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    Lithographic Apparatus and Device Manufacturing Method
    12.
    发明申请
    Lithographic Apparatus and Device Manufacturing Method 有权
    光刻设备和器件制造方法

    公开(公告)号：US20140340659A1

    公开(公告)日：2014-11-20

    申请号：US14375457

    申请日：2013-01-25

    Applicant: ASML Netherlands B.V.

    Inventor： Jan Bernard Plechelmus Van Schoot ,  Adrianus Hendrik Koevoets ,  Theodorus Petrus Maria Cadee ,  Sjoerd Nicolaas Lambertus Donders ,  Koen Jacobus Johannes Maria Zaal

    IPC: G03F7/20

    CPC classification number: G03F7/70891 ,  G03F7/70266 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70858

    Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.

    Abstract translation: 光刻设备部件如测量系统或光学元件（例如，反射镜）设置有用于控制部件变形的温度控制系统。 控制系统包括靠近组件的表面设置的通道，通过该通道提供两相冷却介质。 计量系统测量相对于参考位置的至少可移动项目的位置，并且包括连接到参考位置的计量框架。 编码器连接到可移动项目，并被构造和布置成测量编码器相对于参考网格的相对位置。 参考网格可以直接设置在计量框架的表面上。 平版印刷设备可以具有用于测量衬底台相对于投影系统的位置的计量系统。

    RADIATION SOURCE
    15.
    发明申请
    RADIATION SOURCE 有权
    辐射源

    公开(公告)号：US20150146182A1

    公开(公告)日：2015-05-28

    申请号：US14400773

    申请日：2013-04-29

    Applicant: ASML Netherlands B.V.

    Inventor： Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmus Kempen ,  Hermanus Kreuwel ,  Andrei Mikhailovich Yakunin

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006

    Abstract: A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.

    Abstract translation: 用于产生EUV辐射的辐射源包括激光器，其被配置为在被供应燃料液滴流的目标区域发射激光脉冲，所述燃料液滴流可以是当被激光束激发时发射EUV辐射的锡液滴。 EUV辐射由收集器收集。 锡液滴可以在主激光脉冲之前通过激光预脉冲进行预调节，以改变液滴的形状，使得液滴处于用于接收主激光脉冲的最佳状态。 本发明的实施例考虑了一个燃料液滴对随后的液滴的蒸发的影响，并允许调整主和/或预脉冲的定时，以考虑随后的液滴或振荡到达的任何延迟 可能由先前液滴汽化引起的后续液滴的形状。

    Lithographic apparatus and method
    17.
    发明授权
    Lithographic apparatus and method 有权

    公开(公告)号：US10558126B2

    公开(公告)日：2020-02-11

    申请号：US15120093

    申请日：2015-02-10

    Applicant: ASML Netherlands B.V. ,  Carl Zeiss SMT GmbH

    Inventor： Jan Bernard Plechelmus Van Schoot ,  Sascha Migura ,  Bernhard Kneer

    IPC: G03F7/20 ,  G03F1/00

    Abstract: A lithographic apparatus including a support structure constructed to support a mask having a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4×.

    Beam delivery for EUV lithography
    18.
    发明授权
    Beam delivery for EUV lithography 有权

    公开(公告)号：US10289006B2

    公开(公告)日：2019-05-14

    申请号：US14648452

    申请日：2013-11-26

    Applicant: ASML Netherlands B.V.

    Inventor： Jan Bernard Plechelmus Van Schoot ,  Markus Franciscus Antonius Eurlings ,  Hermanus Johannes Maria Kreuwel

    IPC: G03B27/54 ,  G03F7/20 ,  H05G2/00 ,  G02B19/00 ,  G02B27/09

    Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.

    Radiation source
    19.
    发明授权
    Radiation source 有权

    公开(公告)号：US09860966B2

    公开(公告)日：2018-01-02

    申请号：US14400773

    申请日：2013-04-29

    Applicant: ASML Netherlands B.V.

    Inventor： Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmus Kempen ,  Hermanus Kreuwel ,  Andrei Mikhailovich Yakunin

    IPC: G03B27/54 ,  H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006

    Abstract: A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.

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