公开(公告)号：US20070139633A1

公开(公告)日：2007-06-21

申请号：US11311640

申请日：2005-12-20

申请人： Arno Bleeker ,  Kars Troost

发明人： Arno Bleeker ,  Kars Troost

IPC分类号： G03B27/54

CPC分类号： G03F7/7045 ,  G03F7/70291 ,  G03F7/70341 ,  G03F7/70408 ,  G03F7/70466

摘要： A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference exposure unit is an integer multiple of a size of an exposure area of the lithography unit corresponding to a single individually controllable element.

摘要翻译： 组合干涉曝光单元和光刻单元的光刻系统。 光刻单元可以包括单独可控元件的阵列。 光刻系统可以布置成使得由干涉曝光单元曝光的线的间距是与单个可单独控制的元件对应的光刻单元的曝光区域的尺寸的整数倍。

公开(公告)号：US20070058145A1

公开(公告)日：2007-03-15

申请号：US11595968

申请日：2006-11-13

申请人： Arno Bleeker

发明人： Arno Bleeker

IPC分类号： G03F7/26

CPC分类号： G03F1/32 ,  G03F7/70283 ,  G03F7/70291

摘要： Pixel element for a programmable patterning structure (e.g. a spatial light modulator) which can simultaneously modulate both phase and amplitude. Use of such a programmable patterning structure with lithographic projection apparatus is also described.

摘要翻译： 用于可同时调制相位和幅度的可编程图案结构（例如空间光调制器）的像素元件。 还描述了使用这种可编程图案结构与光刻投影装置。

公开(公告)号：US20070030471A1

公开(公告)日：2007-02-08

申请号：US11580134

申请日：2006-10-13

申请人： Kars Troost ,  Arno Bleeker

发明人： Kars Troost ,  Arno Bleeker

IPC分类号： G03B27/54

CPC分类号： G03F7/70058 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70425

摘要： A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.

摘要翻译： 使用系统和方法来制造使用至少一个曝光步骤的装置。 每个曝光步骤将图案化的辐射束投射到衬底上。 图案化的波束包括多个像素。 每个像素在曝光步骤中向目标部分提供不大于预定正常最大剂量的辐射剂量，和/或至少一个所选择的像素传递大于正常最大剂量的增加的辐射剂量。 可以递送增加的剂量以补偿阵列中与已选择像素相邻的像素处的已知位置处的有缺陷元件的影响，或者补偿由于该位置的曝光导致的所选像素的位置处的目标部分的曝光不足 涉及在另一曝光步骤中受已知缺陷元件影响的像素。

公开(公告)号：US20070013889A1

公开(公告)日：2007-01-18

申请号：US11179056

申请日：2005-07-12

申请人： Laurentius Jorritsma ,  Johannes Baselmans ,  Arno Bleeker ,  Jacob Klinkhamer

发明人： Laurentius Jorritsma ,  Johannes Baselmans ,  Arno Bleeker ,  Jacob Klinkhamer

IPC分类号： G03B27/54

CPC分类号： G03F7/70275 ,  G03F7/70575 ,  G03F7/70641

摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, an array of individually controllable elements serving to impart the beam with a pattern in its cross-section, a substrate table for supporting a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The beam of radiation comprises a plurality of beam components. The plurality of beam components includes a first beam component having a first frequency spectrum about a first frequency and at least a second beam component having a second frequency spectrum about a second frequency. The second frequency is different from the first frequency. The projection system focuses the first and second beam components at different heights with respect to the substrate table.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于在其横截面中赋予光束的单独可控元件的阵列，用于支撑衬底的衬底台，以及用于将图案化的投影系统 光束到基板的目标部分上。 辐射束包括多个光束分量。 多个光束分量包括具有关于第一频率的第一频谱的第一光束分量和具有关于第二频率的第二频谱的至少第二光束分量。 第二频率与第一频率不同。 投影系统将第一和第二光束分量相对于衬底台聚焦在不同的高度。

公开(公告)号：US20060203220A1

公开(公告)日：2006-09-14

申请号：US11252877

申请日：2005-10-19

申请人： Kars Troost ,  Johannes Baselmans ,  Arno Bleeker ,  Louis Markoya ,  Neal Callan ,  Nicholas Eib

发明人： Kars Troost ,  Johannes Baselmans ,  Arno Bleeker ,  Louis Markoya ,  Neal Callan ,  Nicholas Eib

IPC分类号： G03B27/54

CPC分类号： G03F7/70291 ,  G03F7/70275 ,  G03F7/70358

摘要： The tilt and position of individually controllable element are simultaneously adjusted to allow a greater range of contrasts to be achieved. This can also be used to compensate for cupping of individually controllable elements. Simultaneous adjustment of both the position and tilt of the individually controllable elements can be achieved by two electrodes operable over a range of values.

公开(公告)号：US20060138349A1

公开(公告)日：2006-06-29

申请号：US11020567

申请日：2004-12-27

申请人： Arno Bleeker ,  Johannes Jacobus Baselmans ,  Marce Mathijs Dierichs ,  Stanislav Smirnov ,  Christian Wagner ,  Lev Ryzhikov ,  Kars Troost

发明人： Arno Bleeker ,  Johannes Jacobus Baselmans ,  Marce Mathijs Dierichs ,  Stanislav Smirnov ,  Christian Wagner ,  Lev Ryzhikov ,  Kars Troost

IPC分类号： G03F7/20

CPC分类号： G03F7/702 ,  G03F7/70291

摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.

摘要翻译： 系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。 可单独控制的元件可以改变辐射束的远心性。 将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。 或者，独立可控元件可以改变辐射束的光轴。

公开(公告)号：US20060110665A1

公开(公告)日：2006-05-25

申请号：US10994201

申请日：2004-11-22

申请人： Arno Bleeker ,  Dominicus Jacobus Franken ,  Stephen Roux ,  Michael Nelson

发明人： Arno Bleeker ,  Dominicus Jacobus Franken ,  Stephen Roux ,  Michael Nelson

IPC分类号： G03F9/00 ,  G03C5/00 ,  G01B11/00 ,  G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70258 ,  G03F7/70308

摘要： A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.

公开(公告)号：US20060038969A1

公开(公告)日：2006-02-23

申请号：US10919530

申请日：2004-08-17

申请人： Johannes Baselmans ,  Arno Bleeker ,  Pieter De Jager ,  Kars Troost

发明人： Johannes Baselmans ,  Arno Bleeker ,  Pieter De Jager ,  Kars Troost

IPC分类号： G03B27/42

CPC分类号： G03F7/70383 ,  G03F7/70291

摘要： An array of individually controllable elements, comprising a plurality of control areas consisting of a plurality of rows of reflectors. Alternate rows of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.

摘要翻译： 一组可独立控制的元件，包括由多排反射器组成的多个控制区域。 交替的反射体行以常见的方式启动，使得控制区域用作光栅，以提供可用作衍射光学元件的控制元件。

公开(公告)号：US20050179884A1

公开(公告)日：2005-08-18

申请号：US10779823

申请日：2004-02-18

申请人： Cheng-Qun Gui ,  Arno Bleeker ,  Pieter De Jager ,  Joost Sytsma

发明人： Cheng-Qun Gui ,  Arno Bleeker ,  Pieter De Jager ,  Joost Sytsma

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC分类号： G03F7/70208 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291

摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.

摘要翻译： 提供了一种用于将照明系统的辐射分配到两个或更多个图案形成装置的辐射分布系统，每个图案装置用于构图辐射束，随后将其投影到衬底上。

公开(公告)号：US20050068511A1

公开(公告)日：2005-03-31

申请号：US10994669

申请日：2004-11-23

申请人： Paulus Liebregts ,  Arno Bleeker ,  Erik Loopstra ,  Harry Borggreve

发明人： Paulus Liebregts ,  Arno Bleeker ,  Erik Loopstra ,  Harry Borggreve

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC分类号： G03F7/70991 ,  G03F7/70291

摘要： A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.