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公开(公告)号：US20200294750A1
公开(公告)日：2020-09-17
申请号：US16351956
申请日：2019-03-13
Applicant: Applied Materials, Inc.
Inventor： Svetlana B. Radovanov , Bon-Woong Koo , Alexandre Likhanskii
Abstract: An indirectly heated cathode ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.
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公开(公告)号：US10748738B1
公开(公告)日：2020-08-18
申请号：US16355997
申请日：2019-03-18
Applicant: APPLIED Materials, Inc.
Inventor： Bon-Woong Koo , Svetlana Radovanov , Frank Sinclair , You Chia Li , Peter Ewing , Ajdin Sarajlic , Christopher A. Rowland , Nunzio Carbone
IPC: H01J37/08 , H01J37/317
Abstract: Provided herein are approaches for increasing efficiency of ion sources. In some embodiments, an apparatus, such as an ion source, may include a chamber housing having a first end wall and a second end wall, and an extraction plate coupled to at least one of the first end wall and the second end wall. The extraction plate may include an extraction aperture. The apparatus may further include a tubular cathode extending between the first end wall and the second end wall.
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公开(公告)号：US12154755B2
公开(公告)日：2024-11-26
申请号：US17551849
申请日：2021-12-15
Applicant: Applied Materials, Inc.
Inventor： June Young Kim , Jin Young Choi , Yong-Seok Hwang , Kyoung-Jae Chung , Bon-Woong Koo
IPC: H01J37/09 , C23C14/48 , C23C14/52 , H01J37/08 , H01J37/317
Abstract: An IHC ion source having increased plasma potential is disclosed. In certain embodiments, the extraction plate is biased at a higher voltage than the body of the arc chamber to achieve the higher plasma potential. Shielding electrodes may be utilized to remove the interaction between the biased extraction plate and the plasma. The cross-section of the arc chamber may be circular or nearly circular to facilitate the rotation of electrons in the chamber. In another embodiment, biased electrodes may be disposed in the chamber on opposite sides of the extraction aperture in the height direction. In some embodiments, only one of the electrodes is biased at a voltage greater than the body of the arc chamber.
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公开(公告)号：US20240249908A1
公开(公告)日：2024-07-25
申请号：US18101260
申请日：2023-01-25
Applicant: Applied Materials, Inc.
Inventor： Frank Sinclair , Paul Joseph Murphy , Bon-Woong Koo , Gregory Edward Stratoti , Tseh-Jen Hsieh , Glenn Green
IPC: H01J37/244 , C23C14/48 , H01J37/09 , H01J37/317
CPC classification number: H01J37/244 , C23C14/48 , H01J37/09 , H01J37/3171 , H01J2237/0453 , H01J2237/24564
Abstract: A dose cup assembly that results in less particles in a process chamber is disclosed. The dose cup assembly includes a faceplate attached to a back wall of the process chamber, and having an opening; an aperture plate defining a plurality of slots; and a tunnel having walls and sidewalls and having a proximal end and a distal end, located between the faceplate and the aperture plate, such that the proximal end is nearer to the faceplate and the distal end is nearer to the aperture plate; wherein at least one of the faceplate, the walls, the sidewalls or the aperture plate has one or more exposed outer surfaces that comprise silicon. The exposed outer surfaces may be silicon. In some embodiments, the faceplate, the walls, the sidewalls or the aperture plate may be graphite, aluminum, or stainless steel which is coated with silicon or silicon carbide.
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公开(公告)号：US11600473B2
公开(公告)日：2023-03-07
申请号：US17150031
申请日：2021-01-15
Applicant: Applied Materials, Inc.
Inventor： Svetlana B. Radovanov , Bon-Woong Koo , Alexandre Likhanskii
Abstract: An ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.
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Patent Agency Ranking
公开(公告)号：US10923306B2
公开(公告)日：2021-02-16
申请号：US16351956
申请日：2019-03-13
Applicant: Applied Materials, Inc.
Inventor： Svetlana B. Radovanov , Bon-Woong Koo , Alexandre Likhanskii
Abstract: An indirectly heated cathode ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.
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公开(公告)号：US12278124B2
公开(公告)日：2025-04-15
申请号：US17513241
申请日：2021-10-28
Applicant: Applied Materials, Inc.
Inventor： D. Jeffrey Lischer , Bon-Woong Koo , Dawei Sun , Chi-Yang Cheng , Paul Joseph Murphy , Frank Sinclair , Gregory Edward Stratoti , Tseh-Jen Hsieh , Wayne Chen , Guy Oteri
Abstract: A load lock in which the pumping speed is controlled so as to minimize the possibility of condensation is disclosed. The load lock is in communication with a vacuum pump and a valve. A controller is used to control the valve such that the supersaturation ratio within the load lock does not exceed a predetermined threshold, which is less than or equal to the critical value at which vapor condenses. In certain embodiments, a computer model is used to generate a profile, which may be a pumping speed profile or a pressure profile, and the valve is controlled according to the profile. In another embodiment, the load lock comprises a temperature sensor and a pressure sensor. The controller may calculate the supersaturation ratio based on these parameters and control the valve accordingly.
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公开(公告)号：US11810746B2
公开(公告)日：2023-11-07
申请号：US17473096
申请日：2021-09-13
Applicant: Applied Materials, Inc.
Inventor： Alexandre Likhanskii , Alexander S. Perel , Jay T. Scheuer , Bon-Woong Koo , Robert C. Lindberg , Peter F. Kurunczi , Graham Wright
CPC classification number: H01J27/024 , H01J37/08 , H01J2237/0455 , H01J2237/061 , H01J2237/327
Abstract: An ion source having an extraction plate with a variable thickness is disclosed. The extraction plate has a protrusion on its interior or exterior surface proximate the extraction aperture. The protrusion increases the thickness of the extraction aperture in certain regions. This increases the loss area in those regions, which serves as a sink for ions and electrons. In this way, the plasma density is decreased more significantly in the regions where the extraction aperture has a greater thickness. The shape of the protrusion may be modified to achieve the desired plasma uniformity. Thus, it may be possible to create an extracted ion beam having a more uniform ion density. In some tests, the uniformity of the beam current along the width direction was improved by between 20% and 50%.
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公开(公告)号：US11631567B2
公开(公告)日：2023-04-18
申请号：US17407714
申请日：2021-08-20
Applicant: Applied Materials, Inc.
Inventor： Bon-Woong Koo , Frank Sinclair , Alexandre Likhanskii , Svetlana Radovanov , Alexander Perel , Graham Wright , Jay T. Scheuer , Daniel Tieger , You Chia Li , Jay Johnson , Tseh-Jen Hsieh , Ronald Johnson
IPC: H01J27/02 , H01J37/317
Abstract: An ion source including a chamber housing defining an ion source chamber and including an extraction plate on a front side thereof, the extraction plate having an extraction aperture formed therein, and a tubular cathode disposed within the ion source chamber and having an opening formed in a front half thereof nearest the extraction aperture, wherein a rear half of the tubular cathode furthest from the extraction aperture is closed.
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公开(公告)号：US20200343071A1
公开(公告)日：2020-10-29
申请号：US16923304
申请日：2020-07-08
Applicant: APPLIED Materials, Inc.
Inventor： Bon-Woong Koo , Svetlana Radovanov , Frank Sinclair , You Chia Li , Peter Ewing , Ajdin Sarajlic , Christopher A. Rowland , Nunzio Carbone
IPC: H01J37/08 , H01J37/317
Abstract: Provided herein are approaches for increasing efficiency of ion sources. In some embodiments, an apparatus, such as an ion source, may include a chamber housing having a first end wall and a second end wall, and an extraction plate coupled to at least one of the first end wall and the second end wall. The extraction plate may include an extraction aperture. The apparatus may further include a tubular cathode extending between the first end wall and the second end wall.
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