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33 条记录 (耗时 0.03 秒)

    Method of forming shadow mask pattern
    11.
    发明授权
    Method of forming shadow mask pattern 有权
    形成荫罩图案的方法

    公开(公告)号：US07765669B2

    公开(公告)日：2010-08-03

    申请号：US11325312

    申请日：2006-01-05

    申请人： Jin Kyoo Kim ,  Sang Jin Han ,  Hee Cheol Kang ,  Eu Gene Kang ,  Tae Hyung Kim

    发明人： Jin Kyoo Kim ,  Sang Jin Han ,  Hee Cheol Kang ,  Eu Gene Kang ,  Tae Hyung Kim

    IPC分类号： B23P11/02 ,  H01L21/00

    CPC分类号： C23C14/042 ,  H01L51/0011 ,  Y10T29/49867

    摘要： Disclosed is a method of forming a pattern on a mask sheet including an attaching portion to be attached to a mask frame, and a pattern area in which the pattern is formed. The method includes positioning the mask sheet on an auxiliary sheet with a thickness greater than the thickness of the mask sheet, fastening the auxiliary sheet to the mask frame, applying a stretching force to the mask sheet and the auxiliary sheet, and forming the pattern on the pattern area of the mask sheet. Thus, a predetermined pattern is formed on a mask sheet while a uniformly distributed external force is applied to the mask sheet, so that bending or deflecting out of plane by the mask sheet is prevented, thereby forming a precise mask pattern.

    摘要翻译： 公开了一种在掩模板上形成图案的方法，该掩模板包括附着到掩模框架的附接部分和形成图案的图案区域。 该方法包括将掩模片定位在厚度大于掩模片的厚度的辅助片上，将辅助片固定到掩模框架上，向掩模片和辅助片施加拉伸力，并将形状形成在 掩模片的图案区域。 因此，在均匀分布的外力施加到掩模片上时，在掩模板上形成预定图案，从而防止由掩模片弯曲或偏转出平面，从而形成精确的掩模图案。

    Device for aligning substrate with mask and method using the same
    12.
    发明授权
    Device for aligning substrate with mask and method using the same 有权
    用于使衬底与掩模对准的装置和使用其的方法

    公开(公告)号：US07486397B2

    公开(公告)日：2009-02-03

    申请号：US11324247

    申请日：2006-01-04

    申请人： Sung Wha Jung ,  Sang Jin Han ,  Eu Gene Kang

    发明人： Sung Wha Jung ,  Sang Jin Han ,  Eu Gene Kang

    IPC分类号： G01B11/00 ,  G01B9/02

    CPC分类号： G03F9/7038 ,  G03F7/70791 ,  G03F9/7088

    摘要： A device for aligning a substrate and a mask, and a method using the same, where the device includes aligning marks in unused portions of the substrate and the mask, a sensing unit for determining overlap of the aligning marks when the substrate is aligned with the mask, and a control unit for controlling an aligning process to be repeated on the basis of data sensed and determined by the sensing unit. The sensing unit may include a camera positioned in photographic range to determine any alignment error in the alignment marks. According to another embodiment of the present invention, the alignment error between the substrate and the mask is sensed to determine whether it is acceptable or not. When the alignment error is unacceptable, the operations for aligning the substrate with the mask are repeated until the alignment error is acceptable.

    摘要翻译： 用于对准衬底和掩模的装置及其使用方法，其中所述装置包括对准所述衬底和所述掩模的未使用部分中的标记;感测单元，用于当所述衬底与所述掩模对准时确定所述对准标记的重叠 掩模和控制单元，用于基于由感测单元感测和确定的数据来控制要重复的对准处理。 感测单元可以包括位于照相范围中的摄像机，以确定对准标记中的任何对准误差。 根据本发明的另一实施例，感测基板和掩模之间的对准误差以确定其是否可接受。 当对准误差不可接受时，重复对准衬底与掩模的操作，直到对准误差是可接受的。

    Method for synthesizing hydrazodicarbonamide
    13.
    发明授权
    Method for synthesizing hydrazodicarbonamide 有权
    肼二酰胺合成方法

    公开(公告)号：US06635785B1

    公开(公告)日：2003-10-21

    申请号：US10169127

    申请日：2002-06-27

    申请人： Chun-Hyuk Lee ,  Sang-Jin Han

    发明人： Chun-Hyuk Lee ,  Sang-Jin Han

    IPC分类号： C07C2800

    CPC分类号： C07C281/06

    摘要： A method for synthesizing hydrazodicarbonamide (HDCA) by a reaction of monohalobiuret metal salt having the formula 1 or 2, which is derived from biuret, and ammonia, wherein M is a metal and X is a halogen. The monohalobiuret metal salt is inexpensive and easy to synthesize and thus a great yield of HDCA can be obtained from the monohalobiuret metal salt at low cost.

    摘要翻译： 通过由缩二脲衍生的具有式1或2的单卤代羰基金属盐与氨的反应合成肼基二酰胺（HDCA）的方法，其中M是金属，X是卤素。 单卤代硼烷金属盐廉价且易于合成，因此可以以低成本从单卤代硼烷金属盐获得大量的HDCA。

    ELECTRONIC APPARATUS AND METHOD FOR CONTROLLING THEREOF
    17.
    发明申请
    ELECTRONIC APPARATUS AND METHOD FOR CONTROLLING THEREOF 审中-公开
    电子装置及其控制方法

    公开(公告)号：US20130033644A1

    公开(公告)日：2013-02-07

    申请号：US13567427

    申请日：2012-08-06

    申请人： Jung-geun KIM ,  Yoo-tai KIM ,  Seung-dong YU ,  Sang-jin HAN ,  Hee-seob RYU

    发明人： Jung-geun KIM ,  Yoo-tai KIM ,  Seung-dong YU ,  Sang-jin HAN ,  Hee-seob RYU

    IPC分类号： H04N5/50

    CPC分类号： H04N21/42203 ,  H04N21/4223 ,  H04N21/4821

    摘要： An electronic apparatus and a method for controlling thereof are provided. The method for controlling of the electronic apparatus includes: recognizing one of among a user voice and a user motion through one of among a voice recognition module and a motion recognition module, and, performing a voice task in response to a user voice is recognized through the voice recognition module, and, performing a motion task in response to a user motion is recognized through the motion recognition module.

    摘要翻译： 提供一种电子设备及其控制方法。 电子设备的控制方法包括：通过语音识别模块和运动识别模块之一识别用户语音和用户动作之一，并且响应于用户语音执行语音任务被识别，通过 通过运动识别模块识别语音识别模块和响应于用户运动执行运动任务。

    LINEAR EVAPORATION SOURCE AND DEPOSITION APPARATUS HAVING THE SAME
    18.
    发明申请
    LINEAR EVAPORATION SOURCE AND DEPOSITION APPARATUS HAVING THE SAME 有权
    线性蒸发源和沉积装置

    公开(公告)号：US20110146579A1

    公开(公告)日：2011-06-23

    申请号：US12972327

    申请日：2010-12-17

    申请人： Min-Gyu Seo ,  Sang-Jin Han ,  Cheol-Lae Roh ,  Jae-Hong Ahn

    发明人： Min-Gyu Seo ,  Sang-Jin Han ,  Cheol-Lae Roh ,  Jae-Hong Ahn

    IPC分类号： C23C16/448

    CPC分类号： C23C16/4485 ,  C23C14/243 ,  C23C14/26

    摘要： A linear evaporation source and a deposition apparatus having the same are disclosed. In one embodiment ,the linear evaporation source includes i) a crucible being open on one side thereof and configured to store a deposition material and ii) a plurality of partitions dividing an internal space of the crucible, wherein each of the partitions has at least one opening in a lower portion thereof. The source further includes i) a nozzle section located on the open side of the crucible and comprising a plurality of nozzles, ii) a heater configured to heat the crucible and iii) a housing configured to accommodate to the crucible, the nozzle section, and the heater.

    摘要翻译： 公开了一种线性蒸发源及其沉积装置。 在一个实施例中，线性蒸发源包括i）坩埚在其一侧开口并被构造成存储沉积材料，以及ii）分隔坩埚内部空间的多个隔板，其中每个隔板具有至少一个 在其下部开口。 该源还包括i）位于坩埚的开放侧上并包括多个喷嘴的喷嘴部分，ii）被配置为加热坩埚的加热器，以及iii）构造成容纳坩埚，喷嘴部分和 加热器。

    Chuck plate assembly with cooling means
    20.
    发明授权
    Chuck plate assembly with cooling means 有权
    带冷却装置的卡盘组件

    公开(公告)号：US07548304B2

    公开(公告)日：2009-06-16

    申请号：US11298566

    申请日：2005-12-12

    申请人： Sang Jin Han ,  Sung Ho Lee ,  Myung Soo Huh ,  Seok Heon Jeong ,  Kwan Seop Song ,  Hee Cheol Kang

    发明人： Sang Jin Han ,  Sung Ho Lee ,  Myung Soo Huh ,  Seok Heon Jeong ,  Kwan Seop Song ,  Hee Cheol Kang

    IPC分类号： G03B27/62 ,  G03B27/52 ,  C23C14/00 ,  C23C16/00

    CPC分类号： C03C17/28 ,  C03C17/001 ,  C03C17/002 ,  C23C14/042 ,  C23C14/541

    摘要： The invention provides a chuck plate assembly that includes a shadow mask formed with a predetermined pattern; a shadow mask frame holding the shadow mask and having heat-radiating and cooling functions; a substrate aligned with the shadow mask and onto which deposition materials from a deposition source are deposited; and a chuck plate, attaching the substrate to the shadow mask, that includes a refrigerant circulating duct. The temperature of the substrate is optimized in consideration of the temperature of the shadow mask so that an alignment error due to thermal deformation is minimized. That is, the temperature of the shadow mask itself is prevented from rising, and thereby prevents deformation of the shadow mask due to thermal expansion, which improves the precision of a substrate pattern position.

    摘要翻译： 本发明提供一种卡盘板组件，其包括以预定图案形成的荫罩; 保持荫罩并具有散热和冷却功能的荫罩框架; 与荫罩对准的衬底，沉积来自沉积源的沉积材料; 以及夹持板，将基板安装在荫罩上，该荫罩包括制冷剂循环管道。 考虑到荫罩的温度来优化衬底的温度，使得由于热变形引起的取向误差最小化。 也就是说，防止荫罩本身的温度上升，从而防止由于热膨胀而引起的荫罩的变形，这提高了基板图案位置的精度。