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    Lithographic apparatus with disturbance correction system and device manufacturing method
    1.
    发明授权
    Lithographic apparatus with disturbance correction system and device manufacturing method 有权
    具有扰动校正系统和装置制造方法的平版印刷装置

    公开(公告)号：US07193722B2

    公开(公告)日：2007-03-20

    申请号：US10747617

    申请日：2003-12-30

    申请人： Martinus Godefridus Helena Boogaarts ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Martinus Agnes Willem Cuijpers ,  Jan Jaap Kuit

    发明人： Martinus Godefridus Helena Boogaarts ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Martinus Agnes Willem Cuijpers ,  Jan Jaap Kuit

    IPC分类号： G01B9/02 ,  G03B27/68

    CPC分类号： G03F7/70808 ,  G01N21/8851 ,  G03F7/709

    摘要： A lithographic projection apparatus is presented, which includes a housing, which comprises therein a first exposure system that has at least one movable part (e.g. a movable first substrate holder or a movable second substrate holder in a twin stage apparatus). The apparatus also includes a position disturbance correction system for correcting a position of the first substrate holder with respect to the patterned projection beam due to the influence of gas pressure differences or gas movements, caused by movements of the movable part. A related device manufacturing method is also presented in which, during the exposure of a first substrate, the position thereof is corrected by means of position disturbance correction system.

    摘要翻译： 提供了一种光刻投影装置，其包括壳体，其中包括第一曝光系统，该第一曝光系统具有至少一个可移动部分（例如，可移动的第一基板支架或双级装置中的可移动的第二基板支架）。 该装置还包括位置扰动校正系统，用于由于可移动部分的运动引起的气体压力差或气体运动的影响，校正第一衬底保持器相对于图案化的投影束的位置。 还提出了一种相关的器件制造方法，其中在第一衬底的曝光期间，其位置通过位置干扰校正系统被校正。

    Measurement method, device manufacturing method and lithographic apparatus
    2.
    发明授权
    Measurement method, device manufacturing method and lithographic apparatus 有权
    测量方法，器件制造方法和光刻设备

    公开(公告)号：US07227614B2

    公开(公告)日：2007-06-05

    申请号：US10986180

    申请日：2004-11-12

    申请人： Hans Butler ,  Martinus Godefridus Helena Boogaarts

    发明人： Hans Butler ,  Martinus Godefridus Helena Boogaarts

    IPC分类号： G03B27/42

    CPC分类号： G03F9/7003 ,  G03F7/70725 ,  G03F9/7034

    摘要： To increase a measurement range of a measurement system taking measurement samples of an object moving with respect to said measurement system, the measurement system is configured to take measurement samples at different sample positions while the object accelerates with respect to the measurement system. In particular, a measurement timing for taking samples is determined corresponding to a selected acceleration and velocity of the object as a function of time with respect to the measurement system.

    摘要翻译： 为了增加测量系统的测量范围，该测量系统测量相对于所述测量系统移动的物体的测量样本，测量系统被配置为在对象相对于测量系统加速的同时在不同的采样位置拍摄测量样本。 特别地，对应于对象的所选加速度和速度，相对于测量系统作为时间的函数来确定取样的测量定时。

    Positioning system, a lithographic apparatus and a method for positional control
    6.
    发明授权
    Positioning system, a lithographic apparatus and a method for positional control 有权
    定位系统，光刻设备和位置控制方法

    公开(公告)号：US09229339B2

    公开(公告)日：2016-01-05

    申请号：US13301505

    申请日：2011-11-21

    申请人： Hans Butler ,  Henrikus Herman Marie Cox

    发明人： Hans Butler ,  Henrikus Herman Marie Cox

    IPC分类号： G03F7/20 ,  G03B27/53 ,  G03B27/58

    CPC分类号： G03F7/70775 ,  G03B27/53 ,  G03B27/58 ,  G03F7/70725

    摘要： A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.

    摘要翻译： 一种用于控制光刻设备的第一部件和第二部件之间的相对位置的定位系统，其中每个部件的位置由一组正交坐标定义，所述定位系统包括：测量装置，其被配置为确定 相对于测量坐标中的设定点位置的部件之一的瞬时位置; 以及控制器，被配置为基于所确定的误差来控制所述另一部件在控制坐标中的移动; 其中测量坐标与控制坐标不同。

    Lithographic apparatus having a controlled motor, and motor control system and method
    10.
    发明授权
    Lithographic apparatus having a controlled motor, and motor control system and method 失效
    具有受控电机的光刻设备，以及电机控制系统和方法

    公开(公告)号：US07468589B2

    公开(公告)日：2008-12-23

    申请号：US11331337

    申请日：2006-01-13

    申请人： Henrikus Herman Marie Cox ,  Hans Butler ,  Sven Antoin Johan Hol

    发明人： Henrikus Herman Marie Cox ,  Hans Butler ,  Sven Antoin Johan Hol

    IPC分类号： H02K41/00

    CPC分类号： H02P25/06

    摘要： A lithographic apparatus includes an illumination system to condition a radiation beam. A patterning support holds a patterning device that imparts the radiation beam with a pattern to form a patterned radiation beam. A substrate support holds a substrate. A projection system projects the patterned radiation beam onto the substrate. A positioning system positions the patterning support and the substrate support. The positioning system has a motor with a stator and a mover coupled to a support, and an associated motor control system with a controller providing an output for controlling currents applied to the motor. The motor control system determines a controller output required to compensate for a weight of mover and associated support, determines a deviation of this output from an output required to compensate the gravity force acting on the mover and associated support, and corrects the currents applied to the motor based on the deviation.

    摘要翻译： 光刻设备包括用于调节辐射束的照明系统。 图案形成支撑件保持图案形成装置，其使得辐射束具有图案以形成图案化的辐射束。 衬底支撑件保持衬底。 投影系统将图案化的辐射束投射到衬底上。 定位系统定位图形支撑件和基板支撑件。 定位系统具有带有定子的电动机和耦合到支撑件的动子，以及具有控制器的相关联的电动机控制系统，该控制器提供用于控制施加到电动机的电流的输出。 电动机控制系统确定需要补偿动力和相关支撑的重量的控制器输出，确定该输出与补偿作用在动子和相关支撑上的重力所需的输出的偏差，并校正施加到 电机基于偏差。