公开(公告)号：US20120203030A1

公开(公告)日：2012-08-09

申请号：US13367762

申请日：2012-02-07

申请人： Jung Hoon OH ,  Dae Kyung Yoon ,  Yong Hwa Hong ,  Seung Duk Cho

发明人： Jung Hoon OH ,  Dae Kyung Yoon ,  Yong Hwa Hong ,  Seung Duk Cho

IPC分类号： C07C309/19 ,  C07C309/10 ,  C07C303/22 ,  C07C309/24

CPC分类号： C07C309/10 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  G03F7/00 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397

摘要： A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.

摘要翻译： 提供由下式（1）表示的光致酸发生剂，光酸产生剂的制造方法和含有光酸产生剂的抗蚀剂组合物。 其中，在式（1）中，Y，X，R1，R2，n1，n2和A +具有与本发明的详细说明中所定义的相同的含义。 光致酸发生器可以在ArF液浸光刻时保持适当的接触角，可以减少液浸光刻过程中发生的缺陷，并且在抗蚀剂溶剂中具有优异的溶解性和与树脂的相容性优异。 此外，光致酸产生剂可以通过使用工业上容易获得的环氧化合物的有效且简单的方法制备。

公开(公告)号：US08158327B2

公开(公告)日：2012-04-17

申请号：US12321111

申请日：2009-01-15

申请人： Hyun-Sang Joo ,  Joo-Hyeon Park ,  Jung-Hoon Oh ,  Dae-Hyeon Shin

发明人： Hyun-Sang Joo ,  Joo-Hyeon Park ,  Jung-Hoon Oh ,  Dae-Hyeon Shin

IPC分类号： G03F7/004 ,  G03F7/30 ,  C08F228/02

CPC分类号： C07C381/12 ,  C07C309/12 ,  C08F20/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： A compound represented by the following formula (1) is provided: wherein R1 represents a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group; and A represents a group represented by the following formula (2) or formula (3): wherein R2, R3, R4, R5 and R6 each independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted allyl group, a substituted or unsubstituted perfluoroalkyl group, a substituted or unsubstituted benzyl group, or a substituted or unsubstituted aryl group; and two or more of R2, R3 and R4 may be linked to each other to form a saturated or unsaturated carbon ring or a saturated or unsaturated heterocyclic ring. The chemically amplified resist composition comprising a polymer compound which is produced from the compound of formula 1 according to the present invention provides a chemically amplified resist sensitive to far-ultraviolet radiation, which is represented by KrF excimer laser or ArF excimer laser.

摘要翻译： 提供由下式（1）表示的化合物：其中R1表示氢原子，三氟甲基，烷基或烷氧基; A表示由下式（2）或式（3）表示的基团：其中R 2，R 3，R 4，R 5和R 6各自独立地表示取代或未取代的烷基，取代或未取代的烯丙基，取代或未取代的 取代或未取代的苄基或取代或未取代的芳基; R2，R3和R4中的两个或多个可以彼此连接形成饱和或不饱和的碳环或饱和或不饱和的杂环。 包含由根据本发明的式1化合物制备的高分子化合物的化学放大抗蚀剂组合物提供对由KrF准分子激光器或ArF准分子激光器表示的远紫外辐射敏感的化学放大抗蚀剂。

公开(公告)号：US08026390B2

公开(公告)日：2011-09-27

申请号：US12384191

申请日：2009-04-01

申请人： Jung-Hoon Oh ,  Dong-Cheol Seo ,  Jin-Bong Shin

发明人： Jung-Hoon Oh ,  Dong-Cheol Seo ,  Jin-Bong Shin

IPC分类号： C07C309/00

CPC分类号： C07C25/18 ,  C07C309/08 ,  C07C309/12 ,  C07C313/04 ,  C07C323/52 ,  C07C381/12 ,  C07C2601/08 ,  C07C2603/08 ,  C07C2603/18 ,  C07C2603/24 ,  C07C2603/26 ,  C07D311/84 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

摘要： An acid generator represented by the following formula (1) is provided: wherein X represents an alkylene group having 1 to 10 carbon atoms, —X1—O—X2—, or a heteroatom selected from the group consisting of nitrogen, sulfur and fluorine; X1 and X2 each independently represent an alkylene group having 1 to 10 carbon atoms; Y represents a cyclic hydrocarbon group having 5 to 30 carbon atoms and containing one or more aromatic rings, while one or more hydrogen atoms on the ring of the cyclic hydrocarbon group may be substituted by one or more members selected from the group consisting of —O—Y1, —CO—Y2, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a perfluoroalkyl group having 1 to 4 carbon atoms, a perfluoroalkoxy group having 1 to 4 carbon atoms, a hydroxyalkyl group having 1 to 6 carbon atoms, a halogen atom, a hydroxyl group and a cyano group; Y1 and Y2 each independently represent an alkyl group having 1 to 6 carbon atoms; n represents an integer of 0 or 5; and A+ represents an organic counterion.

摘要翻译： 提供由下式（1）表示的酸发生剂：其中X表示碳原子数1〜10的亚烷基，-X 1 -O-X 2 - 或选自氮，硫和氟的杂原子; X1和X2各自独立地表示碳原子数1〜10的亚烷基。 Y表示碳原子数为5〜30的环状烃基，含有一个以上的芳香环，环状烃基的环上的一个以上的氢原子可以被选自-O〜 -Y1，-CO-Y2，碳原子数1〜6的烷基，碳原子数1〜6的烷氧基，碳原子数1〜4的全氟烷基，碳原子数1〜4的全氟烷氧基， 具有1至6个碳原子的基团，卤素原子，羟基和氰基; Y1和Y2各自独立地表示碳原子数1〜6的烷基。 n表示0或5的整数; A +代表有机抗衡离子。

公开(公告)号：US20100143843A1

公开(公告)日：2010-06-10

申请号：US12416988

申请日：2009-04-02

申请人： Jung Hoon OH ,  Sang Jin KIM ,  Jin Ho KIM ,  Dae Hyeon SHIN

发明人： Jung Hoon OH ,  Sang Jin KIM ,  Jin Ho KIM ,  Dae Hyeon SHIN

IPC分类号： G03F7/20 ,  C07C69/65 ,  C07C69/52 ,  C07C69/618 ,  C07C69/74 ,  C08F14/18 ,  G03F7/004

CPC分类号： C07C381/12 ,  C07C309/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C08F220/18 ,  C08F220/28 ,  C08F220/32 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

摘要： Disclosed are a photoacid generator, a copolymer, a chemically amplified resist composition, and a method of forming a pattern using the chemically amplified resist composition. The photoacid is connected with a main chain of the copolymer, whereby the photoacid is equally dispersed within a resist layer, and characteristics of line edge roughness of a resist pattern is improved.

摘要翻译： 公开了光致酸产生剂，共聚物，化学放大抗蚀剂组合物，以及使用化学放大抗蚀剂组合物形成图案的方法。 光致酸与共聚物的主链连接，光致酸等均分散在抗蚀剂层中，抗蚀剂图案的线边缘粗糙度的特性提高。

公开(公告)号：US20100033387A1

公开(公告)日：2010-02-11

申请号：US12499177

申请日：2009-07-08

申请人： Jung Hoon Oh ,  Yong Ho Noh ,  Tae-Heon Kim ,  Ho-Sung Choo ,  Woo-Jun Kang

发明人： Jung Hoon Oh ,  Yong Ho Noh ,  Tae-Heon Kim ,  Ho-Sung Choo ,  Woo-Jun Kang

IPC分类号： H01Q1/32 ,  G01R29/10

CPC分类号： H01Q7/00 ,  H01Q1/1271 ,  H01Q5/40

摘要： The present invention relates to a method of tuning a glass antenna that is capable of analyzing the sensitivity of each point, and forming a structure of a glass antenna by making use of a common simulation tool so as to perform tuning depending on a priority that is determined by data obtained by analyzing the sensitivity.

摘要翻译： 本发明涉及一种调谐能够分析每个点的灵敏度的玻璃天线的方法，并且通过使用通用的模拟工具来形成玻璃天线的结构，以便根据优先级进行调谐 由通过分析灵敏度获得的数据确定。

公开(公告)号：US20090291390A1

公开(公告)日：2009-11-26

申请号：US12231814

申请日：2008-09-05

申请人： Sung-Do Jung ,  Jin-Ho Kim ,  Jung-Hoon Oh ,  Hyun-Soon Lim

发明人： Sung-Do Jung ,  Jin-Ho Kim ,  Jung-Hoon Oh ,  Hyun-Soon Lim

IPC分类号： G03F7/004 ,  C07C305/00

CPC分类号： C07C309/68 ,  C07C329/06 ,  C07C381/12 ,  C07C2602/42 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041

摘要： An acid generating agent represented by the following formula (1) or (2) is provided, which is included in chemically amplified resist compositions: wherein in the formula (1) and (2), X represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms and selected from alkyl, haloalkyl and alkylsulfonyl, which may have at least one hydrogen atom substituted by an ether group, an ester group, a carbonyl group, an acetal group, a nitrile group, a cyano group, a hydroxyl group, a carboxyl group or an aldehyde group, or represents a perfluoroalkyl group having 1 to 4 carbon atoms; R6 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a heteroatom selected from nitrogen, sulfur, fluorine and oxygen; m is an integer from 0 to 2; and A+ is an organic counterion.

摘要翻译： 提供了由下列通式（1）或（2）表示的酸产生剂，其包括在化学放大型抗蚀剂组合物中：其中在式（1）和（2）中，X表示未取代或取代的具有1 20个碳原子，选自烷基，卤代烷基和烷基磺酰基，其可以具有至少一个被醚基取代的氢原子，酯基，羰基，缩醛基，腈基，氰基，羟基 ，羧基或醛基，或者表示碳原子数1〜4的全氟烷基。 R 6表示碳原子数1〜10的烷基，碳原子数1〜10的烷氧基或氮，硫，氟和氧的杂原子。 m为0〜2的整数; 而A +是一种有机的抗衡离子。

公开(公告)号：US20090234155A1

公开(公告)日：2009-09-17

申请号：US12214429

申请日：2008-06-19

申请人： Jung-Hoon Oh ,  Dong-Cheol Seo ,  Hyun-Sang Joo ,  Chang-Soo Lee

发明人： Jung-Hoon Oh ,  Dong-Cheol Seo ,  Hyun-Sang Joo ,  Chang-Soo Lee

IPC分类号： C07C309/19 ,  C07C309/02 ,  C07C309/24

CPC分类号： C07C309/12 ,  C07C25/18 ,  C07C43/225 ,  C07C69/712 ,  C07C309/08 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/28 ,  C07C2602/42 ,  C07C2603/74 ,  C07C2603/86 ,  C07D333/46

摘要： An acid generating agent used for chemically amplified resist compositions is provided, which agent is represented by the following formula (1): wherein X represents a monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and having at least one hydrogen atom on the ring substituted by an alkyl or alkoxy group which and may be unsubstituted or substituted with a group selected from an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group and an aldehyde group, or by a perfluoroalkyl group, a hydroxyalkyl group, or a cyano group; R6 is an alkyl group, an alkoxy group, or a heteroatom selected from the group consisting of N, S and F; m is an integer from 0 to 2; and A+ is an organic counterion.

摘要翻译： 提供了用于化学放大抗蚀剂组合物的酸产生剂，该试剂由下式（1）表示：其中X表示具有3至30个碳原子的单环或多环烃基，并且其上具有至少一个氢原子 可被未取代的或被选自醚基，酯基，羰基，缩醛基，环氧基，腈基和醛基中的基团取代的烷基或烷氧基取代的环，或由 全氟烷基，羟烷基或氰基; R6是烷基，烷氧基或选自N，S和F的杂原子; m为0〜2的整数; 而A +是一种有机的抗衡离子。

公开(公告)号：US06580380B2

公开(公告)日：2003-06-17

申请号：US10058333

申请日：2002-01-30

申请人： Jung-Hoon Oh ,  Byeong-Hwan Cho

发明人： Jung-Hoon Oh ,  Byeong-Hwan Cho

IPC分类号： H03M110

CPC分类号： H03M1/109 ,  H03M1/12

摘要： A tester and method for testing linearity of an analog to digital converter without being influenced by noise, includes a controller that outputs a sampling frequency clock to convert an analog signal into a digital signal, that digitally filters the digitized code value, that generates a histogram responsive to the filtered digitized code value according to a predetermined program, and that controls display of the histogram; a signal generator that generates ground voltage and a triangular wave signal; an analog to digital converter that converts the analog triangular wave signal generated by the signal generator into a digital signal and that outputs the digital signal; a memory that stores the digitized code value converted by the analog to digital converter under control of the controller; and a display that displays the histogram related to the digitally filtered code value generated under control of the controller.

公开(公告)号：US08889901B2

公开(公告)日：2014-11-18

申请号：US13367762

申请日：2012-02-07

申请人： Jung Hoon Oh ,  Dae Kyung Yoon ,  Yong Hwa Hong ,  Seung Duk Cho

发明人： Jung Hoon Oh ,  Dae Kyung Yoon ,  Yong Hwa Hong ,  Seung Duk Cho

IPC分类号： C07C309/10 ,  G03F7/00 ,  C07C381/12 ,  G03F7/039 ,  G03F7/004

CPC分类号： C07C309/10 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  G03F7/00 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397

摘要： A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.

摘要翻译： 提供由下式（1）表示的光致酸发生剂，光酸产生剂的制造方法和含有光酸产生剂的抗蚀剂组合物。 其中，在式（1）中，Y，X，R1，R2，n1，n2和A +具有与本发明的详细说明中所定义的相同的含义。 光致酸发生器可以在ArF液浸光刻时保持适当的接触角，可以减少液浸光刻过程中发生的缺陷，并且在抗蚀剂溶剂中具有优异的溶解性和与树脂的相容性优异。 此外，光致酸产生剂可以通过使用工业上容易获得的环氧化合物的有效且简单的方法制备。

公开(公告)号：US08648659B2

公开(公告)日：2014-02-11

申请号：US13329824

申请日：2011-12-19

申请人： Jung-Hoon Oh ,  Joon-Hyung Kim ,  Gweon-Do Jo ,  Young-Hoon Kim

发明人： Jung-Hoon Oh ,  Joon-Hyung Kim ,  Gweon-Do Jo ,  Young-Hoon Kim

IPC分类号： H03F1/26

CPC分类号： H03F1/0266 ,  H03F1/3247 ,  H03F3/24 ,  H03F2200/102 ,  H04L27/368

摘要： A digital pre-distortion (DPD) power amplifying apparatus and a method for digitally controlling synchronization of the DPD power amplifying apparatus, which includes a power amplifier, a bias shifter and a DPD unit, are provided. The method includes acquiring a DPD path delay time at a path along which an input signal is fed back to the DPD unit; delaying an input signal incoming to the power amplifier by the DPD path delay time and acquiring synchronization by delaying a bias signal a predetermined number of times until the bias signal and the delayed input signal are synchronized with each other; and in response to synchronization between the bias signal and the delayed input signal being established, pre-distorting the input signal according to a feedback signal output from the power amplifier.

摘要翻译： 提供了数字预失真（DPD）功率放大装置和用于数字控制DPD功率放大装置的同步的方法，其包括功率放大器，偏置移位器和DPD单元。 该方法包括在输入信号被反馈到DPD单元的路径处获取DPD路径延迟时间; 延迟通过DPD路径延迟时间输入到功率放大器的输入信号，并通过将偏置信号延迟预定次数获得同步，直到偏置信号和延迟的输入信号彼此同步; 并且响应于所建立的偏置信号和延迟的输入信号之间的同步，根据从功率放大器输出的反馈信号对输入信号进行预失真。