公开(公告)号：US20100265482A1

公开(公告)日：2010-10-21

申请号：US12795014

申请日：2010-06-07

申请人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

发明人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

IPC分类号： G03B27/32

CPC分类号： G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

摘要： An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.

摘要翻译： 提供微光刻投影曝光装置的照明系统，其被配置为照亮位于掩模平面中的掩模。 该系统包括光束成形光学子系统和照射光束偏转部件的照明器光学器件。 为了确定光束偏转分量的特性，确定照明系统的系统光瞳表面中的强度分布。 然后确定光束偏转分量的特性，使得瞳孔成形子系统在系统光瞳表面中产生的强度分布近似于之前确定的强度分布。 在该确定中考虑以下像差中的至少一个：（i）由照明器光学器件产生的像差; （ii）由光瞳成形光学子系统产生的像差; （iii）由布置在系统光瞳表面和掩模平面之间的光学元件产生的像差。

公开(公告)号：US08896816B2

公开(公告)日：2014-11-25

申请号：US13208472

申请日：2011-08-12

申请人： Michael Patra

发明人： Michael Patra

IPC分类号： G03B27/72 ,  G03F7/20 ,  G02B27/48 ,  H01S3/225 ,  H01S3/08

CPC分类号： G03F7/70583 ,  G02B27/48 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/08009 ,  H01S3/225

摘要： In a projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective, laser radiation having a spectral intensity distribution I(ω) dependent on the angular frequency ω is used. The laser radiation is characterized by an aberration parameter α in accordance with: α := ∫ I ⁡ ( ω ) ⁢ ω 2 ⁢ ⅆ ω ∫ I ⁡ ( ω ) ⁢ ⅆ ω and a coherence time τ in accordance with: τ = ∫ I ⁡ ( ω ) 2 ⁢ ⅆ ω [ ∫ I ⁡ ( ω ) ⁢ ⅆ ω ] 2 The laser radiation is introduced into an illumination system for generating an illumination radiation directed onto the mask, and the pattern is imaged onto the substrate with the aid of a projection objective. The spectral intensity distribution is set so that ατ2≦0.3. The influence of temporally varying speckles on image generation can be reduced by comparison with conventional methods, without simultaneously increasing the influence of chromatic aberrations on image generation.

摘要翻译： 在投影曝光方法中，通过布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像来布置在投影物镜的图像表面区域中的放射线敏感基板的曝光， 使用具有取决于角频率ω的光谱强度分布I（ω）的激光辐射。 激光辐射的特征在于根据以下的像差参数α：α=∫I⁡（ω)ω2ⅆω∫I⁡（ω）ⅆω和相干时间τ，其根据：τ=∫ I⁡（ω）2ⅆω[∫I⁡（ω）ⅆω] 2激光辐射被引入到照射系统中，用于产生指向掩模的照射辐射，并且图案被成像到基板上 协助投影目标。 光谱强度分布被设置为使得ατ2＆nlE; 0.3。 与常规方法相比，可以减少时间上变化的斑点对图像产生的影响，而不会同时增加色差对图像生成的影响。

公开(公告)号：US08724080B2

公开(公告)日：2014-05-13

申请号：US13022265

申请日：2011-02-07

申请人： Michael Patra

发明人： Michael Patra

IPC分类号： G03B27/42

CPC分类号： G03F7/70075

摘要： An optical raster element for an illumination system of a microlithographic projection exposure apparatus includes an array of refractive optical elements extending on a planar or curved surface. At least two of the optical elements are arranged side by side along a reference direction with a pitch of less than 2 mm. They have a height perpendicular to the surface of less than 50 μm and a surface profile along the reference direction which includes a central section, two transition sections adjacent the central section and two end sections adjacent the transition sections. The curvatures in the two transition sections are greater than the curvatures in the central section and the end sections. The optical raster element is intended for being used as a first channel plate in an optical integrator (honeycomb condenser) and can reduce the maximum light intensities occurring in or behind the second channel plate.

摘要翻译： 用于微光刻投影曝光设备的照明系统的光栅元件包括在平面或曲面上延伸的折射光学元件的阵列。 至少两个光学元件沿着基准方向并排布置，间距小于2mm。 它们具有垂直于表面的小于50μm的高度以及沿着参考方向的表面轮廓，其包括中心部分，邻近中心部分的两个过渡部分和与过渡部分相邻的两个端部部分。 两个过渡部分中的曲率大于中央部分和端部部分的曲率。 光栅元件旨在用作光学积分器（蜂窝式聚光器）中的第一通道板，并且可以减少在第二通道板中或之后发生的最大光强度。

公开(公告)号：US20130057844A1

公开(公告)日：2013-03-07

申请号：US13604296

申请日：2012-09-05

申请人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

发明人： Michael Patra ,  Stig Bieling ,  Markus Deguenther ,  Frank Schlesener ,  Markus Schwab

IPC分类号： G03B27/72

CPC分类号： G03F7/70158 ,  G03F7/70058

摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.

公开(公告)号：US08339577B2

公开(公告)日：2012-12-25

申请号：US12506364

申请日：2009-07-21

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC分类号： G01C11/26 ,  G01N21/00 ,  G03B27/32 ,  G03B27/54 ,  G03B27/74

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.

摘要翻译： 微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。 每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。 测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。 检测仪器在光束偏离元件偏离后记录测量光束。 评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。

公开(公告)号：US20120099093A1

公开(公告)日：2012-04-26

申请号：US13281179

申请日：2011-10-25

申请人： Michael Patra ,  Martin Meier

发明人： Michael Patra ,  Martin Meier

IPC分类号： G03B27/72 ,  G02B27/28 ,  G02B5/22

CPC分类号： G03F7/70141

摘要： The present invention relates to an apparatus for influencing a light beam arrangement comprising a plurality of light beams (4) arranged alongside one another, wherein provision is made of at least one optical element (5, 15, 25) which is movable transversely with respect to the light beams and by which the light beams can be influenced if the light beams pass through the optical element, and which has at least one light-absorbing region (9, 19, 29), wherein the apparatus comprises a drive device for the optical element, a measuring device for detecting the light of the light beam and a control unit, wherein the control unit is designed such that the drive device is controlled in a manner dependent on the position of the light-absorbing region. Furthermore, the present invention also relates to a projection exposure apparatus for microlithography comprising a multi-mirror array, in Which the corresponding apparatus can be used, and to a method for operating the corresponding apparatus or the projection exposure apparatus.

摘要翻译： 本发明涉及一种用于影响光束布置的装置，其包括彼此并排布置的多个光束（4），其中提供由至少一个光学元件（5,15,25）制成，该光学元件可相对于 如果光束通过光学元件并且具有至少一个光吸收区域（9,19,29），则光束可以受到影响，其中该装置包括用于该光束的驱动装置 光学元件，用于检测光束的光的测量装置和控制单元，其中控制单元被设计成使得驱动装置以取决于光吸收区域的位置的方式被控制。 此外，本发明还涉及一种用于微光刻的投影曝光装置，其包括可以使用相应装置的多镜阵列，以及用于操作相应装置或投影曝光装置的方法。

公开(公告)号：US08854604B2

公开(公告)日：2014-10-07

申请号：US13215616

申请日：2011-08-23

申请人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

发明人： Markus Deguenther ,  Michael Patra ,  Andras G. Major

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20 ,  G02B26/08

CPC分类号： G03F7/7085 ,  G02B26/0833 ,  G03F7/70116 ,  G03F7/70266 ,  G03F7/70591 ,  G03F7/706

摘要： A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.

摘要翻译： 微光刻投影曝光装置包括可以由多个微镜形成的光学表面，以及被配置为测量与多个位置处的光学表面相关的参数的测量装置。 测量装置包括具有多个照明构件的照明单元，每个具有光出射面。 光学成像系统在其中布置至少两个光出射面的物平面与至少基本上与光学表面重合的像平面之间建立成像关系。 检测器单元在与光学表面相互作用后测量光的性质，并且评估单元基于由检测器单元确定的特性来确定每个位置的表面相关参数。

公开(公告)号：US20100283985A1

公开(公告)日：2010-11-11

申请号：US12818844

申请日：2010-06-18

申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

IPC分类号： G03B27/54

CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

摘要翻译： 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。

公开(公告)号：US08891057B2

公开(公告)日：2014-11-18

申请号：US12818501

申请日：2010-06-18

申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

摘要翻译： 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。

公开(公告)号：US08593645B2

公开(公告)日：2013-11-26

申请号：US13330964

申请日：2011-12-20

申请人： Michael Patra

发明人： Michael Patra

IPC分类号： G01B11/24

CPC分类号： G03F7/7085 ,  G02B13/143 ,  G02B17/0663 ,  G02B26/0825 ,  G02B26/0833 ,  G03F7/70116

摘要： A microlithographic projection exposure apparatus includes an optical surface and a measurement device which measures a parameter related to the optical surface at a plurality of separated areas on the optical surface. The measurement device includes an illumination unit which directs individual measuring light beams towards the areas on the optical surface. Each measuring light beam illuminates at least a portion of an area, which is associated with the measuring light beam, and at least a portion of an adjacent area which is not associated with the measuring light beam. A detector unit measures a property for each measuring light beam after it has interacted with the optical surface.

摘要翻译： 微光刻投影曝光装置包括光学表面和测量与光学表面上的光学表面相关的参数在光学表面上的多个分离区域的测量装置。 测量装置包括照射单元，其将各个测量光束引向光学表面上的区域。 每个测量光束照亮与测量光束相关联的区域的至少一部分以及与测量光束不相关联的至少一部分相邻区域。 检测器单元在与光学表面相互作用后测量每个测量光束的性质。