lithographic apparatus, device manufacturing method and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US20070070324A1
公开(公告)日：2007-03-29
申请号：US11238157
申请日：2005-09-29
申请人： Jan Jaap Kuit , Peter Schaap
发明人： Jan Jaap Kuit , Peter Schaap
IPC分类号： G03B27/58
CPC分类号： G03F7/70741 , G03F7/7075 , G03F7/70875
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the substrate prior to, during, or both, a transfer of the substrate to the substrate holder to substantially match a temperature of the substrate holder.
摘要翻译： 公开了一种布置成将图案从图案形成结构转印到基板上的光刻设备，其包括被配置为保持基板的基板保持器和被配置为在转印之前，期间或两者期间调节基板的温度的基板温度调节器 的衬底到衬底保持器以基本上匹配衬底保持器的温度。
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公开(公告)号：US09134631B2
公开(公告)日：2015-09-15
申请号：US12407360
申请日：2009-03-19
CPC分类号： G03F7/70891 , G03F7/70533
摘要： In a lithographic apparatus, a control system is provided to automatically reduce throughput in the event that lens-heating aberrations exceed a certain threshold. The determination of whether lens-heating aberrations will exceed the threshold may be based upon a prediction, e.g. using a lens-heating model, or on measurements taken from a previously exposed substrate. Reduction of throughput of the device manufacture may be effected by reducing beam power or the duty cycle of the apparatus. In a particular embodiment, the time taken for substrate movement between exposure portions is increased.
摘要翻译： 在光刻设备中，提供控制系统以在透镜加热像差超过一定阈值的情况下自动降低产量。 透镜加热像差是否超过阈值的确定可以基于预测，例如， 使用透镜加热模型，或从先前曝光的基底获取的测量结果。 可以通过减小装置的光束功率或占空比来实现器件制造的吞吐量的降低。 在特定实施例中，曝光部分之间的衬底移动所花费的时间增加。
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13.发明授权Lithographic apparatus, device manufacturing method, and substrate exchanging method 有权平版印刷设备，器件制造方法和衬底交换方法公开(公告)号：US08947636B2
公开(公告)日：2015-02-03
申请号：US13050667
申请日：2011-03-17
申请人： Theodorus Petrus Maria Cadee , Jan Jaap Kuit , Johannes Catharinus Hubertus Mulkens , Koen Jacobus Johannes Maria Zaal
发明人： Theodorus Petrus Maria Cadee , Jan Jaap Kuit , Johannes Catharinus Hubertus Mulkens , Koen Jacobus Johannes Maria Zaal
CPC分类号： G03B21/58 , G03F7/70733
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 至少三个衬底台，其被构造成保持衬底; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述基板台可在基本上在垂直于所述图案化的辐射束的平面中延伸的公共移动区域中移动，所述移动区域包括至少三个工作 布置其至少一个工作位置的位置用于将衬底暴露于图案化的辐射束，并且至少一个工作位置被布置用于非曝光目的。
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公开(公告)号：US20100178612A1
公开(公告)日：2010-07-15
申请号：US12642610
申请日：2009-12-18
申请人： Johannes ONVLEE , Jan Jaap Kuit , Joost Kos
发明人： Johannes ONVLEE , Jan Jaap Kuit , Joost Kos
CPC分类号： G03B27/54 , G03F9/7065 , G03F9/7088
摘要： A lithographic apparatus includes a support constructed to support a patterning device for imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. A projection system projects the patterned radiation beam onto a target portion of the substrate. The patterning device includes one or more alignment patterns, the lithographic apparatus including a secondary illumination system effective to illuminate each alignment pattern with radiation separate from said radiation beam, the projection system projecting an image of each alignment pattern onto the substrate table. The substrate table includes a number of sensor arrangements, each sensitive to the projected image of one of said alignment patterns.
摘要翻译： 光刻设备包括支撑结构，以支撑图案形成装置，用于在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及构造成保持衬底的衬底台。 投影系统将图案化的辐射束投影到基板的目标部分上。 所述图案形成装置包括一个或多个对准图案，所述光刻设备包括有效地用与所述辐射束分离的辐射来照射每个对准图案的次级照明系统，所述投影系统将每个对准图案的图像投影到所述衬底台上。 衬底台包括多个传感器布置，每个传感器布置对于所述对准图案之一的投影图像敏感。
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公开(公告)号：US20100097586A1
公开(公告)日：2010-04-22
申请号：US12579083
申请日：2009-10-14
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70358
摘要： An immersion lithographic apparatus is provided in which a maximum permissible velocity of the substrate relative to a fluid confinement structure that controls the immersion fluid is determined based on a property of the substrate to be exposed and, during the exposure process, the velocity of the substrate relative to the fluid confinement structure is limited to be below this maximum permissible velocity.
摘要翻译： 提供一种浸没式光刻设备，其中基于待暴露的基板的性质和在曝光过程中基板的速度确定基板相对于控制浸没流体的流体限制结构的最大允许速度 相对于流体限制结构被限制在低于该最大允许速度。
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16.发明授权Lithographic apparatus, device manufacturing method and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07440076B2
公开(公告)日：2008-10-21
申请号：US11238157
申请日：2005-09-29
申请人： Jan Jaap Kuit , Peter Schaap
发明人： Jan Jaap Kuit , Peter Schaap
CPC分类号： G03F7/70741 , G03F7/7075 , G03F7/70875
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the substrate prior to, during, or both, a transfer of the substrate to the substrate holder to substantially match a temperature of the substrate holder.
摘要翻译： 公开了一种布置成将图案从图案形成结构转印到基板上的光刻设备，其包括被配置为保持基板的基板保持器和被配置为在转印之前，期间或两者期间调节基板的温度的基板温度调节器 的衬底到衬底保持器以基本上匹配衬底保持器的温度。
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公开(公告)号：US07345736B2
公开(公告)日：2008-03-18
申请号：US10927532
申请日：2004-08-27
CPC分类号： G03F7/70733 , G03F7/7075
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.
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18.发明授权Lithographic apparatus with disturbance correction system and device manufacturing method 有权具有扰动校正系统和装置制造方法的平版印刷装置公开(公告)号：US07193722B2
公开(公告)日：2007-03-20
申请号：US10747617
申请日：2003-12-30
申请人： Martinus Godefridus Helena Boogaarts , Hans Butler , Henrikus Herman Marie Cox , Martinus Agnes Willem Cuijpers , Jan Jaap Kuit
发明人： Martinus Godefridus Helena Boogaarts , Hans Butler , Henrikus Herman Marie Cox , Martinus Agnes Willem Cuijpers , Jan Jaap Kuit
CPC分类号： G03F7/70808 , G01N21/8851 , G03F7/709
摘要： A lithographic projection apparatus is presented, which includes a housing, which comprises therein a first exposure system that has at least one movable part (e.g. a movable first substrate holder or a movable second substrate holder in a twin stage apparatus). The apparatus also includes a position disturbance correction system for correcting a position of the first substrate holder with respect to the patterned projection beam due to the influence of gas pressure differences or gas movements, caused by movements of the movable part. A related device manufacturing method is also presented in which, during the exposure of a first substrate, the position thereof is corrected by means of position disturbance correction system.
摘要翻译： 提供了一种光刻投影装置，其包括壳体，其中包括第一曝光系统，该第一曝光系统具有至少一个可移动部分（例如，可移动的第一基板支架或双级装置中的可移动的第二基板支架）。 该装置还包括位置扰动校正系统，用于由于可移动部分的运动引起的气体压力差或气体运动的影响，校正第一衬底保持器相对于图案化的投影束的位置。 还提出了一种相关的器件制造方法，其中在第一衬底的曝光期间，其位置通过位置干扰校正系统被校正。
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公开(公告)号：US07136147B2
公开(公告)日：2006-11-14
申请号：US11015765
申请日：2004-12-20
申请人： Jan Jaap Kuit
发明人： Jan Jaap Kuit
CPC分类号： G03F7/70733
摘要： The present invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with an exchangeable object loading station and a support, the exchangeable object handling apparatus including three or more end-effectors each capable of exchanging an exchangeable object with one of the supports. Such lithographic apparatus is in particular suited for the streaming of subsequent double exposure jobs.
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20.发明申请LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND SUBSTRATE EXCHANGING METHOD 有权光刻设备，器件制造方法和基板交换方法公开(公告)号：US20110242518A1
公开(公告)日：2011-10-06
申请号：US13050667
申请日：2011-03-17
申请人： Theodorus Petrus Maria Cadee , Jan Jaap Kuit , Johannes Catharinus Hubertus Mulkens , Koen Jacobus Johannes Maria Zaal
发明人： Theodorus Petrus Maria Cadee , Jan Jaap Kuit , Johannes Catharinus Hubertus Mulkens , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03B27/58
CPC分类号： G03B21/58 , G03F7/70733
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 至少三个衬底台，其被构造成保持衬底; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述基板台可在基本上在垂直于所述图案化的辐射束的平面中延伸的公共移动区域中移动，所述移动区域包括至少三个工作 布置其至少一个工作位置的位置用于将衬底暴露于图案化的辐射束，并且至少一个工作位置被布置用于非曝光目的。
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