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公开(公告)号：US10017849B2
公开(公告)日：2018-07-10
申请号：US13840752
申请日：2013-03-15
Applicant: CORNING INCORPORATED
Inventor： Robert Alan Bellman , Ta-Ko Chuang , Robert George Manley , Mark Alejandro Quesada , Paul Arthur Sachenik
CPC classification number: C23C14/34 , C23C14/10 , C23C14/35 , C23C14/541
Abstract: A method of forming a hermetic barrier layer comprises sputtering a thin film from a sputtering target, wherein the sputtering target includes a sputtering material such as a low Tg glass, a precursor of a low Tg glass, or an oxide of copper or tin. During the sputtering, the formation of defects in the barrier layer are constrained to within a narrow range and the sputtering material is maintained at a temperature of less than 200° C.
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12.发明申请ARTICLES WITH MONOLITHIC, STRUCTURED SURFACES AND METHODS FOR MAKING AND USING SAME 审中-公开具有单晶，结构化表面的制品及其制造和使用方法公开(公告)号：US20150174625A1
公开(公告)日：2015-06-25
申请号：US14625010
申请日：2015-02-18
Applicant: CORNING INCORPORATED , ICFO (THE INSTITUE OF PHOTONIC SCIENCES) , ICREA (INSTITUTE CATALANA DE RECERCA I ESTUDIS AVANCATS)
Inventor： Shandon Dee Hart , Karl William Koch, III , Domenico Tulli , Prantik Mazumder , Valerio Pruneri , Paul Arthur Sachenik , Lili Tian , Johann Osmond , Albert Carrilero
CPC classification number: B08B17/065 , C03C15/00 , C03C17/30 , C03C2204/08 , G06F3/041 , G06F2203/04103 , Y10S977/773 , Y10S977/89 , Y10T428/24355
Abstract: A textured article that includes a transparent substrate having at least one primary surface and a glass, glass-ceramic or ceramic composition; a micro-textured surface on the primary surface of the substrate, the micro-textured surface comprising a plurality of hillocks; and a nano-structured surface on the micro-textured surface, the nano-structured surface comprising a plurality of nano-sized protrusions or a multilayer coating comprising a plurality of layers having a nano-scale thickness. Further, the hillocks have an average height of about 10 to about 1000 nm and an average longest lateral cross-sectional dimension of about 1 to about 100 μm, and the nano-sized protrusions have an average height of about 10 to about 500 nm and an average longest lateral cross-sectional dimension of about 10 to about 500 nm. The substrate may be chemically strengthened with a compressive stress greater than about 500 MPa and a compressive depth-of-layer greater than about 15 μm.
Abstract translation: 一种纹理制品，其包括具有至少一个主表面的透明基材和玻璃，玻璃陶瓷或陶瓷组合物; 在所述基底的主表面上的微纹理表面，所述微纹理表面包括多个小丘; 以及纳米结构化表面，所述纳米结构化表面包括多个纳米尺寸的突起或包含具有纳米级厚度的多个层的多层涂层。 此外，小丘的平均高度为约10至约1000nm，平均最大横向横截面尺寸为约1至约100μm，并且纳米尺寸的突起具有约10至约500nm的平均高度，以及 约10至约500nm的平均最长横向横截面尺寸。 衬底可以用大于约500MPa的压缩应力和大于约15μm的压缩深度层进行化学强化。
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13.发明申请公开(公告)号：US20140144772A1
公开(公告)日：2014-05-29
申请号：US13840752
申请日：2013-03-15
Applicant: CORNING INCORPORATED
Inventor： Robert Alan Bellman , Ta-Ko Chuang , Robert George Manley , Mark Alejandro Quesada , Paul Arthur Sachenik
IPC: C23C14/34
CPC classification number: C23C14/34 , C23C14/10 , C23C14/35 , C23C14/541
Abstract: A method of forming a hermetic barrier layer comprises sputtering a thin film from a sputtering target, wherein the sputtering target includes a sputtering material such as a low Tg glass, a precursor of a low Tg glass, or an oxide of copper or tin. During the sputtering, the formation of defects in the barrier layer are constrained to within a narrow range and the sputtering material is maintained at a temperature of less than 200° C.
Abstract translation: 形成气密性阻挡层的方法包括从溅射靶溅射薄膜，其中溅射靶包括诸如低Tg玻璃，低Tg玻璃的前体或铜或锡的氧化物的溅射材料。 在溅射期间，阻挡层中的缺陷的形成被限制在窄范围内，溅射材料保持在小于200℃的温度。
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公开(公告)号：US11434166B2
公开(公告)日：2022-09-06
申请号：US17205699
申请日：2021-03-18
Applicant: CORNING INCORPORATED
Inventor： Heather Bossard Decker , Shandon Dee Hart , Guangli Hu , James Joseph Price , Paul Arthur Sachenik
Abstract: One or more aspects of the disclosure pertain to an article including a film disposed on a glass substrate, which may be strengthened, where the interface between the film and the glass substrate is modified, such that the article has an improved average flexural strength, and the film retains key functional properties for its application. Some key functional properties of the film include optical, electrical and/or mechanical properties. The bridging of a crack from one of the film or the glass substrate into the other of the film or the glass substrate can be suppressed by inserting a nanoporous crack mitigating layer between the glass substrate and the film.
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Patent Agency Ranking
公开(公告)号：US10829409B2
公开(公告)日：2020-11-10
申请号：US14053093
申请日：2013-10-14
Applicant: CORNING INCORPORATED
Inventor： Heather Bossard Decker , Shandon Dee Hart , Guangli Hu , James Joseph Price , Paul Arthur Sachenik
Abstract: One or more aspects of the disclosure pertain to an article including a film disposed on a glass substrate, which may be strengthened, where the interface between the film and the glass substrate is modified, such that the article has an improved average flexural strength, and the film retains key functional properties for its application. Some key functional properties of the film include optical, electrical and/or mechanical properties. The bridging of a crack from one of the film or the glass substrate into the other of the film or the glass substrate can be suppressed by inserting a nanoporous crack mitigating layer between the glass substrate and the film.
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公开(公告)号：US20180247726A1
公开(公告)日：2018-08-30
申请号：US15963437
申请日：2018-04-26
Applicant: Corning Incorporated
Inventor： Robert Alan Bellman , Jeremy Curtis Clark , Paul Arthur Sachenik , Lynn Bernard Simpson , Lili Tian
CPC classification number: H01B1/08 , C23C14/086 , C23C14/3485 , H01B5/14 , H01L31/022483 , H01L31/1884 , Y02E10/50 , Y10T428/24355
Abstract: Disclosed are AZO films deposited on a transparent substrate by pulse DC using an oxide target with a composition in the range 0.5-2 wt % Al2O3, desirably at temperature above 325° C., resulting in films showing columnar grain structure with columns extending from the top to the bottom of the film, and small lateral grain size (less than 70 nm from substrate to top of film). The film has low resistivity at less than 10 Ohm/square at a thickness less than 400 nm, resistivity is desirably unchanged by annealing at temperatures of up to 450° C.
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公开(公告)号：US09984786B2
公开(公告)日：2018-05-29
申请号：US14434229
申请日：2013-10-04
Applicant: Corning Incorporated
Inventor： Robert Alan Bellman , Jeremy Curtis Clark , Paul Arthur Sachenik , Lynn Bernard Simpson , Lili Tian
CPC classification number: H01B1/08 , C23C14/086 , C23C14/3485 , H01B5/14 , H01L31/022483 , H01L31/1884 , Y02E10/50 , Y10T428/24355
Abstract: Disclosed are AZO films deposited on a transparent substrate by pulse DC using an oxide target with a composition in the range 0.5-2 wt % Al2O3, desirably at temperature above 325° C., resulting in films showing columnar grain structure with columns extending from the top to the bottom of the film, and small lateral grain size (less than 70 nm from substrate to top of film). The film has low resistivity at less than 10 Ohm/square at a thickness less than 400 nm, resistivity is desirably unchanged by annealing at temperatures of up to 450° C.
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公开(公告)号：US20170218503A1
公开(公告)日：2017-08-03
申请号：US15432453
申请日：2017-02-14
Applicant: Corning Incorporated
Inventor： Robert Alan Bellman , Ta-Ko Chuang , Robert George Manley , Mark Alejandro Quesada , Paul Arthur Sachenik
CPC classification number: C23C14/34 , C23C14/10 , C23C14/35 , C23C14/541
Abstract: A method of forming a hermetic barrier layer comprises sputtering a thin film from a sputtering target, wherein the sputtering target includes a sputtering material such as a low Tg glass, a precursor of a low Tg glass, or an oxide of copper or tin. During the sputtering, the formation of defects in the barrier layer are constrained to within a narrow range and the sputtering material is maintained at a temperature of less than 200° C.
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公开(公告)号：US09703011B2
公开(公告)日：2017-07-11
申请号：US14262224
申请日：2014-04-25
Applicant: CORNING INCORPORATED
Inventor： Kaveh Adib , Shandon Dee Hart , Karl William Koch, III , Charles Andrew Paulson , James Joseph Price , Paul Arthur Sachenik
CPC classification number: G02B1/14 , C03C3/095 , C03C17/006 , C03C17/245 , C03C17/3435 , C03C17/3657 , C03C2217/214 , C03C2217/228 , C03C2217/29 , C03C2217/425 , C03C2217/73 , C03C2217/78 , C03C2217/91 , C03C2218/154 , C03C2218/155 , C23C14/10 , C23C14/34 , G02B1/10 , G02B1/105 , G02B1/115
Abstract: Embodiments of this disclosure pertain to articles that exhibit scratch-resistance and improved optical properties. In some examples, the article exhibits a color shift of about 2 or less, when viewed at an incident illumination angle in the range from about 0 degrees to about 60 degrees from normal under an illuminant. In one or more embodiments, the articles include a substrate, and an optical film disposed on the substrate. The optical film includes a scratch-resistant layer and a refractive index gradient. In one or more embodiments, the refractive index includes a refractive index that increases from a first surface at the interface between the substrate and the optical film to a second surface. The refractive index gradient may be formed from a compositional gradient and/or a porosity gradient.
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