Array substrate and fabrication method thereof, and display device
    16.
    发明授权
    Array substrate and fabrication method thereof, and display device 有权
    阵列基板及其制造方法以及显示装置

    公开(公告)号:US09437663B2

    公开(公告)日:2016-09-06

    申请号:US14785905

    申请日:2015-03-18

    Abstract: An array substrate and a fabrication method thereof, and a display device are provided. The array substrate comprises: a pattern of an organic light-emitting layer (11); a pattern of an active layer (4a) located in a thin film transistor region and a pattern of an absorbing layer (4b) located in an open region, which are arranged in a same layer, wherein, the pattern of the absorbing layer (4b) is located in a light outgoing direction of the pattern of the organic light-emitting layer (11), and is made of a transparent material having an ultraviolet absorbing function. In this way, the pattern of the absorbing layer located in the open region can absorb ultraviolet light from outgoing light, so that damage to eyes caused by the outgoing light can be reduced; and the pattern of the active layer and the pattern of the absorbing layer are arranged in a same layer, which, as compared with a manner of separately arranging a layer of an ultraviolet absorbing layer in the array substrate, can reduce a thickness of the array substrate, which is conducive to lighting and thinning a display device.

    Abstract translation: 提供阵列基板及其制造方法以及显示装置。 阵列基板包括:有机发光层(11)的图案; 位于薄膜晶体管区域中的有源层(4a)的图案和布置在同一层中的位于开放区域中的吸收层(4b)的图案,其中,吸收层(4b)的图案 )位于有机发光层(11)的图案的光出射方向上,并且由具有紫外线吸收功能的透明材料制成。 以这种方式,位于开放区域中的吸收层的图案可以吸收出射光的紫外线,从而可以减少由出射光引起的对眼睛的损伤; 并且有源层的图案和吸收层的图案被布置在同一层中,与在阵列基板中分开布置一层紫外线吸收层的方式相比,可以减小阵列的厚度 衬底,这有利于照明和变薄显示装置。

    Anti-diffusion layer, preparation method thereof, thin-film transistor (TFT), array substrate, display device
    17.
    发明授权
    Anti-diffusion layer, preparation method thereof, thin-film transistor (TFT), array substrate, display device 有权
    防扩散层,其制备方法,薄膜晶体管(TFT),阵列基板,显示装置

    公开(公告)号:US09368360B2

    公开(公告)日:2016-06-14

    申请号:US14345607

    申请日:2013-05-31

    Abstract: An anti-diffusion layer, a preparation method thereof, a thin-film transistor (TFT), an array substrate and a display device are provided, involve the display device manufacturing field and can resolve problem that a high atmosphere temperature is need in process of preparing a tantalum dioxide anti-diffusion layer by PVD or CVD, which causes the gate electrode to volatilize and affect the performance of a display device. The method for preparing the anti-diffusion layer comprises: placing a conductive base (1) and a cathode (4) in a electrolytic solution (3), taking the conductive base (1) as an anode, and forming a tantalum dioxide anti-diffusion layer on the conductive base (1) after energizing.

    Abstract translation: 提供了抗扩散层,其制备方法,薄膜晶体管(TFT),阵列基板和显示装置,涉及显示装置制造领域,并且可以解决在高温气氛中需要高气氛的问题 通过PVD或CVD制备二氧化钽防扩散层,这导致栅电极挥发并影响显示装置的性能。 制备抗扩散层的方法包括:以导电性基体(1)为阳极,将导电性基体(1)和阴极(4)放置在电解液(3)中, 通电后导电基体(1)上的扩散层。

    Pixel drive circuit and preparation method therefor, and array substrate
    18.
    发明授权
    Pixel drive circuit and preparation method therefor, and array substrate 有权
    像素驱动电路及其制备方法,阵列基板

    公开(公告)号:US09099497B2

    公开(公告)日:2015-08-04

    申请号:US14124763

    申请日:2012-11-23

    Inventor: Chunsheng Jiang

    Abstract: The application discloses a pixel driving circuit and a fabrication method thereof as well as an array substrate, the pixel driving circuit including a switching and a driving TFT, the method including: on a substrate, fabricating a gate, a gate insulation GI layer, an oxide semiconductor layer, and an etching stop ESL layer simultaneously in turn; depositing simultaneously source/drain metals of the switching TFT and the driving TFT, the drain metal of the switching TFT extending and covering the GI layer on the gate of the driving TFT by etching; depositing a protection layer; etching off the protection layer, the drain metal of the switching TFT and the GI layer at a via hole by using a via hole process, to expose the gate of the driving TFT; depositing an ITO layer connecting the drain of the switching TFT and the gate of the driving TFT at the via hole.

    Abstract translation: 应用公开了一种像素驱动电路及其制造方法以及阵列基板,该像素驱动电路包括开关和驱动TFT,该方法包括:在基板上制造栅极,栅极绝缘GI层, 氧化物半导体层和蚀刻停止层ESL层; 同时沉积开关TFT和驱动TFT的源极/漏极金属,开关TFT的漏极金属通过蚀刻在驱动TFT的栅极上延伸并覆盖GI层; 沉积保护层; 通过使用通孔工艺在通孔处蚀刻保护层,开关TFT的漏极金属和GI层,以暴露驱动TFT的栅极; 在通孔处沉积连接开关TFT的漏极和驱动TFT的栅极的ITO层。

    Light-emitting display backplane, display device and manufacturing method of pixel define layer
    19.
    发明授权
    Light-emitting display backplane, display device and manufacturing method of pixel define layer 有权
    发光显示背板,显示装置及像素定义层的制造方法

    公开(公告)号:US09065001B2

    公开(公告)日:2015-06-23

    申请号:US14078569

    申请日:2013-11-13

    CPC classification number: H01L33/08 G02F1/133603 H01L27/3246 H01L27/3283

    Abstract: The present invention discloses a light-emitting display backplane, a display device and a manufacturing method of a pixel define layer. A light-emitting display backplane according to the present invention comprises: a substrate and a pixel define layer provided thereon, wherein said pixel define layer comprises: a first photosensitive resin layer, a first transparent define layer and a second transparent define layer sequentially provided on said substrate from bottom to top, each of the first photosensitive resin layer, the first define layer and the second define layer is provided with openings corresponding to respective pixels, and the openings in said second define layer are smaller than those in both said first define layer and said first photosensitive resin layer, so as to form luminescent material filling regions which are wider at bottom and narrower at top.

    Abstract translation: 本发明公开了一种像素限定层的发光显示器背板,显示装置和制造方法。 根据本发明的发光显示器背板包括:衬底和设置在其上的像素限定层,其中所述像素限定层包括:第一感光树脂层,第一透明限定层和第二透明限定层, 所述基板从底部到顶部,每个第一感光性树脂层,第一限定层和第二限定层设置有对应于各个像素的开口,并且所述第二限定层中的开口小于所述第一限定层中的开口 层和所述第一感光性树脂层,以形成底部较宽且顶部较窄的发光材料填充区域。

    Light-emitting Display Backplane, Display Device and Manufacturing Method of Pixel Define Layer
    20.
    发明申请
    Light-emitting Display Backplane, Display Device and Manufacturing Method of Pixel Define Layer 有权
    发光显示器背板,显示设备和像素定义层的制造方法

    公开(公告)号:US20140131743A1

    公开(公告)日:2014-05-15

    申请号:US14078569

    申请日:2013-11-13

    CPC classification number: H01L33/08 G02F1/133603 H01L27/3246 H01L27/3283

    Abstract: The present invention discloses a light-emitting display backplane, a display device and a manufacturing method of a pixel define layer. A light-emitting display backplane according to the present invention comprises: a substrate and a pixel define layer provided thereon, wherein said pixel define layer comprises: a first photosensitive resin layer, a first transparent define layer and a second transparent define layer sequentially provided on said substrate from bottom to top, each of the first photosensitive resin layer, the first define layer and the second define layer is provided with openings corresponding to respective pixels, and the openings in said second define layer are smaller than those in both said first define layer and said first photosensitive resin layer, so as to form luminescent material filling regions which are wider at bottom and narrower at top.

    Abstract translation: 本发明公开了一种像素限定层的发光显示器背板,显示装置和制造方法。 根据本发明的发光显示器背板包括:衬底和设置在其上的像素限定层,其中所述像素限定层包括:第一感光树脂层,第一透明限定层和第二透明限定层, 所述基板从底部到顶部,每个第一感光性树脂层,第一限定层和第二限定层设置有对应于各个像素的开口,并且所述第二限定层中的开口小于所述第一限定层中的开口 层和所述第一感光性树脂层,以形成底部较宽且顶部较窄的发光材料填充区域。

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