公开(公告)号：US08576374B2

公开(公告)日：2013-11-05

申请号：US12393805

申请日：2009-02-26

Applicant: Keith Frank Best ,  Henricus Wilhelmus Maria Van Buel ,  Cheng-Qun Gui ,  Johannes Onvlee ,  Rudy Jan Maria Pellens ,  Remi Daniel Marie Edart ,  Oleg Viacheslavovich Voznyi ,  Pascale Anne Maury

Inventor： Keith Frank Best ,  Henricus Wilhelmus Maria Van Buel ,  Cheng-Qun Gui ,  Johannes Onvlee ,  Rudy Jan Maria Pellens ,  Remi Daniel Marie Edart ,  Oleg Viacheslavovich Voznyi ,  Pascale Anne Maury

IPC: G03B27/68 ,  G03B27/32

CPC classification number: G03F9/7084 ,  G03F7/70633 ,  G03F9/7076 ,  G03F9/708 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

Abstract: According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.

Abstract translation: 根据本发明的第一方面，提供了一种在设置在基板上的层上提供对准标记的光刻方法，所述方法包括在所述层的一定范围内定向的区域上提供对准标记 相对于其上设置有该层的基板的表面。

公开(公告)号：US07714981B2

公开(公告)日：2010-05-11

申请号：US11589300

申请日：2006-10-30

Applicant: Johannes Onvlee ,  Erik Roelof Loopstra

Inventor： Johannes Onvlee ,  Erik Roelof Loopstra

IPC: G03B27/42

CPC classification number: G03F7/70775 ,  G03F1/42 ,  G03F1/44 ,  G03F7/707 ,  G03F9/7011

Abstract: In a lithographic apparatus, a slip of a patterning device relative to a support, the support being constructed to support the patterning device, may be provided by: measuring a position of the support relative to a structure of the lithographic apparatus; measuring a position of the patterning device relative to the structure of the lithographic apparatus; determining a correlation between the position of the patterning device and the position of the support; and deriving from the correlation a slip of the patterning device relative to the support. The structure may include a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. The projection system may be connected to a frame, such as a metrology frame of the lithographic apparatus.

Abstract translation: 在光刻设备中，图案形成装置相对于支撑件的滑动可以通过以下方式来提供：测量支撑件相对于光刻设备的结构的位置; 测量所述图案形成装置相对于所述光刻设备的结构的位置; 确定图案形成装置的位置与支撑件的位置之间的相关性; 并且从相关性导出图案形成装置相对于支撑件的滑移。 该结构可以包括投影系统，以将由图案形成装置图案化的辐射束投影到基板的目标部分上。 投影系统可以连接到诸如光刻设备的计量框架的框架。

公开(公告)号：US07633600B2

公开(公告)日：2009-12-15

申请号：US11262963

申请日：2005-11-01

Applicant: Johannes Onvlee ,  Dirk-Jan Bijvoet

Inventor： Johannes Onvlee ,  Dirk-Jan Bijvoet

IPC: G03B27/62 ,  G03B27/58 ,  G03B27/42

CPC classification number: G03F7/70775 ,  G03F7/70516 ,  G03F7/70716 ,  G03F9/7011

Abstract: A lithographic apparatus has a patterning support holding a patterning device. At least one position sensor measures a position of the patterning device relative to the patterning support, and generates a measuring signal. A positioning device controls a position of the patterning support on the basis of the measuring signal input to the positioning device. In a corresponding device manufacturing method a patterning support is provided. A patterning device is held on the patterning support. The patterning support is moved along a line of movement. A position of the patterning device relative to the patterning support is measured, and a position of the patterning support is controlled on the basis of the measurement of the position of the patterning device relative to the patterning support. Thus, the controlling of the position of the patterning support compensates for a slip of the patterning device relative to the patterning support.

Abstract translation: 光刻设备具有保持图案形成装置的图案形成支撑。 至少一个位置传感器测量图案形成装置相对于图案形成支撑件的位置，并产生测量信号。 定位装置基于输入到定位装置的测量信号来控制图案形成支撑件的位置。 在相应的器件制造方法中，提供了图案形成支撑。 图案形成装置被保持在图案形成支撑件上。 图形支撑沿着移动线移动。 测量图案形成装置相对于图案形成支撑件的位置，并且基于图案形成装置相对于图案形成支撑件的位置的测量来控制图案形成支撑件的位置。 因此，图案形成支撑件的位置的控制补偿图案形成装置相对于图案形成支撑件的滑动。

公开(公告)号：US07349082B2

公开(公告)日：2008-03-25

申请号：US10957752

申请日：2004-10-05

Applicant: Johannes Onvlee ,  Peter Ferdinand Greve ,  Johannes Hendrikus Gertrudis Franssen

Inventor： Johannes Onvlee ,  Peter Ferdinand Greve ,  Johannes Hendrikus Gertrudis Franssen

IPC: G01N21/00

CPC classification number: G03F7/70916 ,  G01N21/94 ,  G01N21/956 ,  G03F7/7085

Abstract: To enable differentiation between a particle and a ghost particle, a detector system is presented. The detector system is configured to output at least two detector signals corresponding to an intensity of radiation being incident on the detector system. If radiation is received from a ghost particle, not all of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a contaminating particle results in all signals having a level above a threshold level. Thus, it may be determined with a high accuracy whether a particle or a ghost particle is redirecting radiation towards the detector system.

Abstract translation: 为了实现粒子和鬼粒子之间的区分，提出了一种检测器系统。 检测器系统被配置为输出对应于入射在检测器系统上的辐射强度的至少两个检测器信号。 如果从重影颗粒接收到辐射，则并非所有至少两个检测器信号都具有高于预定阈值水平的水平，而从污染颗粒接收的辐射导致所有信号具有高于阈值水平的水平。 因此，可以高精度地确定颗粒或重影颗粒是否朝向检测器系统重定向辐射。

公开(公告)号：US07184849B2

公开(公告)日：2007-02-27

申请号：US10852678

申请日：2004-05-25

Applicant: Norbertus Josephus Martinus Van Den Nieuwelaar ,  Johannes Onvlee ,  Roel Boumen ,  Henricus Petrus Johannus Van Lierop ,  Robert Jozef Dumont ,  Jacobus Eelkman Rooda

Inventor： Norbertus Josephus Martinus Van Den Nieuwelaar ,  Johannes Onvlee ,  Roel Boumen ,  Henricus Petrus Johannus Van Lierop ,  Robert Jozef Dumont ,  Jacobus Eelkman Rooda

IPC: G06F19/00

CPC classification number: G05B19/41865 ,  G03F7/70533 ,  G05B2219/32298 ,  G05B2219/32423 ,  G05B2219/45028 ,  Y02P90/20 ,  Y02P90/86

Abstract: A method of planning tasks to be performed in a machine derives a precedence graph by linking subsidiary tasks to a sequence of key tasks to create a scheduling problem that can be solved by an automated scheduler.

Abstract translation: 计划在机器中执行的任务的方法通过将辅助任务链接到一系列关键任务来产生优先图，以创建可由自动调度器解决的调度问题。

公开(公告)号：US07123349B2

公开(公告)日：2006-10-17

申请号：US10797657

申请日：2004-03-11

Applicant: Pieter Johannes Marius Van Groos ,  Pieter Renaat Maria Hennus ,  Jan Frederik Hoogkamp ,  Albert Jan Hendrik Klomp ,  Johannes Onvlee ,  Raimond Visser

Inventor： Pieter Johannes Marius Van Groos ,  Pieter Renaat Maria Hennus ,  Jan Frederik Hoogkamp ,  Albert Jan Hendrik Klomp ,  Johannes Onvlee ,  Raimond Visser

IPC: G03B27/58 ,  G03B27/42

CPC classification number: H01L21/67225 ,  G03F7/70733 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70858 ,  G03F7/70875 ,  G03F7/70991 ,  H01L21/67201

Abstract: The invention relates to a lithographic projection assembly, having at least two load locks for transferring substrates between a first environment and a lower pressure second environment, a substrate handler with a handler chamber within the second environment and a lithographic projection apparatus including a projection chamber. The handler chamber and the projection chamber communicate via a load position for entering a substrate from the handler chanter into the projection chamber and an unload position for removing the substrate from the projection chamber into the handler chamber. The handler chamber also includes pre-processing means for pre-processing of the substrates and transport means for transferring substrates between the load locks and pre-processing means.

Abstract translation: 本发明涉及一种光刻投影组件，其具有至少两个用于在第一环境和较低压力的第二环境之间传送衬底的负载锁，在第二环境内具有处理室的衬底处理器以及包括投影室的光刻投影设备。 处理器室和投影室通过负载位置连通，用于从处理器进入投影室进入基板，以及卸载位置，用于将基板从投影室移除到处理室中。 处理室还包括用于预处理基板的预处理装置和用于在装载锁和预处理装置之间传送基板的传送装置。

公开(公告)号：US20060197929A1

公开(公告)日：2006-09-07

申请号：US11418146

申请日：2006-05-05

Applicant: Norbertus Van Den Nieuwelaar ,  Johannes Onvlee ,  Roel Boumen

Inventor： Norbertus Van Den Nieuwelaar ,  Johannes Onvlee ,  Roel Boumen

IPC: G03B27/42

CPC classification number: G03D5/00 ,  G03F7/70525 ,  G03F7/70991 ,  Y10S414/135 ,  Y10S414/14

Abstract: A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus.

Abstract translation: 本文提出了一种控制光刻设备装置中的轨道装置的方法。 光刻池包括被配置为暴露衬底的光刻曝光装置和配置成在曝光之前制备衬底并在曝光之后显影衬底的轨道装置。 该方法包括预测光刻曝光装置将可用于接收用于从轨道装置曝光的准备的基板的时间，以及调整轨道装置准备基板的速率，使得基板准备在时间上被光刻接受 曝光装置

公开(公告)号：US20050185952A1

公开(公告)日：2005-08-25

申请号：US10781945

申请日：2004-02-20

Applicant: Norbertus Van Den Nieuwelaar ,  Johannes Onvlee ,  Roel Boumen

Inventor： Norbertus Van Den Nieuwelaar ,  Johannes Onvlee ,  Roel Boumen

IPC: H01L21/027 ,  G03D5/00

CPC classification number: G03D5/00 ,  G03F7/70525 ,  G03F7/70991 ,  Y10S414/135 ,  Y10S414/14

Abstract: A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method comprises predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.

Abstract translation: 本文提出了一种控制光刻设备装置中的轨道装置的方法。 光刻池包括被配置为暴露衬底的光刻曝光装置和配置成在曝光之前制备衬底并在曝光之后显影衬底的轨道装置。 该方法包括预测光刻曝光装置将可用于接收用于从轨道装置曝光的准备的基板的时间，以及调整轨道装置准备基板的速率，使得基板准备在时间上被光刻接受 曝光装置 通过调整轨迹速率使得基板准备就绪，就像平版印刷曝光设备所需要的那样，轨迹中的缓冲器的使用可以被大大地避免甚至完全消除。

公开(公告)号：US09235140B2

公开(公告)日：2016-01-12

申请号：US13579539

申请日：2011-02-18

Applicant: Erwin John Van Zwet ,  Pieter Willem Herman De Jager ,  Johannes Onvlee ,  Erik Christiaan Fritz

Inventor： Erwin John Van Zwet ,  Pieter Willem Herman De Jager ,  Johannes Onvlee ,  Erik Christiaan Fritz

IPC: G03B27/54 ,  G03F7/20

CPC classification number: G03F7/704 ,  G03F7/70275 ,  G03F7/70391

Abstract: A lithographic apparatus having an optical column capable of projecting a beam on a target portion on a substrate held by the substrate support. The optical column may have a self-emissive contrast device to emit the beam. The optical column may include a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.

Abstract translation: 一种光刻设备，其具有能够将基板支撑体保持的基板上的目标部分上的光束投射的光学列。 光学柱可以具有发射光束的自发射对比度装置。 光学柱可以包括将光束投影到目标部分上的投影系统。 目标部分具有基板的扫描方向的高度和主要垂直于扫描方向的切线宽度，其中基板沿扫描方向除以高度的扫描速度基本上对应于光学柱的转速或 其一部分除以目标部分的切线宽度。

公开(公告)号：US20130021593A1

公开(公告)日：2013-01-24

申请号：US13582725

申请日：2011-03-14

Applicant: Johannes Onvlee ,  Robert-Han Munnig Schmidt

Inventor： Johannes Onvlee ,  Robert-Han Munnig Schmidt

IPC: G03B27/58 ,  B65G54/00 ,  B65G49/06

CPC classification number: G03F7/70258 ,  B65H23/245 ,  B65H2406/311 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70391 ,  G03F7/70525 ,  G03F7/70583 ,  G03F7/707 ,  G03F7/70775 ,  G03F7/70816

Abstract: A substrate handling apparatus for handling a substrate is disclosed. The substrate handling apparatus includes a substrate feeding device to feed the substrate towards an exposure area, a substrate receiving device to receive the substrate from the exposure area, and a substrate stabilization device to maintain, at least in the exposure area, the substrate substantially flat at an exposure height and/or tilt, the substrate stabilization device configured for contactless stabilization of the flexible substrate.

Abstract translation: 公开了一种用于处理基板的基板处理装置。 基板处理装置包括：基板馈送装置，用于将基板馈送到曝光区域;基板接收装置，用于从曝光区域接收基板;以及基板稳定装置，至少在曝光区域中基板保持基本平坦 在曝光高度和/或倾斜下，所述基板稳定装置被配置用于柔性基板的非接触式稳定。