公开(公告)号：US20120293786A1

公开(公告)日：2012-11-22

申请号：US13564419

申请日：2012-08-01

申请人： Damian Fiolka ,  Manfred Maul ,  Markus Schwab ,  Wolfgang Seitz ,  Olaf Dittmann

发明人： Damian Fiolka ,  Manfred Maul ,  Markus Schwab ,  Wolfgang Seitz ,  Olaf Dittmann

IPC分类号： G03F7/20 ,  G03B27/72

CPC分类号： G03F7/70191 ,  G02B3/0056 ,  G02B5/1876 ,  G02B27/283 ,  G02B27/285 ,  G02B27/286 ,  G03F7/70566

摘要： The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%.

摘要翻译： 本公开涉及一种微光刻投影曝光装置的照明系统。 照明系统可以包括去极化器，其与在光传播方向上设置的下游的光混合系统相结合，至少部分地导致撞击在去极化器上的偏振光的有效去极化。 照明系统还可以包括在光传播方向上布置在光混合系统的上游的微透镜阵列。 微透镜阵列可以包括以周期布置的多个微透镜。 去极化器可以被配置为使得通过去极化器的相互作用提供的贡献与微透镜阵列的周期性对在光传播方向上布置在微透镜阵列的下游的光瞳面中发生的残留极化分布产生的贡献具有最大的偏振度 不超过5％。

公开(公告)号：US20110069296A1

公开(公告)日：2011-03-24

申请号：US12946380

申请日：2010-11-15

申请人： Toralf GRUNER ,  Daniel KRAEHMER ,  Michael TOTZECK ,  Johannes WANGLER ,  Markus BROTSACK ,  Nils DIECKMANN ,  Aksel GOEHNERMEIER ,  Markus SCHWAB ,  Damian FIOLKA ,  Markus ZENZINGER

发明人： Toralf GRUNER ,  Daniel KRAEHMER ,  Michael TOTZECK ,  Johannes WANGLER ,  Markus BROTSACK ,  Nils DIECKMANN ,  Aksel GOEHNERMEIER ,  Markus SCHWAB ,  Damian FIOLKA ,  Markus ZENZINGER

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。

公开(公告)号：US07808615B2

公开(公告)日：2010-10-05

申请号：US11427183

申请日：2006-06-28

申请人： Toralf Gruner ,  Olaf Conradi ,  Nils Dieckmann ,  Markus Schwab ,  Olaf Dittmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Vladimir Kamenov

发明人： Toralf Gruner ,  Olaf Conradi ,  Nils Dieckmann ,  Markus Schwab ,  Olaf Dittmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Vladimir Kamenov

IPC分类号： G03B27/54 ,  G03B27/32

CPC分类号： G03F7/70958 ,  G02B13/143 ,  G02B17/0856 ,  G02B17/0892 ,  G02B27/0012 ,  G03F7/70091

摘要： The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in an image plane (8). The object (5) is illuminated with light of an operating wavelength of the projection exposure apparatus according to one of several adjustable exposure modes. The light produces changes in at least one optical element (9) of the projection exposure apparatus, by which the optical properties of the projection exposure apparatus are influenced. The operation of the projection exposure apparatus makes allowance for the influencing of the optical properties of the projection exposure apparatus or a quantity dependent on the former, being calculated approximately on the basis of the exposure mode used and the structure of the object (5).

摘要翻译： 本发明涉及一种用于操作投影曝光装置以将布置在物平面（6）中的物体（5）的结构的图像投影到布置在图像平面（8）中的基板（10）上的方法。 根据多种可调曝光模式之一，物体（5）被投影曝光装置的工作波长的光照射。 该光在投影曝光装置的至少一个光学元件（9）中产生变化，由此影响投影曝光装置的光学特性。 投影曝光装置的操作允许基于所使用的曝光模式和对象（5）的结构大致计算投影曝光装置的光学特性或取决于前者的光学特性的影响。

公开(公告)号：US07423871B2

公开(公告)日：2008-09-09

申请号：US10579379

申请日：2003-11-14

申请人： Markus Schwab

发明人： Markus Schwab

IPC分类号： H05K7/20 ,  F28F7/00

CPC分类号： H05K7/20918

摘要： The casing of a power supply includes a bottom and a cover. Both of them have a U-like shape. Since the cover is slightly wider than the bottom two air ducts are provided between the side plates of the bottom and the corresponding side plates of the cover respectively. A printed circuit board is mounted within the casing, particularly on the bottom. Different mechanical, electric and/or electronic components are mounted on the printed circuit board. Furthermore, heat generating components are mounted on the printed circuit board such that they are in right contact with the side plates of the bottom. The waste heat generated by the components is transferred to the side plates of the bottom and further on to the cover and its side plates. From there the heat is dissipated into the air and particularly into the air ducts from where it is dissipated by the air flow from two fans that are arranged at the inlet of the air ducts.

摘要翻译： 电源的外壳包括底部和盖子。 他们都有一个U形的形状。 由于盖子比底部略宽，因此分别在底盖的侧板和对应的侧板之间设置有两个空气导管。 印刷电路板安装在外壳内，特别是在底部。 不同的机械，电和/或电子部件安装在印刷电路板上。 此外，发热部件安装在印刷电路板上，使得它们与底部的侧板正确接触。 由部件产生的废热转移到底部的侧板，并进一步转移到盖板及其侧板上。 从那里，热量被散发到空气中，特别是散发到空气管道中，在空气管道中，空气流被来自布置在空气管道入口处的两个风扇的空气流散发。

公开(公告)号：US20080002167A1

公开(公告)日：2008-01-03

申请号：US11427183

申请日：2006-06-28

申请人： Toralf Gruner ,  Olaf Conradi ,  Nils Dieckmann ,  Markus Schwab ,  Olaf Hmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Vladimir Kamenov

发明人： Toralf Gruner ,  Olaf Conradi ,  Nils Dieckmann ,  Markus Schwab ,  Olaf Hmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Vladimir Kamenov

IPC分类号： G03B27/42 ,  G02B9/00

CPC分类号： G03F7/70958 ,  G02B13/143 ,  G02B17/0856 ,  G02B17/0892 ,  G02B27/0012 ,  G03F7/70091

摘要： The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in an image plane (8). The object (5) is illuminated with light of an operating wavelength of the projection exposure apparatus according to one of several adjustable exposure modes. The light produces changes in at least one optical element (9) of the projection exposure apparatus, by which the optical properties of the projection exposure apparatus are influenced. The operation of the projection exposure apparatus makes allowance for the influencing of the optical properties of the projection exposure apparatus or a quantity dependent on the former, being calculated approximately on the basis of the exposure mode used and the structure of the object (5).

摘要翻译： 本发明涉及一种用于操作投影曝光装置以将布置在物平面（6）中的物体（5）的结构的图像投影到布置在图像平面（8）中的基板（10）上的方法。 根据多种可调曝光模式之一，物体（5）被投影曝光装置的工作波长的光照射。 该光在投影曝光装置的至少一个光学元件（9）中产生变化，由此影响投影曝光装置的光学特性。 投影曝光装置的操作允许基于所使用的曝光模式和对象（5）的结构大致计算投影曝光装置的光学特性或取决于前者的光学特性的影响。

公开(公告)号：US20050146704A1

公开(公告)日：2005-07-07

申请号：US10949396

申请日：2004-09-27

申请人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

发明人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

IPC分类号： G03F7/20 ,  G03B27/72

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。

公开(公告)号：US08537335B2

公开(公告)日：2013-09-17

申请号：US12917956

申请日：2010-11-02

申请人： Markus Schwab ,  Michael Layh ,  Markus Deguenther ,  Artur Hoegele

发明人： Markus Schwab ,  Michael Layh ,  Markus Deguenther ,  Artur Hoegele

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70116 ,  G03F7/70075

摘要： An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface of the illumination system. The pupil shaping unit has a Fourier optical system for converting an entrance beam bundle entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length fFOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis, where (L/fFOS)

摘要翻译： 一种用于利用来自初级光源的光照射照明场的微光刻投影曝光设备的照明系统具有可变地调节的瞳孔成形单元，用于接收来自主光源的光并且用于产生可变地调节的二维强度分布 照明系统的瞳孔成形表面。 瞳孔成形单元具有傅里叶光学系统，用于将通过傅立叶光学系统的入射面进入的入射束束转换成从傅立叶光学系统的出射平面离开的出射光束束。 傅里叶光学系统具有焦距fFOS和在沿着光轴的入射侧第一系统表面和出射侧最后系统表面之间测量的结构长度L，其中（L / fFOS）<1/6。

公开(公告)号：US20130057844A1

公开(公告)日：2013-03-07

申请号：US13604296

申请日：2012-09-05

申请人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

发明人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

IPC分类号： G03B27/72

CPC分类号： G03F7/70158 ,  G03F7/70058

摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

公开(公告)号：US20110102758A1

公开(公告)日：2011-05-05

申请号：US12917956

申请日：2010-11-02

申请人： Markus Schwab ,  Michael Layh ,  Markus Deguenther ,  Artur Hoegele

发明人： Markus Schwab ,  Michael Layh ,  Markus Deguenther ,  Artur Hoegele

IPC分类号： G03B27/54

CPC分类号： G03F7/70116 ,  G03F7/70075

摘要： An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from a primary light source has a variably adjustable pupil shaping unit for receiving light from the primary light source and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface of the illumination system. The pupil shaping unit has a Fourier optical system for converting an entrance beam bundle entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length fFOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis, where (L/fFOS)

摘要翻译： 一种用于利用来自初级光源的光照射照明场的微光刻投影曝光设备的照明系统具有可变地调节的瞳孔成形单元，用于接收来自主光源的光并且用于产生可变地调节的二维强度分布 照明系统的瞳孔成形表面。 瞳孔成形单元具有傅里叶光学系统，用于将通过傅立叶光学系统的入射面进入的入射束束转换成从傅立叶光学系统的出射平面离开的出射光束束。 傅里叶光学系统具有焦距fFOS和在沿着光轴的入射侧第一系统表面和出射侧最后系统表面之间测量的结构长度L，其中（L / fFOS）<1/6。

公开(公告)号：US20100002217A1

公开(公告)日：2010-01-07

申请号：US12496762

申请日：2009-07-02

申请人： Damian Fiolka ,  Manfred Maul ,  Markus Schwab ,  Wolfgang Seitz ,  Olaf Dittmann

发明人： Damian Fiolka ,  Manfred Maul ,  Markus Schwab ,  Wolfgang Seitz ,  Olaf Dittmann

IPC分类号： G03B27/54 ,  F21V9/14 ,  G03B27/32

CPC分类号： G03F7/70191 ,  G02B3/0056 ,  G02B5/1876 ,  G02B27/283 ,  G02B27/285 ,  G02B27/286 ,  G03F7/70566

摘要： The disclosure relates to an illumination system of a microlithographic projection exposure apparatus. The illumination system can include a depolariser which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser. The illumination system can also include a microlens array which is arranged upstream of the light mixing system in the light propagation direction. The microlens array can include a plurality of microlenses arranged with a periodicity. The depolariser can be configured so that a contribution afforded by interaction of the depolariser with the periodicity of the microlens array to a residual polarisation distribution occurring in a pupil plane arranged downstream of the microlens array in the light propagation direction has a maximum degree of polarisation of not more than 5%.

摘要翻译： 本公开涉及一种微光刻投影曝光装置的照明系统。 照明系统可以包括去极化器，其与在光传播方向上设置的下游的光混合系统相结合，至少部分地导致撞击在去极化器上的偏振光的有效去极化。 照明系统还可以包括在光传播方向上布置在光混合系统的上游的微透镜阵列。 微透镜阵列可以包括以周期布置的多个微透镜。 去极化器可以被配置为使得通过去极化器的相互作用提供的贡献与微透镜阵列的周期性对在光传播方向上布置在微透镜阵列的下游的光瞳面中发生的残留极化分布产生的贡献具有最大的偏振度 不超过5％。