Method of manufacturing a metal hybrid, heat-dissipating material

    公开(公告)号:US11383297B2

    公开(公告)日:2022-07-12

    申请号:US16400412

    申请日:2019-05-01

    Abstract: A method of manufacturing a metal hybrid, heat-dissipating material includes the steps of (a) preparing a spherical metal powder and a flake graphite powder having an aspect ratio greater than 1, respectively; (b) preparing a powder mixture by inserting only the spherical metal powder and the flake graphite powder into a container, followed by dry mixing the powder mixture using a multi-axial mixing method for rotating or vibrating the container about two or more different rotation axes without any liquid input and without any mixing aids; (c) manufacturing a green compact by pressing the powder mixture; and (d) sintering the green compact to provide the metal hybrid, heat-dissipating material.

    DIELECTRIC SUBSTANCE-ELECTRODE ASSEMBLY AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20220166001A1

    公开(公告)日:2022-05-26

    申请号:US17388010

    申请日:2021-07-29

    Abstract: Disclosed are a dielectric substance-electrode assembly in which an electrode is coated with a dielectric and a method for manufacturing the same. The dielectric substance-electrode assembly is formed by forming a lower dielectric electrode constituting a lower portion of an assembly body, sealing a capsule filled with a treated powder and a lower dielectric in which an electrode is formed, and forming an upper dielectric constituting an upper portion of the assembly body using the treated powder which is diffused on and bonded to surfaces of the lower dielectric and the electrode due to sintering heat treatment which is performed by applying an isostatic pressure in a state in which the sealed capsule is placed in a pressure vessel of a heat treatment equipment.

    CHEMICAL MECHANICAL POLISHING PAD HAVING PATTERN SUBSTRATE

    公开(公告)号:US20220134507A1

    公开(公告)日:2022-05-05

    申请号:US17536358

    申请日:2021-11-29

    Abstract: The present invention relates to a chemical mechanical polishing pad having a pattern structure. The configuration of the present invention provides a chemical mechanical polishing pad having a pattern structure including a polishing pad configured to polish a wafer placed thereon; and a plurality of figure units formed on the polishing pad and formed to protrude from an upper portion of the polishing pad. The figure units are formed to have a predetermined contact area ratio and a predetermined circumferential length per unit area which correspond to a target polishing characteristic.

    MULTI-PROBER CHUCK ASSEMBLY AND CHANNEL

    公开(公告)号:US20220034960A1

    公开(公告)日:2022-02-03

    申请号:US17297657

    申请日:2019-11-25

    Abstract: A multi-prober chuck assembly and channel are provided. The multi-prober chuck assembly, according to one embodiment of the present invention, comprises: a chuck for supporting a wafer; a probe card structure coupled to the top part of the chuck; a heater for heating the chuck under the chuck; a conductive guard plate spaced apart from the heater below the heater; and a body part positioned under the chuck so that the heater and the guard plate are positioned inside the body part, wherein the probe card structure and the body part are coupled mechanically to form a cartridge-type structure.

    MACHINING DEVICE FOR CONTROLLING TOOL POSITION CONSIDERING TOOL WEAR AND METHOD FOR CONTROLLING TOOL POSITION USING THE SAME

    公开(公告)号:US20210402542A1

    公开(公告)日:2021-12-30

    申请号:US17295430

    申请日:2019-11-18

    Abstract: An embodiment of the present invention provides a machining system that can lengthen the lifespan of a tool and improve the machining quality of a workpiece by managing the amount of wear of the tool by machining the workpiece using the other portion of the tool when a portion of the tool is worn and the machining performance of the tool is decreased. The machining device for controlling a tool position considering tool wear according to an embodiment of the present invention includes: a tool-moving unit coupled to the machining unit and moving the machining unit to change the position of the tool with respect to the workpiece; a supporting unit supporting the workpiece and moving the workpiece to change the position of the workpiece with respect to the tool; a sensor unit disposed at the machining unit and measuring a current amount, which is supplied to a machining motor operating the tool, or an operation force of the tool; and a control unit receiving a measurement signal from the sensor unit and transmitting a control signal to the tool-moving unit and the supporting unit.

    Moisture adsorption composition, a method of preparing the same, and a surface coating including the same

    公开(公告)号:US11161089B2

    公开(公告)日:2021-11-02

    申请号:US15750613

    申请日:2016-09-28

    Abstract: A moisture adsorption composition that is a vacuum dried powder, that is a metal chloride-impregnated, nanoporous material including a crystallization reaction product of an aluminum precursor and a dicarboxylic acid organic ligand having an average particle diameter of 100 to 2,000 nm, a pore size of 0.6 to 1.7 nm, and a maximum moisture adsorption amount of from 0.2 to 0.9 g/g within a driving pressure (P/P0) that ranges from 0.1 to 0.3. The composition is prepared by synthesizing the nanoporous material by a crystallization reaction between the aluminum precursor and the dicarboxylic acid organic ligand; heat-treating to purify the nanoporous material; impregnating the nanoporous material by mixing with a metal chloride solution in water having a weight ratio of the metal chloride to the nanoporous material of 10:2.5 to 10:50; drying the mixture; crushing the dried product; and vacuum drying the crushed product to provide the moisture adsorption composition.

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