公开(公告)号：US20220162747A1

公开(公告)日：2022-05-26

申请号：US17529463

申请日：2021-11-18

Applicant: Applied Materials, Inc.

Inventor： Tapash Chakraborty ,  Nitin Deepak ,  Prerna Sonthalia Goradia ,  Bahubali S. Upadhye ,  Nilesh Chimanrao Bagul ,  Subramanya P. Herle ,  Visweswaren Sivaramakrishnan

IPC: C23C16/44

Abstract: Exemplary methods of removing lithium-containing deposits may include heating a surface of a lithium-containing deposit. The surface may include oxygen or nitrogen, and the lithium-containing deposit may be disposed on a surface of a processing chamber. The methods may include contacting the surface of the lithium-containing deposit with a hydrogen-containing precursor. The contacting may hydrogenate the surface of the lithium-containing deposit. The methods may include contacting the lithium-containing deposit with a nitrogen-containing precursor to form volatile byproducts. The methods may include exhausting the volatile byproducts of the lithium-containing deposit from the processing chamber.

公开(公告)号：US20210094234A1

公开(公告)日：2021-04-01

申请号：US16684524

申请日：2019-11-14

Applicant: Applied Materials, Inc.

Inventor： Dakshalkumar Patel ,  Girish Kumar Chaturvedi ,  Bahubali S. Upadhye ,  Sumedh Acharya ,  Mahendran Chidambaram ,  Nilesh Chimanrao Bagul

IPC: B29C64/35 ,  B29C64/245 ,  B29C64/205 ,  B29C64/268

Abstract: An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform, at least one energy source to selectively fuse feed material in a layer on the platform, and an air knife assembly. The air knife assembly includes an inlet unit to deliver gas over the platform and an exhaust unit to receive gas from over the platform. The inlet unit includes a multi-chamber plenum, a gas inlet, and a gas distribution module. The multi-chamber plenum has a plurality of vertically stacked chambers that are fluidically connected, with a first chamber of the plurality of vertically stacked chambers positioned at a higher elevation than a collection chamber of the plurality of vertically stacked chambers.

公开(公告)号：US20210094229A1

公开(公告)日：2021-04-01

申请号：US16684519

申请日：2019-11-14

Applicant: Applied Materials, Inc.

Inventor： Dakshalkumar Patel ,  Girish Kumar Chaturvedi ,  Bahubali S. Upadhye ,  Sumedh Acharya ,  Mahendran Chidambaram ,  Nilesh Chimanrao Bagul

IPC: B29C64/205 ,  B29C64/264 ,  B29C64/245 ,  B29C64/241 ,  B29C64/255

Abstract: An additive manufacturing apparatus includes an environmentally sealed first chamber, a second chamber separated from the first chamber by a first valve, a platform positionable in the first chamber, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform in the first chamber, at least one energy source to selectively fuse feed material in a layer on the platform in the first chamber, and an air knife assembly to direct a laminar flow of air across a layer of feed material on the platform in the first chamber. The air knife assembly includes an inlet module and an exhaust module that are movable through the first valve between the first chamber and the second chamber.

公开(公告)号：US20180298492A1

公开(公告)日：2018-10-18

申请号：US15978930

申请日：2018-05-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Ranga Rao Arnepalli ,  Darshan Thakare ,  Abhijit Basu Mallick ,  Pramit Manna ,  Robert Jan Visser ,  Prerna Sonthalia Goradia ,  Nilesh Chimanrao Bagul

IPC: C23C16/448 ,  C23C16/40 ,  C23C16/34 ,  H01L21/02

CPC classification number: C23C16/4486 ,  B05D1/02 ,  C23C16/045 ,  C23C16/345 ,  C23C16/401 ,  C23C16/403 ,  C23C16/405 ,  H01L21/02153 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02178 ,  H01L21/02181 ,  H01L21/02183 ,  H01L21/02186 ,  H01L21/02189 ,  H01L21/02271

Abstract: Systems and methods for forming films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a liquid solution made from a solvent and a deposition precursor. A carrier gas may be flowed through the liquid solution and push the droplets toward a substrate placed in a substrate processing region. The droplets pass into the substrate processing region and chemically react with the substrate to form films. The temperature of the substrate may be maintained below the boiling temperature of the solvent during film formation. The solvent imparts a flowability to the forming film and enable the depositing film to flow along the surface of a patterned substrate during formation prior to solidifying. The flowable film results in bottom-up gapfill inside narrow high-aspect ratio gaps in the patterned substrate.

公开(公告)号：US11926903B2

公开(公告)日：2024-03-12

申请号：US17836578

申请日：2022-06-09

Applicant: Applied Materials, Inc.

Inventor： Nitin Deepak ,  Tapash Chakraborty ,  Prerna Sonthalia Goradia ,  Visweswaren Sivaramakrishnan ,  Nilesh Chimanrao Bagul ,  Bahubali S. Upadhye

IPC: C23F1/00 ,  C09K13/00 ,  C23F1/10 ,  C23F1/12 ,  C23F1/44 ,  C23F4/02

CPC classification number: C23F1/00 ,  C09K13/00 ,  C23F1/10 ,  C23F1/12 ,  C23F1/44 ,  C23F4/02

Abstract: Methods for etching alkali metal compounds are disclosed. Some embodiments of the disclosure expose an alkali metal compound to an alcohol to form a volatile metal alkoxide. Some embodiments of the disclosure expose an alkali metal compound to a β-diketone to form a volatile alkali metal β-diketonate compound. Some embodiments of the disclosure are performed in-situ after a deposition process. Some embodiments of the disclosure provide methods which selectively etch alkali metal compounds.

公开(公告)号：US20220362995A1

公开(公告)日：2022-11-17

申请号：US17869721

申请日：2022-07-20

Applicant: Applied Materials, Inc.

Inventor： Dakshalkumar Patel ,  Girish Kumar Chaturvedi ,  Bahubali S. Upadhye ,  Sumedh Acharya ,  Mahendran Chidambaram ,  Nilesh Chimanrao Bagul

IPC: B29C64/205 ,  B29C64/264 ,  B29C64/245 ,  B29C64/255 ,  B29C64/241

Abstract: An additive manufacturing apparatus includes an environmentally sealed first chamber, a second chamber separated from the first chamber by a first valve, a platform positionable in the first chamber, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform in the first chamber, at least one energy source to selectively fuse feed material in a layer on the platform in the first chamber, and an air knife assembly to direct a laminar flow of air across a layer of feed material on the platform in the first chamber. The air knife assembly includes an inlet module and an exhaust module that are movable through the first valve between the first chamber and the second chamber.

公开(公告)号：US11413817B2

公开(公告)日：2022-08-16

申请号：US16684524

申请日：2019-11-14

Applicant: Applied Materials, Inc.

Inventor： Dakshalkumar Patel ,  Girish Kumar Chaturvedi ,  Bahubali S. Upadhye ,  Sumedh Acharya ,  Mahendran Chidambaram ,  Nilesh Chimanrao Bagul

IPC: B29C64/20 ,  B29C64/35 ,  B29C64/371 ,  B29C64/245 ,  B29C64/205 ,  B33Y30/00 ,  B33Y10/00 ,  B33Y40/00

Abstract: An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform, at least one energy source to selectively fuse feed material in a layer on the platform, and an air knife assembly. The air knife assembly includes an inlet unit to deliver gas over the platform and an exhaust unit to receive gas from over the platform. The inlet unit includes a multi-chamber plenum, a gas inlet, and a gas distribution module. The multi-chamber plenum has a plurality of vertically stacked chambers that are fluidically connected, with a first chamber of the plurality of vertically stacked chambers positioned at a higher elevation than a collection chamber of the plurality of vertically stacked chambers.

公开(公告)号：US10280507B2

公开(公告)日：2019-05-07

申请号：US15978930

申请日：2018-05-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Ranga Rao Arnepalli ,  Darshan Thakare ,  Abhijit Basu Mallick ,  Pramit Manna ,  Robert Jan Visser ,  Prerna Sonthalia Goradia ,  Nilesh Chimanrao Bagul

IPC: C23C16/448 ,  C23C16/40 ,  C23C16/34 ,  H01L21/02

Abstract: Systems and methods for forming films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a liquid solution made from a solvent and a deposition precursor. A carrier gas may be flowed through the liquid solution and push the droplets toward a substrate placed in a substrate processing region. The droplets pass into the substrate processing region and chemically react with the substrate to form films. The temperature of the substrate may be maintained below the boiling temperature of the solvent during film formation. The solvent imparts a flowability to the forming film and enable the depositing film to flow along the surface of a patterned substrate during formation prior to solidifying. The flowable film results in bottom-up gapfill inside narrow high-aspect ratio gaps in the patterned substrate.

公开(公告)号：US10081036B2

公开(公告)日：2018-09-25

申请号：US15269324

申请日：2016-09-19

Applicant: APPLIED MATERIALS, INC.

Inventor： Sankesha Bhoyar ,  Mahesh Arcot ,  Nilesh Chimanrao Bagul ,  Hemantha Raju ,  Ravindra Patil

IPC: B08B3/12 ,  B08B3/14 ,  G01N15/14 ,  G01N15/06 ,  C02F1/00 ,  C02F1/42 ,  C02F103/34

CPC classification number: B08B3/12 ,  B08B3/00 ,  B08B3/14 ,  C02F1/001 ,  C02F1/42 ,  C02F2103/346 ,  C02F2209/40 ,  C02F2301/046 ,  G01N15/0618 ,  G01N15/1436 ,  G01N15/1459 ,  G01N2015/0053 ,  G01N2015/0693 ,  G01N2015/1486

Abstract: Systems for prequalifying components for a processing chamber are described. The systems may be used to clean particulates from chamber parts and concurrently quantify the cleanliness. The systems may be used to qualify replacement parts before sending to a customer site for installation. The systems have three adjacent compartments separated by impermeable barriers. All three compartments are filled with liquid while cleaning a chamber component. The center compartment contains a submerged component for cleaning and qualifying. Two compartments on either side of the center compartment are configured with submerged ultrasonic transducers to deliver ultrasonic energy to either side of the component being cleaned and prequalified. A liquid pump is connected to the cleaning tub to recirculate water from the cleaning bath and another liquid pump is configured to remove a small amount of the cleaning bath to sample particulates.

公开(公告)号：US10017856B1

公开(公告)日：2018-07-10

申请号：US15489242

申请日：2017-04-17

Applicant: APPLIED MATERIALS, INC.

Inventor： Ranga Rao Arnepalli ,  Darshan Thakare ,  Abhijit Basu Mallick ,  Pramit Manna ,  Robert Jan Visser ,  Prerna Sonthalia Goradia ,  Nilesh Chimanrao Bagul

IPC: H01L21/02 ,  C23C16/448 ,  C23C16/40 ,  C23C16/34

CPC classification number: C23C16/4486 ,  C23C16/045 ,  C23C16/345 ,  C23C16/401 ,  C23C16/403 ,  C23C16/405 ,  H01L21/02153 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02178 ,  H01L21/02181 ,  H01L21/02183 ,  H01L21/02186 ,  H01L21/02189 ,  H01L21/02271

Abstract: Systems and methods for forming films on the surface of a substrate are described. The systems possess aerosol generators which form droplets from a liquid solution made from a solvent and a deposition precursor. A carrier gas may be flowed through the liquid solution and push the droplets toward a substrate placed in a substrate processing region. The droplets pass into the substrate processing region and chemically react with the substrate to form films. The temperature of the substrate may be maintained below the boiling temperature of the solvent during film formation. The solvent imparts a flowability to the forming film and enable the depositing film to flow along the surface of a patterned substrate during formation prior to solidifying. The flowable film results in bottom-up gapfill inside narrow high-aspect ratio gaps in the patterned substrate.