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29 条记录 (耗时 0.026 秒)

    Measurement system and method for measuring critical dimensions using ellipsometry
    11.
    发明授权
    Measurement system and method for measuring critical dimensions using ellipsometry 有权
    使用椭偏仪测量关键尺寸的测量系统和方法

    公开(公告)号：US6031614A

    公开(公告)日：2000-02-29

    申请号：US204402

    申请日：1998-12-02

    申请人： Alexander Michaelis ,  Oliver Genz ,  Ulrich Mantz

    发明人： Alexander Michaelis ,  Oliver Genz ,  Ulrich Mantz

    IPC分类号： G01B11/00 ,  G01B11/02 ,  G01J4/00 ,  H01L21/66

    CPC分类号： G01J4/00 ,  G01B11/02

    摘要： A system for measuring surface features having form birefringence in accordance with the present invention includes a radiation source for providing radiation incident on a surface having surface features. A radiation detecting device is provided for measuring characteristics of the incident radiation after being reflected from the surface features. A rotating stage rotates the surface such that incident light is directed at different angles due to the rotation of the rotating stage. A processor is included for processing the measured characteristics of the reflected light and correlating the characteristics to measure the surface features. A method for measuring feature sizes having form birefringence, in accordance with the present invention includes the steps of providing a surface having surface features thereon, radiating the surface features with light having a first polarization, measuring a reflected polarization of light reflected from the surface features, rotating the surface features by rotating the surface to measure the reflected polarization of the reflected light at least one new rotated position and correlating the reflected polarization to surface feature sizes.

    摘要翻译： 根据本发明的用于测量具有双折射的表面特征的系统包括用于提供入射在具有表面特征的表面上的辐射的辐射源。 提供辐射检测装置，用于测量从表面特征反射后的入射辐射的特性。 旋转台旋转表面，使得入射光由于旋转台的旋转而以不同的角度被引导。 包括一个处理器来处理所测量的反射光的特性，并且将特征相关联以测量表面特征。 根据本发明的用于测量具有双折射的特征尺寸的方法包括以下步骤：在其上提供具有表面特征的表面，用具有第一偏振光的光辐射表面特征，测量从表面特征反射的光的反射偏振 通过旋转表面旋转表面特征以测量反射光的反射极化至少一个新的旋转位置，并将反射的偏振与表面特征尺寸相关联。

    Method for the characterization of a film
    13.
    发明授权
    Method for the characterization of a film 失效
    电影表征方法

    公开(公告)号：US07362453B2

    公开(公告)日：2008-04-22

    申请号：US10952373

    申请日：2004-09-29

    申请人： Ulrich Mantz

    发明人： Ulrich Mantz

    IPC分类号： G01B11/28

    CPC分类号： G01N21/8422 ,  G01N21/211 ,  G01N21/55

    摘要： A method for the characterization of a film arranged in a plurality of regions on a substrate forms a respective optical measurement at each of a multiplicity of measurement sites in order to determine a respective measurement result, the measurement result being correlated with a film thickness on the substrate. Measurement results that satisfy a predetermined condition, which is satisfied for a measurement result that has been determined at a measurement site within one of the plurality of regions are selected. The film is characterized on the basis of the selected measurement results.

    摘要翻译： 用于表征布置在基板上的多个区域中的膜的方法在多个测量位置的每一个处形成相应的光学测量，以便确定相应的测量结果，测量结果与 基质。 选择满足对在多个区域中的一个区域内的测量部位确定的测量结果满足的预定条件的测量结果。 该电影的特点是在所选的测量结果的基础上。

    Optical measurement system and method
    14.
    发明授权
    Optical measurement system and method 有权
    光学测量系统及方法

    公开(公告)号：US07046363B2

    公开(公告)日：2006-05-16

    申请号：US10236448

    申请日：2002-09-06

    申请人： Alexander Michaelis ,  Oliver Genz ,  Ulrich Mantz

    发明人： Alexander Michaelis ,  Oliver Genz ,  Ulrich Mantz

    IPC分类号： G01N21/55

    CPC分类号： G01B11/02

    摘要： An apparatus and method for measuring feature sizes having form birefringence. The method includes providing a surface having surface features thereon; radiating the surface features with light having a first wavelength and a first polarization; measuring a reflected polarization of light having the first wavelength reflected from the surface features; rotating the surface features by rotating the surface to measure the reflected polarization of the reflected light having the first wavelength at least one new rotated position; radiating the surface features with light having a second wavelength and the first polarization; measuring a reflected polarization of light having the second wavelength reflected from the surface features; rotating the surface features by rotating the surface to measure the reflected polarization of the reflected light having the second wavelength at least one new rotated position; and correlating the reflected polarization from the light having the first and second polarizations to surface feature sizes.

    摘要翻译： 一种用于测量具有双折射形状的特征尺寸的装置和方法。 该方法包括提供其上具有表面特征的表面; 用具有第一波长和第一极化的光辐射表面特征; 测量具有从表面特征反射的第一波长的光的反射偏振; 通过旋转表面来旋转表面特征以测量具有第一波长的反射光的反射偏振至少一个新的旋转位置; 用具有第二波长和第一极化的光辐射表面特征; 测量具有从表面特征反射的第二波长的光的反射偏振; 通过旋转表面来旋转表面特征以测量具有第二波长的反射光的反射偏振至少一个新的旋转位置; 并且将具有第一和第二偏振的光的反射偏振与表面特征尺寸相关联。

    Method and apparatus for the depth-resolved characterization of layer of a carrier
    15.
    发明申请
    Method and apparatus for the depth-resolved characterization of layer of a carrier 失效
    用于载体层的深度分辨表征的方法和装置

    公开(公告)号：US20060076494A1

    公开(公告)日：2006-04-13

    申请号：US11196513

    申请日：2005-08-04

    申请人： Harald Bloess ,  Ulrich Mantz

    发明人： Harald Bloess ,  Ulrich Mantz

    IPC分类号： G01J5/02

    CPC分类号： H01L22/12

    摘要： The present invention relates to a method for the depth-resolved characterization of a layer of a carrier. This involves firstly producing a cutout in the layer of the carrier with a sidewall and subsequently removing carrier material adjoining the sidewall with the aid of an ion beam. During the removal process, images of the sidewall are recorded and material compositions of the removed carrier material are determined as well. A depth-resolved characterization of the layer of the carrier is carried out on the basis of a correlation of the determined material compositions of the removed carrier material with the recorded images of the sidewall, layer depths being assigned to the material compositions of the removed carrier material with the aid of the images of the sidewall. The invention furthermore relates to an apparatus for carrying out this method.

    摘要翻译： 本发明涉及用于载体层的深度分辨表征的方法。 这涉及首先在载体的层中产生具有侧壁的切口，随后借助离子束去除与侧壁相邻的载体材料。 在去除过程中，记录侧壁的图像，并且还确定去除的载体材料的材料组成。 基于去除的载体材料的确定的材料组成与侧壁的记录图像的相关性来执行载体层的深度分辨表征，层深度被分配给去除的载体的材料组成 借助于侧壁图像的材料。 本发明还涉及一种用于执行该方法的装置。

    Method and device for monitoring the etching operation for a regular depth structure in a semiconductor substrate
    16.
    发明申请
    Method and device for monitoring the etching operation for a regular depth structure in a semiconductor substrate 审中-公开
    用于监测半导体衬底中规则深度结构的蚀刻操作的方法和装置

    公开(公告)号：US20050239223A1

    公开(公告)日：2005-10-27

    申请号：US11106726

    申请日：2005-04-15

    申请人： Ulrich Mantz ,  Thomas Hingst ,  Stephan Wege

    发明人： Ulrich Mantz ,  Thomas Hingst ,  Stephan Wege

    IPC分类号： G01N21/55 ,  H01L21/66

    CPC分类号： G01N21/55

    摘要： In order to monitor the etching operation for a regular depth structure in a semiconductor substrate, a radiation source is used to irradiate, in large-area fashion, the semiconductor substrate in the region of the depth structure during the etching operation at a predetermined angle of incidence with respect to the surface of the semiconductor substrate with an electromagnetic radiation whose wavelength lies in the infrared region, a radiation detector is used to continuously detect the intensity of the reflected radiation at an angle of reflection—corresponding to the angle of incidence—with respect to the surface of the semiconductor substrate, and an evaluation unit is used to determine the depth of the etched structure and/or the quality of the etched structure with regard to the regularity thereof from the recorded intensity profile.

    摘要翻译： 为了监测半导体衬底中的规则深度结构的蚀刻操作，使用辐射源以大面积的方式在蚀刻操作期间以预定角度照射深度结构区域中的半导体衬底 相对于具有波长在红外区域的电磁辐射的半导体衬底的表面的入射，使用辐射检测器以与入射角相对应的反射角连续地检测反射辐射的强度 - 与 相对于半导体衬底的表面，使用评估单元来确定蚀刻结构的深度和/或蚀刻结构的质量。

    Method for the characterization of a film
    19.
    发明申请
    Method for the characterization of a film 失效
    电影表征方法

    公开(公告)号：US20050095731A1

    公开(公告)日：2005-05-05

    申请号：US10952373

    申请日：2004-09-29

    申请人： Ulrich Mantz

    发明人： Ulrich Mantz

    IPC分类号： G01N21/21 ,  G01N21/55 ,  G01N21/84 ,  H01L21/66

    CPC分类号： G01N21/8422 ,  G01N21/211 ,  G01N21/55

    摘要： A method for the characterization of a film arranged in a plurality of regions on a substrate forms a respective optical measurement at each of a multiplicity of measurement sites in order to determine a respective measurement result, the measurement result being correlated with a film thickness on the substrate. Measurement results that satisfy a predetermined condition, which is satisfied for a measurement result that has been determined at a measurement site within one of the plurality of regions are selected. The film is characterized on the basis of the selected measurement results.

    摘要翻译： 用于表征布置在基板上的多个区域中的膜的方法在多个测量位置的每一个处形成相应的光学测量，以便确定相应的测量结果，测量结果与 基质。 选择满足对在多个区域中的一个区域内的测量部位确定的测量结果满足的预定条件的测量结果。 该电影的特点是在所选的测量结果的基础上。