公开(公告)号：US5855677A

公开(公告)日：1999-01-05

申请号：US831797

申请日：1997-04-08

申请人： David K. Carlson ,  Norma Riley ,  Roger N. Anderson

发明人： David K. Carlson ,  Norma Riley ,  Roger N. Anderson

IPC分类号： C23C16/44 ,  C23C16/48 ,  C23C16/52 ,  H01L21/00

CPC分类号： C23C16/4405 ,  C23C16/481 ,  C23C16/52 ,  H01L21/67248 ,  Y10S438/905

摘要： An apparatus and a concomitant method for controlling coolant (air) flow proximate a reaction chamber within a workpiece processing system such that the temperature of a wall of the reaction chamber is maintained at a predefined target temperature. The target temperature is typically a temperature that optimizes a process concurrently being accomplished within the chamber, e.g., utilizing one temperature during deposition processes and a different temperature during cleaning processes. The apparatus contains a temperature measuring device to measure the temperature of the chamber wall. The measured temperature is compared to the predefined target temperature. A closed loop system controls the air flow proximate the chamber walls such that the measured temperature becomes substantially equal to the target temperature. Air flow control is provided by an air flow control device located within an inlet conduit that supplies air to a shroud for channeling the air past the reaction chamber. The shroud forms a portion of a housing which supports and encloses the reaction chamber.

摘要翻译： 一种用于控制工件处理系统内的反应室附近的冷却剂（空气）流的装置和并发方法，使得反应室的壁的温度保持在预定的目标温度。 目标温度通常是优化室内同时进行的过程的温度，例如在沉积过程期间利用一个温度和在清洁过程期间不同的温度。 该装置包含用于测量室壁温度的温度测量装置。 将测量的温度与预定的目标温度进行比较。 闭环系统控制靠近室壁的空气流，使得测量的温度基本上等于目标温度。 空气流量控制由位于入口管道内的空气流量控制装置提供，该进气管道将空气供给到护罩，以将空气引导通过反应室。 护罩形成支撑并包围反应室的壳体的一部分。

公开(公告)号：US5179677A

公开(公告)日：1993-01-12

申请号：US651668

申请日：1991-02-06

申请人： Roger N. Anderson ,  Thomas E. Deacon ,  David K. Carlson

发明人： Roger N. Anderson ,  Thomas E. Deacon ,  David K. Carlson

IPC分类号： H01L21/205 ,  C23C16/48 ,  H01L21/00 ,  H01L21/22 ,  H01L21/31

CPC分类号： H01L21/67115 ,  C23C16/481

摘要： A reflector array employs a number of linear, tubular heater lamps arranged in a circle concentric with the substrate to be heated. Some of the lamps have focusing reflectors and the remainder have dispersive reflectors. A peripheral cylindrical reflector surrounds the lamps and their associated reflectors. The combined reflectors permit balancing the thermal radiation intensity across the surface of the substrate.

公开(公告)号：US06476362B1

公开(公告)日：2002-11-05

申请号：US09660565

申请日：2000-09-12

申请人： Thomas E. Deacon ,  Roger N. Anderson ,  David K. Carlson ,  Paul Comita

发明人： Thomas E. Deacon ,  Roger N. Anderson ,  David K. Carlson ,  Paul Comita

IPC分类号： F27B514

CPC分类号： H01L21/67115 ,  H05B3/0047

摘要： A lamp array for a thermal processing chamber. The lamp array includes a plurality of lamps arranged in a generally circular array. The plurality of lamps can be arranged in one or more concentric rings to form a generally circular array. Additional lamp arrays can be provided adjacent the circumference of the circular array or outermost concentric ring to provide a generally rectangular heating pattern. At least one row of lamps can be provided tangentially to the circular portion of the lamp array to provide preheating or postheating of process gases in the flow direction of a rectangular processing chamber.

摘要翻译： 用于热处理室的灯阵列。 灯阵列包括以大致圆形阵列布置的多个灯。 多个灯可以布置在一个或多个同心环中以形成大致圆形的阵列。 可以在圆形阵列或最外同心环的圆周附近设置附加的灯阵列，以提供大致矩形的加热图案。 至少一排灯可以与灯阵列的圆形部分相切地提供，以在矩形处理室的流动方向上提供工艺气体的预加热或后加热。

公开(公告)号：US08725665B2

公开(公告)日：2014-05-13

申请号：US13589737

申请日：2012-08-20

申请人： Roger N. Anderson ,  Albert Boulanger ,  Leon Wu ,  Serena Lee

发明人： Roger N. Anderson ,  Albert Boulanger ,  Leon Wu ,  Serena Lee

IPC分类号： G06F15/18

CPC分类号： G06Q10/04

摘要： Techniques for evaluating the accuracy of a predicted effectiveness of an improvement to an infrastructure include collecting data, representative of at least one pre-defined metric, from the infrastructure during first and second time periods corresponding to before and after a change has been implemented, respectively. A machine learning system can receive compiled data representative of the first time period and generate corresponding machine learning data. A machine learning results evaluator can empirically analyze the generated machine learning data. An implementer can implement the change to the infrastructure based at least in part on the data from a machine learning data outputer. A system performance improvement evaluator can compare the compiled data representative of the first time period to that of the second time period to determine a difference, if any, and compare the difference, if any, to a prediction based on the generated machine learning data.

摘要翻译： 用于评估对基础设施改进的预测有效性的准确性的技术包括分别在对应于改变之前和之后的第一和第二时间段期间从基础设施收集表示至少一个预定义度量的数据 。 机器学习系统可以接收代表第一时间段的编译数据并产生相应的机器学习数据。 机器学习结果评估器可以经验性地分析生成的机器学习数据。 至少部分地基于来自机器学习数据输出器的数据，实现者可以实现对基础设施的改变。 系统性能改进评估器可以将表示第一时间段的编译数据与第二时间周期的编译数据进行比较，以确定差异（如果有的话），并根据生成的机器学习数据将差值（如果有的话）与预测进行比较。

公开(公告)号：US08560476B2

公开(公告)日：2013-10-15

申请号：US12019347

申请日：2008-01-24

申请人： Roger N. Anderson ,  Albert Boulanger ,  Wei He ,  Ulisses Mello ,  Liqing Xu

发明人： Roger N. Anderson ,  Albert Boulanger ,  Wei He ,  Ulisses Mello ,  Liqing Xu

IPC分类号： G06F17/00 ,  G06N5/00 ,  G06G7/48

CPC分类号： G01V11/00 ,  G01V2210/612 ,  G06Q10/04

摘要： A computer-aided lean management (CALM) controller system recommends actions and manages production in an oil and gas reservoir/field as its properties and conditions change with time. The reservoir/field is characterized and represented as an electronic-field (“e-field”). A plurality of system applications describe dynamic and static e-field properties and conditions. The application workflows are integrated and combined in a feedback loop between actions taken in the field and metrics that score the success or failure of those actions. A controller/optimizer operates on the combination of the application workflows to compute production strategies and actions. The controller/optimizer is configured to generate a best action sequence for production, which is economically “always-in-the-money.”

摘要翻译： 计算机辅助精简管理（CALM）控制器系统建议在油气藏/油田中的生产进行动作和管理，因为其属性和条件随时间而变化。 水库/油田被表征为电子场（“电场”）。 多个系统应用程序描述动态和静态电场特性和条件。 应用程序工作流程被集成在一起，并结合在现场采取的动作和衡量这些操作的成功或失败的指标之间的反馈循环中。 一个控制器/优化器运行在应用程序工作流的组合上来计算生产策略和动作。 控制器/优化器被配置为生成最佳的动作序列，这是经济上“永远在金钱”。

公开(公告)号：US20080294387A1

公开(公告)日：2008-11-27

申请号：US12019347

申请日：2008-01-24

申请人： Roger N. Anderson ,  Albert Boulanger ,  Wei He ,  Ulisses Mello ,  Liqing Xu

发明人： Roger N. Anderson ,  Albert Boulanger ,  Wei He ,  Ulisses Mello ,  Liqing Xu

IPC分类号： G06F17/50 ,  G06G7/50

CPC分类号： G01V11/00 ,  G01V2210/612 ,  G06Q10/04

摘要： A computer-aided lean management (CALM) controller system recommends actions and manages production in an oil and gas reservoir/field as its properties and conditions change with time. The reservoir/field is characterized and represented as an electronic-field (“e-field”). A plurality of system applications describe dynamic and static e-field properties and conditions. The application workflows are integrated and combined in a feedback loop between actions taken in the field and metrics that score the success or failure of those actions. A controller/optimizer operates on the combination of the application workflows to compute production strategies and actions. The controller/optimizer is configured to generate a best action sequence for production, which is economically “always-in-the-money.”

摘要翻译： 计算机辅助精简管理（CALM）控制器系统建议在油气藏/油田中的生产进行动作和管理，因为其属性和条件随时间而变化。 水库/油田被表征为电子场（“电场”）。 多个系统应用程序描述动态和静态电场特性和条件。 应用程序工作流程被集成在一起，并结合在现场采取的动作和衡量这些操作的成功或失败的指标之间的反馈循环中。 一个控制器/优化器运行在应用程序工作流的组合上来计算生产策略和动作。 控制器/优化器被配置为生成最佳的动作序列，这是经济上“永远在金钱”。

公开(公告)号：US6146464A

公开(公告)日：2000-11-14

申请号：US884243

申请日：1997-06-30

申请人： Israel Beinglass ,  Mahalingam Venkatesan ,  Roger N. Anderson

发明人： Israel Beinglass ,  Mahalingam Venkatesan ,  Roger N. Anderson

IPC分类号： H01L21/687 ,  C23C16/00

CPC分类号： H01L21/6875 ,  H01L21/68735

摘要： An apparatus for depositing a material on a wafer includes a susceptor plate mounted in a deposition chamber. The chamber has a gas inlet and a gas exhaust. Means are provided for heating the susceptor plate. The susceptor plate has a plurality of support posts projecting from its top surface. The support posts are arranged to support a wafer thereon with the back surface of the wafer being spaced from the surface of the susceptor plate. The support posts are of a length so that the wafer is spaced from the susceptor plate a distance sufficient to allow deposition gas to flow and/or diffuse between the wafer and the susceptor plate, but still allow heat transfer from the susceptor plate to the wafer mainly by conduction. The susceptor plate is also provided with means, such as retaining pins or a recess, to prevent lateral movement of a wafer seated on the support posts.

摘要翻译： 用于在晶片上沉积材料的设备包括安装在沉积室中的基座板。 该室具有气体入口和排气。 提供用于加热感受板的装置。 基座板具有从其顶表面突出的多个支撑柱。 支撑柱布置成在其上支撑晶片，其中晶片的后表面与基座板的表面间隔开。 支撑柱具有长度，使得晶片与基座板间隔足以允许沉积气体在晶片和基座板之间流动和/或扩散的距离，但仍允许从基座板到晶片的热传递 主要是通过传导。 基座板还设置有诸如保持销或凹部的装置，以防止位于支撑柱上的晶片的横向移动。

公开(公告)号：US5725673A

公开(公告)日：1998-03-10

申请号：US719580

申请日：1996-09-25

申请人： Roger N. Anderson ,  H. Peter W. Hey ,  Israel Beinglass ,  Mahalingam Venkatesan

发明人： Roger N. Anderson ,  H. Peter W. Hey ,  Israel Beinglass ,  Mahalingam Venkatesan

IPC分类号： C30B25/08 ,  C23C14/50 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C30B25/10 ,  C30B25/14 ,  H01L21/205 ,  H01L21/31 ,  C23C16/00

CPC分类号： C23C16/45502 ,  C23C16/455 ,  C23C16/45561 ,  C23C16/45563 ,  C23C16/4581 ,  C30B25/105 ,  C30B25/14

摘要： The present disclosure is directed to an apparatus for depositing a layer of a material on a wafer. The apparatus includes a deposition chamber having an upper dome, a lower dome and a side wall between the upper and lower domes. A susceptor plate is in and extends across the deposition chamber to divide the deposition chamber into an upper portion above the susceptor plate and a lower portion below the susceptor plate. An exhaust passage formed through the side wall and is coupled to an upper passage which extends to the upper portion of the deposition chamber and is coupled to a lower passage which extends to the lower portion of the deposition chamber.

摘要翻译： 本公开涉及一种用于在晶片上沉积材料层的装置。 该装置包括具有上圆顶，下圆顶和在上下圆顶之间的侧壁的沉积室。 感受板在沉积室中并且延伸穿过沉积室，以将沉积室分成基座板上方的上部和基座板下方的下部。 排气通道，其形成为穿过侧壁并且连接到上部通道，该上部通道延伸到沉积室的上部并且联接到延伸到沉积室的下部的下部通道。

公开(公告)号：US5311484A

公开(公告)日：1994-05-10

申请号：US736682

申请日：1991-07-26

申请人： Roger N. Anderson ,  Wei He

发明人： Roger N. Anderson ,  Wei He

IPC分类号： G01V1/28 ,  G01V9/00 ,  G01V1/00

CPC分类号： G01V9/005 ,  G01V1/28 ,  G01V2210/51

摘要： In the exploration for petroleum or natural gas, drilling targets are identified by locating local maxima of horizontal gradient in the top-of-geopressure surface of a region of exploration. The probability of finding hydrocarbon deposits is significantly improved where the drilling targets are local maxima of the horizontal gradient in the top-of-geopressure surface which coincide with local maxima of subsurface heat flow in the region of exploration, particularly where the local maxima in the horizontal gradient of the top-of-geopressured surface is concentrated across major fault offsets and are parallel to the predominant strike directions of the faults. The top-of-geopressure surface may be remotely sensed by performing complex trace analysis on reflection seismic traces gathered for the region of exploration to derive corresponding reflection strength attribute traces. The corresponding reflection strength traces are first smoothed and then subject to further complex trace analysis to derive the envelope amplitudes of the smoothed reflection strength traces, which are referred to as second reflection strength traces. The second reflection strength traces are then analyzed to locate an uppermost distinct subsurface boundary between high and low amplitude components thereof. Such a distinct boundary is then identified as the top-of-geopressure surface for the region of exploration.

摘要翻译： 在勘探石油或天然气时，通过在勘探区域顶部地质压力表面定位局部最大水平梯度来确定钻井目标。 发现碳氢化合物沉积物的概率显着改善，其中钻井目标是地质压力表面中的水平梯度的局部最大值，其与勘探区域中的地下热流的局部最大值一致，特别是在 顶层地表压实表面的水平梯度集中在主要的断层偏移上，并且与断层的主要冲击方向平行。 可以通过对为探索区域收集的反射地震迹线执行复杂的轨迹分析来导出相应的反射强度属性轨迹，来远程感测地顶压力表面。 首先平滑对应的反射强度迹线，然后进行进一步的复杂轨迹分析，得到平滑的反射强度迹线的包络幅度，这被称为第二反射强度迹线。 然后分析第二反射强度迹线以在其高和低幅度分量之间定位最上面的不同的地下边界。 然后，将这样一个明确的边界确定为勘探区域的地顶压力表面。

公开(公告)号：US5108792A

公开(公告)日：1992-04-28

申请号：US491416

申请日：1990-03-09

申请人： Roger N. Anderson ,  John G. Martin ,  Douglas Meyer ,  Daniel West ,  Russell Bowman ,  David V. Adams

发明人： Roger N. Anderson ,  John G. Martin ,  Douglas Meyer ,  Daniel West ,  Russell Bowman ,  David V. Adams

IPC分类号： H01L21/203 ,  C23C16/44 ,  C23C16/48 ,  C30B25/08 ,  C30B25/10 ,  C30B25/14 ,  H01L21/00 ,  H01L21/205 ,  H01L21/26 ,  H01L21/324

CPC分类号： H01L21/67115 ,  C23C16/44 ,  C23C16/481 ,  C30B25/08 ,  C30B25/10 ,  C30B25/14

摘要： A thermal reactor for epitaxial deposition on a wafer comprises a double-dome vessel and dual heat sources. Each heat source comprises inner and outer circular arrays of infrared lamps. Circumferential heating uniformity is assured by the cylindrical symmetry of the vessel and the heating sources. Radial heating uniformity is provided by independent control of inner and outer heating arrays for both the top and bottom heat sources. The relative temperatures of wafer and susceptor are controlled by adjusting relative energies provided by the upper and lower heat sources so that backside migration. Reduced pressure operation is provided for by the convex top and bottom domes. Due to the provided control over transmitted energy distribution, a susceptor can have low thermal mass so that elevated temperature can be achieved more quickly and cooling can be facilitated as well. This improves throughput and reduces manufacturing costs per wafer. Reagent gas introduction can be axial or radial as desired.