公开(公告)号：US20190179233A1

公开(公告)日：2019-06-13

申请号：US16321867

申请日：2017-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Wim SYMENS ,  Bas JANSEN

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/70825 ,  H02N2/062

Abstract: A positioning system including: a first body; a second body; and an actuator arranged between the first body and the second body to position the first body relative to the second body, wherein the actuator includes a first piezoelectric actuator and a second piezoelectric actuator arranged in series, wherein the first piezoelectric actuator has a first hysteresis, wherein the second piezoelectric actuator has a second hysteresis smaller than the first hysteresis, and wherein the second piezoelectric actuator has a positioning range at least equal to the first hysteresis.

公开(公告)号：US20180017879A1

公开(公告)日：2018-01-18

申请号：US15547713

申请日：2016-01-26

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Maurice Willem Jozef Etiënne WIJCKMANS ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Christiaan Alexander HOOGENDAM ,  Bernardus Antonius Johannes LUTTIKHUIS

IPC: G03F7/20

CPC classification number: G03F7/70833 ,  G03F7/70725 ,  G03F7/709

Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.

公开(公告)号：US20170363965A1

公开(公告)日：2017-12-21

申请号：US15525610

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Raoul Maarten Simon KNOPS ,  Bob STREEFKERK ,  Christiaan Louis VALENTIN ,  Jan Bernard Plechelmus VAN SCHOOT ,  Wilhelmus Franciscus Johanne SIMONS ,  Leon Leonardus Franciscus MERKX ,  Robertus Johannes Marinus DE JONGH ,  Roel Johannes Elisabeth MERRY ,  Michael Frederik YPMA

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70266 ,  G03F7/705 ,  G03F7/706

Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

公开(公告)号：US20170102621A1

公开(公告)日：2017-04-13

申请号：US15385584

申请日：2016-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MEIJER ,  Johannes Catherinus Hubertus MULKENS ,  Roelof Aeilko Siebranc RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Erik Theodorus Maria BIJLAART ,  Christiaan Alexander HOOGENDAM ,  Helmar VAN SANTEN ,  Marcus Adrianus VAN DE KERKHOF ,  Mark KROON ,  Arie Jeffrey DEN BOEF ,  Joost Jeroen OTTENS ,  Jeroen Johannes Sophia Maria MERTENS

IPC: G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US20240184218A1

公开(公告)日：2024-06-06

申请号：US18441772

申请日：2024-02-14

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Arie Jeffrey DEN BOEF ,  Duygu AKBULUT ,  Marinus Johannes Maria VAN DAM ,  Hans BUTLER ,  Hugo Augustinus Joseph CRAMER ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Ferry ZIJP ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Marinus Petrus REIJNDERS

IPC: G03F7/00 ,  G01N21/956

CPC classification number: G03F7/70625 ,  G01N21/956 ,  G03F7/7015 ,  G03F7/70633

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US20240061348A1

公开(公告)日：2024-02-22

申请号：US18268847

申请日：2021-12-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Bram Antonius Gerardus LOMANS ,  Arie Jeffrey DEN BOEF ,  Hans BUTLER

IPC: G03F7/00

CPC classification number: G03F7/706843 ,  G03F7/7085

Abstract: A metrology apparatus for measuring a parameter of interest of a target on a substrate, the metrology apparatus including: m×n detectors, wherein m≥1 and n≥1; a first frame; and (n−1) second frames; and (m−1)×n intermediate frames, wherein each detector is connected to one of the intermediate or first or second frames via a primary positioning assembly; and each intermediate frame is connected to one of the first or second frames via a secondary positioning assembly.

公开(公告)号：US20220197157A1

公开(公告)日：2022-06-23

申请号：US17602616

申请日：2020-03-10

Applicant: ASML Netherlands B.V.

Inventor： Bas JANSEN ,  Samer Abdelmoeti Abuzeid ABDELMOETI ,  Hans BUTLER ,  Koen Johan Frederik LOONEN ,  Aditya SINGH ,  Ruben Etienne Johan Rinus VANDERVELDEN

IPC: G03F7/20

Abstract: The invention relates to an object positioning system including: an actuator system and a measurement system. The actuator system comprises an actuator made of a material with predominantly electrostrictive properties and substantially no net polarization in absence of an electric field. The actuator system is configured to apply an electric field to the actuator, which electric field comprises a bias electric field and an actuation electric field superimposed on the bias electric field, a field strength of said actuation electric field being equal to or smaller than a field strength of the bias electric field. The measurement system is configured to measure an electrical property of the actuator which is representative for a mechanical state of the actuator. The measurement system comprises a bridge circuit including an actuator and a reference element having electrical properties matched to the electrical properties of the actuator.

公开(公告)号：US20210240090A1

公开(公告)日：2021-08-05

申请号：US17049719

申请日：2019-04-04

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Joep Sander DE BEER ,  Cornelius Adrianus Lambertus DE HOON ,  Jeroen Pieter STARREVELD ,  Martinus VAN DUIJNHOVEN ,  Maurice Willem Jozef Etiënn WIJCKMANS

IPC: G03F7/20

Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.

公开(公告)号：US20200057390A1

公开(公告)日：2020-02-20

申请号：US16346727

申请日：2017-10-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Marinus Petrus REIJNDERS

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: A lithographic apparatus (LA) applies a pattern to a substrate (W). The lithographic apparatus includes a height sensor (LS), a substrate positioning subsystem, and a controller configured for causing the height sensor to measure the height (h) of the substrate surface at locations across the substrate. The measured heights are used to control the focusing of one or more patterns applied to the substrate. The height h is measured relative to a reference height (zref). The height sensor is operable to vary the reference height (zref), which allows a wider effective range of operation. Specifications for control of the substrate height during measurement can be relaxed. The reference height can be varied by moving one or more optical elements (566, 572, 576, 504 and/or 512) within the height sensor, or moving the height sensor. An embodiment without moving parts includes a multi-element photodetector (1212).

公开(公告)号：US20190187566A1

公开(公告)日：2019-06-20

申请号：US16099733

申请日：2017-04-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Paul Corné Henri DE WIT

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70633 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70808 ,  G03F9/70 ,  G03F9/7015 ,  G03F9/7019 ,  G03F9/7049 ,  G03F9/7084 ,  G03F9/7088

Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.