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公开(公告)号：US11031209B2
公开(公告)日：2021-06-08
申请号：US16729211
申请日：2019-12-27
Applicant: ASML Netherlands B.V.
Inventor： Jan-Gerard Cornelis Van Der Toorn
IPC: H01J37/24 , H01J37/147 , H01J37/28
Abstract: Systems and methods of observing a sample in a multi-beam apparatus are disclosed. A multi-beam apparatus may comprise an array of deflectors configured to steer individual beamlets of multiple beamlets, each deflector of the array of deflectors having a corresponding driver configured to receive a signal for steering a corresponding individual beamlet. The apparatus may further include a controller having circuitry to acquire profile data of a sample and to control each deflector by providing the signal to the corresponding driver based on the acquired profile data, and a steering circuitry comprising the corresponding driver configured to generate a driving signal, a corresponding compensator configured to receive the driving signal and a set of driving signals from other adjacent drivers associated with adjacent deflectors and to generate a compensation signal to compensate a corresponding deflector based on the driving signal and the set of driving signals.
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公开(公告)号：US10466595B2
公开(公告)日：2019-11-05
申请号：US15790287
申请日：2017-10-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC: G03F7/20
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US09477153B2
公开(公告)日：2016-10-25
申请号：US14484076
申请日：2014-09-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
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公开(公告)号：US09798246B2
公开(公告)日：2017-10-24
申请号：US15184770
申请日：2016-06-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US11996263B2
公开(公告)日：2024-05-28
申请号：US18196296
申请日：2023-05-11
Applicant: ASML Netherlands B.V.
CPC classification number: H01J37/20 , H02G11/00 , H01J2237/0262 , H01J2237/2007
Abstract: The present disclosure relates to a stage apparatus comprising: an object table configured to hold a substrate, the object table comprising an electrode configured to be charged by a power source and an electrical connection configured to electrically connect the electrode to the power source, and an electric field shield configured to shield at least a part of the electrical connection.
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Patent Agency Ranking
公开(公告)号：US12028000B2
公开(公告)日：2024-07-02
申请号：US18132617
申请日：2023-04-10
Applicant: ASML Netherlands B.V.
Inventor： Jan-Gerard Cornelis Van Der Toorn , Jeroen Gertruda Antonius Huinck , Han Willem Hendrik Severt , Allard Eelco Kooiker , Michael Johannes Christiaan Ronde , Arno Maria Wellink , Shibing Liu , Ying Luo , Yixiang Wang , Chia-Yao Chen , Bohang Zhu , Jurgen Van Soest
CPC classification number: H02N13/00 , G03F7/70708 , G03F7/70716
Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.
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公开(公告)号：US11637512B2
公开(公告)日：2023-04-25
申请号：US17351181
申请日：2021-06-17
Applicant: ASML Netherlands B.V.
Inventor： Jan-Gerard Cornelis Van Der Toorn , Jeroen Gertruda Antonius Huinck , Han Willem Hendrik Severt , Allard Eelco Kooiker , Michaël Johannes Christiaan Ronde , Arno Maria Wellink , Shibing Liu , Ying Luo , Yixiang Wang , Chia-Yao Chen , Bohang Zhu , Jurgen Van Soest
Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.
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公开(公告)号：US09477160B2
公开(公告)日：2016-10-25
申请号：US14624167
申请日：2015-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US12051607B2
公开(公告)日：2024-07-30
申请号：US17257900
申请日：2019-06-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Patriek Adrianus Alphonsus Maria Bruurs , Dennis Herman Caspar Van Banning , Jan-Gerard Cornelis Van Der Toorn , Edwin Cornelis Kadijk
IPC: H01L21/67 , G01K1/14 , G01K11/125 , H01J37/20 , H01J37/244 , H01L21/68
CPC classification number: H01L21/67248 , G01K1/14 , G01K11/125 , H01J37/20 , H01J37/244 , H01L21/68 , H01J2237/20228 , H01J2237/20235
Abstract: A stage apparatus including: an object table configured to hold an object; a positioning device configured to position the object table and the object held by the object table; and a remote temperature sensor configured to measure a temperature of the object table and/or the object, wherein the remote temperature sensor comprises a passive temperature sensing element.
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公开(公告)号：US12051562B2
公开(公告)日：2024-07-30
申请号：US17753298
申请日：2020-08-25
Applicant: ASML Netherlands B.V.
Inventor： Yixiang Wang , Shibing Liu , Shanhui Cao , Kangsheng Qiu , Juying Dou , Ying Luo , Yinglong Li , Qiang Li , Ronald Van Der Wilk , Jan-Gerard Cornelis Van Der Toorn
IPC: H01J37/20 , H01L21/683
CPC classification number: H01J37/20 , H01L21/6833 , H01J2237/0044
Abstract: Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.
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